KR101397856B1 - 오늄―함유 ｃｍｐ 조성물 및 그의 이용 방법 - Google Patents

오늄―함유 ｃｍｐ 조성물 및 그의 이용 방법 Download PDF

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KR101397856B1
KR101397856B1 KR1020097007113A KR20097007113A KR101397856B1 KR 101397856 B1 KR101397856 B1 KR 101397856B1 KR 1020097007113 A KR1020097007113 A KR 1020097007113A KR 20097007113 A KR20097007113 A KR 20097007113A KR 101397856 B1 KR101397856 B1 KR 101397856B1
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substituent
composition
alkyl
aryl
cmp
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KR20090051269A (ko
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마이클 화이트
잔 첸
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캐보트 마이크로일렉트로닉스 코포레이션
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    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
    • H10P95/06—Planarisation of inorganic insulating materials
    • H10P95/062—Planarisation of inorganic insulating materials involving a dielectric removal step
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/02—Polishing compositions containing abrasives or grinding agents

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
KR1020097007113A 2006-09-08 2007-09-07 오늄―함유 ｃｍｐ 조성물 및 그의 이용 방법 Active KR101397856B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US11/517,909 US9129907B2 (en) 2006-09-08 2006-09-08 Onium-containing CMP compositions and methods of use thereof
US11/517,909 2006-09-08
PCT/US2007/019570 WO2008030576A1 (en) 2006-09-08 2007-09-07 Onium-containing cmp compositions and methods of use thereof

Publications (2)

Publication Number Publication Date
KR20090051269A KR20090051269A (ko) 2009-05-21
KR101397856B1 true KR101397856B1 (ko) 2014-05-20

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ID=39157555

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KR1020097007113A Active KR101397856B1 (ko) 2006-09-08 2007-09-07 오늄―함유 ｃｍｐ 조성물 및 그의 이용 방법

Country Status (9)

Country Link
US (1) US9129907B2 (enExample)
EP (1) EP2069452B1 (enExample)
JP (1) JP5385142B2 (enExample)
KR (1) KR101397856B1 (enExample)
CN (1) CN101511966B (enExample)
MY (1) MY154310A (enExample)
SG (1) SG174778A1 (enExample)
TW (1) TWI361831B (enExample)
WO (1) WO2008030576A1 (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5452859B2 (ja) * 2007-11-05 2014-03-26 富士フイルム株式会社 金属研磨用組成物、及び金属研磨方法
WO2010033156A2 (en) * 2008-09-19 2010-03-25 Cabot Microelectronics Corporation Barrier slurry for low-k dielectrics
JP5493526B2 (ja) * 2009-07-14 2014-05-14 日立化成株式会社 Ｃｍｐ用研磨液及び研磨方法
US8999193B2 (en) 2012-05-10 2015-04-07 Air Products And Chemicals, Inc. Chemical mechanical polishing composition having chemical additives and methods for using same
WO2014007063A1 (ja) * 2012-07-06 2014-01-09 日立化成株式会社 Ｃｍｐ用研磨液、貯蔵液及び研磨方法
JP6631520B2 (ja) * 2014-07-09 2020-01-15 日立化成株式会社 Ｃｍｐ用研磨液及び研磨方法
CN107922786B (zh) 2015-08-19 2023-02-03 费罗公司 浆料组合物和使用方法
KR102649775B1 (ko) * 2016-09-28 2024-03-20 롬 앤드 하스 일렉트로닉 머티리얼스 씨엠피 홀딩스, 인코포레이티드 4차 포스포늄 화합물을 포함하는 조성물 및 방법을 사용하는 텅스텐의 화학 기계적 연마
US12291655B2 (en) 2021-04-27 2025-05-06 DuPont Electronic Materials Holding, Inc. Polishing composition and method of polishing a substrate having enhanced defect reduction
US11274230B1 (en) * 2021-04-27 2022-03-15 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Polishing composition and method of polishing a substrate having enhanced defect inhibition
CN121620574A (zh) * 2023-07-14 2026-03-06 富士胶片电子材料美国有限公司 抛光组成物及其使用方法

Citations (2)

* Cited by examiner, † Cited by third party
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JP2000144109A (ja) * 1998-11-10 2000-05-26 Okamoto Machine Tool Works Ltd 化学機械研磨用研磨剤スラリ−
KR20020040636A (ko) * 2000-11-24 2002-05-30 가네꼬 히사시 화학적 기계적 연마용 슬러리

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US4528384A (en) * 1980-06-30 1985-07-09 The Dow Chemical Company Addition polymerizable aromatic sulfonium salts and polymers thereof
GB8504862D0 (en) * 1985-02-26 1985-03-27 Unilever Plc Liquid detergent composition
US5234493A (en) * 1988-11-08 1993-08-10 Rhone-Poulenc Chimie Stable, pumpable aqueous suspensions of precipitated silica particulates
US5393469A (en) * 1992-03-20 1995-02-28 Lumigen, Inc. Polymeric phosphonium salts providing enhanced chemiluminescence from 1,2-dioxetanes
US5858813A (en) * 1996-05-10 1999-01-12 Cabot Corporation Chemical mechanical polishing slurry for metal layers and films
US5958288A (en) * 1996-11-26 1999-09-28 Cabot Corporation Composition and slurry useful for metal CMP
EP0853335A3 (en) * 1997-01-10 1999-01-07 Texas Instruments Incorporated Slurry and process for the mechano-chemical polishing of semiconductor devices
US6083419A (en) * 1997-07-28 2000-07-04 Cabot Corporation Polishing composition including an inhibitor of tungsten etching
US6046112A (en) * 1998-12-14 2000-04-04 Taiwan Semiconductor Manufacturing Company Chemical mechanical polishing slurry
JP3841995B2 (ja) * 1999-12-28 2006-11-08 Ｎｅｃエレクトロニクス株式会社 化学的機械的研磨用スラリー
DE10022649B4 (de) * 2000-04-28 2008-06-19 Qimonda Ag Polierflüssigkeit und Verfahren zur Strukturierung von Metalloxiden
JP4507141B2 (ja) * 2000-05-22 2010-07-21 隆章 徳永 研磨用組成物、その製造方法およびそれを用いた研磨方法
US6974777B2 (en) * 2002-06-07 2005-12-13 Cabot Microelectronics Corporation CMP compositions for low-k dielectric materials
JP2004247605A (ja) * 2003-02-14 2004-09-02 Toshiba Corp Ｃｍｐ用スラリーおよび半導体装置の製造方法
US7018560B2 (en) * 2003-08-05 2006-03-28 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Composition for polishing semiconductor layers
US7968465B2 (en) * 2003-08-14 2011-06-28 Dupont Air Products Nanomaterials Llc Periodic acid compositions for polishing ruthenium/low K substrates
US20050076580A1 (en) * 2003-10-10 2005-04-14 Air Products And Chemicals, Inc. Polishing composition and use thereof
US7504044B2 (en) * 2004-11-05 2009-03-17 Cabot Microelectronics Corporation Polishing composition and method for high silicon nitride to silicon oxide removal rate ratios

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000144109A (ja) * 1998-11-10 2000-05-26 Okamoto Machine Tool Works Ltd 化学機械研磨用研磨剤スラリ−
KR20020040636A (ko) * 2000-11-24 2002-05-30 가네꼬 히사시 화학적 기계적 연마용 슬러리

Also Published As

Publication number Publication date
US20080060278A1 (en) 2008-03-13
SG174778A1 (en) 2011-10-28
US9129907B2 (en) 2015-09-08
EP2069452B1 (en) 2016-11-09
JP5385142B2 (ja) 2014-01-08
CN101511966A (zh) 2009-08-19
TW200821376A (en) 2008-05-16
WO2008030576A1 (en) 2008-03-13
JP2010503233A (ja) 2010-01-28
KR20090051269A (ko) 2009-05-21
TWI361831B (en) 2012-04-11
MY154310A (en) 2015-05-29
EP2069452A1 (en) 2009-06-17
CN101511966B (zh) 2013-01-16
EP2069452A4 (en) 2010-11-03

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