KR101306751B1 - 기판 지지용 홀더 및 이를 사용한 기판 처리 장치 - Google Patents
기판 지지용 홀더 및 이를 사용한 기판 처리 장치 Download PDFInfo
- Publication number
- KR101306751B1 KR101306751B1 KR1020110041160A KR20110041160A KR101306751B1 KR 101306751 B1 KR101306751 B1 KR 101306751B1 KR 1020110041160 A KR1020110041160 A KR 1020110041160A KR 20110041160 A KR20110041160 A KR 20110041160A KR 101306751 B1 KR101306751 B1 KR 101306751B1
- Authority
- KR
- South Korea
- Prior art keywords
- substrate
- support
- holder
- support plate
- processing apparatus
- Prior art date
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/6734—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders specially adapted for supporting large square shaped substrates
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/6875—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a plurality of individual support members, e.g. support posts or protrusions
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Nonlinear Science (AREA)
- Optics & Photonics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Chemical & Material Sciences (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Physical Vapour Deposition (AREA)
- Drying Of Semiconductors (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020110041160A KR101306751B1 (ko) | 2011-04-29 | 2011-04-29 | 기판 지지용 홀더 및 이를 사용한 기판 처리 장치 |
CN201280020720.3A CN103493195A (zh) | 2011-04-29 | 2012-04-30 | 基板支撑用的支撑板以及使用该支撑板的基板处理装置 |
JP2014508297A JP2014512700A (ja) | 2011-04-29 | 2012-04-30 | 基板支持用ホルダ及び該ホルダを用いた基板処理装置 |
PCT/KR2012/003338 WO2012148237A2 (ko) | 2011-04-29 | 2012-04-30 | 기판 지지용 홀더 및 이를 사용한 기판 처리 장치 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020110041160A KR101306751B1 (ko) | 2011-04-29 | 2011-04-29 | 기판 지지용 홀더 및 이를 사용한 기판 처리 장치 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20120122795A KR20120122795A (ko) | 2012-11-07 |
KR101306751B1 true KR101306751B1 (ko) | 2013-09-10 |
Family
ID=47072959
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020110041160A KR101306751B1 (ko) | 2011-04-29 | 2011-04-29 | 기판 지지용 홀더 및 이를 사용한 기판 처리 장치 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP2014512700A (zh) |
KR (1) | KR101306751B1 (zh) |
CN (1) | CN103493195A (zh) |
WO (1) | WO2012148237A2 (zh) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105068282A (zh) * | 2015-08-25 | 2015-11-18 | 太仓金马金属构件有限公司 | 液晶面板生产支架 |
CN108034929A (zh) * | 2017-12-27 | 2018-05-15 | 深圳市华星光电技术有限公司 | 一种应用于真空溅射设备的基板承载装置 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20050094685A (ko) * | 2004-03-24 | 2005-09-28 | 삼성전자주식회사 | 반도체 검사장치용 프로브 카드홀더 |
KR20060019777A (ko) * | 2004-08-30 | 2006-03-06 | 삼성전자주식회사 | 기판 적재용 카세트 |
KR20100008722A (ko) * | 2008-07-16 | 2010-01-26 | 주식회사 테라세미콘 | 배치식 열처리 장치 |
KR20110000253A (ko) * | 2009-06-26 | 2011-01-03 | 주식회사 티지솔라 | 기판 홀더 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4280481B2 (ja) * | 2002-10-17 | 2009-06-17 | タツモ株式会社 | 基板支持装置 |
JP2006005177A (ja) * | 2004-06-17 | 2006-01-05 | Tokyo Electron Ltd | 熱処理装置 |
KR100829923B1 (ko) * | 2006-08-30 | 2008-05-16 | 세메스 주식회사 | 스핀헤드 및 이를 이용하는 기판처리방법 |
KR101411620B1 (ko) * | 2007-02-16 | 2014-06-25 | 엘아이지에이디피 주식회사 | 평판표시소자 제조장치의 로드 락 챔버 |
JP4898627B2 (ja) * | 2007-10-19 | 2012-03-21 | 富士機械製造株式会社 | 回路基板支持装置および回路基板支持ピン |
TWI508178B (zh) * | 2008-07-16 | 2015-11-11 | Tera Semicon Corp | 批量式熱處理裝置 |
JP5218039B2 (ja) * | 2008-12-26 | 2013-06-26 | 株式会社Sumco | 気相成長装置 |
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2011
- 2011-04-29 KR KR1020110041160A patent/KR101306751B1/ko active IP Right Grant
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2012
- 2012-04-30 JP JP2014508297A patent/JP2014512700A/ja active Pending
- 2012-04-30 WO PCT/KR2012/003338 patent/WO2012148237A2/ko active Application Filing
- 2012-04-30 CN CN201280020720.3A patent/CN103493195A/zh active Pending
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20050094685A (ko) * | 2004-03-24 | 2005-09-28 | 삼성전자주식회사 | 반도체 검사장치용 프로브 카드홀더 |
KR20060019777A (ko) * | 2004-08-30 | 2006-03-06 | 삼성전자주식회사 | 기판 적재용 카세트 |
KR20100008722A (ko) * | 2008-07-16 | 2010-01-26 | 주식회사 테라세미콘 | 배치식 열처리 장치 |
KR20110000253A (ko) * | 2009-06-26 | 2011-01-03 | 주식회사 티지솔라 | 기판 홀더 |
Also Published As
Publication number | Publication date |
---|---|
KR20120122795A (ko) | 2012-11-07 |
JP2014512700A (ja) | 2014-05-22 |
WO2012148237A3 (ko) | 2013-01-10 |
CN103493195A (zh) | 2014-01-01 |
WO2012148237A2 (ko) | 2012-11-01 |
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