KR101263109B1 - 플라즈마 처리 장치 및 그 유전체창 구조 - Google Patents

플라즈마 처리 장치 및 그 유전체창 구조 Download PDF

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Publication number
KR101263109B1
KR101263109B1 KR1020110053344A KR20110053344A KR101263109B1 KR 101263109 B1 KR101263109 B1 KR 101263109B1 KR 1020110053344 A KR1020110053344 A KR 1020110053344A KR 20110053344 A KR20110053344 A KR 20110053344A KR 101263109 B1 KR101263109 B1 KR 101263109B1
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KR
South Korea
Prior art keywords
dielectric
window
plasma
protective cover
beam member
Prior art date
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KR1020110053344A
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English (en)
Korean (ko)
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KR20110134284A (ko
Inventor
가즈오 사사키
마사토 미나미
히토시 사이토
Original Assignee
도쿄엘렉트론가부시키가이샤
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Application filed by 도쿄엘렉트론가부시키가이샤 filed Critical 도쿄엘렉트론가부시키가이샤
Publication of KR20110134284A publication Critical patent/KR20110134284A/ko
Application granted granted Critical
Publication of KR101263109B1 publication Critical patent/KR101263109B1/ko

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H01J37/32119—Windows
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H01J37/3211—Antennas, e.g. particular shapes of coils
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32559—Protection means, e.g. coatings
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H05H1/4645—Radiofrequency discharges
    • H05H1/4652—Radiofrequency discharges using inductive coupling means, e.g. coils

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)
  • Drying Of Semiconductors (AREA)
KR1020110053344A 2010-06-07 2011-06-02 플라즈마 처리 장치 및 그 유전체창 구조 KR101263109B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2010129653A JP2011258622A (ja) 2010-06-07 2010-06-07 プラズマ処理装置及びその誘電体窓構造
JPJP-P-2010-129653 2010-06-07

Publications (2)

Publication Number Publication Date
KR20110134284A KR20110134284A (ko) 2011-12-14
KR101263109B1 true KR101263109B1 (ko) 2013-05-09

Family

ID=45105715

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020110053344A KR101263109B1 (ko) 2010-06-07 2011-06-02 플라즈마 처리 장치 및 그 유전체창 구조

Country Status (4)

Country Link
JP (1) JP2011258622A (ja)
KR (1) KR101263109B1 (ja)
CN (1) CN102280338B (ja)
TW (1) TW201220962A (ja)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6190571B2 (ja) * 2012-01-17 2017-08-30 東京エレクトロン株式会社 プラズマ処理装置
JP6228400B2 (ja) * 2013-07-16 2017-11-08 東京エレクトロン株式会社 誘導結合プラズマ処理装置
US10553398B2 (en) 2013-09-06 2020-02-04 Applied Materials, Inc. Power deposition control in inductively coupled plasma (ICP) reactors
JP6435090B2 (ja) * 2013-10-03 2018-12-05 東京エレクトロン株式会社 プラズマ処理装置
JP6600990B2 (ja) * 2015-01-27 2019-11-06 東京エレクトロン株式会社 プラズマ処理装置
US10370763B2 (en) 2016-04-18 2019-08-06 Tokyo Electron Limited Plasma processing apparatus
JP2016167461A (ja) * 2016-05-02 2016-09-15 東京エレクトロン株式会社 プラズマ処理装置
JP6906377B2 (ja) * 2017-06-23 2021-07-21 東京エレクトロン株式会社 排気プレート及びプラズマ処理装置
KR102256691B1 (ko) * 2017-10-24 2021-05-26 세메스 주식회사 기판 처리 장치 및 방법
KR102046034B1 (ko) * 2017-12-22 2019-11-18 인베니아 주식회사 유도결합 플라즈마 처리장치
KR102071517B1 (ko) * 2018-05-30 2020-01-30 인베니아 주식회사 유도결합 플라즈마 처리장치
US11688586B2 (en) * 2018-08-30 2023-06-27 Tokyo Electron Limited Method and apparatus for plasma processing
JP7303980B2 (ja) * 2019-07-09 2023-07-06 日新電機株式会社 プラズマ処理装置
KR102180640B1 (ko) * 2019-07-08 2020-11-19 인베니아 주식회사 유도 결합 플라즈마 처리장치
KR102180641B1 (ko) * 2019-07-08 2020-11-19 인베니아 주식회사 유도 결합 플라즈마 처리장치
CN115513025A (zh) * 2021-06-23 2022-12-23 北京鲁汶半导体科技有限公司 一种等离子刻蚀机的激励射频系统
JP2024084563A (ja) * 2022-12-13 2024-06-25 日新電機株式会社 プラズマ処理装置

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100418228B1 (ko) 1999-05-13 2004-02-11 동경 엘렉트론 주식회사 유도 결합 플라즈마 처리 장치

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100238627B1 (ko) * 1993-01-12 2000-01-15 히가시 데쓰로 플라즈마 처리장치
JP4028534B2 (ja) * 1999-05-13 2007-12-26 東京エレクトロン株式会社 誘導結合プラズマ処理装置
JP4672113B2 (ja) * 2000-07-07 2011-04-20 東京エレクトロン株式会社 誘導結合プラズマ処理装置
TWI290810B (en) * 2001-09-27 2007-12-01 Tokyo Electron Ltd Plasma treatment device
JP2007311182A (ja) * 2006-05-18 2007-11-29 Tokyo Electron Ltd 誘導結合プラズマ処理装置およびプラズマ処理方法
JP2008276984A (ja) * 2007-04-25 2008-11-13 Canon Inc プラズマ処理装置及び誘電体窓
KR20090073565A (ko) * 2007-12-31 2009-07-03 주식회사 에이디피엔지니어링 국소영역의 플라즈마 차폐장치 및 그 차폐방법
JP5551343B2 (ja) * 2008-05-14 2014-07-16 東京エレクトロン株式会社 誘導結合プラズマ処理装置

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100418228B1 (ko) 1999-05-13 2004-02-11 동경 엘렉트론 주식회사 유도 결합 플라즈마 처리 장치

Also Published As

Publication number Publication date
CN102280338A (zh) 2011-12-14
CN102280338B (zh) 2014-03-19
JP2011258622A (ja) 2011-12-22
TW201220962A (en) 2012-05-16
KR20110134284A (ko) 2011-12-14

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