KR101250602B1 - 감광성 도전 페이스트 및 그의 제조 방법 - Google Patents

감광성 도전 페이스트 및 그의 제조 방법 Download PDF

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Publication number
KR101250602B1
KR101250602B1 KR1020100094034A KR20100094034A KR101250602B1 KR 101250602 B1 KR101250602 B1 KR 101250602B1 KR 1020100094034 A KR1020100094034 A KR 1020100094034A KR 20100094034 A KR20100094034 A KR 20100094034A KR 101250602 B1 KR101250602 B1 KR 101250602B1
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KR
South Korea
Prior art keywords
conductive paste
mass
glass frit
photosensitive
conductor pattern
Prior art date
Application number
KR1020100094034A
Other languages
English (en)
Korean (ko)
Other versions
KR20110035945A (ko
Inventor
노부유끼 야나기다
히데유끼 이또
Original Assignee
다이요 홀딩스 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 다이요 홀딩스 가부시키가이샤 filed Critical 다이요 홀딩스 가부시키가이샤
Publication of KR20110035945A publication Critical patent/KR20110035945A/ko
Application granted granted Critical
Publication of KR101250602B1 publication Critical patent/KR101250602B1/ko

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J11/00—Gas-filled discharge tubes with alternating current induction of the discharge, e.g. alternating current plasma display panels [AC-PDP]; Gas-filled discharge tubes without any main electrode inside the vessel; Gas-filled discharge tubes with at least one main electrode outside the vessel
    • H01J11/20—Constructional details
    • H01J11/34—Vessels, containers or parts thereof, e.g. substrates

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Conductive Materials (AREA)
  • Gas-Filled Discharge Tubes (AREA)
  • Materials For Photolithography (AREA)
  • Parts Printed On Printed Circuit Boards (AREA)
KR1020100094034A 2009-09-30 2010-09-29 감광성 도전 페이스트 및 그의 제조 방법 KR101250602B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2009-227884 2009-09-30
JP2009227884A JP5399193B2 (ja) 2009-09-30 2009-09-30 感光性導電ペーストおよびその製造方法

Publications (2)

Publication Number Publication Date
KR20110035945A KR20110035945A (ko) 2011-04-06
KR101250602B1 true KR101250602B1 (ko) 2013-04-03

Family

ID=43886496

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020100094034A KR101250602B1 (ko) 2009-09-30 2010-09-29 감광성 도전 페이스트 및 그의 제조 방법

Country Status (3)

Country Link
JP (1) JP5399193B2 (ja)
KR (1) KR101250602B1 (ja)
CN (1) CN102033430B (ja)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI578099B (zh) * 2012-02-09 2017-04-11 大阪曹達股份有限公司 含有金屬微粒子之光硬化性樹脂組成物及其利用
CN111145935B (zh) * 2019-12-16 2022-07-15 中国人民解放军国防科技大学 一种银电极浆料及其制备方法和应用
CN116206800B (zh) * 2023-04-28 2023-07-21 乾宇微纳技术(深圳)有限公司 一种介质浆料及其制备方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20080009684A (ko) * 2005-05-25 2008-01-29 스미토모덴키고교가부시키가이샤 도전성 페이스트 및 그것을 이용한 배선기판
KR20080026165A (ko) * 2005-07-13 2008-03-24 다이요 잉키 세이조 가부시키가이샤 은 페이스트 조성물, 및 그것을 이용한 도전성 패턴의 형성방법 및 그의 도전성 패턴

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3510761B2 (ja) * 1997-03-26 2004-03-29 太陽インキ製造株式会社 アルカリ現像型光硬化性導電性ペースト組成物及びそれを用いて電極形成したプラズマディスプレイパネル
JP4095151B2 (ja) * 1998-02-06 2008-06-04 太陽インキ製造株式会社 アルカリ現像型光硬化性導電性ペースト組成物及びそれを用いて電極形成したプラズマディスプレイパネル
JP4327975B2 (ja) * 2000-02-25 2009-09-09 大日本印刷株式会社 導体インキ
JP4369103B2 (ja) * 2002-09-30 2009-11-18 太陽インキ製造株式会社 感光性導電ペースト及びそれを用いて電極形成したプラズマディスプレイパネル
JP4071171B2 (ja) * 2003-08-21 2008-04-02 太陽インキ製造株式会社 感光性導電組成物およびプラズマディスプレイパネル
US7608784B2 (en) * 2006-07-13 2009-10-27 E. I. Du Pont De Nemours And Company Photosensitive conductive paste for electrode formation and electrode
JP2008108724A (ja) * 2006-09-28 2008-05-08 Taiyo Ink Mfg Ltd 感光性導電ペースト及びその焼成物から形成された導電体パターン
JP5178178B2 (ja) * 2006-12-22 2013-04-10 太陽ホールディングス株式会社 感光性樹脂組成物及びそれを用いて得られる焼成物パターンの製造方法
JP2009187695A (ja) * 2008-02-04 2009-08-20 Dainippon Printing Co Ltd ディスプレイ用導体ペースト組成物

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20080009684A (ko) * 2005-05-25 2008-01-29 스미토모덴키고교가부시키가이샤 도전성 페이스트 및 그것을 이용한 배선기판
KR20080026165A (ko) * 2005-07-13 2008-03-24 다이요 잉키 세이조 가부시키가이샤 은 페이스트 조성물, 및 그것을 이용한 도전성 패턴의 형성방법 및 그의 도전성 패턴

Also Published As

Publication number Publication date
CN102033430A (zh) 2011-04-27
JP5399193B2 (ja) 2014-01-29
KR20110035945A (ko) 2011-04-06
JP2011076898A (ja) 2011-04-14
CN102033430B (zh) 2012-11-07

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