KR101238807B1 - 하이브리드 간섭 코팅, 램프, 및 방법 - Google Patents

하이브리드 간섭 코팅, 램프, 및 방법 Download PDF

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Publication number
KR101238807B1
KR101238807B1 KR1020127003265A KR20127003265A KR101238807B1 KR 101238807 B1 KR101238807 B1 KR 101238807B1 KR 1020127003265 A KR1020127003265 A KR 1020127003265A KR 20127003265 A KR20127003265 A KR 20127003265A KR 101238807 B1 KR101238807 B1 KR 101238807B1
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South Korea
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cvd
layer
region
layers
refractive index
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Expired - Fee Related
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KR1020127003265A
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English (en)
Korean (ko)
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KR20120025625A (ko
Inventor
지보 자오
티안지 자오
라자싱 슈와르츠 이스라엘
지아웨이 리
Original Assignee
제너럴 일렉트릭 캄파니
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/28—Interference filters
    • G02B5/285—Interference filters comprising deposited thin solid films
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00—Gas-discharge or vapour-discharge lamps
    • H01J61/02—Details
    • H01J61/30—Vessels; Containers
    • H01J61/35—Vessels; Containers provided with coatings on the walls thereof; Selection of materials for the coatings
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/20—Manufacture of screens on or from which an image or pattern is formed, picked up, converted or stored; Applying coatings to the vessel
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01K—ELECTRIC INCANDESCENT LAMPS
    • H01K1/00—Details
    • H01K1/28—Envelopes; Vessels
    • H01K1/32—Envelopes; Vessels provided with coatings on the walls; Vessels or coatings thereon characterised by the material thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01K—ELECTRIC INCANDESCENT LAMPS
    • H01K3/00—Apparatus or processes adapted to the manufacture, installing, removal, or maintenance of incandescent lamps or parts thereof
    • H01K3/005—Methods for coating the surface of the envelope

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Optical Filters (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Vapour Deposition (AREA)
KR1020127003265A 2009-07-08 2010-06-22 하이브리드 간섭 코팅, 램프, 및 방법 Expired - Fee Related KR101238807B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US12/499,394 2009-07-08
US12/499,394 US8035285B2 (en) 2009-07-08 2009-07-08 Hybrid interference coatings, lamps, and methods
PCT/US2010/039397 WO2011005489A1 (en) 2009-07-08 2010-06-22 Hybrid interference coatings, lamps, and methods

Publications (2)

Publication Number Publication Date
KR20120025625A KR20120025625A (ko) 2012-03-15
KR101238807B1 true KR101238807B1 (ko) 2013-03-04

Family

ID=42651401

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020127003265A Expired - Fee Related KR101238807B1 (ko) 2009-07-08 2010-06-22 하이브리드 간섭 코팅, 램프, 및 방법

Country Status (10)

Country Link
US (1) US8035285B2 (cg-RX-API-DMAC10.html)
EP (1) EP2452216A1 (cg-RX-API-DMAC10.html)
JP (1) JP5572707B2 (cg-RX-API-DMAC10.html)
KR (1) KR101238807B1 (cg-RX-API-DMAC10.html)
CN (1) CN102498420B (cg-RX-API-DMAC10.html)
BR (1) BR112012000319A2 (cg-RX-API-DMAC10.html)
CA (1) CA2767356C (cg-RX-API-DMAC10.html)
IN (1) IN2012DN00389A (cg-RX-API-DMAC10.html)
MX (1) MX2012000397A (cg-RX-API-DMAC10.html)
WO (1) WO2011005489A1 (cg-RX-API-DMAC10.html)

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* Cited by examiner, † Cited by third party
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CN103109210A (zh) * 2010-07-20 2013-05-15 沉积科学公司 高增益涂层与方法
US9236545B2 (en) 2013-11-18 2016-01-12 Ge Lighting Solutions Llc Hybrid metallization on plastic for a light emitting diode (LED) lighting system
US9501393B2 (en) * 2014-01-27 2016-11-22 Western Digital Technologies, Inc. Data storage system garbage collection based on at least one attribute
US10283342B2 (en) 2015-12-06 2019-05-07 Kla-Tencor Corporation Laser sustained plasma light source with graded absorption features

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JPH1154094A (ja) * 1997-07-30 1999-02-26 Matsushita Electron Corp ハロゲン電球およびその製造方法
JP2008221732A (ja) * 2007-03-15 2008-09-25 Kiyoshi Chiba 積層体

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US4949005A (en) 1988-11-14 1990-08-14 General Electric Company Tantala-silica interference filters and lamps using same
CA2017471C (en) 1989-07-19 2000-10-24 Matthew Eric Krisl Optical interference coatings and lamps using same
US5143445A (en) 1989-10-10 1992-09-01 General Electric Company Glass reflectors lpcvd coated with optical interference film
US5250367A (en) 1990-09-17 1993-10-05 Kennametal Inc. Binder enriched CVD and PVD coated cutting tool
JP3091326B2 (ja) * 1992-08-25 2000-09-25 松下電工株式会社 成膜方法
US5422534A (en) 1992-11-18 1995-06-06 General Electric Company Tantala-silica interference filters and lamps using same
US5412274A (en) 1992-12-17 1995-05-02 General Electric Company Diffusely reflecting optical interference filters and articles including lamps reflectors and lenses
GB2284704B (en) * 1993-12-10 1998-07-08 Gen Electric Patterned optical interference coatings for electric lamps
EP0691419A1 (en) * 1994-07-05 1996-01-10 General Electric Company A process and apparatus for forming multi-layer optical films
CN1089944C (zh) 1994-08-22 2002-08-28 皇家菲利浦电子有限公司 涂有干扰膜的电灯
JP3425248B2 (ja) * 1994-12-27 2003-07-14 大日本印刷株式会社 多重真空処理方法、機能性フィルムの製造方法及び機能性フィルム
CA2167957A1 (en) 1995-01-27 1996-07-28 Hongwen Li Method of making a tantala/silica interference filter on a vitreous substrate and an electric lamp made thereby
US6049169A (en) 1998-04-08 2000-04-11 Philips Electronics North America Corp. Electric lamp having optical interference filter of alternating layers of SiO2 and Nb2 O5 --Ta2 O5
US6295164B1 (en) 1998-09-08 2001-09-25 Nikon Corporation Multi-layered mirror
US6186090B1 (en) * 1999-03-04 2001-02-13 Energy Conversion Devices, Inc. Apparatus for the simultaneous deposition by physical vapor deposition and chemical vapor deposition and method therefor
JP4337164B2 (ja) * 1999-03-17 2009-09-30 セイコーエプソン株式会社 光学製品及びその製造方法
JP3506949B2 (ja) * 1999-04-09 2004-03-15 松下電器産業株式会社 薄膜の製造方法、薄膜が形成された回転楕円体、及びこれを用いた電球と薄膜形成装置。
US6441541B1 (en) 1999-08-25 2002-08-27 General Electric Company Optical interference coatings and lamps using same
JP4653369B2 (ja) 1999-09-30 2011-03-16 コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ 電気ランプ
KR20010110712A (ko) 2000-02-03 2001-12-13 롤페스 요하네스 게라투스 알베르투스 전기 램프 및 간섭막
JP2002040239A (ja) * 2000-07-26 2002-02-06 Toshiba Lighting & Technology Corp 光干渉膜構成体およびハロゲン電球
US6494997B1 (en) 2000-08-18 2002-12-17 General Electric Company Radio frequency magnetron sputtering for lighting applications
US6710520B1 (en) 2000-08-24 2004-03-23 General Electric Company Stress relief mechanism for optical interference coatings
US6911125B2 (en) 2000-09-07 2005-06-28 Matsushita Electric Industrial Co., Ltd. Thin film producing method and light bulb having such thin film
JP3751922B2 (ja) * 2001-08-28 2006-03-08 大日本印刷株式会社 反射防止フィルム、およびこれを用いたディスプレイ装置、液晶ディスプレイ装置
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JPH1154094A (ja) * 1997-07-30 1999-02-26 Matsushita Electron Corp ハロゲン電球およびその製造方法
JP2008221732A (ja) * 2007-03-15 2008-09-25 Kiyoshi Chiba 積層体

Also Published As

Publication number Publication date
CA2767356A1 (en) 2011-01-13
KR20120025625A (ko) 2012-03-15
BR112012000319A2 (pt) 2016-03-22
CN102498420B (zh) 2014-11-26
US20110006659A1 (en) 2011-01-13
JP5572707B2 (ja) 2014-08-13
EP2452216A1 (en) 2012-05-16
IN2012DN00389A (cg-RX-API-DMAC10.html) 2015-08-21
MX2012000397A (es) 2012-03-29
JP2012533088A (ja) 2012-12-20
US8035285B2 (en) 2011-10-11
WO2011005489A1 (en) 2011-01-13
CA2767356C (en) 2013-08-13
CN102498420A (zh) 2012-06-13

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