KR101225527B1 - 티올 화합물 및 이를 사용한 감광성 조성물과 블랙매트릭스 레지스트 조성물 - Google Patents

티올 화합물 및 이를 사용한 감광성 조성물과 블랙매트릭스 레지스트 조성물 Download PDF

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KR101225527B1
KR101225527B1 KR1020077007542A KR20077007542A KR101225527B1 KR 101225527 B1 KR101225527 B1 KR 101225527B1 KR 1020077007542 A KR1020077007542 A KR 1020077007542A KR 20077007542 A KR20077007542 A KR 20077007542A KR 101225527 B1 KR101225527 B1 KR 101225527B1
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South Korea
Prior art keywords
compound
group
general formula
meth
acrylate
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KR1020077007542A
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English (en)
Korean (ko)
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KR20070068356A (ko
Inventor
히로토시 카마타
미나 오니시
카츠미 무로후시
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쇼와 덴코 가부시키가이샤
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Priority claimed from PCT/JP2005/019955 external-priority patent/WO2006046733A1/en
Publication of KR20070068356A publication Critical patent/KR20070068356A/ko
Application granted granted Critical
Publication of KR101225527B1 publication Critical patent/KR101225527B1/ko

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    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
    • C07C323/50—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton
    • C07C323/51—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton
    • C07C323/52—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton the carbon skeleton being acyclic and saturated
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D233/00—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings
    • C07D233/04—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member
    • C07D233/20—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member with substituted hydrocarbon radicals, directly attached to ring carbon atoms
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
KR1020077007542A 2004-10-26 2005-10-25 티올 화합물 및 이를 사용한 감광성 조성물과 블랙매트릭스 레지스트 조성물 KR101225527B1 (ko)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JPJP-P-2004-00311233 2004-10-26
JP2004311233 2004-10-26
JP2004311275 2004-10-26
JPJP-P-2004-00311275 2004-10-26
PCT/JP2005/019955 WO2006046733A1 (en) 2004-10-26 2005-10-25 Thiol compound, and photosensitive composition and black matrix resist composition using the compound

Publications (2)

Publication Number Publication Date
KR20070068356A KR20070068356A (ko) 2007-06-29
KR101225527B1 true KR101225527B1 (ko) 2013-01-23

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Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020077007542A KR101225527B1 (ko) 2004-10-26 2005-10-25 티올 화합물 및 이를 사용한 감광성 조성물과 블랙매트릭스 레지스트 조성물

Country Status (3)

Country Link
KR (1) KR101225527B1 (zh)
CN (1) CN101048372B (zh)
TW (1) TWI390342B (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20200127773A (ko) 2019-05-03 2020-11-11 동우 화인켐 주식회사 폴리티올우레탄계 수지, 이를 포함하는 착색 감광성 수지 조성물, 상기 조성물을 포함하는 컬러필터 및 상기 컬러필터를 포함하는 표시장치

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101323562B1 (ko) * 2011-03-10 2013-10-29 롬엔드하스전자재료코리아유한회사 감광성 수지 조성물, 이를 이용한 저유전율 차광층 및 액정 디스플레이 장치
JP5924089B2 (ja) * 2012-04-11 2016-05-25 Jsr株式会社 感放射線性着色組成物、カラーフィルタ及び表示素子
JP6190650B2 (ja) * 2013-07-19 2017-08-30 昭和電工株式会社 カラーフィルターのオーバーコート層用樹脂組成物、それを用いたオーバーコート層、画像表示素子、及び画像表示素子の製造方法
WO2017203979A1 (ja) * 2016-05-27 2017-11-30 富士フイルム株式会社 硬化性組成物、硬化膜、カラーフィルタ、遮光膜、固体撮像素子、画像表示装置、及び硬化膜の製造方法
KR102232103B1 (ko) * 2019-09-04 2021-03-25 현기웅 광학 기기용 광 차단 필름 및 이의 제조 방법

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05287050A (ja) * 1992-04-13 1993-11-02 Mitsubishi Petrochem Co Ltd 高屈折率光学材料およびその製造法
JPH08259648A (ja) * 1995-03-27 1996-10-08 Nippon Kayaku Co Ltd レンズ用樹脂組成物及びその硬化物

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4048218A (en) * 1975-02-24 1977-09-13 W. R. Grace & Co. Flame retardant mercaptocarboxylic acid esters of halogenated aromatic polyols
FR2459816A1 (fr) * 1979-06-26 1981-01-16 Rhone Poulenc Ind Procede ameliore de stabilisation thermique de compositions a base de chlorure de polyvinyle
FR2492391A1 (fr) * 1980-10-20 1982-04-23 Rhone Poulenc Ind Compositions stabilisantes pour polymeres a base de chlorure de polyvinyle. procede de stabilisation desdits polymeres et polymeres ainsi stabilises
FR2552440B1 (fr) * 1983-09-28 1986-09-19 Rhone Poulenc Spec Chim Procede de stabilisation de polymeres a base de chlorure de vinyle, compositions stabilisantes pour la mise en oeuvre du procede et polymeres ainsi stabilises

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05287050A (ja) * 1992-04-13 1993-11-02 Mitsubishi Petrochem Co Ltd 高屈折率光学材料およびその製造法
JPH08259648A (ja) * 1995-03-27 1996-10-08 Nippon Kayaku Co Ltd レンズ用樹脂組成物及びその硬化物

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20200127773A (ko) 2019-05-03 2020-11-11 동우 화인켐 주식회사 폴리티올우레탄계 수지, 이를 포함하는 착색 감광성 수지 조성물, 상기 조성물을 포함하는 컬러필터 및 상기 컬러필터를 포함하는 표시장치

Also Published As

Publication number Publication date
KR20070068356A (ko) 2007-06-29
TWI390342B (zh) 2013-03-21
CN101048372B (zh) 2010-05-12
CN101048372A (zh) 2007-10-03
TW200630745A (en) 2006-09-01

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