KR101219835B1 - 태양전지 및 이의 제조방법 - Google Patents

태양전지 및 이의 제조방법 Download PDF

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Publication number
KR101219835B1
KR101219835B1 KR1020110007516A KR20110007516A KR101219835B1 KR 101219835 B1 KR101219835 B1 KR 101219835B1 KR 1020110007516 A KR1020110007516 A KR 1020110007516A KR 20110007516 A KR20110007516 A KR 20110007516A KR 101219835 B1 KR101219835 B1 KR 101219835B1
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KR
South Korea
Prior art keywords
layer
solar cell
buffer layer
light absorbing
back electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1020110007516A
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English (en)
Korean (ko)
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KR20120086205A (ko
Inventor
임진우
Original Assignee
엘지이노텍 주식회사
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Publication date
Application filed by 엘지이노텍 주식회사 filed Critical 엘지이노텍 주식회사
Priority to KR1020110007516A priority Critical patent/KR101219835B1/ko
Priority to US13/981,781 priority patent/US9818902B2/en
Priority to PCT/KR2011/007394 priority patent/WO2012102449A1/en
Priority to CN201180056408.5A priority patent/CN103222068B/zh
Priority to EP11856640.5A priority patent/EP2619800B1/en
Priority to JP2013550370A priority patent/JP2014503125A/ja
Publication of KR20120086205A publication Critical patent/KR20120086205A/ko
Application granted granted Critical
Publication of KR101219835B1 publication Critical patent/KR101219835B1/ko
Expired - Fee Related legal-status Critical Current
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    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F10/00Individual photovoltaic cells, e.g. solar cells
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F10/00Individual photovoltaic cells, e.g. solar cells
    • H10F10/10Individual photovoltaic cells, e.g. solar cells having potential barriers
    • H10F10/16Photovoltaic cells having only PN heterojunction potential barriers
    • H10F10/161Photovoltaic cells having only PN heterojunction potential barriers comprising multiple PN heterojunctions, e.g. tandem cells
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F10/00Individual photovoltaic cells, e.g. solar cells
    • H10F10/10Individual photovoltaic cells, e.g. solar cells having potential barriers
    • H10F10/16Photovoltaic cells having only PN heterojunction potential barriers
    • H10F10/167Photovoltaic cells having only PN heterojunction potential barriers comprising Group I-III-VI materials, e.g. CdS/CuInSe2 [CIS] heterojunction photovoltaic cells
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F71/00Manufacture or treatment of devices covered by this subclass
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00Constructional details of devices covered by this subclass
    • H10F77/10Semiconductor bodies
    • H10F77/16Material structures, e.g. crystalline structures, film structures or crystal plane orientations
    • H10F77/169Thin semiconductor films on metallic or insulating substrates
    • H10F77/1694Thin semiconductor films on metallic or insulating substrates the films including Group I-III-VI materials, e.g. CIS or CIGS
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/541CuInSe2 material PV cells
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

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  • Photovoltaic Devices (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Sustainable Energy (AREA)
  • Sustainable Development (AREA)
KR1020110007516A 2011-01-25 2011-01-25 태양전지 및 이의 제조방법 Expired - Fee Related KR101219835B1 (ko)

Priority Applications (6)

Application Number Priority Date Filing Date Title
KR1020110007516A KR101219835B1 (ko) 2011-01-25 2011-01-25 태양전지 및 이의 제조방법
US13/981,781 US9818902B2 (en) 2011-01-25 2011-10-06 Solar cell and method for manufacturing the same
PCT/KR2011/007394 WO2012102449A1 (en) 2011-01-25 2011-10-06 Solar cell and method for manufacturing the same
CN201180056408.5A CN103222068B (zh) 2011-01-25 2011-10-06 太阳能电池及其制造方法
EP11856640.5A EP2619800B1 (en) 2011-01-25 2011-10-06 Solar cell
JP2013550370A JP2014503125A (ja) 2011-01-25 2011-10-06 太陽電池及びその製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020110007516A KR101219835B1 (ko) 2011-01-25 2011-01-25 태양전지 및 이의 제조방법

Publications (2)

Publication Number Publication Date
KR20120086205A KR20120086205A (ko) 2012-08-02
KR101219835B1 true KR101219835B1 (ko) 2013-01-21

Family

ID=46581001

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020110007516A Expired - Fee Related KR101219835B1 (ko) 2011-01-25 2011-01-25 태양전지 및 이의 제조방법

Country Status (6)

Country Link
US (1) US9818902B2 (enExample)
EP (1) EP2619800B1 (enExample)
JP (1) JP2014503125A (enExample)
KR (1) KR101219835B1 (enExample)
CN (1) CN103222068B (enExample)
WO (1) WO2012102449A1 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106531827A (zh) * 2015-09-15 2017-03-22 株式会社东芝 光电转换元件、太阳能电池、太阳能电池模块及太阳光发电系统
CN105514198B (zh) * 2015-12-29 2017-03-08 中国科学院深圳先进技术研究院 薄膜太阳能电池及其缓冲层的制备方法
KR20170097440A (ko) * 2016-02-18 2017-08-28 전영권 태양전지 및 그 제조방법
CN106449875A (zh) * 2016-10-10 2017-02-22 北京四方创能光电科技有限公司 一种利用MgZnO薄膜制作CIGS薄膜太阳能电池的方法
CN108321216A (zh) * 2018-01-30 2018-07-24 北京铂阳顶荣光伏科技有限公司 一种可调光学带隙的氧锌镁材料、制备方法及太阳能电池

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20080009346A (ko) * 2006-07-24 2008-01-29 주식회사 엘지화학 태양전지 버퍼층의 제조방법
JP2010245189A (ja) 2009-04-02 2010-10-28 Institute Of National Colleges Of Technology Japan 薄膜太陽電池の製造方法
JP2010272613A (ja) 2009-05-20 2010-12-02 Fujifilm Corp 光電変換素子用基板とその製造方法、光電変換素子、及び太陽電池
JP2011009287A (ja) 2009-06-23 2011-01-13 Showa Shell Sekiyu Kk Cis系薄膜太陽電池

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5720827A (en) * 1996-07-19 1998-02-24 University Of Florida Design for the fabrication of high efficiency solar cells
JP2000332273A (ja) * 1999-05-25 2000-11-30 Matsushita Electric Ind Co Ltd 太陽電池およびその製造方法
JP2003264306A (ja) * 2002-03-07 2003-09-19 Matsushita Electric Ind Co Ltd 太陽電池の製造方法
JP2004158619A (ja) * 2002-11-06 2004-06-03 Matsushita Electric Ind Co Ltd 電子デバイスおよびその製造方法
US7038250B2 (en) 2003-05-28 2006-05-02 Kabushiki Kaisha Toshiba Semiconductor device suited for a high frequency amplifier
JP4841173B2 (ja) 2005-05-27 2011-12-21 昭和シェル石油株式会社 Cis系薄膜太陽電池の高抵抗バッファ層・窓層連続製膜方法及び製膜装置
US20100252110A1 (en) 2007-09-28 2010-10-07 Fujifilm Corporation Solar cell
JP5007907B2 (ja) * 2008-05-09 2012-08-22 株式会社豊田中央研究所 エッチング液及び半導体素子の製造方法
JP2010074069A (ja) * 2008-09-22 2010-04-02 Rohm Co Ltd 半導体発光素子
JP5022341B2 (ja) 2008-11-19 2012-09-12 三菱重工業株式会社 光電変換装置
KR20100066975A (ko) * 2008-12-10 2010-06-18 엘지이노텍 주식회사 태양전지 및 이의 제조방법
CN101814537B (zh) 2009-02-19 2012-03-28 中国科学院半导体研究所 氮化镓基雪崩型探测器及其制作方法
DE102009050987B3 (de) * 2009-05-12 2010-10-07 Schott Ag Dünnschichtsolarzelle und Verfahren zur Herstellung einer Dünnschichtsolarzelle
CN101840942A (zh) * 2010-05-19 2010-09-22 深圳丹邦投资集团有限公司 一种薄膜太阳电池及其制造方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20080009346A (ko) * 2006-07-24 2008-01-29 주식회사 엘지화학 태양전지 버퍼층의 제조방법
JP2010245189A (ja) 2009-04-02 2010-10-28 Institute Of National Colleges Of Technology Japan 薄膜太陽電池の製造方法
JP2010272613A (ja) 2009-05-20 2010-12-02 Fujifilm Corp 光電変換素子用基板とその製造方法、光電変換素子、及び太陽電池
JP2011009287A (ja) 2009-06-23 2011-01-13 Showa Shell Sekiyu Kk Cis系薄膜太陽電池

Also Published As

Publication number Publication date
US9818902B2 (en) 2017-11-14
CN103222068A (zh) 2013-07-24
KR20120086205A (ko) 2012-08-02
CN103222068B (zh) 2016-08-17
WO2012102449A1 (en) 2012-08-02
EP2619800A4 (en) 2018-01-17
JP2014503125A (ja) 2014-02-06
EP2619800A1 (en) 2013-07-31
EP2619800B1 (en) 2019-12-04
US20130327383A1 (en) 2013-12-12

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