KR101148589B1 - 마이크로리소그래피 투사 대물렌즈 - Google Patents

마이크로리소그래피 투사 대물렌즈 Download PDF

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Publication number
KR101148589B1
KR101148589B1 KR1020077010535A KR20077010535A KR101148589B1 KR 101148589 B1 KR101148589 B1 KR 101148589B1 KR 1020077010535 A KR1020077010535 A KR 1020077010535A KR 20077010535 A KR20077010535 A KR 20077010535A KR 101148589 B1 KR101148589 B1 KR 101148589B1
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South Korea
Prior art keywords
mirror
delete delete
concave
mirrors
image
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Expired - Fee Related
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KR1020077010535A
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English (en)
Korean (ko)
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KR20070084117A (ko
Inventor
한스-쥐르겐 만
데이비드 샤퍼
윌헴 울리흐
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칼 짜이스 에스엠티 게엠베하
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Priority claimed from DE102005042005A external-priority patent/DE102005042005A1/de
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Publication of KR20070084117A publication Critical patent/KR20070084117A/ko
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
    • G02B13/143—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation for use with ultraviolet radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
    • G02B17/0647—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors
    • G02B17/0657—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
KR1020077010535A 2004-12-23 2005-12-22 마이크로리소그래피 투사 대물렌즈 Expired - Fee Related KR101148589B1 (ko)

Applications Claiming Priority (11)

Application Number Priority Date Filing Date Title
DE102004063313.4 2004-12-23
DE102004063313 2004-12-23
US66503605P 2005-03-24 2005-03-24
US60/665,036 2005-03-24
US69545505P 2005-06-30 2005-06-30
US60/695,455 2005-06-30
US69890905P 2005-07-13 2005-07-13
US60/698,909 2005-07-13
DE102005042005.2 2005-09-05
DE102005042005A DE102005042005A1 (de) 2004-12-23 2005-09-05 Hochaperturiges Objektiv mit obskurierter Pupille
PCT/EP2005/013841 WO2006069725A1 (de) 2004-12-23 2005-12-22 Hochaperturiges objektiv mit obskurierter pupille

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1020107020467A Division KR101323888B1 (ko) 2004-12-23 2005-12-22 마이크로리소그래피 투사 대물렌즈

Publications (2)

Publication Number Publication Date
KR20070084117A KR20070084117A (ko) 2007-08-24
KR101148589B1 true KR101148589B1 (ko) 2012-05-22

Family

ID=35888429

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020077010535A Expired - Fee Related KR101148589B1 (ko) 2004-12-23 2005-12-22 마이크로리소그래피 투사 대물렌즈

Country Status (5)

Country Link
EP (1) EP1828829B1 (enExample)
JP (3) JP5366405B2 (enExample)
KR (1) KR101148589B1 (enExample)
CN (1) CN101713864B (enExample)
WO (1) WO2006069725A1 (enExample)

Families Citing this family (46)

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Publication number Priority date Publication date Assignee Title
US7884998B2 (en) * 2003-02-21 2011-02-08 Kla - Tencor Corporation Catadioptric microscope objective employing immersion liquid for use in broad band microscopy
KR100962911B1 (ko) 2005-09-13 2010-06-10 칼 짜이스 에스엠테 아게 마이크로리소그라피 투영 광학 시스템, 디바이스 제작 방법 및 광학 표면을 설계하기 위한 방법
DE102006014380A1 (de) * 2006-03-27 2007-10-11 Carl Zeiss Smt Ag Projektionsobjektiv und Projektionsbelichtungsanlage mit negativer Schnittweite der Eintrittspupille
JP5479890B2 (ja) 2006-04-07 2014-04-23 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影光学システム、装置、及び製造方法
DE102006047387A1 (de) * 2006-10-06 2008-04-10 Carl Zeiss Smt Ag Kompaktes 3-Spiegel-Objektiv
US7929114B2 (en) 2007-01-17 2011-04-19 Carl Zeiss Smt Gmbh Projection optics for microlithography
EP1950594A1 (de) 2007-01-17 2008-07-30 Carl Zeiss SMT AG Abbildende Optik, Projektionsbelichtunsanlage für die Mikrolithographie mit einer derartigen abbildenden Optik, Verfahren zur Herstellung eines mikrostrukturierten Bauteils mit einer derartigen Projektionsbelichtungsanlage, durch das Herstellungsverfahren gefertigtes mikrostrukturiertes Bauelement sowie Verwendung einer derartigen abbildenden Optik
DE102007045396A1 (de) 2007-09-21 2009-04-23 Carl Zeiss Smt Ag Bündelführender optischer Kollektor zur Erfassung der Emission einer Strahlungsquelle
EP2191331B1 (en) * 2007-09-21 2017-05-31 Carl Zeiss SMT GmbH Projection objective with obscurated pupil for microlithography
JP5902884B2 (ja) * 2007-10-26 2016-04-13 カール・ツァイス・エスエムティー・ゲーエムベーハー 結像光学系及びこの種の結像光学系を含むマイクロリソグラフィ用の投影露光装置
DE102007051671A1 (de) 2007-10-26 2009-05-07 Carl Zeiss Smt Ag Abbildende Optik sowie Projektionsbelichtungsanlage für die Mikrolithographie mit einer derartigen abbildenden Optik
CN102819197B (zh) 2007-10-26 2016-06-22 卡尔蔡司Smt有限责任公司 成像光学系统、投射曝光设备、微结构部件及其产生方法
DE102008017645A1 (de) 2008-04-04 2009-10-08 Carl Zeiss Smt Ag Vorrichtung zur mikrolithographischen Projektionsbelichtung sowie Vorrichtung zur Inspektion einer Oberfläche eines Substrats
JP5489034B2 (ja) * 2008-08-28 2014-05-14 国立大学法人東北大学 反射型投影光学装置
DE102008046699B4 (de) 2008-09-10 2014-03-13 Carl Zeiss Smt Gmbh Abbildende Optik
WO2010099899A1 (en) 2009-03-06 2010-09-10 Carl Zeiss Smt Ag Imaging optics and projection exposure installation for microlithography with an imaging optics of this type
WO2010115500A1 (en) 2009-03-30 2010-10-14 Carl Zeiss Smt Ag Imaging optics and projection exposure installation for microlithography with an imaging optics of this type
WO2010148293A2 (en) 2009-06-19 2010-12-23 Kla-Tencor Corporation Euv high throughput inspection system for defect detection on patterned euv masks, mask blanks, and wafers
DE102009030501A1 (de) 2009-06-24 2011-01-05 Carl Zeiss Smt Ag Abbildende Optik zur Abbildung eines Objektfeldes in ein Bildfeld sowie Beleuchtungsoptik zur Ausleuchtung eines Objektfeldes
DE102009035583A1 (de) 2009-07-29 2011-02-03 Carl Zeiss Sms Gmbh Vergrößernde abbildende Optik sowie Metrologiesystem mit einer derartigen abbildenden Optik
DE102009035582A1 (de) * 2009-07-29 2011-02-03 Carl Zeiss Sms Gmbh Vergrößernde abbildende Optik sowie Metrologiesystem mit einer derartigen abbildenden Optik
DE102010038748A1 (de) 2009-08-07 2011-03-24 Carl Zeiss Smt Gmbh Verfahren zur Herstellung eines Spiegels mit wenigstens zwei Spiegelflächen, Spiegel einer Projektionsbelichtungsanlage der Mikrolithographie und Projektionsbelichtungsanlage
DE102009049640B4 (de) 2009-10-15 2012-05-31 Carl Zeiss Smt Gmbh Projektionsobjektiv für eine mikrolithographische EUV-Projektionsbelichtungsanlage
DE102009046685A1 (de) * 2009-11-13 2011-05-26 Carl Zeiss Smt Gmbh Abbildende Optik
DE102010039745A1 (de) * 2010-08-25 2012-03-01 Carl Zeiss Smt Gmbh Abbildende Optik
DE102010040108A1 (de) 2010-09-01 2012-03-01 Carl Zeiss Smt Gmbh Obskurationsblende
US9075322B2 (en) * 2010-09-10 2015-07-07 Nikon Corporation Reflective imaging optical system, exposure apparatus, and method for producing device
DE102010041746A1 (de) * 2010-09-30 2012-04-05 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage der EUV-Mikrolithographie und Verfahren zur mikrolithographischen Belichtung
US8837041B2 (en) 2010-11-23 2014-09-16 Carl Zeiss Smt Gmbh Magnifying imaging optical system and metrology system with an imaging optical system of this type
DE102011084255A1 (de) 2010-11-24 2012-05-24 Carl Zeiss Smt Gmbh Vergrößernde abbildende Optik sowie Metrologiesystem mit einer derartigen abbildenden Optik
DE102011003302A1 (de) 2011-01-28 2012-08-02 Carl Zeiss Smt Gmbh Vergrößerte abbildende Optik sowie Metrologiesystem mit einer derartigen abbildenden Optik
DE102011006468B4 (de) 2011-03-31 2014-08-28 Carl Zeiss Smt Gmbh Vermessung eines abbildenden optischen Systems durch Überlagerung von Mustern
JP6116128B2 (ja) 2011-04-11 2017-04-19 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置および方法
DE102013213842A1 (de) 2013-07-16 2015-01-22 Carl Zeiss Smt Gmbh Optisches Bauelement
DE102015226531A1 (de) * 2015-04-14 2016-10-20 Carl Zeiss Smt Gmbh Abbildende Optik zur Abbildung eines Objektfeldes in ein Bildfeld sowie Projektionsbelichtungsanlage mit einer derartigen abbildenden Optik
KR102868300B1 (ko) 2015-05-28 2025-10-13 칼 짜이스 에스엠테 게엠베하 대물 필드를 이미지 필드 내로 이미징하기 위한 이미징 광학 유닛, 및 이러한 이미징 광학 유닛을 포함하는 투영 노광 장치
WO2017029383A1 (de) 2015-08-20 2017-02-23 Carl Zeiss Smt Gmbh Euv-lithographieanlage und verfahren
DE102015215948A1 (de) 2015-08-20 2015-10-15 Carl Zeiss Smt Gmbh Obskurationsvorrichtung
DE102015219671A1 (de) 2015-10-12 2017-04-27 Carl Zeiss Smt Gmbh Optische Baugruppe, Projektionssystem, Metrologiesystem und EUV-Lithographieanlage
DE102015221983A1 (de) * 2015-11-09 2017-05-11 Carl Zeiss Smt Gmbh Abbildende Optik zur Abbildung eines Objektfeldes in ein Bildfeld sowie Projektionsbelichtungsanlage mit einer derartigen abbildenden Optik
DE102017216458A1 (de) * 2017-09-18 2019-03-21 Carl Zeiss Smt Gmbh Verfahren zur Herstellung eines Spiegels als optischer Komponente für ein optisches System einer Projektionsbelichtungsanlage für die Projektionslithographie
DE102019117964A1 (de) 2019-07-03 2020-07-23 Asml Netherlands B.V. Lithographieanlage mit einer Überwachungseinrichtung für ein Pellikel
EP3928683A1 (en) * 2020-06-24 2021-12-29 Carl Zeiss Vision International GmbH Device and method for determining at least one ocular aberration
DE102020208007A1 (de) 2020-06-29 2021-12-30 Carl Zeiss Smt Gmbh Optisches System mit einer Aperturblende
DE102020211663A1 (de) 2020-09-17 2022-03-17 Carl Zeiss Smt Gmbh Optisches System, insbesondere Lithographiesystem
CN114371548B (zh) * 2021-12-28 2023-03-21 中国科学院长春光学精密机械与物理研究所 一种二维大视场成像平面对称自由曲面光学系统

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DE10052289A1 (de) * 2000-10-20 2002-04-25 Zeiss Carl 8-Spiegel-Mikrolithographie-Projektionsobjektiv
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Publication number Priority date Publication date Assignee Title
US5003567A (en) * 1989-02-09 1991-03-26 Hawryluk Andrew M Soft x-ray reduction camera for submicron lithography
US5212588A (en) * 1991-04-09 1993-05-18 The United States Of America As Represented By The United States Department Of Energy Reflective optical imaging system for extreme ultraviolet wavelengths
US5812309A (en) * 1993-08-17 1998-09-22 Steinheil Optronik Gmbh Infrared objective
US5686728A (en) * 1996-05-01 1997-11-11 Lucent Technologies Inc Projection lithography system and method using all-reflective optical elements

Also Published As

Publication number Publication date
JP5996892B2 (ja) 2016-09-21
KR20070084117A (ko) 2007-08-24
EP1828829A1 (de) 2007-09-05
EP1828829B1 (de) 2012-08-22
JP2008525831A (ja) 2008-07-17
JP2014123131A (ja) 2014-07-03
JP2012168541A (ja) 2012-09-06
CN101713864A (zh) 2010-05-26
JP5366405B2 (ja) 2013-12-11
JP5762579B2 (ja) 2015-08-12
CN101713864B (zh) 2013-10-30
WO2006069725A1 (de) 2006-07-06

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