CN101713864B - 具有暗化光瞳的大孔径物镜 - Google Patents

具有暗化光瞳的大孔径物镜 Download PDF

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Publication number
CN101713864B
CN101713864B CN2009102526330A CN200910252633A CN101713864B CN 101713864 B CN101713864 B CN 101713864B CN 2009102526330 A CN2009102526330 A CN 2009102526330A CN 200910252633 A CN200910252633 A CN 200910252633A CN 101713864 B CN101713864 B CN 101713864B
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CN
China
Prior art keywords
mirror
mirror body
projection objective
object lens
refl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN2009102526330A
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English (en)
Chinese (zh)
Other versions
CN101713864A (zh
Inventor
汉斯-于尔根·曼
戴维·谢弗
威廉·乌尔里希
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Original Assignee
Carl Zeiss SMT GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE102005042005A external-priority patent/DE102005042005A1/de
Application filed by Carl Zeiss SMT GmbH filed Critical Carl Zeiss SMT GmbH
Publication of CN101713864A publication Critical patent/CN101713864A/zh
Application granted granted Critical
Publication of CN101713864B publication Critical patent/CN101713864B/zh
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
    • G02B13/143—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation for use with ultraviolet radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
    • G02B17/0647—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors
    • G02B17/0657—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
CN2009102526330A 2004-12-23 2005-12-22 具有暗化光瞳的大孔径物镜 Expired - Fee Related CN101713864B (zh)

Applications Claiming Priority (12)

Application Number Priority Date Filing Date Title
DE1020040633134 2004-12-23
DE102004063313.4 2004-12-23
DE102004063313 2004-12-23
US66503605P 2005-03-24 2005-03-24
US60/665,036 2005-03-24
US69545505P 2005-06-30 2005-06-30
US60/695,455 2005-06-30
US69890905P 2005-07-13 2005-07-13
US60/698,909 2005-07-13
DE102005042005.2 2005-09-05
DE102005042005A DE102005042005A1 (de) 2004-12-23 2005-09-05 Hochaperturiges Objektiv mit obskurierter Pupille
DE1020050420052 2005-09-05

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
CN200580044848A Division CN100582861C (zh) 2004-12-23 2005-12-22 具有暗化光瞳的大孔径物镜

Publications (2)

Publication Number Publication Date
CN101713864A CN101713864A (zh) 2010-05-26
CN101713864B true CN101713864B (zh) 2013-10-30

Family

ID=35888429

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2009102526330A Expired - Fee Related CN101713864B (zh) 2004-12-23 2005-12-22 具有暗化光瞳的大孔径物镜

Country Status (5)

Country Link
EP (1) EP1828829B1 (enExample)
JP (3) JP5366405B2 (enExample)
KR (1) KR101148589B1 (enExample)
CN (1) CN101713864B (enExample)
WO (1) WO2006069725A1 (enExample)

Families Citing this family (46)

* Cited by examiner, † Cited by third party
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US7884998B2 (en) * 2003-02-21 2011-02-08 Kla - Tencor Corporation Catadioptric microscope objective employing immersion liquid for use in broad band microscopy
KR100962911B1 (ko) 2005-09-13 2010-06-10 칼 짜이스 에스엠테 아게 마이크로리소그라피 투영 광학 시스템, 디바이스 제작 방법 및 광학 표면을 설계하기 위한 방법
DE102006014380A1 (de) * 2006-03-27 2007-10-11 Carl Zeiss Smt Ag Projektionsobjektiv und Projektionsbelichtungsanlage mit negativer Schnittweite der Eintrittspupille
JP5479890B2 (ja) 2006-04-07 2014-04-23 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影光学システム、装置、及び製造方法
DE102006047387A1 (de) * 2006-10-06 2008-04-10 Carl Zeiss Smt Ag Kompaktes 3-Spiegel-Objektiv
US7929114B2 (en) 2007-01-17 2011-04-19 Carl Zeiss Smt Gmbh Projection optics for microlithography
EP1950594A1 (de) 2007-01-17 2008-07-30 Carl Zeiss SMT AG Abbildende Optik, Projektionsbelichtunsanlage für die Mikrolithographie mit einer derartigen abbildenden Optik, Verfahren zur Herstellung eines mikrostrukturierten Bauteils mit einer derartigen Projektionsbelichtungsanlage, durch das Herstellungsverfahren gefertigtes mikrostrukturiertes Bauelement sowie Verwendung einer derartigen abbildenden Optik
DE102007045396A1 (de) 2007-09-21 2009-04-23 Carl Zeiss Smt Ag Bündelführender optischer Kollektor zur Erfassung der Emission einer Strahlungsquelle
EP2191331B1 (en) * 2007-09-21 2017-05-31 Carl Zeiss SMT GmbH Projection objective with obscurated pupil for microlithography
JP5902884B2 (ja) * 2007-10-26 2016-04-13 カール・ツァイス・エスエムティー・ゲーエムベーハー 結像光学系及びこの種の結像光学系を含むマイクロリソグラフィ用の投影露光装置
DE102007051671A1 (de) 2007-10-26 2009-05-07 Carl Zeiss Smt Ag Abbildende Optik sowie Projektionsbelichtungsanlage für die Mikrolithographie mit einer derartigen abbildenden Optik
CN102819197B (zh) 2007-10-26 2016-06-22 卡尔蔡司Smt有限责任公司 成像光学系统、投射曝光设备、微结构部件及其产生方法
DE102008017645A1 (de) 2008-04-04 2009-10-08 Carl Zeiss Smt Ag Vorrichtung zur mikrolithographischen Projektionsbelichtung sowie Vorrichtung zur Inspektion einer Oberfläche eines Substrats
JP5489034B2 (ja) * 2008-08-28 2014-05-14 国立大学法人東北大学 反射型投影光学装置
DE102008046699B4 (de) 2008-09-10 2014-03-13 Carl Zeiss Smt Gmbh Abbildende Optik
WO2010099899A1 (en) 2009-03-06 2010-09-10 Carl Zeiss Smt Ag Imaging optics and projection exposure installation for microlithography with an imaging optics of this type
WO2010115500A1 (en) 2009-03-30 2010-10-14 Carl Zeiss Smt Ag Imaging optics and projection exposure installation for microlithography with an imaging optics of this type
WO2010148293A2 (en) 2009-06-19 2010-12-23 Kla-Tencor Corporation Euv high throughput inspection system for defect detection on patterned euv masks, mask blanks, and wafers
DE102009030501A1 (de) 2009-06-24 2011-01-05 Carl Zeiss Smt Ag Abbildende Optik zur Abbildung eines Objektfeldes in ein Bildfeld sowie Beleuchtungsoptik zur Ausleuchtung eines Objektfeldes
DE102009035583A1 (de) 2009-07-29 2011-02-03 Carl Zeiss Sms Gmbh Vergrößernde abbildende Optik sowie Metrologiesystem mit einer derartigen abbildenden Optik
DE102009035582A1 (de) * 2009-07-29 2011-02-03 Carl Zeiss Sms Gmbh Vergrößernde abbildende Optik sowie Metrologiesystem mit einer derartigen abbildenden Optik
DE102010038748A1 (de) 2009-08-07 2011-03-24 Carl Zeiss Smt Gmbh Verfahren zur Herstellung eines Spiegels mit wenigstens zwei Spiegelflächen, Spiegel einer Projektionsbelichtungsanlage der Mikrolithographie und Projektionsbelichtungsanlage
DE102009049640B4 (de) 2009-10-15 2012-05-31 Carl Zeiss Smt Gmbh Projektionsobjektiv für eine mikrolithographische EUV-Projektionsbelichtungsanlage
DE102009046685A1 (de) * 2009-11-13 2011-05-26 Carl Zeiss Smt Gmbh Abbildende Optik
DE102010039745A1 (de) * 2010-08-25 2012-03-01 Carl Zeiss Smt Gmbh Abbildende Optik
DE102010040108A1 (de) 2010-09-01 2012-03-01 Carl Zeiss Smt Gmbh Obskurationsblende
US9075322B2 (en) * 2010-09-10 2015-07-07 Nikon Corporation Reflective imaging optical system, exposure apparatus, and method for producing device
DE102010041746A1 (de) * 2010-09-30 2012-04-05 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage der EUV-Mikrolithographie und Verfahren zur mikrolithographischen Belichtung
US8837041B2 (en) 2010-11-23 2014-09-16 Carl Zeiss Smt Gmbh Magnifying imaging optical system and metrology system with an imaging optical system of this type
DE102011084255A1 (de) 2010-11-24 2012-05-24 Carl Zeiss Smt Gmbh Vergrößernde abbildende Optik sowie Metrologiesystem mit einer derartigen abbildenden Optik
DE102011003302A1 (de) 2011-01-28 2012-08-02 Carl Zeiss Smt Gmbh Vergrößerte abbildende Optik sowie Metrologiesystem mit einer derartigen abbildenden Optik
DE102011006468B4 (de) 2011-03-31 2014-08-28 Carl Zeiss Smt Gmbh Vermessung eines abbildenden optischen Systems durch Überlagerung von Mustern
JP6116128B2 (ja) 2011-04-11 2017-04-19 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置および方法
DE102013213842A1 (de) 2013-07-16 2015-01-22 Carl Zeiss Smt Gmbh Optisches Bauelement
DE102015226531A1 (de) * 2015-04-14 2016-10-20 Carl Zeiss Smt Gmbh Abbildende Optik zur Abbildung eines Objektfeldes in ein Bildfeld sowie Projektionsbelichtungsanlage mit einer derartigen abbildenden Optik
KR102868300B1 (ko) 2015-05-28 2025-10-13 칼 짜이스 에스엠테 게엠베하 대물 필드를 이미지 필드 내로 이미징하기 위한 이미징 광학 유닛, 및 이러한 이미징 광학 유닛을 포함하는 투영 노광 장치
WO2017029383A1 (de) 2015-08-20 2017-02-23 Carl Zeiss Smt Gmbh Euv-lithographieanlage und verfahren
DE102015215948A1 (de) 2015-08-20 2015-10-15 Carl Zeiss Smt Gmbh Obskurationsvorrichtung
DE102015219671A1 (de) 2015-10-12 2017-04-27 Carl Zeiss Smt Gmbh Optische Baugruppe, Projektionssystem, Metrologiesystem und EUV-Lithographieanlage
DE102015221983A1 (de) * 2015-11-09 2017-05-11 Carl Zeiss Smt Gmbh Abbildende Optik zur Abbildung eines Objektfeldes in ein Bildfeld sowie Projektionsbelichtungsanlage mit einer derartigen abbildenden Optik
DE102017216458A1 (de) * 2017-09-18 2019-03-21 Carl Zeiss Smt Gmbh Verfahren zur Herstellung eines Spiegels als optischer Komponente für ein optisches System einer Projektionsbelichtungsanlage für die Projektionslithographie
DE102019117964A1 (de) 2019-07-03 2020-07-23 Asml Netherlands B.V. Lithographieanlage mit einer Überwachungseinrichtung für ein Pellikel
EP3928683A1 (en) * 2020-06-24 2021-12-29 Carl Zeiss Vision International GmbH Device and method for determining at least one ocular aberration
DE102020208007A1 (de) 2020-06-29 2021-12-30 Carl Zeiss Smt Gmbh Optisches System mit einer Aperturblende
DE102020211663A1 (de) 2020-09-17 2022-03-17 Carl Zeiss Smt Gmbh Optisches System, insbesondere Lithographiesystem
CN114371548B (zh) * 2021-12-28 2023-03-21 中国科学院长春光学精密机械与物理研究所 一种二维大视场成像平面对称自由曲面光学系统

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Also Published As

Publication number Publication date
JP5996892B2 (ja) 2016-09-21
KR20070084117A (ko) 2007-08-24
EP1828829A1 (de) 2007-09-05
EP1828829B1 (de) 2012-08-22
JP2008525831A (ja) 2008-07-17
JP2014123131A (ja) 2014-07-03
JP2012168541A (ja) 2012-09-06
CN101713864A (zh) 2010-05-26
JP5366405B2 (ja) 2013-12-11
JP5762579B2 (ja) 2015-08-12
KR101148589B1 (ko) 2012-05-22
WO2006069725A1 (de) 2006-07-06

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Granted publication date: 20131030

Termination date: 20171222