KR101127355B1 - 포토마스크 및 그 제조 방법과 패턴 전사 방법 - Google Patents

포토마스크 및 그 제조 방법과 패턴 전사 방법 Download PDF

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KR101127355B1
KR101127355B1 KR1020080069980A KR20080069980A KR101127355B1 KR 101127355 B1 KR101127355 B1 KR 101127355B1 KR 1020080069980 A KR1020080069980 A KR 1020080069980A KR 20080069980 A KR20080069980 A KR 20080069980A KR 101127355 B1 KR101127355 B1 KR 101127355B1
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photomask
pattern
semi
transmissive
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Korean (ko)
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KR20090009155A (ko
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미찌아끼 사노
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호야 가부시키가이샤
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G03F1/32—Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portion; Preparation thereof

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
KR1020080069980A 2007-07-19 2008-07-18 포토마스크 및 그 제조 방법과 패턴 전사 방법 Active KR101127355B1 (ko)

Applications Claiming Priority (2)

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JP2007188335 2007-07-19
JPJP-P-2007-00188335 2007-07-19

Related Child Applications (1)

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KR1020120004711A Division KR101357324B1 (ko) 2007-07-19 2012-01-16 표시 장치 제조용 포토마스크 및 표시 장치의 제조 방법

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KR20090009155A KR20090009155A (ko) 2009-01-22
KR101127355B1 true KR101127355B1 (ko) 2012-03-29

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KR1020080069980A Active KR101127355B1 (ko) 2007-07-19 2008-07-18 포토마스크 및 그 제조 방법과 패턴 전사 방법
KR1020120004711A Active KR101357324B1 (ko) 2007-07-19 2012-01-16 표시 장치 제조용 포토마스크 및 표시 장치의 제조 방법

Family Applications After (1)

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KR1020120004711A Active KR101357324B1 (ko) 2007-07-19 2012-01-16 표시 장치 제조용 포토마스크 및 표시 장치의 제조 방법

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JP (2) JP5244485B2 (enExample)
KR (2) KR101127355B1 (enExample)
CN (1) CN101349864B (enExample)
TW (1) TWI422961B (enExample)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101194151B1 (ko) 2009-06-23 2012-12-24 호야 가부시키가이샤 다계조 포토마스크, 패턴 전사 방법 및 박막 트랜지스터의 제조 방법
WO2010150355A1 (ja) * 2009-06-23 2010-12-29 Hoya株式会社 多階調フォトマスク
CN101943854B (zh) * 2009-07-03 2012-07-04 深圳清溢光电股份有限公司 半灰阶掩模板半曝光区的设计方法及其制造方法
JP5409238B2 (ja) * 2009-09-29 2014-02-05 Ｈｏｙａ株式会社 フォトマスク、フォトマスクの製造方法、パターン転写方法及び表示装置用画素電極の製造方法
JP2011215197A (ja) * 2010-03-31 2011-10-27 Hoya Corp フォトマスク及びその製造方法
WO2012005524A2 (en) * 2010-07-08 2012-01-12 Lg Innotek Co., Ltd. The printed circuit board and the method for manufacturing the same
KR101149023B1 (ko) * 2010-07-08 2012-05-24 엘지이노텍 주식회사 인쇄회로기판 제조 방법 및 이에 의해 제조된 인쇄회로기판
JP2012212124A (ja) * 2011-03-23 2012-11-01 Hoya Corp フォトマスクの製造方法、パターン転写方法及び表示装置の製造方法
JP2012212125A (ja) * 2011-03-24 2012-11-01 Hoya Corp フォトマスクの製造方法、パターン転写方法及び表示装置の製造方法
JP6186719B2 (ja) * 2011-12-21 2017-08-30 大日本印刷株式会社 大型位相シフトマスクおよび大型位相シフトマスクの製造方法
JP6139826B2 (ja) * 2012-05-02 2017-05-31 Hoya株式会社 フォトマスク、パターン転写方法、及びフラットパネルディスプレイの製造方法
JP6081716B2 (ja) * 2012-05-02 2017-02-15 Hoya株式会社 フォトマスク、パターン転写方法及びフラットパネルディスプレイの製造方法
JP6093117B2 (ja) 2012-06-01 2017-03-08 Hoya株式会社 フォトマスク、フォトマスクの製造方法及びパターンの転写方法
US9679803B2 (en) 2014-01-13 2017-06-13 Taiwan Semiconductor Manufacturing Company, Ltd. Method for forming different patterns in a semiconductor structure using a single mask
CN104765245A (zh) * 2015-04-10 2015-07-08 深圳市华星光电技术有限公司 一种灰色调掩膜及其制作方法
JP6767735B2 (ja) * 2015-06-30 2020-10-14 Hoya株式会社 フォトマスク、フォトマスクの設計方法、フォトマスクブランク、および表示装置の製造方法
JP6557638B2 (ja) * 2016-07-06 2019-08-07 株式会社エスケーエレクトロニクス ハーフトーンマスクおよびハーフトーンマスクブランクス
JP6573591B2 (ja) * 2016-09-13 2019-09-11 Hoya株式会社 フォトマスクの製造方法、フォトマスク、及び表示装置の製造方法
JP2017072842A (ja) * 2016-11-09 2017-04-13 Hoya株式会社 フォトマスクの製造方法、フォトマスク、パターン転写方法、及びフラットパネルディスプレイの製造方法
KR102032188B1 (ko) 2017-08-11 2019-10-15 이용구 휴대용 가림판
JP6500076B2 (ja) * 2017-12-05 2019-04-10 Hoya株式会社 フォトマスクの製造方法及びフォトマスク基板
CN108196421B (zh) * 2017-12-14 2021-03-05 深圳市路维光电股份有限公司 灰阶掩膜版制作方法
JP6715360B2 (ja) * 2019-02-05 2020-07-01 Hoya株式会社 フォトマスク基板
CN113260178B (zh) * 2021-06-16 2021-09-28 广东科翔电子科技股份有限公司 一种刚挠结合板高精密线路的制备方法
CN114122022A (zh) * 2021-11-23 2022-03-01 京东方科技集团股份有限公司 阵列基板、掩膜板、显示装置及阵列基板的制作方法
CN114355736B (zh) * 2022-02-23 2023-06-16 鲁东大学 一种利用掩膜光刻技术一步制备微米级双层结构的方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3285167B2 (ja) * 1993-08-06 2002-05-27 大日本印刷株式会社 階調マスク
KR950034748A (ko) * 1994-05-30 1995-12-28 김주용 포토레지스트 패턴 형성방법
KR970008372A (ko) * 1995-07-31 1997-02-24 김광호 반도체장치의 미세 패턴 형성방법
JP2003173015A (ja) * 2001-09-28 2003-06-20 Hoya Corp グレートーンマスクの製造方法
KR20060004276A (ko) * 2004-07-09 2006-01-12 현대모비스 주식회사 디스크 브레이크의 캘리퍼 어셈블리
TW200639576A (en) * 2005-02-28 2006-11-16 Hoya Corp Method of manufacturing gray level mask, gray level mask, and gray level mask blank
TW200636820A (en) * 2005-04-04 2006-10-16 Adv Lcd Tech Dev Ct Co Ltd Thin film transistor, integrated circuit, liquid crystal display, method of producing thin film transistor, and method of exposure using attenuated type mask
JP4850616B2 (ja) * 2005-08-12 2012-01-11 株式会社半導体エネルギー研究所 半導体装置の作製方法
KR101190045B1 (ko) * 2005-12-21 2012-10-12 엘지디스플레이 주식회사 포토 마스크 및 이를 이용한 액정표시장치용 어레이 기판의제조 방법
JP4005622B1 (ja) * 2006-09-04 2007-11-07 ジオマテック株式会社 フォトマスク用基板及びフォトマスク並びにその製造方法

Also Published As

Publication number Publication date
JP2009042753A (ja) 2009-02-26
TW200925774A (en) 2009-06-16
KR20120009526A (ko) 2012-01-31
JP5244485B2 (ja) 2013-07-24
KR20090009155A (ko) 2009-01-22
TWI422961B (zh) 2014-01-11
KR101357324B1 (ko) 2014-02-03
CN101349864A (zh) 2009-01-21
JP2013137576A (ja) 2013-07-11
CN101349864B (zh) 2013-04-03
JP5555789B2 (ja) 2014-07-23

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