KR101028038B1 - 반도체 제조용 필름 코팅장치 - Google Patents

반도체 제조용 필름 코팅장치 Download PDF

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Publication number
KR101028038B1
KR101028038B1 KR1020100096199A KR20100096199A KR101028038B1 KR 101028038 B1 KR101028038 B1 KR 101028038B1 KR 1020100096199 A KR1020100096199 A KR 1020100096199A KR 20100096199 A KR20100096199 A KR 20100096199A KR 101028038 B1 KR101028038 B1 KR 101028038B1
Authority
KR
South Korea
Prior art keywords
roller
coating
film
coating liquid
main roller
Prior art date
Application number
KR1020100096199A
Other languages
English (en)
Korean (ko)
Inventor
황선오
Original Assignee
주식회사 코엠에스
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 주식회사 코엠에스 filed Critical 주식회사 코엠에스
Priority to KR1020100096199A priority Critical patent/KR101028038B1/ko
Application granted granted Critical
Publication of KR101028038B1 publication Critical patent/KR101028038B1/ko
Priority to PCT/KR2011/004771 priority patent/WO2012046944A1/ko
Priority to CN201180047409.3A priority patent/CN103930969B/zh

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C1/00—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating
    • B05C1/04—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating for applying liquid or other fluent material to work of indefinite length
    • B05C1/08—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating for applying liquid or other fluent material to work of indefinite length using a roller or other rotating member which contacts the work along a generating line
    • B05C1/0826—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating for applying liquid or other fluent material to work of indefinite length using a roller or other rotating member which contacts the work along a generating line the work being a web or sheets
    • B05C1/083—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating for applying liquid or other fluent material to work of indefinite length using a roller or other rotating member which contacts the work along a generating line the work being a web or sheets being passed between the coating roller and one or more backing rollers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C1/00—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating
    • B05C1/04—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating for applying liquid or other fluent material to work of indefinite length
    • B05C1/08—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating for applying liquid or other fluent material to work of indefinite length using a roller or other rotating member which contacts the work along a generating line
    • B05C1/0826—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating for applying liquid or other fluent material to work of indefinite length using a roller or other rotating member which contacts the work along a generating line the work being a web or sheets
    • B05C1/0834—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating for applying liquid or other fluent material to work of indefinite length using a roller or other rotating member which contacts the work along a generating line the work being a web or sheets the coating roller co-operating with other rollers, e.g. dosing, transfer rollers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/265—Selective reaction with inorganic or organometallic reagents after image-wise exposure, e.g. silylation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Coating Apparatus (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
KR1020100096199A 2010-10-04 2010-10-04 반도체 제조용 필름 코팅장치 KR101028038B1 (ko)

Priority Applications (3)

Application Number Priority Date Filing Date Title
KR1020100096199A KR101028038B1 (ko) 2010-10-04 2010-10-04 반도체 제조용 필름 코팅장치
PCT/KR2011/004771 WO2012046944A1 (ko) 2010-10-04 2011-06-29 반도체 제조용 필름 코팅장치
CN201180047409.3A CN103930969B (zh) 2010-10-04 2011-06-29 半导体制造用薄膜涂布装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020100096199A KR101028038B1 (ko) 2010-10-04 2010-10-04 반도체 제조용 필름 코팅장치

Publications (1)

Publication Number Publication Date
KR101028038B1 true KR101028038B1 (ko) 2011-04-08

Family

ID=44049851

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020100096199A KR101028038B1 (ko) 2010-10-04 2010-10-04 반도체 제조용 필름 코팅장치

Country Status (3)

Country Link
KR (1) KR101028038B1 (zh)
CN (1) CN103930969B (zh)
WO (1) WO2012046944A1 (zh)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101433805B1 (ko) * 2013-11-14 2014-09-23 주식회사 코엠에스 구조개선된 반도체 제조용 필름 코팅장치
CN104168715A (zh) * 2014-07-30 2014-11-26 东莞市五株电子科技有限公司 软板感光膜贴附方法

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104766908A (zh) * 2014-12-31 2015-07-08 苏州润阳光伏科技有限公司 链式扩散非制绒面涂磷装置
KR102086411B1 (ko) * 2018-06-04 2020-03-09 주식회사 코엠에스 반도체 기판용 보호필름 박리 여부 감시 장치 및 방법
CN110620065A (zh) * 2019-08-26 2019-12-27 石狮市纳傲贸易有限公司 一种晶圆加工设备

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR200158207Y1 (ko) * 1997-06-26 1999-10-15 윤종용 현상기의 토너 보급 규제장치
KR200447378Y1 (ko) * 2008-01-24 2010-01-20 양동영 필름코팅장치

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3935059C1 (zh) * 1989-10-20 1991-02-21 Juergen 8609 Bischberg De Ruemmer
KR100766115B1 (ko) * 2006-02-15 2007-10-11 엘지전자 주식회사 평판 디스플레이 기판용 코팅장치

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR200158207Y1 (ko) * 1997-06-26 1999-10-15 윤종용 현상기의 토너 보급 규제장치
KR200447378Y1 (ko) * 2008-01-24 2010-01-20 양동영 필름코팅장치

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101433805B1 (ko) * 2013-11-14 2014-09-23 주식회사 코엠에스 구조개선된 반도체 제조용 필름 코팅장치
CN104168715A (zh) * 2014-07-30 2014-11-26 东莞市五株电子科技有限公司 软板感光膜贴附方法

Also Published As

Publication number Publication date
CN103930969B (zh) 2016-08-03
WO2012046944A1 (ko) 2012-04-12
CN103930969A (zh) 2014-07-16

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