WO2012046944A1 - 반도체 제조용 필름 코팅장치 - Google Patents

반도체 제조용 필름 코팅장치 Download PDF

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Publication number
WO2012046944A1
WO2012046944A1 PCT/KR2011/004771 KR2011004771W WO2012046944A1 WO 2012046944 A1 WO2012046944 A1 WO 2012046944A1 KR 2011004771 W KR2011004771 W KR 2011004771W WO 2012046944 A1 WO2012046944 A1 WO 2012046944A1
Authority
WO
WIPO (PCT)
Prior art keywords
roller
film
coating
coating liquid
main roller
Prior art date
Application number
PCT/KR2011/004771
Other languages
English (en)
French (fr)
Korean (ko)
Inventor
황선오
Original Assignee
주식회사 코엠에스
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 주식회사 코엠에스 filed Critical 주식회사 코엠에스
Priority to CN201180047409.3A priority Critical patent/CN103930969B/zh
Publication of WO2012046944A1 publication Critical patent/WO2012046944A1/ko

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C1/00—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating
    • B05C1/04—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating for applying liquid or other fluent material to work of indefinite length
    • B05C1/08—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating for applying liquid or other fluent material to work of indefinite length using a roller or other rotating member which contacts the work along a generating line
    • B05C1/0826—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating for applying liquid or other fluent material to work of indefinite length using a roller or other rotating member which contacts the work along a generating line the work being a web or sheets
    • B05C1/083—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating for applying liquid or other fluent material to work of indefinite length using a roller or other rotating member which contacts the work along a generating line the work being a web or sheets being passed between the coating roller and one or more backing rollers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C1/00—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating
    • B05C1/04—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating for applying liquid or other fluent material to work of indefinite length
    • B05C1/08—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating for applying liquid or other fluent material to work of indefinite length using a roller or other rotating member which contacts the work along a generating line
    • B05C1/0826—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating for applying liquid or other fluent material to work of indefinite length using a roller or other rotating member which contacts the work along a generating line the work being a web or sheets
    • B05C1/0834—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating for applying liquid or other fluent material to work of indefinite length using a roller or other rotating member which contacts the work along a generating line the work being a web or sheets the coating roller co-operating with other rollers, e.g. dosing, transfer rollers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/265—Selective reaction with inorganic or organometallic reagents after image-wise exposure, e.g. silylation

Definitions

  • the present invention relates to a coating apparatus for an ultraviolet work exposure film of a mask film or a board (Board) of ultraviolet light exposure.
  • the photomask film may be used at every exposure by the close contact between the photomask film and the wiring board. Damage occurred and there was a problem that patterns such as wiring or solder resist were not formed precisely on the wiring board.
  • the film coating apparatus for semiconductor manufacturing in coating the coating liquid so that the exposure mask film is not damaged, the film coating apparatus for semiconductor manufacturing enables to manufacture semiconductors more precisely by applying a uniform amount of protective coating liquid to the entire surface of the film to enable more precise semiconductor production. Is provided.
  • the present invention provides a film coating apparatus comprising: a main roller (10) which is in contact with the other surface of a film;
  • a coating roller 20 which is rotated by the rotating means 90 and provided in parallel with the main roller 10 and in contact with one surface of the film;
  • the coating liquid 20 On the opposite side of the main roller 10 is provided spaced apart in parallel adjacent to the coating roller 20, the coating liquid 20 after the coating liquid is buried in the lower portion of the coating liquid reservoir 39, the coating roller 20 Coating liquid supply roller 30 to be applied to the surface of the);
  • It relates to a film coating apparatus for manufacturing a semiconductor, characterized in that consisting of; conveyor 60 for conveying the film to pass through the curing means 40.
  • the present invention is to provide a film coating apparatus for semiconductor manufacturing that makes the semiconductor coating more precise by applying a uniform amount of the protective coating liquid to the entire surface of the film in applying the coating liquid so that the exposure mask film is not damaged. For sake.
  • FIG. 1 is a side view of the film coating apparatus for manufacturing a semiconductor according to an embodiment of the present invention.
  • Figure 2 is an enlarged view of the main portion of the film coating apparatus for manufacturing a semiconductor according to an embodiment of the present invention.
  • FIG 3 is a plan view of a film coating apparatus for manufacturing a semiconductor according to an embodiment of the present invention.
  • Figure 4 is a front view of the film coating apparatus for manufacturing a semiconductor according to an embodiment of the present invention.
  • Figure 5 is a front view of the coating roller of the film coating apparatus for manufacturing a semiconductor according to an embodiment of the present invention.
  • FIG. 1 is a side configuration of the film coating apparatus for semiconductor manufacturing according to an embodiment of the present invention
  • Figure 2 (a, b) is an enlarged view of the main part of the film coating apparatus for semiconductor manufacturing according to an embodiment of the present invention
  • Figure 3 4 is a plan view of a film coating apparatus for manufacturing a semiconductor according to an embodiment of the present invention
  • FIG. 4 is a front view of a film coating apparatus for manufacturing a semiconductor according to an embodiment of the present invention
  • FIG. 5 is a film coating apparatus for manufacturing a semiconductor according to an embodiment of the present invention. It is a front view of a coating roller.
  • the present invention can be used for the UV coating of the mask film or artwork film used in the ultraviolet exposure process of the flexible substrate (Board) to which the ultraviolet photosensitive film is applied.
  • the film coating apparatus for manufacturing a semiconductor according to an embodiment of the present invention, the main roller 10, the coating roller 20, the coating liquid supply roller 30 and the film guide portion ( 40) and the hardening means 50 and the conveyor 60.
  • the main roller 10 is in contact with the other surface of the film.
  • the coating roller 20 is provided adjacent to the main roller 10 in parallel and is in contact with one surface of the film.
  • the main roller 10 and the application roller 20 are supported as bearings in the body portion.
  • Rotating means 90 for rotating the main roller 10 is further provided.
  • the rotating means 90 is fixed to the drive gear 91 fixed to the body portion, the driven gear 93 fixed to the main roller shaft 11, the drive gear 91 and the main roller shaft 11 It consists of a belt 92 or a chain connecting the driven gear 93.
  • the coating liquid supply roller 30 is provided on the opposite side of the main roller 10 to be spaced apart adjacent in parallel with the coating roller 20, the coating liquid in a state in which the lower portion is locked in the coating liquid reservoir 39 After being buried on the surface, it is applied to the surface of the coating roller 20.
  • the upper portion of the coating liquid reservoir 39 is open to replenish the coating liquid, and the lower portion of the coating liquid supply roller 30 is positioned at the open upper portion.
  • the coating roller 20 and the coating liquid supply roller 30 may be maintained at an interval of 30 ⁇ 300 ⁇ m. If the gap is too small, high precision position control may be required, and failure may result in damage to the equipment. If the gap exceeds 300 ⁇ m, the gap may be too wide so that the coating liquid contained in the coating liquid supply roller 30 is transferred to the coating roller 20 by the surface tension.
  • the film guide portion 40 guides the film into the gap between the main roller 10 and the roller 20.
  • the film guide portion 40 has a curved surface support portion 40a formed in a plate shape wide at the bottom and bent upwards and upwards, and an upper end 40b is disposed between the main roller 10 and the application roller 20. Extends to the bottom of the gap.
  • the hardening means unit 50 is provided with heating means 51 placed on the upper portion of the film through which the film is coated with a high temperature heat while passing between the main roller 10 and the roller for application 20. do.
  • the heating means 51 can use a normal ultraviolet light and an infrared lamp.
  • the conveyor 60 transfers the film to pass through the hardening means portion 40. Conveyor 60 may be applied to a conventional transport system known in the art and a detailed description thereof is omitted.
  • the coating solution impregnating groove 35 may be uniformly formed in a spiral shape on the surface of the coating solution supply roller 30. .
  • the coating solution impregnating groove 35 may be a scratch formed spirally using a metal needle.
  • the vertical direction adjusting means for adjusting the vertical height of one of the coating roller 20 or the coating liquid supply roller 30 ( It is preferably configured to further comprise 70).
  • the vertical direction adjusting means 70 is lifted by the servo motor 71 and the servo motor 71 and the upper end thereof is connected to elevate one of the application roller shaft 21 or the coating liquid supply roller shaft 31.
  • It may be configured to include a first adjustment shaft (72).
  • the first adjustment shaft 72 raises and lowers the coating liquid supply roller 30 to adjust the size of the gap GAP between the coating roller 20 and the coating liquid supply roller 30.
  • the main roller 10 by moving back and forth between the main roller 10 and the coating roller 20, the interval. It further comprises a horizontal direction adjusting means for adjusting the 80.
  • the horizontal direction adjusting means 70 includes a horizontal driving part 81 and a second adjusting shaft 82 which is lifted by the horizontal direction driving part 81 and whose front end advances the main roller shaft 11 back and forth. Can be.
  • the second adjustment shaft 82 may move the main roller shaft 11 forward and backward by applying a force to the transfer block B that is moved back and forth along the guide formed in the body portion.
  • the film passes through the main roller 10 and the application roller 20 by the rotating main roller 10 to cure. It is conveyed to the means 50 and the conveyor 60 assists in the movement of the film.
  • the present invention provides a film coating apparatus comprising: a main roller (10) which is in contact with the other surface of a film;
  • a coating roller 20 which is rotated by the rotating means 90 and provided in parallel with the main roller 10 and in contact with one surface of the film;
  • the coating liquid 20 On the opposite side of the main roller 10 is provided spaced apart in parallel adjacent to the coating roller 20, the coating liquid 20 after the coating liquid is buried in the lower portion of the coating liquid reservoir 39, the coating roller 20 Coating liquid supply roller 30 to be applied to the surface of the);
  • It relates to a film coating apparatus for manufacturing a semiconductor, characterized in that consisting of; conveyor 60 for conveying the film to pass through the curing means 40.
  • the present invention is to provide a film coating apparatus for semiconductor manufacturing that makes the semiconductor coating more precise by applying a uniform amount of protective coating liquid to the entire surface of the film in applying the coating liquid so that the exposure mask film is not damaged. For sake.

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Coating Apparatus (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
PCT/KR2011/004771 2010-10-04 2011-06-29 반도체 제조용 필름 코팅장치 WO2012046944A1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201180047409.3A CN103930969B (zh) 2010-10-04 2011-06-29 半导体制造用薄膜涂布装置

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020100096199A KR101028038B1 (ko) 2010-10-04 2010-10-04 반도체 제조용 필름 코팅장치
KR10-2010-0096199 2010-10-04

Publications (1)

Publication Number Publication Date
WO2012046944A1 true WO2012046944A1 (ko) 2012-04-12

Family

ID=44049851

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2011/004771 WO2012046944A1 (ko) 2010-10-04 2011-06-29 반도체 제조용 필름 코팅장치

Country Status (3)

Country Link
KR (1) KR101028038B1 (zh)
CN (1) CN103930969B (zh)
WO (1) WO2012046944A1 (zh)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101433805B1 (ko) * 2013-11-14 2014-09-23 주식회사 코엠에스 구조개선된 반도체 제조용 필름 코팅장치
CN104168715A (zh) * 2014-07-30 2014-11-26 东莞市五株电子科技有限公司 软板感光膜贴附方法
CN104766908A (zh) * 2014-12-31 2015-07-08 苏州润阳光伏科技有限公司 链式扩散非制绒面涂磷装置
KR102086411B1 (ko) * 2018-06-04 2020-03-09 주식회사 코엠에스 반도체 기판용 보호필름 박리 여부 감시 장치 및 방법
CN110620065A (zh) * 2019-08-26 2019-12-27 石狮市纳傲贸易有限公司 一种晶圆加工设备

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR200158207Y1 (ko) * 1997-06-26 1999-10-15 윤종용 현상기의 토너 보급 규제장치
KR100766115B1 (ko) * 2006-02-15 2007-10-11 엘지전자 주식회사 평판 디스플레이 기판용 코팅장치
KR200447378Y1 (ko) * 2008-01-24 2010-01-20 양동영 필름코팅장치

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3935059C1 (zh) * 1989-10-20 1991-02-21 Juergen 8609 Bischberg De Ruemmer

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR200158207Y1 (ko) * 1997-06-26 1999-10-15 윤종용 현상기의 토너 보급 규제장치
KR100766115B1 (ko) * 2006-02-15 2007-10-11 엘지전자 주식회사 평판 디스플레이 기판용 코팅장치
KR200447378Y1 (ko) * 2008-01-24 2010-01-20 양동영 필름코팅장치

Also Published As

Publication number Publication date
KR101028038B1 (ko) 2011-04-08
CN103930969B (zh) 2016-08-03
CN103930969A (zh) 2014-07-16

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