KR101013394B1 - 신규 에폭시 화합물 및 그 제조방법 - Google Patents

신규 에폭시 화합물 및 그 제조방법 Download PDF

Info

Publication number
KR101013394B1
KR101013394B1 KR1020097001894A KR20097001894A KR101013394B1 KR 101013394 B1 KR101013394 B1 KR 101013394B1 KR 1020097001894 A KR1020097001894 A KR 1020097001894A KR 20097001894 A KR20097001894 A KR 20097001894A KR 101013394 B1 KR101013394 B1 KR 101013394B1
Authority
KR
South Korea
Prior art keywords
group
carbon atoms
hydrogen atom
epoxy compound
alkyl group
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1020097001894A
Other languages
English (en)
Korean (ko)
Other versions
KR20090024827A (ko
Inventor
노부토시 사사키
토시오 후지타
히로시 우치다
Original Assignee
쇼와 덴코 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 쇼와 덴코 가부시키가이샤 filed Critical 쇼와 덴코 가부시키가이샤
Publication of KR20090024827A publication Critical patent/KR20090024827A/ko
Application granted granted Critical
Publication of KR101013394B1 publication Critical patent/KR101013394B1/ko
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02Silicon compounds
    • C07F7/08Compounds having one or more C—Si linkages
    • C07F7/18Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02Silicon compounds
    • C07F7/08Compounds having one or more C—Si linkages
    • C07F7/18Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
    • C07F7/1804Compounds having Si-O-C linkages
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S525/00Synthetic resins or natural rubbers -- part of the class 520 series
    • Y10S525/934Powdered coating composition

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Epoxy Compounds (AREA)
  • Epoxy Resins (AREA)
KR1020097001894A 2006-08-15 2007-08-13 신규 에폭시 화합물 및 그 제조방법 Expired - Fee Related KR101013394B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2006-221648 2006-08-15
JP2006221648 2006-08-15

Publications (2)

Publication Number Publication Date
KR20090024827A KR20090024827A (ko) 2009-03-09
KR101013394B1 true KR101013394B1 (ko) 2011-02-14

Family

ID=39082158

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020097001894A Expired - Fee Related KR101013394B1 (ko) 2006-08-15 2007-08-13 신규 에폭시 화합물 및 그 제조방법

Country Status (7)

Country Link
US (1) US7880018B2 (enExample)
EP (1) EP2055708B1 (enExample)
JP (1) JP5153635B2 (enExample)
KR (1) KR101013394B1 (enExample)
CN (1) CN101501047B (enExample)
TW (1) TW200815492A (enExample)
WO (1) WO2008020637A1 (enExample)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5266248B2 (ja) * 2007-11-07 2013-08-21 昭和電工株式会社 エポキシ基含有オルガノシロキサン化合物
CN101977919B (zh) * 2008-03-24 2014-04-23 昭和电工株式会社 环氧化合物及其制造方法
JP5210122B2 (ja) * 2008-10-31 2013-06-12 昭和電工株式会社 接着剤用硬化性組成物
JP5149126B2 (ja) * 2008-11-07 2013-02-20 昭和電工株式会社 半導体封止用硬化性組成物
US8957136B2 (en) 2010-08-11 2015-02-17 Showa Denko K.K. Epoxysilicone condensate, curable composition comprising condensate, and cured product thereof
KR20150133779A (ko) * 2013-03-15 2015-11-30 다우 코닝 코포레이션 분말 형태의 고체 실리콘-함유 핫 멜트 조성물을 침착하는 단계 및 그의 봉지재를 형성하는 단계를 포함하는, 광학 조립체의 제조 방법
CN105669738A (zh) * 2016-01-19 2016-06-15 南昌大学 一种改性硅烷偶联剂的制备方法
WO2023008493A1 (ja) * 2021-07-29 2023-02-02 株式会社カネカ シラン化合物およびその製造方法、ポリオルガノシロキサン化合物、ハードコート組成物、ハードコーフィルムおよびその製造方法、ならびにディスプレイ
CN119798304B (zh) * 2024-12-31 2025-10-10 苏州高泰电子技术股份有限公司 一种耐高温硅烷偶联剂及其制备方法和应用

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5580430A (en) 1978-12-13 1980-06-17 Teijin Ltd Preparation of polyester
JPS58222160A (ja) 1982-06-16 1983-12-23 Tokuyama Soda Co Ltd コ−テイング用組成物
US6080872A (en) 1997-12-16 2000-06-27 Lonza S.P.A. Cycloaliphatic epoxy compounds

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5206328A (en) * 1990-02-08 1993-04-27 Shin-Etsu Chemical Co., Ltd. Process for the production of an organopolysiloxane
JPH03255130A (ja) 1990-03-05 1991-11-14 Shin Etsu Chem Co Ltd エポキシ基含有オルガノポリシロキサンの製造方法
AU2002253429A1 (en) * 2002-04-08 2003-10-20 Ranbaxy Laboratories Limited ALPHA, OMEGA-DICARBOXIMIDE DERIVATIVES AS USEFUL URO-SELECTIVE Alpha1Alpha ADRENOCEPTOR BLOCKERS
US7244473B2 (en) * 2003-04-22 2007-07-17 Konica Minolta Medical & Graphic, Inc. Active ray curable ink-jet composition, image forming method using the same, ink-jet recording apparatus, and triarylsulfonium salt compound
FI116844B (fi) * 2004-03-22 2006-03-15 Valtion Teknillinen Reaktiiviset kalvonmuodostajat
CN100569209C (zh) * 2004-07-14 2009-12-16 3M创新有限公司 包括环氧乙烷单体的牙科组合物

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5580430A (en) 1978-12-13 1980-06-17 Teijin Ltd Preparation of polyester
JPS58222160A (ja) 1982-06-16 1983-12-23 Tokuyama Soda Co Ltd コ−テイング用組成物
US6080872A (en) 1997-12-16 2000-06-27 Lonza S.P.A. Cycloaliphatic epoxy compounds

Also Published As

Publication number Publication date
JP5153635B2 (ja) 2013-02-27
CN101501047B (zh) 2011-12-14
TW200815492A (en) 2008-04-01
US20100197936A1 (en) 2010-08-05
EP2055708B1 (en) 2013-07-17
KR20090024827A (ko) 2009-03-09
TWI362397B (enExample) 2012-04-21
EP2055708A1 (en) 2009-05-06
EP2055708A4 (en) 2011-01-26
US7880018B2 (en) 2011-02-01
JPWO2008020637A1 (ja) 2010-01-07
WO2008020637A1 (en) 2008-02-21
CN101501047A (zh) 2009-08-05

Similar Documents

Publication Publication Date Title
KR101013394B1 (ko) 신규 에폭시 화합물 및 그 제조방법
JP5325206B2 (ja) エポキシ化合物およびその製造方法
JP5115729B2 (ja) トリアルキルシリル基で保護されたアセト酢酸エステル基含有有機ケイ素化合物及びその製造方法
CN101460537B (zh) 新型环氧化合物及其制备方法
US7402648B2 (en) Method for producing cyclic organic silicon compound and organic silicon resin having alcoholic hydroxyl group
JP5062231B2 (ja) アルコール性水酸基を有する有機ケイ素樹脂及びその製造方法
JP4655789B2 (ja) ケイ素化合物
KR101123101B1 (ko) 신규 에폭시 화합물 및 그 제조방법
JP5052209B2 (ja) 新規エポキシ化合物とその製造方法
WO2005077960A1 (ja) 新規な有機ケイ素化合物及びジオールを有する有機ケイ素樹脂並びにそれらの製造方法
JP4172342B2 (ja) 環状有機ケイ素化合物及びその製造方法
WO2007007598A1 (ja) アルコ-ル性水酸基を有する有機ケイ素樹脂及びその製造方法
JPH04217690A (ja) オルガノシクロシロキサンおよびその製造方法

Legal Events

Date Code Title Description
A201 Request for examination
PA0105 International application

St.27 status event code: A-0-1-A10-A15-nap-PA0105

PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

St.27 status event code: A-1-2-D10-D22-exm-PE0701

GRNT Written decision to grant
PR0701 Registration of establishment

St.27 status event code: A-2-4-F10-F11-exm-PR0701

PR1002 Payment of registration fee

St.27 status event code: A-2-2-U10-U12-oth-PR1002

Fee payment year number: 1

PG1601 Publication of registration

St.27 status event code: A-4-4-Q10-Q13-nap-PG1601

LAPS Lapse due to unpaid annual fee
PC1903 Unpaid annual fee

St.27 status event code: A-4-4-U10-U13-oth-PC1903

Not in force date: 20140201

Payment event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

PC1903 Unpaid annual fee

St.27 status event code: N-4-6-H10-H13-oth-PC1903

Ip right cessation event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

Not in force date: 20140201

PN2301 Change of applicant

St.27 status event code: A-5-5-R10-R13-asn-PN2301

St.27 status event code: A-5-5-R10-R11-asn-PN2301

R18-X000 Changes to party contact information recorded

St.27 status event code: A-5-5-R10-R18-oth-X000