KR100983952B1 - 복합구조물 - Google Patents

복합구조물 Download PDF

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Publication number
KR100983952B1
KR100983952B1 KR1020087008410A KR20087008410A KR100983952B1 KR 100983952 B1 KR100983952 B1 KR 100983952B1 KR 1020087008410 A KR1020087008410 A KR 1020087008410A KR 20087008410 A KR20087008410 A KR 20087008410A KR 100983952 B1 KR100983952 B1 KR 100983952B1
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KR
South Korea
Prior art keywords
yttrium
yttrium oxide
fine particles
base material
substrate
Prior art date
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Expired - Fee Related
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KR1020087008410A
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English (en)
Korean (ko)
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KR20080044335A (ko
Inventor
쥰이치 이와사와
료이치 니시미즈
히로노리 하토노
히로아키 아시자와
Original Assignee
토토 가부시키가이샤
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Publication of KR20080044335A publication Critical patent/KR20080044335A/ko
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Expired - Fee Related legal-status Critical Current
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C30/00—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C24/00—Coating starting from inorganic powder
    • C23C24/02—Coating starting from inorganic powder by application of pressure only
    • C23C24/04—Impact or kinetic deposition of particles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F2998/00—Supplementary information concerning processes or compositions relating to powder metallurgy
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
    • C04B2235/30—Constituents and secondary phases not being of a fibrous nature
    • C04B2235/32—Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
    • C04B2235/3293—Tin oxides, stannates or oxide forming salts thereof, e.g. indium tin oxide [ITO]

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
  • Compounds Of Alkaline-Earth Elements, Aluminum Or Rare-Earth Metals (AREA)
  • Compositions Of Oxide Ceramics (AREA)
KR1020087008410A 2005-10-12 2006-10-10 복합구조물 Expired - Fee Related KR100983952B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JPJP-P-2005-00298223 2005-10-12
JP2005298223 2005-10-12
JP2006274848A JP5093745B2 (ja) 2005-10-12 2006-10-06 複合構造物
JPJP-P-2006-00274848 2006-10-06

Publications (2)

Publication Number Publication Date
KR20080044335A KR20080044335A (ko) 2008-05-20
KR100983952B1 true KR100983952B1 (ko) 2010-09-27

Family

ID=37942756

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020087008410A Expired - Fee Related KR100983952B1 (ko) 2005-10-12 2006-10-10 복합구조물

Country Status (6)

Country Link
US (1) US7897268B2 (https=)
JP (1) JP5093745B2 (https=)
KR (1) KR100983952B1 (https=)
CN (1) CN101283118B (https=)
TW (1) TWI315356B (https=)
WO (1) WO2007043520A1 (https=)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103348454B (zh) * 2010-12-01 2016-04-06 株式会社东芝 等离子体蚀刻装置部件及其制造方法
TW201334035A (zh) * 2011-10-06 2013-08-16 葛林陀德德拉威公司 抗電漿蝕刻膜，承載抗電漿蝕刻膜之物品及相關的方法
KR101637801B1 (ko) * 2012-05-22 2016-07-07 가부시끼가이샤 도시바 플라즈마 처리 장치용 부품 및 플라즈마 처리 장치용 부품의 제조 방법
JP5656036B2 (ja) * 2013-03-28 2015-01-21 Toto株式会社 複合構造物
JP5888458B2 (ja) * 2014-06-26 2016-03-22 Toto株式会社 耐プラズマ性部材及びその製造方法
JP2016008352A (ja) * 2014-06-26 2016-01-18 Toto株式会社 耐プラズマ性部材
JP6808168B2 (ja) 2015-12-24 2021-01-06 Toto株式会社 耐プラズマ性部材
US11047035B2 (en) 2018-02-23 2021-06-29 Applied Materials, Inc. Protective yttria coating for semiconductor equipment parts
JP7165748B2 (ja) * 2018-12-05 2022-11-04 京セラ株式会社 プラズマ処理装置用部材およびこれを備えるプラズマ処理装置
WO2020218265A1 (ja) * 2019-04-26 2020-10-29 京セラ株式会社 プラズマ処理装置用部材およびプラズマ処理装置
KR102490570B1 (ko) * 2022-05-23 2023-01-20 주식회사 코미코 희토류 금속 화합물 분말의 열처리 공정을 이용하여 저 명도의 내플라즈마성 코팅막의 제조방법 및 이에 의해 형성된 내플라즈마성 코팅막
TW202409316A (zh) * 2022-08-19 2024-03-01 日商Ａｇｃ股份有限公司 釔質保護膜及其製造方法以及構件

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1078630A (ja) 1996-09-03 1998-03-24 Nippon Hoso Kyokai <Nhk> 光メモリ材料およびその製造方法
JP2005217351A (ja) * 2004-02-02 2005-08-11 Toto Ltd 耐プラズマ性を有する半導体製造装置用部材およびその作製方法
JP2005217349A (ja) 2004-02-02 2005-08-11 Toto Ltd 耐プラズマ性を有する半導体製造装置用部材およびその作製方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3265481B2 (ja) * 1999-04-23 2002-03-11 独立行政法人産業技術総合研究所 脆性材料超微粒子成形体の低温成形法
JP3348154B2 (ja) * 1999-10-12 2002-11-20 独立行政法人産業技術総合研究所 複合構造物及びその作製方法並びに作製装置
JP4205912B2 (ja) 2002-08-13 2009-01-07 時田シーブイディーシステムズ株式会社 透明な酸化イットリウム膜とその製造方法
JP4006535B2 (ja) 2003-11-25 2007-11-14 独立行政法人産業技術総合研究所 半導体または液晶製造装置部材およびその製造方法
JP2005217350A (ja) 2004-02-02 2005-08-11 Toto Ltd 耐プラズマ性を有する半導体製造装置用部材およびその作製方法
TW200724506A (en) * 2005-10-07 2007-07-01 Ohara Kk Inorganic composition
JP2007109828A (ja) * 2005-10-12 2007-04-26 Toto Ltd 耐プラズマ性部材
JP2007109827A (ja) * 2005-10-12 2007-04-26 Toto Ltd 静電チャック

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1078630A (ja) 1996-09-03 1998-03-24 Nippon Hoso Kyokai <Nhk> 光メモリ材料およびその製造方法
JP2005217351A (ja) * 2004-02-02 2005-08-11 Toto Ltd 耐プラズマ性を有する半導体製造装置用部材およびその作製方法
JP2005217349A (ja) 2004-02-02 2005-08-11 Toto Ltd 耐プラズマ性を有する半導体製造装置用部材およびその作製方法

Also Published As

Publication number Publication date
WO2007043520A1 (ja) 2007-04-19
KR20080044335A (ko) 2008-05-20
US7897268B2 (en) 2011-03-01
TWI315356B (en) 2009-10-01
JP2007131943A (ja) 2007-05-31
US20090233126A1 (en) 2009-09-17
TW200734485A (en) 2007-09-16
CN101283118B (zh) 2011-04-20
JP5093745B2 (ja) 2012-12-12
CN101283118A (zh) 2008-10-08

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