KR100907598B1 - 종형 열처리 장치 및 그 제어 방법 - Google Patents

종형 열처리 장치 및 그 제어 방법 Download PDF

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Publication number
KR100907598B1
KR100907598B1 KR1020067006681A KR20067006681A KR100907598B1 KR 100907598 B1 KR100907598 B1 KR 100907598B1 KR 1020067006681 A KR1020067006681 A KR 1020067006681A KR 20067006681 A KR20067006681 A KR 20067006681A KR 100907598 B1 KR100907598 B1 KR 100907598B1
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KR
South Korea
Prior art keywords
temperature
processing
heater
blower
region
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Expired - Fee Related
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KR1020067006681A
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English (en)
Korean (ko)
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KR20060107740A (ko
Inventor
마꼬또 나까지마
다까노리 사이또오
쯔요시 다끼자와
마나부 혼마
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도쿄엘렉트론가부시키가이샤
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Publication of KR20060107740A publication Critical patent/KR20060107740A/ko
Application granted granted Critical
Publication of KR100907598B1 publication Critical patent/KR100907598B1/ko
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    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B17/00—Furnaces of a kind not covered by any of groups F27B1/00 - F27B15/00
    • F27B17/0016—Chamber type furnaces
    • F27B17/0025—Chamber type furnaces specially adapted for treating semiconductor wafers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
    • H10P95/90—Thermal treatments, e.g. annealing or sintering
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B5/00—Muffle furnaces; Retort furnaces; Other furnaces in which the charge is held completely isolated
    • F27B5/04—Muffle furnaces; Retort furnaces; Other furnaces in which the charge is held completely isolated adapted for treating the charge in vacuum or special atmosphere
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B5/00—Muffle furnaces; Retort furnaces; Other furnaces in which the charge is held completely isolated
    • F27B5/06—Details, accessories or equipment specially adapted for furnaces of these types
    • F27B5/18—Arrangement of controlling, monitoring, alarm or like devices

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Waste-Gas Treatment And Other Accessory Devices For Furnaces (AREA)
  • Muffle Furnaces And Rotary Kilns (AREA)
KR1020067006681A 2003-12-26 2004-12-22 종형 열처리 장치 및 그 제어 방법 Expired - Fee Related KR100907598B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2003-00432596 2003-12-26
JP2003432596A JP4642349B2 (ja) 2003-12-26 2003-12-26 縦型熱処理装置及びその低温域温度収束方法
PCT/JP2004/019251 WO2005064254A1 (ja) 2003-12-26 2004-12-22 縦型熱処理装置及びその制御方法

Publications (2)

Publication Number Publication Date
KR20060107740A KR20060107740A (ko) 2006-10-16
KR100907598B1 true KR100907598B1 (ko) 2009-07-14

Family

ID=34736482

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020067006681A Expired - Fee Related KR100907598B1 (ko) 2003-12-26 2004-12-22 종형 열처리 장치 및 그 제어 방법

Country Status (5)

Country Link
US (1) US7432475B2 (https=)
JP (1) JP4642349B2 (https=)
KR (1) KR100907598B1 (https=)
TW (1) TW200527492A (https=)
WO (1) WO2005064254A1 (https=)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101332065B1 (ko) 2009-09-26 2013-11-22 도쿄엘렉트론가부시키가이샤 열처리 장치 및 냉각 방법
KR20150122874A (ko) * 2014-04-23 2015-11-03 (주) 예스티 가동형 풍량 조절부재를 포함하는 열처리 장치

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8211235B2 (en) * 2005-03-04 2012-07-03 Picosun Oy Apparatuses and methods for deposition of material on surfaces
JP5312765B2 (ja) * 2007-01-26 2013-10-09 株式会社日立国際電気 基板処理方法及び半導体製造装置
JP4870604B2 (ja) * 2007-03-29 2012-02-08 株式会社ニューフレアテクノロジー 気相成長装置
JP2009010009A (ja) * 2007-06-26 2009-01-15 Hitachi Kokusai Electric Inc 基板処理装置及び半導体装置の製造方法
JP5374061B2 (ja) * 2008-03-25 2013-12-25 日本碍子株式会社 電子部品用焼成炉とその炉圧制御方法
JP5613471B2 (ja) * 2010-06-16 2014-10-22 東京エレクトロン株式会社 縦型熱処理装置及びその制御方法
US9513003B2 (en) * 2010-08-16 2016-12-06 Purpose Company Limited Combustion apparatus, method for combustion control, board, combustion control system and water heater
JP2012080080A (ja) * 2010-09-07 2012-04-19 Tokyo Electron Ltd 縦型熱処理装置及びその制御方法
KR101512874B1 (ko) * 2010-09-07 2015-04-16 도쿄엘렉트론가부시키가이샤 종형 열처리 장치 및 그 제어 방법
KR101509286B1 (ko) * 2010-09-09 2015-04-06 도쿄엘렉트론가부시키가이샤 종형 열처리 장치
JP5893280B2 (ja) 2010-09-09 2016-03-23 東京エレクトロン株式会社 縦型熱処理装置
JP2012172871A (ja) 2011-02-18 2012-09-10 Tokyo Electron Ltd 熱処理装置および熱処理装置の温度測定方法
JP5662845B2 (ja) 2011-03-01 2015-02-04 東京エレクトロン株式会社 熱処理装置およびその制御方法
US20150370245A1 (en) * 2012-12-07 2015-12-24 Hitachi Kokusai Electric Inc. Substrate processing apparatus, substrate processing method, semiconductor device manufacturing method, and control program
US20170207078A1 (en) * 2016-01-15 2017-07-20 Taiwan Semiconductor Manufacturing Co., Ltd. Atomic layer deposition apparatus and semiconductor process
CN106403630A (zh) * 2016-09-14 2017-02-15 成都中光电科技有限公司 一种tft‑lcd液晶玻璃池壁冷却风机调温装置
JP6964737B2 (ja) * 2017-01-12 2021-11-10 東京エレクトロン株式会社 熱処理装置及び温度制御方法
JP6804309B2 (ja) * 2017-01-12 2020-12-23 東京エレクトロン株式会社 熱処理装置及び温度制御方法
US11913724B2 (en) 2018-02-18 2024-02-27 Markforged, Inc. Sintering furnace
CN111771263B (zh) * 2018-02-23 2024-10-25 株式会社国际电气 清洁方法、半导体装置的制造方法、基板处理装置以及记录介质
JP7012585B2 (ja) * 2018-04-12 2022-01-28 東京エレクトロン株式会社 熱処理装置及び熱処理方法
US12489002B2 (en) * 2021-08-30 2025-12-02 Taiwan Semiconductor Manufacturing Company Ltd. Annealing apparatus and method of operating the same
WO2023039286A1 (en) * 2021-09-13 2023-03-16 Desktop Metal, Inc. Systems and methods for providing inert environments for additive manufacturing and processing

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0379985A (ja) * 1989-08-22 1991-04-04 Deisuko Haitetsuku:Kk 電気炉の温度制御方法
JP4365017B2 (ja) * 2000-08-23 2009-11-18 東京エレクトロン株式会社 熱処理装置の降温レート制御方法および熱処理装置

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101332065B1 (ko) 2009-09-26 2013-11-22 도쿄엘렉트론가부시키가이샤 열처리 장치 및 냉각 방법
KR20150122874A (ko) * 2014-04-23 2015-11-03 (주) 예스티 가동형 풍량 조절부재를 포함하는 열처리 장치
KR101676756B1 (ko) * 2014-04-23 2016-11-18 (주) 예스티 가동형 풍량 조절부재를 포함하는 열처리 장치

Also Published As

Publication number Publication date
JP4642349B2 (ja) 2011-03-02
TW200527492A (en) 2005-08-16
US20070148606A1 (en) 2007-06-28
JP2005188869A (ja) 2005-07-14
US7432475B2 (en) 2008-10-07
WO2005064254A1 (ja) 2005-07-14
TWI364786B (https=) 2012-05-21
KR20060107740A (ko) 2006-10-16

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