KR100899080B1 - 측쇄 불포화 중합체, 감방사선성 수지 조성물 및 액정 표시소자용 스페이서 - Google Patents

측쇄 불포화 중합체, 감방사선성 수지 조성물 및 액정 표시소자용 스페이서 Download PDF

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KR100899080B1
KR100899080B1 KR1020060080433A KR20060080433A KR100899080B1 KR 100899080 B1 KR100899080 B1 KR 100899080B1 KR 1020060080433 A KR1020060080433 A KR 1020060080433A KR 20060080433 A KR20060080433 A KR 20060080433A KR 100899080 B1 KR100899080 B1 KR 100899080B1
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KR
South Korea
Prior art keywords
spacer
resin composition
film
sensitive resin
compound
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KR1020060080433A
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English (en)
Korean (ko)
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KR20070024399A (ko
Inventor
다이고 이찌노헤
이사무 요네꾸라
도시히로 니시오
히로시 시호
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제이에스알 가부시끼가이샤
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Publication of KR20070024399A publication Critical patent/KR20070024399A/ko
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/035—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyurethanes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Liquid Crystal (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
KR1020060080433A 2005-08-25 2006-08-24 측쇄 불포화 중합체, 감방사선성 수지 조성물 및 액정 표시소자용 스페이서 KR100899080B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2005-00244153 2005-08-25
JP2005244153 2005-08-25

Publications (2)

Publication Number Publication Date
KR20070024399A KR20070024399A (ko) 2007-03-02
KR100899080B1 true KR100899080B1 (ko) 2009-05-25

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ID=38099054

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KR1020060080433A KR100899080B1 (ko) 2005-08-25 2006-08-24 측쇄 불포화 중합체, 감방사선성 수지 조성물 및 액정 표시소자용 스페이서

Country Status (3)

Country Link
KR (1) KR100899080B1 (zh)
CN (1) CN101131511B (zh)
TW (1) TWI388581B (zh)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4826803B2 (ja) * 2007-03-20 2011-11-30 Ｊｓｒ株式会社 感放射線性樹脂組成物および液晶表示素子用スペーサーとその製造法
KR101321417B1 (ko) 2009-12-28 2013-10-30 제일모직주식회사 컬러필터 보호막용 수지 조성물, 이를 이용하여 제조된 컬러필터 보호막 및 이를 포함하는 이미지 센서
TW201702737A (zh) * 2015-07-09 2017-01-16 奇美實業股份有限公司 感光性樹脂組成物、保護膜及元件
CN109062006A (zh) * 2018-08-31 2018-12-21 饶圣红 一种感光碱溶性树脂及其制备方法及负性抗蚀剂组合物

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000248024A (ja) * 1999-02-25 2000-09-12 Dainippon Printing Co Ltd 共重合樹脂
JP2000292616A (ja) 1999-04-09 2000-10-20 Jsr Corp カラーフィルタ用感放射線性組成物およびそれを用いたカラーフィルタ
JP2003173025A (ja) 2001-09-28 2003-06-20 Toagosei Co Ltd 感光性パターン形成用硬化性樹脂、その製造方法、硬化性樹脂組成物、カラーフィルター、液晶パネル用基板、及び、液晶パネル
KR20060050406A (ko) * 2004-08-12 2006-05-19 제이에스알 가부시끼가이샤 측쇄 불포화 중합체, 감방사선성 수지 조성물 및 액정 표시소자용 스페이서

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6844029B2 (en) * 2001-10-26 2005-01-18 Kansai Paint Co., Ltd. Photocurable primer composition and coating method by use of the same
JP4351519B2 (ja) * 2003-11-26 2009-10-28 東洋インキ製造株式会社 感光性組成物およびカラーフィルタ

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000248024A (ja) * 1999-02-25 2000-09-12 Dainippon Printing Co Ltd 共重合樹脂
JP2000292616A (ja) 1999-04-09 2000-10-20 Jsr Corp カラーフィルタ用感放射線性組成物およびそれを用いたカラーフィルタ
JP2003173025A (ja) 2001-09-28 2003-06-20 Toagosei Co Ltd 感光性パターン形成用硬化性樹脂、その製造方法、硬化性樹脂組成物、カラーフィルター、液晶パネル用基板、及び、液晶パネル
KR20060050406A (ko) * 2004-08-12 2006-05-19 제이에스알 가부시끼가이샤 측쇄 불포화 중합체, 감방사선성 수지 조성물 및 액정 표시소자용 스페이서

Also Published As

Publication number Publication date
KR20070024399A (ko) 2007-03-02
TW200714622A (en) 2007-04-16
CN101131511B (zh) 2012-05-30
TWI388581B (zh) 2013-03-11
CN101131511A (zh) 2008-02-27

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