KR100831559B1 - 메틸벤젠류 부분산화용 촉매, 그 제조방법 및 방향족알데히드의 제조방법 - Google Patents
메틸벤젠류 부분산화용 촉매, 그 제조방법 및 방향족알데히드의 제조방법 Download PDFInfo
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- KR100831559B1 KR100831559B1 KR1020070033800A KR20070033800A KR100831559B1 KR 100831559 B1 KR100831559 B1 KR 100831559B1 KR 1020070033800 A KR1020070033800 A KR 1020070033800A KR 20070033800 A KR20070033800 A KR 20070033800A KR 100831559 B1 KR100831559 B1 KR 100831559B1
- Authority
- KR
- South Korea
- Prior art keywords
- catalyst
- methylbenzenes
- nitrate
- partial oxidation
- group
- Prior art date
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- 239000003054 catalyst Substances 0.000 title claims abstract description 134
- 238000007254 oxidation reaction Methods 0.000 title claims abstract description 32
- 230000003647 oxidation Effects 0.000 title claims abstract description 29
- 238000000034 method Methods 0.000 title claims abstract description 27
- 150000005172 methylbenzenes Chemical class 0.000 title claims abstract description 25
- 230000036961 partial effect Effects 0.000 title claims abstract description 19
- 150000003934 aromatic aldehydes Chemical class 0.000 title claims abstract description 17
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 13
- 238000002360 preparation method Methods 0.000 title description 4
- 229910052721 tungsten Inorganic materials 0.000 claims abstract description 17
- 229910052783 alkali metal Inorganic materials 0.000 claims abstract description 16
- 150000001340 alkali metals Chemical class 0.000 claims abstract description 16
- 229910052792 caesium Inorganic materials 0.000 claims abstract description 15
- 229910052701 rubidium Inorganic materials 0.000 claims abstract description 15
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical group [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims abstract description 14
- 229910052700 potassium Inorganic materials 0.000 claims abstract description 13
- 229910052708 sodium Inorganic materials 0.000 claims abstract description 13
- 229910052725 zinc Inorganic materials 0.000 claims abstract description 13
- 229910052726 zirconium Inorganic materials 0.000 claims abstract description 13
- 229910052742 iron Inorganic materials 0.000 claims abstract description 12
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 11
- 229910052712 strontium Inorganic materials 0.000 claims abstract description 11
- 239000007789 gas Substances 0.000 claims abstract description 10
- 229910052684 Cerium Inorganic materials 0.000 claims abstract description 9
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 claims abstract description 9
- 229910052746 lanthanum Inorganic materials 0.000 claims abstract description 9
- 229910052758 niobium Inorganic materials 0.000 claims abstract description 9
- 125000004430 oxygen atom Chemical group O* 0.000 claims abstract description 9
- 229910052718 tin Inorganic materials 0.000 claims abstract description 9
- 229910052720 vanadium Inorganic materials 0.000 claims abstract description 9
- 229910052791 calcium Inorganic materials 0.000 claims abstract description 8
- 150000001875 compounds Chemical class 0.000 claims abstract description 8
- 229910052802 copper Inorganic materials 0.000 claims abstract description 8
- 229910001882 dioxygen Inorganic materials 0.000 claims abstract description 8
- 229910052744 lithium Inorganic materials 0.000 claims abstract description 8
- 229910052719 titanium Inorganic materials 0.000 claims abstract description 8
- 229910001930 tungsten oxide Inorganic materials 0.000 claims abstract description 8
- 229910052727 yttrium Inorganic materials 0.000 claims abstract description 8
- 229910052788 barium Inorganic materials 0.000 claims abstract description 7
- 229910052793 cadmium Inorganic materials 0.000 claims abstract description 7
- 229910052804 chromium Inorganic materials 0.000 claims abstract description 7
- 229910052749 magnesium Inorganic materials 0.000 claims abstract description 7
- 229910052748 manganese Inorganic materials 0.000 claims abstract description 7
- 229910052702 rhenium Inorganic materials 0.000 claims abstract description 7
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 6
- 229910052796 boron Inorganic materials 0.000 claims abstract description 6
- 125000004429 atom Chemical group 0.000 claims abstract description 5
- 239000002994 raw material Substances 0.000 claims description 32
- KUCOHFSKRZZVRO-UHFFFAOYSA-N terephthalaldehyde Chemical group O=CC1=CC=C(C=O)C=C1 KUCOHFSKRZZVRO-UHFFFAOYSA-N 0.000 claims description 29
- URLKBWYHVLBVBO-UHFFFAOYSA-N Para-Xylene Chemical group CC1=CC=C(C)C=C1 URLKBWYHVLBVBO-UHFFFAOYSA-N 0.000 claims description 26
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 claims description 16
- 239000002002 slurry Substances 0.000 claims description 14
- 238000001035 drying Methods 0.000 claims description 11
- 239000010937 tungsten Substances 0.000 claims description 9
- QGLKJKCYBOYXKC-UHFFFAOYSA-N nonaoxidotritungsten Chemical compound O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1 QGLKJKCYBOYXKC-UHFFFAOYSA-N 0.000 claims description 7
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 claims description 6
- 239000004480 active ingredient Substances 0.000 claims description 6
- 125000004432 carbon atom Chemical group C* 0.000 claims description 6
- 238000010304 firing Methods 0.000 claims description 4
- 238000001354 calcination Methods 0.000 claims description 3
- 229910052760 oxygen Inorganic materials 0.000 abstract description 5
- VVRQVWSVLMGPRN-UHFFFAOYSA-N oxotungsten Chemical class [W]=O VVRQVWSVLMGPRN-UHFFFAOYSA-N 0.000 abstract 1
- 239000007864 aqueous solution Substances 0.000 description 50
- 238000006243 chemical reaction Methods 0.000 description 43
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 33
- 239000000243 solution Substances 0.000 description 29
- 239000000203 mixture Substances 0.000 description 28
- 238000002474 experimental method Methods 0.000 description 23
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 22
- NLSCHDZTHVNDCP-UHFFFAOYSA-N caesium nitrate Chemical compound [Cs+].[O-][N+]([O-])=O NLSCHDZTHVNDCP-UHFFFAOYSA-N 0.000 description 14
- MVFCKEFYUDZOCX-UHFFFAOYSA-N iron(2+);dinitrate Chemical compound [Fe+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O MVFCKEFYUDZOCX-UHFFFAOYSA-N 0.000 description 12
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 11
- 239000011701 zinc Substances 0.000 description 11
- 239000011734 sodium Substances 0.000 description 10
- HSJPMRKMPBAUAU-UHFFFAOYSA-N cerium(3+);trinitrate Chemical compound [Ce+3].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O HSJPMRKMPBAUAU-UHFFFAOYSA-N 0.000 description 9
- FGIUAXJPYTZDNR-UHFFFAOYSA-N potassium nitrate Chemical compound [K+].[O-][N+]([O-])=O FGIUAXJPYTZDNR-UHFFFAOYSA-N 0.000 description 9
- DHEQXMRUPNDRPG-UHFFFAOYSA-N strontium nitrate Chemical compound [Sr+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O DHEQXMRUPNDRPG-UHFFFAOYSA-N 0.000 description 9
- RTHYXYOJKHGZJT-UHFFFAOYSA-N rubidium nitrate Inorganic materials [Rb+].[O-][N+]([O-])=O RTHYXYOJKHGZJT-UHFFFAOYSA-N 0.000 description 8
- VWDWKYIASSYTQR-UHFFFAOYSA-N sodium nitrate Chemical compound [Na+].[O-][N+]([O-])=O VWDWKYIASSYTQR-UHFFFAOYSA-N 0.000 description 8
- KHAUBYTYGDOYRU-IRXASZMISA-N trospectomycin Chemical compound CN[C@H]([C@H]1O2)[C@@H](O)[C@@H](NC)[C@H](O)[C@H]1O[C@H]1[C@]2(O)C(=O)C[C@@H](CCCC)O1 KHAUBYTYGDOYRU-IRXASZMISA-N 0.000 description 8
- ONDPHDOFVYQSGI-UHFFFAOYSA-N zinc nitrate Chemical compound [Zn+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O ONDPHDOFVYQSGI-UHFFFAOYSA-N 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 7
- 239000010949 copper Substances 0.000 description 7
- XTVVROIMIGLXTD-UHFFFAOYSA-N copper(II) nitrate Chemical compound [Cu+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O XTVVROIMIGLXTD-UHFFFAOYSA-N 0.000 description 7
- 239000011148 porous material Substances 0.000 description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- 229910052787 antimony Inorganic materials 0.000 description 6
- UFMZWBIQTDUYBN-UHFFFAOYSA-N cobalt dinitrate Chemical compound [Co+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O UFMZWBIQTDUYBN-UHFFFAOYSA-N 0.000 description 6
- 238000011049 filling Methods 0.000 description 6
- KBJMLQFLOWQJNF-UHFFFAOYSA-N nickel(ii) nitrate Chemical compound [Ni+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O KBJMLQFLOWQJNF-UHFFFAOYSA-N 0.000 description 6
- 239000000047 product Substances 0.000 description 6
- OERNJTNJEZOPIA-UHFFFAOYSA-N zirconium nitrate Chemical compound [Zr+4].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O OERNJTNJEZOPIA-UHFFFAOYSA-N 0.000 description 6
- FYDKNKUEBJQCCN-UHFFFAOYSA-N lanthanum(3+);trinitrate Chemical compound [La+3].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O FYDKNKUEBJQCCN-UHFFFAOYSA-N 0.000 description 5
- -1 oxides Chemical class 0.000 description 5
- 239000000843 powder Substances 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 4
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical group CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 4
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 4
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 4
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
- 229910001981 cobalt nitrate Inorganic materials 0.000 description 4
- SQNZJJAZBFDUTD-UHFFFAOYSA-N durene Chemical compound CC1=CC(C)=C(C)C=C1C SQNZJJAZBFDUTD-UHFFFAOYSA-N 0.000 description 4
- 238000011156 evaluation Methods 0.000 description 4
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- 229910052750 molybdenum Inorganic materials 0.000 description 4
- 239000001301 oxygen Substances 0.000 description 4
- 239000004323 potassium nitrate Substances 0.000 description 4
- 235000010333 potassium nitrate Nutrition 0.000 description 4
- 230000035484 reaction time Effects 0.000 description 4
- 239000004317 sodium nitrate Substances 0.000 description 4
- 235000010344 sodium nitrate Nutrition 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
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- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
- 239000006227 byproduct Substances 0.000 description 3
- TVFDJXOCXUVLDH-UHFFFAOYSA-N caesium atom Chemical compound [Cs] TVFDJXOCXUVLDH-UHFFFAOYSA-N 0.000 description 3
- 238000005470 impregnation Methods 0.000 description 3
- 239000011572 manganese Substances 0.000 description 3
- 230000002829 reductive effect Effects 0.000 description 3
- IGLNJRXAVVLDKE-UHFFFAOYSA-N rubidium atom Chemical compound [Rb] IGLNJRXAVVLDKE-UHFFFAOYSA-N 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
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- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 2
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- 125000003172 aldehyde group Chemical group 0.000 description 2
- 229910052797 bismuth Inorganic materials 0.000 description 2
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 229910017052 cobalt Inorganic materials 0.000 description 2
- 239000010941 cobalt Substances 0.000 description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 2
- 239000003085 diluting agent Substances 0.000 description 2
- WOZVHXUHUFLZGK-UHFFFAOYSA-N dimethyl terephthalate Chemical compound COC(=O)C1=CC=C(C(=O)OC)C=C1 WOZVHXUHUFLZGK-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
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- 125000001827 mesitylenyl group Chemical group [H]C1=C(C(*)=C(C([H])=C1C([H])([H])[H])C([H])([H])[H])C([H])([H])[H] 0.000 description 2
- 150000001247 metal acetylides Chemical class 0.000 description 2
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- 229910052757 nitrogen Inorganic materials 0.000 description 2
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- 229910010271 silicon carbide Inorganic materials 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 description 2
- GISVICWQYMUPJF-UHFFFAOYSA-N 2,4-Dimethylbenzaldehyde Chemical compound CC1=CC=C(C=O)C(C)=C1 GISVICWQYMUPJF-UHFFFAOYSA-N 0.000 description 1
- SMUVABOERCFKRW-UHFFFAOYSA-N 2,5-Dimethylbenzaldehyde Chemical compound CC1=CC=C(C)C(C=O)=C1 SMUVABOERCFKRW-UHFFFAOYSA-N 0.000 description 1
- AIBJDPZNCNFKMR-UHFFFAOYSA-N 2,5-dimethylterephthalaldehyde Chemical compound CC1=CC(C=O)=C(C)C=C1C=O AIBJDPZNCNFKMR-UHFFFAOYSA-N 0.000 description 1
- MNHWRUCVFATHDL-UHFFFAOYSA-N 2-methylterephthalaldehyde Chemical compound CC1=CC(C=O)=CC=C1C=O MNHWRUCVFATHDL-UHFFFAOYSA-N 0.000 description 1
- POQJHLBMLVTHAU-UHFFFAOYSA-N 3,4-Dimethylbenzaldehyde Chemical compound CC1=CC=C(C=O)C=C1C POQJHLBMLVTHAU-UHFFFAOYSA-N 0.000 description 1
- NBEFMISJJNGCIZ-UHFFFAOYSA-N 3,5-dimethylbenzaldehyde Chemical compound CC1=CC(C)=CC(C=O)=C1 NBEFMISJJNGCIZ-UHFFFAOYSA-N 0.000 description 1
- RVQPYKLCDGTEPT-UHFFFAOYSA-N 4,5-dimethylphthalaldehyde Chemical compound CC1=CC(C=O)=C(C=O)C=C1C RVQPYKLCDGTEPT-UHFFFAOYSA-N 0.000 description 1
- PHGCHQXJJKPBLD-UHFFFAOYSA-N 5-methylbenzene-1,2,4-tricarbaldehyde Chemical compound CC1=CC(C=O)=C(C=O)C=C1C=O PHGCHQXJJKPBLD-UHFFFAOYSA-N 0.000 description 1
- UWLVWAQSMOVZKN-UHFFFAOYSA-N 5-methylbenzene-1,3-dicarbaldehyde Chemical compound CC1=CC(C=O)=CC(C=O)=C1 UWLVWAQSMOVZKN-UHFFFAOYSA-N 0.000 description 1
- LROJZZICACKNJL-UHFFFAOYSA-N Duryl aldehyde Chemical compound CC1=CC(C)=C(C=O)C=C1C LROJZZICACKNJL-UHFFFAOYSA-N 0.000 description 1
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- XUGISPSHIFXEHZ-GPJXBBLFSA-N [(3r,8s,9s,10r,13r,14s,17r)-10,13-dimethyl-17-[(2r)-6-methylheptan-2-yl]-2,3,4,7,8,9,11,12,14,15,16,17-dodecahydro-1h-cyclopenta[a]phenanthren-3-yl] acetate Chemical compound C1C=C2C[C@H](OC(C)=O)CC[C@]2(C)[C@@H]2[C@@H]1[C@@H]1CC[C@H]([C@H](C)CCCC(C)C)[C@@]1(C)CC2 XUGISPSHIFXEHZ-GPJXBBLFSA-N 0.000 description 1
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- 229910052786 argon Inorganic materials 0.000 description 1
- AEKQNAANFVOBCU-UHFFFAOYSA-N benzene-1,3,5-tricarbaldehyde Chemical compound O=CC1=CC(C=O)=CC(C=O)=C1 AEKQNAANFVOBCU-UHFFFAOYSA-N 0.000 description 1
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- OVWYEQOVUDKZNU-UHFFFAOYSA-N m-tolualdehyde Chemical compound CC1=CC=CC(C=O)=C1 OVWYEQOVUDKZNU-UHFFFAOYSA-N 0.000 description 1
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- 229910017604 nitric acid Inorganic materials 0.000 description 1
- FGHSTPNOXKDLKU-UHFFFAOYSA-N nitric acid;hydrate Chemical compound O.O[N+]([O-])=O FGHSTPNOXKDLKU-UHFFFAOYSA-N 0.000 description 1
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- BTFQKIATRPGRBS-UHFFFAOYSA-N o-tolualdehyde Chemical compound CC1=CC=CC=C1C=O BTFQKIATRPGRBS-UHFFFAOYSA-N 0.000 description 1
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- 229940127557 pharmaceutical product Drugs 0.000 description 1
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- ZWLUXSQADUDCSB-UHFFFAOYSA-N phthalaldehyde Chemical compound O=CC1=CC=CC=C1C=O ZWLUXSQADUDCSB-UHFFFAOYSA-N 0.000 description 1
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- 238000010992 reflux Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000002390 rotary evaporation Methods 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- CGFYHILWFSGVJS-UHFFFAOYSA-N silicic acid;trioxotungsten Chemical compound O[Si](O)(O)O.O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1.O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1.O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1.O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1 CGFYHILWFSGVJS-UHFFFAOYSA-N 0.000 description 1
- 229910021332 silicide Inorganic materials 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 description 1
- 238000001694 spray drying Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000013076 target substance Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 229910052716 thallium Inorganic materials 0.000 description 1
- 150000003568 thioethers Chemical class 0.000 description 1
- 238000001291 vacuum drying Methods 0.000 description 1
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Abstract
Description
Claims (13)
- 활성성분으로 하기 화학식 1의 화합물을 포함하는 메틸벤젠류 부분 산화용 촉매:[화학식 1]WaXbYcOx상기식에서W는 텅스텐원자를 나타내고,X는 Li, Na, K, Rb, 및 Cs로 이루어진 그룹으로부터 선택되는 하나 이상의 알칼리 금속을 나타내며,Y는 Fe, Co, Ni, Cu, Mn, Re, Cr, V, Nb, Ti, Zr, Zn, Cd, Y, La, Ce, B, Al, Sn, Mg, Ca, Sr, 및 Ba로 이루어진 그룹으로부터 선택되는 하나 이상의 원소를 나타내고,O는 산소원자를 나타내며,a, b, c 및 x는 각각 W, X, Y 및 산소원자의 원자수를 나타내고, a:b:c의 비율은 12 : 0.001 ~ 1 : 0 ~ 5를 나타내고, x는 W, X 및 Y원소의 산화상태에 의해 결정되는 값이다.
- 제1항에 있어서, X는 Na, K, Rb, 및 Cs로 이루어진 그룹으로부터 선택된 하나 이상의 알칼리 금속인 것을 특징으로 하는 메틸벤젠류 부분 산화용 촉매.
- 제1항에 있어서, Y는 Fe, Ce, Ni, Co, Sr, La, Cu, Zn 및 Zr로 이루어진 그룹으로부터 선택되는 하나 이상의 원소인 것을 특징으로 하는 메틸벤젠류 부분 산화용 촉매.
- 제1항에 있어서, a:b:c의 비율은 12 : 0.01 ~ 0.5 : 0 ~ 1인 것을 특징으로 하는 메틸벤젠류 부분 산화용 촉매.
- 제1항에 있어서, 화학식 1의 화합물이 내화성 무기 담체에 담지된 것을 특징으로 하는 메틸벤젠류 부분 산화용 촉매.
- (a) 텅스텐 원료, 및 Li, Na, K, Rb, 및 Cs로 이루어진 그룹으로부터 선택되는 하나 이상의 알칼리 금속 원료를 포함하는 용액 또는 슬러리를 제조하는 단계;(b) 상기 용액 또는 슬러리를 건조시키는 단계; 및(c) 상기 (b) 단계에서 수득한 생성물을 소성시키는 단계를 포함하는 하기 화학식 1의 메틸벤젠류 부분산화용 촉매의 제조방법:[화학식 1]WaXbYcOx상기식에서W는 텅스텐원자를 나타내고,X는 Li, Na, K, Rb, 및 Cs로 이루어진 그룹으로부터 선택되는 하나 이상의 알칼리 금속을 나타내며,Y는 Fe, Co, Ni, Cu, Mn, Re, Cr, V, Nb, Ti, Zr, Zn, Cd, Y, La, Ce, B, Al, Sn, Mg, Ca, Sr, 및 Ba로 이루어진 그룹으로부터 선택되는 하나 이상의 원소를 나타내고,O는 산소원자를 나타내며,a, b, c 및 x는 각각 W, X, Y 및 산소원자의 원자수를 나타내고, a:b:c의 비율은 12 : 0.001 ~ 1 : 0 ~ 5를 나타내고, x는 W, X 및 Y원소의 산화상태에 의해 결정되는 값이다.
- 제6항에 있어서, 단계 (a)에서 제조된 용액 또는 슬러리를 무기 담체에 담지시키는 단계를 추가로 포함하는 것을 특징으로 하는 메틸벤젠류 부분산화용 촉매의 제조방법.
- 제6항에 있어서, 텅스텐 원료는 암모늄메타텅스텐 수화물을 소성하여 제조한 텅스텐 옥사이드인 것을 특징으로 하는 메틸벤젠류 부분산화용 촉매의 제조방법.
- 제6항에 있어서, 상기 (b) 단계는 80 ~ 200℃에서 수행되는 것을 특징으로 하는 메틸벤젠류 부분산화용 촉매의 제조방법.
- 제6항에 있어서, 상기 (c) 단계는 300 ~ 700 ℃에서 수행되는 것을 특징으로 하는 메틸벤젠류 부분산화용 촉매의 제조방법.
- 메틸벤젠류를 분자상 산소를 이용하여 기상 산화하여 대응하는 방향족 알데히드를 제조하는 방법에 있어서, 제1항 내지 제5항 중 어느 한 항에 따른 촉매를 사용하는 것을 특징으로 하는 방향족 알데히드의 제조방법.
- 제11항에 있어서, 메틸벤젠류의 탄소원자수가 7 ~ 10인 것을 특징으로 하는 방향족 알데히드의 제조방법.
- 제11항에 있어서, 메틸벤젠류가 p-자일렌이고 대응하는 방향족 알데히드가 테레프탈알데히드인 것을 특징으로 하는 방향족 알데히드의 제조방법.
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