KR100768565B1 - 전도성 표면을 처리하는 에너지 개선방법 - Google Patents

전도성 표면을 처리하는 에너지 개선방법 Download PDF

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Publication number
KR100768565B1
KR100768565B1 KR1020027012569A KR20027012569A KR100768565B1 KR 100768565 B1 KR100768565 B1 KR 100768565B1 KR 1020027012569 A KR1020027012569 A KR 1020027012569A KR 20027012569 A KR20027012569 A KR 20027012569A KR 100768565 B1 KR100768565 B1 KR 100768565B1
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South Korea
Prior art keywords
solution
silicate
hours
corrosion
mineral
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Expired - Fee Related
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KR1020027012569A
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English (en)
Korean (ko)
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KR20020091152A (ko
Inventor
헤이만로버트엘.
달튼윌리엄엠.
한존
프라이스데이비드엠.
소시에웨인엘.
라비찬드란
Original Assignee
엘리사 홀딩 엘엘씨
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Priority claimed from US09/532,982 external-priority patent/US6322687B1/en
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Publication of KR20020091152A publication Critical patent/KR20020091152A/ko
Application granted granted Critical
Publication of KR100768565B1 publication Critical patent/KR100768565B1/ko
Assigned to 애큐라이드코포레이션 reassignment 애큐라이드코포레이션 권리의 전부이전등록 Assignors: 엘리사 홀딩 엘엘씨
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    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D9/00Electrolytic coating other than with metals
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D9/00Electrolytic coating other than with metals
    • C25D9/04Electrolytic coating other than with metals with inorganic materials
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D9/00Electrolytic coating other than with metals
    • C25D9/04Electrolytic coating other than with metals with inorganic materials
    • C25D9/08Electrolytic coating other than with metals with inorganic materials by cathodic processes
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/22Secondary treatment of printed circuits
    • H05K3/28Applying non-metallic protective coatings
    • H05K3/282Applying non-metallic protective coatings for inhibiting the corrosion of the circuit, e.g. for preserving the solderability

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electrochemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
  • Chemical Treatment Of Metals (AREA)
  • Physical Vapour Deposition (AREA)
KR1020027012569A 2000-03-22 2001-03-22 전도성 표면을 처리하는 에너지 개선방법 Expired - Fee Related KR100768565B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US09/532,982 2000-03-22
US09/532,982 US6322687B1 (en) 1997-01-31 2000-03-22 Electrolytic process for forming a mineral
US09/775,072 US6592738B2 (en) 1997-01-31 2001-02-01 Electrolytic process for treating a conductive surface and products formed thereby
US09/775,072 2001-02-01

Publications (2)

Publication Number Publication Date
KR20020091152A KR20020091152A (ko) 2002-12-05
KR100768565B1 true KR100768565B1 (ko) 2007-10-19

Family

ID=27064015

Family Applications (1)

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KR1020027012569A Expired - Fee Related KR100768565B1 (ko) 2000-03-22 2001-03-22 전도성 표면을 처리하는 에너지 개선방법

Country Status (10)

Country Link
US (1) US6592738B2 (https=)
EP (1) EP1307608A2 (https=)
JP (1) JP2003528220A (https=)
KR (1) KR100768565B1 (https=)
CN (1) CN1284886C (https=)
AU (1) AU780174B2 (https=)
BR (1) BR0109472A (https=)
CA (1) CA2387813C (https=)
MX (1) MXPA02003563A (https=)
WO (1) WO2001071067A2 (https=)

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AU5294801A (en) 2001-10-03
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KR20020091152A (ko) 2002-12-05
EP1307608A2 (en) 2003-05-07
AU780174B2 (en) 2005-03-03
CN1284886C (zh) 2006-11-15
US6592738B2 (en) 2003-07-15
WO2001071067A3 (en) 2003-02-06
BR0109472A (pt) 2004-01-13
CN1476493A (zh) 2004-02-18
CA2387813A1 (en) 2001-09-27
US20020012804A1 (en) 2002-01-31
MXPA02003563A (es) 2003-05-23
WO2001071067A2 (en) 2001-09-27

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