KR100717689B1 - 노광장치 및 디바이스제조방법 - Google Patents

노광장치 및 디바이스제조방법 Download PDF

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Publication number
KR100717689B1
KR100717689B1 KR1020050001019A KR20050001019A KR100717689B1 KR 100717689 B1 KR100717689 B1 KR 100717689B1 KR 1020050001019 A KR1020050001019 A KR 1020050001019A KR 20050001019 A KR20050001019 A KR 20050001019A KR 100717689 B1 KR100717689 B1 KR 100717689B1
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South Korea
Prior art keywords
temperature
substrate
liquid
optical system
exposure apparatus
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Expired - Fee Related
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KR1020050001019A
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English (en)
Korean (ko)
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KR20050072685A (ko
Inventor
도키타도시노부
Original Assignee
캐논 가부시끼가이샤
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Publication of KR20050072685A publication Critical patent/KR20050072685A/ko
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Publication of KR100717689B1 publication Critical patent/KR100717689B1/ko
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/52—Details
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G03F7/70891—Temperature

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  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Lenses (AREA)
KR1020050001019A 2004-01-07 2005-01-06 노광장치 및 디바이스제조방법 Expired - Fee Related KR100717689B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2004-00002058 2004-01-07
JP2004002058A JP4429023B2 (ja) 2004-01-07 2004-01-07 露光装置及びデバイス製造方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1020070021718A Division KR100727516B1 (ko) 2004-01-07 2007-03-06 노광장치 및 디바이스 제조방법

Publications (2)

Publication Number Publication Date
KR20050072685A KR20050072685A (ko) 2005-07-12
KR100717689B1 true KR100717689B1 (ko) 2007-05-11

Family

ID=34709026

Family Applications (2)

Application Number Title Priority Date Filing Date
KR1020050001019A Expired - Fee Related KR100717689B1 (ko) 2004-01-07 2005-01-06 노광장치 및 디바이스제조방법
KR1020070021718A Expired - Fee Related KR100727516B1 (ko) 2004-01-07 2007-03-06 노광장치 및 디바이스 제조방법

Family Applications After (1)

Application Number Title Priority Date Filing Date
KR1020070021718A Expired - Fee Related KR100727516B1 (ko) 2004-01-07 2007-03-06 노광장치 및 디바이스 제조방법

Country Status (5)

Country Link
US (1) US7528930B2 (https=)
JP (1) JP4429023B2 (https=)
KR (2) KR100717689B1 (https=)
CN (2) CN101408734A (https=)
TW (1) TWI308673B (https=)

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* Cited by examiner, † Cited by third party
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US20050146694A1 (en) 2005-07-07
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