KR100701518B1 - 기판처리장치 - Google Patents

기판처리장치 Download PDF

Info

Publication number
KR100701518B1
KR100701518B1 KR1020040069948A KR20040069948A KR100701518B1 KR 100701518 B1 KR100701518 B1 KR 100701518B1 KR 1020040069948 A KR1020040069948 A KR 1020040069948A KR 20040069948 A KR20040069948 A KR 20040069948A KR 100701518 B1 KR100701518 B1 KR 100701518B1
Authority
KR
South Korea
Prior art keywords
detection
substrate
processing apparatus
slit nozzle
substrate processing
Prior art date
Application number
KR1020040069948A
Other languages
English (en)
Korean (ko)
Other versions
KR20050024266A (ko
Inventor
다카기요시노리
니시오카켄타로
Original Assignee
다이닛뽕스크린 세이조오 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 다이닛뽕스크린 세이조오 가부시키가이샤 filed Critical 다이닛뽕스크린 세이조오 가부시키가이샤
Publication of KR20050024266A publication Critical patent/KR20050024266A/ko
Application granted granted Critical
Publication of KR100701518B1 publication Critical patent/KR100701518B1/ko

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • H01L21/67259—Position monitoring, e.g. misposition detection or presence detection

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Nonlinear Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Coating Apparatus (AREA)
  • Chemical & Material Sciences (AREA)
  • Optics & Photonics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Supply And Installment Of Electrical Components (AREA)
KR1020040069948A 2003-09-04 2004-09-02 기판처리장치 KR100701518B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2003-00312301 2003-09-04
JP2003312301A JP4105613B2 (ja) 2003-09-04 2003-09-04 基板処理装置

Publications (2)

Publication Number Publication Date
KR20050024266A KR20050024266A (ko) 2005-03-10
KR100701518B1 true KR100701518B1 (ko) 2007-03-29

Family

ID=34413594

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020040069948A KR100701518B1 (ko) 2003-09-04 2004-09-02 기판처리장치

Country Status (4)

Country Link
JP (1) JP4105613B2 (ja)
KR (1) KR100701518B1 (ja)
CN (1) CN1315583C (ja)
TW (1) TWI289481B (ja)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101146437B1 (ko) * 2005-06-30 2012-05-21 엘지디스플레이 주식회사 코팅장비 및 그 운용방법
JP4803714B2 (ja) * 2005-09-21 2011-10-26 東京応化工業株式会社 塗布装置及び塗布方法
JP4587950B2 (ja) * 2005-12-22 2010-11-24 大日本スクリーン製造株式会社 基板処理装置
JP2007250851A (ja) * 2006-03-16 2007-09-27 Dainippon Screen Mfg Co Ltd 基板処理装置、基板処理システムおよび基板処理方法
DE102007049506B3 (de) * 2007-10-15 2009-05-28 Bayer Materialscience Ag Bodenbedeckung mit viskoelastischen Dämpfungseigenschaften
KR101267530B1 (ko) * 2008-04-30 2013-05-23 엘지디스플레이 주식회사 포토레지스트 코팅장비 및 방법
JP5304474B2 (ja) * 2009-06-22 2013-10-02 東京エレクトロン株式会社 液処理装置、液処理方法及び記憶媒体
JP5679866B2 (ja) * 2011-02-28 2015-03-04 東レエンジニアリング株式会社 塗布装置および塗布方法
JP6319193B2 (ja) * 2015-06-03 2018-05-09 東京エレクトロン株式会社 基板処理装置及び基板処理方法
CN109482423B (zh) * 2017-09-12 2021-05-18 南昌欧菲生物识别技术有限公司 超声波传感器制造方法及涂布机台
JP6869279B2 (ja) * 2019-02-19 2021-05-12 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置および基板処理方法
CN110000046A (zh) * 2019-04-29 2019-07-12 华工制造装备数字化国家工程中心有限公司 一种用于硬质载体的液体涂布设备及方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2740588B2 (ja) * 1991-07-24 1998-04-15 日立テクノエンジニアリング株式会社 塗布描画装置
JPH05293417A (ja) * 1992-04-20 1993-11-09 Nissan Motor Co Ltd 粘性材料の塗布パターン検査装置
CN1095698C (zh) * 1995-07-24 2002-12-11 松下电器产业株式会社 结合剂涂敷装置
JPH09329423A (ja) * 1996-04-09 1997-12-22 Dainippon Screen Mfg Co Ltd レジスト膜の塗布むら検出装置
JP3501599B2 (ja) * 1996-10-23 2004-03-02 キヤノン株式会社 記録装置および吐出不良の検出方法
JPH11300257A (ja) * 1998-04-24 1999-11-02 Toray Ind Inc 凹凸基材への塗液の塗布装置およびプラズマディスプレイの製造装置
JP3653688B2 (ja) * 1998-07-10 2005-06-02 平田機工株式会社 スリットコート式塗布装置とスリットコート式塗布方法
JP3933357B2 (ja) * 1999-09-29 2007-06-20 ローム株式会社 レーザセンサ
JP3820830B2 (ja) * 2000-02-01 2006-09-13 セイコーエプソン株式会社 印刷装置に関する不動作ノズル検出方法および印刷装置、並びにそのためのプログラムを記録した記録媒体
JP4273627B2 (ja) * 2000-04-11 2009-06-03 セイコーエプソン株式会社 焦点を移動させながら行うインク滴吐出検査
JP4325084B2 (ja) * 2000-06-19 2009-09-02 東レ株式会社 塗布方法およびそれを用いたカラーフィルタの製造方法
WO2002053297A1 (fr) * 2000-12-27 2002-07-11 Toray Industries, Inc. Embout buccal et dispositif, et procede d'application d'un fluide de revetement
CN1257799C (zh) * 2001-09-05 2006-05-31 财团法人工业技术研究院 滤色片喷涂制造法及设备

Also Published As

Publication number Publication date
JP2005085773A (ja) 2005-03-31
TW200510077A (en) 2005-03-16
TWI289481B (en) 2007-11-11
CN1315583C (zh) 2007-05-16
KR20050024266A (ko) 2005-03-10
JP4105613B2 (ja) 2008-06-25
CN1589975A (zh) 2005-03-09

Similar Documents

Publication Publication Date Title
KR100676240B1 (ko) 기판 처리 장치
KR100658460B1 (ko) 기판 처리 장치
KR100701518B1 (ko) 기판처리장치
JP5679866B2 (ja) 塗布装置および塗布方法
KR101240046B1 (ko) 광학식 이물 검출 장치 및 이것을 탑재한 처리액도포 장치
JPH0524179A (ja) 塗布描画装置
KR101314017B1 (ko) 광학식 이물질 검출 장치 및 이것을 탑재한 처리액 도포장치
KR20080005067A (ko) 노광 장치
JP4587950B2 (ja) 基板処理装置
JP2007173387A (ja) 基板処理装置
JP2011082230A (ja) 基板塗布装置
KR20200085646A (ko) 피가공물의 가공 방법
KR100968011B1 (ko) 기판 도포 장치 및 약액 검출 방법
JP2003347190A (ja) 基板処理装置
KR100921833B1 (ko) 평판디스플레이용 글래스 상부 또는 하부의 이물 검출 장치및 이물 검출 방법
KR100838431B1 (ko) 기판 처리 장치
KR100841203B1 (ko) 기판 처리 장치, 기판 처리 시스템 및 기판 처리 방법
JP4428565B2 (ja) 処理液塗布装置
JP2007173532A (ja) 基板処理装置
KR102625152B1 (ko) 기판 처리 장치 및 방법
JP2001068533A (ja) 光学式基板検出装置、ならびにそれを用いた基板処理装置および基板処理方法
JP2006272207A (ja) 塗布装置
JP2019161144A (ja) 基板処理装置および基板処理装置の異状検知方法
JP2012202907A (ja) 塗布装置

Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
E701 Decision to grant or registration of patent right
GRNT Written decision to grant
FPAY Annual fee payment

Payment date: 20130304

Year of fee payment: 7

FPAY Annual fee payment

Payment date: 20140303

Year of fee payment: 8

FPAY Annual fee payment

Payment date: 20150224

Year of fee payment: 9

FPAY Annual fee payment

Payment date: 20160219

Year of fee payment: 10

FPAY Annual fee payment

Payment date: 20170221

Year of fee payment: 11

FPAY Annual fee payment

Payment date: 20180302

Year of fee payment: 12

FPAY Annual fee payment

Payment date: 20190306

Year of fee payment: 13

FPAY Annual fee payment

Payment date: 20200303

Year of fee payment: 14