KR100700901B1 - 옥심 유도체 및 잠산으로서의 이의 용도 - Google Patents

옥심 유도체 및 잠산으로서의 이의 용도 Download PDF

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Publication number
KR100700901B1
KR100700901B1 KR1020000016548A KR20000016548A KR100700901B1 KR 100700901 B1 KR100700901 B1 KR 100700901B1 KR 1020000016548 A KR1020000016548 A KR 1020000016548A KR 20000016548 A KR20000016548 A KR 20000016548A KR 100700901 B1 KR100700901 B1 KR 100700901B1
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KR
South Korea
Prior art keywords
substituted
phenyl
formula
alkyl
unsubstituted
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KR1020000016548A
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English (en)
Korean (ko)
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KR20000063080A (ko
Inventor
아사쿠라도시카게
야마토히토시
오와마사키
비르바움요안-루크
디트리커쿠르트
다나베쥰이치
Original Assignee
시바 스페셜티 케미칼스 홀딩 인크.
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Application filed by 시바 스페셜티 케미칼스 홀딩 인크. filed Critical 시바 스페셜티 케미칼스 홀딩 인크.
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G7/00—Selection of materials for use in image-receiving members, i.e. for reversal by physical contact; Manufacture thereof
    • G03G7/0006—Cover layers for image-receiving members; Strippable coversheets
    • G03G7/002—Organic components thereof
    • G03G7/0026—Organic components thereof being macromolecular
    • G03G7/004—Organic components thereof being macromolecular obtained by reactions only involving carbon-to-carbon unsaturated bonds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C251/00—Compounds containing nitrogen atoms doubly-bound to a carbon skeleton
    • C07C251/32—Oximes
    • C07C251/62—Oximes having oxygen atoms of oxyimino groups esterified
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C309/00—Sulfonic acids; Halides, esters, or anhydrides thereof
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C309/00—Sulfonic acids; Halides, esters, or anhydrides thereof
    • C07C309/63—Esters of sulfonic acids
    • C07C309/64—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to acyclic carbon atoms
    • C07C309/65—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to acyclic carbon atoms of a saturated carbon skeleton
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C317/00—Sulfones; Sulfoxides
    • C07C317/26—Sulfones; Sulfoxides having sulfone or sulfoxide groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton
    • C07C317/32—Sulfones; Sulfoxides having sulfone or sulfoxide groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton with sulfone or sulfoxide groups bound to carbon atoms of six-membered aromatic rings of the carbon skeleton
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
    • C07C323/23—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton
    • C07C323/46—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton having at least one of the nitrogen atoms, not being part of nitro or nitroso groups, further bound to other hetero atoms
    • C07C323/47—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton having at least one of the nitrogen atoms, not being part of nitro or nitroso groups, further bound to other hetero atoms to oxygen atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C381/00—Compounds containing carbon and sulfur and having functional groups not covered by groups C07C301/00 - C07C337/00
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D319/00—Heterocyclic compounds containing six-membered rings having two oxygen atoms as the only ring hetero atoms
    • C07D319/10—1,4-Dioxanes; Hydrogenated 1,4-dioxanes
    • C07D319/14—1,4-Dioxanes; Hydrogenated 1,4-dioxanes condensed with carbocyclic rings or ring systems
    • C07D319/16—1,4-Dioxanes; Hydrogenated 1,4-dioxanes condensed with carbocyclic rings or ring systems condensed with one six-membered ring
    • C07D319/18—Ethylenedioxybenzenes, not substituted on the hetero ring
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D333/00—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom
    • C07D333/02—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings
    • C07D333/04—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom
    • C07D333/06—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to the ring carbon atoms
    • C07D333/22—Radicals substituted by doubly bound hetero atoms, or by two hetero atoms other than halogen singly bound to the same carbon atom
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2602/00—Systems containing two condensed rings
    • C07C2602/36—Systems containing two condensed rings the rings having more than two atoms in common
    • C07C2602/42—Systems containing two condensed rings the rings having more than two atoms in common the bicyclo ring system containing seven carbon atoms
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
KR1020000016548A 1999-03-31 2000-03-30 옥심 유도체 및 잠산으로서의 이의 용도 KR100700901B1 (ko)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
EP99810273 1999-03-31
EP99810273.5 1999-03-31
EP99810287.5 1999-04-07
EP99810287 1999-04-07
EP99810779.1 1999-08-30
EP99810779 1999-08-30

Publications (2)

Publication Number Publication Date
KR20000063080A KR20000063080A (ko) 2000-10-25
KR100700901B1 true KR100700901B1 (ko) 2007-03-29

Family

ID=27240245

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020000016548A KR100700901B1 (ko) 1999-03-31 2000-03-30 옥심 유도체 및 잠산으로서의 이의 용도

Country Status (12)

Country Link
US (1) US6512020B1 (US06512020-20030128-C00036.png)
KR (1) KR100700901B1 (US06512020-20030128-C00036.png)
AT (1) AT410262B (US06512020-20030128-C00036.png)
AU (1) AU766803B2 (US06512020-20030128-C00036.png)
BE (1) BE1013627A3 (US06512020-20030128-C00036.png)
CA (1) CA2302875A1 (US06512020-20030128-C00036.png)
CH (1) CH694663A5 (US06512020-20030128-C00036.png)
ES (1) ES2168953B1 (US06512020-20030128-C00036.png)
IT (1) IT1318431B1 (US06512020-20030128-C00036.png)
MY (1) MY116074A (US06512020-20030128-C00036.png)
NL (2) NL1014545C2 (US06512020-20030128-C00036.png)
SE (1) SE522082C2 (US06512020-20030128-C00036.png)

Cited By (2)

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WO2010030350A2 (en) * 2008-09-09 2010-03-18 Herman Myburgh Nail driving tool mechanism
KR101491975B1 (ko) 2014-03-14 2015-02-11 (주)휴넷플러스 화학 증폭형 포지티브 감광성 경화 수지 조성물, 이를 이용한 경화막의 제조 방법 및 경화막을 포함하는 전자소자

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KR100801457B1 (ko) * 2001-06-11 2008-02-11 시바 스페셜티 케미칼스 홀딩 인크. 결합된 구조를 가지는 옥심 에스테르 광개시제
US6824954B2 (en) * 2001-08-23 2004-11-30 Jsr Corporation Sulfonyloxime compound, and radiation sensitive acid generator, positive type radiation sensitive resin composition and negative type radiation sensitive resin composition using same
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US6875480B2 (en) * 2002-02-27 2005-04-05 Industrial Technology Research Institute Method of enhancement of electrical conductivity for conductive polymer by use of field effect control
JP3841405B2 (ja) * 2002-03-29 2006-11-01 富士写真フイルム株式会社 ネガ型レジスト組成物
KR101043905B1 (ko) * 2003-02-19 2011-06-29 시바 홀딩 인크 할로겐화 옥심 유도체 및 잠산으로서의 이의 용도
US7098463B2 (en) * 2003-03-03 2006-08-29 Heuris Pharma, Llc Three-dimensional dosimeter for penetrating radiation and method of use
JP2008506749A (ja) * 2004-07-20 2008-03-06 チバ　スペシャルティ　ケミカルズ　ホールディング　インコーポレーテッド オキシム誘導体および潜在酸としてのそれらの使用
TWI332122B (en) 2005-04-06 2010-10-21 Shinetsu Chemical Co Novel sulfonate salts and derivatives, photoacid generators, resist compositions and patterning process
JP4626758B2 (ja) * 2005-07-07 2011-02-09 信越化学工業株式会社 含フッ素環状構造を有するケイ素化合物及びシリコーン樹脂、それを用いたレジスト組成物、及びパターン形成方法
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NL1019981C2 (nl) 2002-10-03
US6512020B1 (en) 2003-01-28
AT410262B (de) 2003-03-25
BE1013627A3 (fr) 2002-05-07
KR20000063080A (ko) 2000-10-25
MY116074A (en) 2003-10-31
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SE0001090L (sv) 2000-10-01
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ATA5422000A (de) 2002-07-15

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