KR100694691B1 - 정전 흡착 방법 - Google Patents
정전 흡착 방법 Download PDFInfo
- Publication number
- KR100694691B1 KR100694691B1 KR1020030086758A KR20030086758A KR100694691B1 KR 100694691 B1 KR100694691 B1 KR 100694691B1 KR 1020030086758 A KR1020030086758 A KR 1020030086758A KR 20030086758 A KR20030086758 A KR 20030086758A KR 100694691 B1 KR100694691 B1 KR 100694691B1
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- KR
- South Korea
- Prior art keywords
- support surface
- substrate
- electrode
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6831—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using electrostatic chucks
- H01L21/6833—Details of electrostatic chucks
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F24—HEATING; RANGES; VENTILATING
- F24D—DOMESTIC- OR SPACE-HEATING SYSTEMS, e.g. CENTRAL HEATING SYSTEMS; DOMESTIC HOT-WATER SUPPLY SYSTEMS; ELEMENTS OR COMPONENTS THEREFOR
- F24D7/00—Central heating systems employing heat-transfer fluids not covered by groups F24D1/00 - F24D5/00, e.g. oil, salt or gas
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F24—HEATING; RANGES; VENTILATING
- F24D—DOMESTIC- OR SPACE-HEATING SYSTEMS, e.g. CENTRAL HEATING SYSTEMS; DOMESTIC HOT-WATER SUPPLY SYSTEMS; ELEMENTS OR COMPONENTS THEREFOR
- F24D12/00—Other central heating systems
- F24D12/02—Other central heating systems having more than one heat source
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F24—HEATING; RANGES; VENTILATING
- F24D—DOMESTIC- OR SPACE-HEATING SYSTEMS, e.g. CENTRAL HEATING SYSTEMS; DOMESTIC HOT-WATER SUPPLY SYSTEMS; ELEMENTS OR COMPONENTS THEREFOR
- F24D19/00—Details
- F24D19/008—Details related to central heating radiators
- F24D19/0087—Fan arrangements for forced convection
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25B—REFRIGERATION MACHINES, PLANTS OR SYSTEMS; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS
- F25B27/00—Machines, plants or systems, using particular sources of energy
- F25B27/002—Machines, plants or systems, using particular sources of energy using solar energy
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- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02N—ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR
- H02N13/00—Clutches or holding devices using electrostatic attraction, e.g. using Johnson-Rahbek effect
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F24—HEATING; RANGES; VENTILATING
- F24D—DOMESTIC- OR SPACE-HEATING SYSTEMS, e.g. CENTRAL HEATING SYSTEMS; DOMESTIC HOT-WATER SUPPLY SYSTEMS; ELEMENTS OR COMPONENTS THEREFOR
- F24D2200/00—Heat sources or energy sources
- F24D2200/08—Electric heater
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F24—HEATING; RANGES; VENTILATING
- F24D—DOMESTIC- OR SPACE-HEATING SYSTEMS, e.g. CENTRAL HEATING SYSTEMS; DOMESTIC HOT-WATER SUPPLY SYSTEMS; ELEMENTS OR COMPONENTS THEREFOR
- F24D2200/00—Heat sources or energy sources
- F24D2200/12—Heat pump
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F24—HEATING; RANGES; VENTILATING
- F24D—DOMESTIC- OR SPACE-HEATING SYSTEMS, e.g. CENTRAL HEATING SYSTEMS; DOMESTIC HOT-WATER SUPPLY SYSTEMS; ELEMENTS OR COMPONENTS THEREFOR
- F24D2200/00—Heat sources or energy sources
- F24D2200/14—Solar energy
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/133354—Arrangements for aligning or assembling substrates
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Thermal Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Combustion & Propulsion (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Liquid Crystal (AREA)
- Sustainable Energy (AREA)
- Sustainable Development (AREA)
- Life Sciences & Earth Sciences (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
Description
Claims (11)
- 유전체로 이루어지는 테이블에 설치된 전극에 직류 전압을 인가하여, 상기 직류 전압 인가에 의하여 발생하는 정전기력으로 상기 테이블의 지지면에 기판을 흡착 지지하는 정전 흡착 방법에 있어서,상기 전극에 설정된 하나의 극성의 전압을 인가하여 상기 지지면에 상기 전극에 인가된 극성과 다른 극성의 전하를 대전시키는 제1 공정,상기 지지면에 상기 기판을 지지하는 제2 공정, 및상기 지지면에 상기 기판을 지지한 상태에서 상기 전극에 상기 제1 공정에서 인가한 극성과 다른 극성의 전압을 인가하여 상기 테이블의 상기 지지면에 상기 제1 공정에서 상기 지지면에 대전시킨 전하와 동일 극성의 전하를 발생시키고, 상기 전하와 상기 제1 공정에서 상기 지지면에 대전시킨 전하로 상기 기판을 흡착 지지하는 제3 공정을 구비하는 것을 특징으로 하는 정전 흡착 방법.
- 제1항에 있어서,상기 제1 공정은 압력 분위기 하에서 행해지고, 상기 압력 분위기에는 하전 입자가 존재하는 것을 특징으로 하는 정전 흡착 방법.
- 제2항에 있어서,상기 압력 분위기에는 수증기와 산소 중 하나 이상이 존재하는 것을 특징으로 하는 정전 흡착 방법.
- 제1항에 있어서,상기 제3 공정은 80kPa 이하의 압력 분위기에서 행하는 것을 특징으로 하는 정전 흡착 방법.
- 제1항에 있어서,상기 제3 공정에서 상기 전극에 전압을 인가하기 전에, 상기 전극을 접지(earth)하여 전극에 축적된 전하를 방전시키는 접지 공정을 가지는 것을 특징으로 하는 정전 흡착 방법.
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Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2002352710 | 2002-12-04 | ||
JPJP-P-2002-00352710 | 2002-12-04 | ||
JPJP-P-2003-00176608 | 2003-06-20 | ||
JP2003176608A JP4323232B2 (ja) | 2002-12-04 | 2003-06-20 | 静電吸着方法、静電吸着装置及び貼り合せ装置 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020060022655A Division KR100918634B1 (ko) | 2002-12-04 | 2006-03-10 | 정전 흡착 장치 및 접합 장치 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20040048837A KR20040048837A (ko) | 2004-06-10 |
KR100694691B1 true KR100694691B1 (ko) | 2007-03-13 |
Family
ID=32964406
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020030086758A KR100694691B1 (ko) | 2002-12-04 | 2003-12-02 | 정전 흡착 방법 |
KR1020060022655A KR100918634B1 (ko) | 2002-12-04 | 2006-03-10 | 정전 흡착 장치 및 접합 장치 |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020060022655A KR100918634B1 (ko) | 2002-12-04 | 2006-03-10 | 정전 흡착 장치 및 접합 장치 |
Country Status (4)
Country | Link |
---|---|
US (1) | US20040223284A1 (ko) |
JP (1) | JP4323232B2 (ko) |
KR (2) | KR100694691B1 (ko) |
TW (1) | TWI227862B (ko) |
Families Citing this family (28)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI350394B (en) * | 2004-04-16 | 2011-10-11 | Chimei Innolux Corp | Apparatus and method for connecting two substrates |
JP4498895B2 (ja) * | 2004-11-22 | 2010-07-07 | 筑波精工株式会社 | 静電吸着システム及びそれを用いたアライメント方法 |
JP4583905B2 (ja) * | 2004-12-17 | 2010-11-17 | 筑波精工株式会社 | アライメント装置及びそれを用いたアライメント方法 |
KR101413233B1 (ko) * | 2007-09-14 | 2014-06-30 | 삼성전자 주식회사 | 나노 임프린트 리소그래피 공정 |
JP5236448B2 (ja) * | 2008-12-16 | 2013-07-17 | アドヴァンスド・ディスプレイ・プロセス・エンジニアリング・コーポレーション・リミテッド | 静電チャック及びそれを備えた基板合着装置 |
JP6133869B2 (ja) * | 2011-08-30 | 2017-05-24 | ワトロウ エレクトリック マニュファクチュアリング カンパニー | サーマルアレイ制御システムおよび方法 |
JP6649689B2 (ja) * | 2015-03-16 | 2020-02-19 | 株式会社ディスコ | 減圧処理装置及びウエーハの保持方法 |
JP6765761B2 (ja) * | 2016-12-27 | 2020-10-07 | 株式会社ディスコ | 静電チャック装置及び静電吸着方法 |
US10714372B2 (en) * | 2017-09-20 | 2020-07-14 | Applied Materials, Inc. | System for coupling a voltage to portions of a substrate |
US10555412B2 (en) | 2018-05-10 | 2020-02-04 | Applied Materials, Inc. | Method of controlling ion energy distribution using a pulse generator with a current-return output stage |
US11476145B2 (en) | 2018-11-20 | 2022-10-18 | Applied Materials, Inc. | Automatic ESC bias compensation when using pulsed DC bias |
WO2020154310A1 (en) | 2019-01-22 | 2020-07-30 | Applied Materials, Inc. | Feedback loop for controlling a pulsed voltage waveform |
US11508554B2 (en) | 2019-01-24 | 2022-11-22 | Applied Materials, Inc. | High voltage filter assembly |
US11462389B2 (en) | 2020-07-31 | 2022-10-04 | Applied Materials, Inc. | Pulsed-voltage hardware assembly for use in a plasma processing system |
US11798790B2 (en) | 2020-11-16 | 2023-10-24 | Applied Materials, Inc. | Apparatus and methods for controlling ion energy distribution |
US11901157B2 (en) | 2020-11-16 | 2024-02-13 | Applied Materials, Inc. | Apparatus and methods for controlling ion energy distribution |
US11495470B1 (en) | 2021-04-16 | 2022-11-08 | Applied Materials, Inc. | Method of enhancing etching selectivity using a pulsed plasma |
US11791138B2 (en) | 2021-05-12 | 2023-10-17 | Applied Materials, Inc. | Automatic electrostatic chuck bias compensation during plasma processing |
US11948780B2 (en) | 2021-05-12 | 2024-04-02 | Applied Materials, Inc. | Automatic electrostatic chuck bias compensation during plasma processing |
US11967483B2 (en) | 2021-06-02 | 2024-04-23 | Applied Materials, Inc. | Plasma excitation with ion energy control |
US20220399185A1 (en) | 2021-06-09 | 2022-12-15 | Applied Materials, Inc. | Plasma chamber and chamber component cleaning methods |
US11810760B2 (en) | 2021-06-16 | 2023-11-07 | Applied Materials, Inc. | Apparatus and method of ion current compensation |
US11569066B2 (en) | 2021-06-23 | 2023-01-31 | Applied Materials, Inc. | Pulsed voltage source for plasma processing applications |
US11776788B2 (en) | 2021-06-28 | 2023-10-03 | Applied Materials, Inc. | Pulsed voltage boost for substrate processing |
US11476090B1 (en) | 2021-08-24 | 2022-10-18 | Applied Materials, Inc. | Voltage pulse time-domain multiplexing |
US12106938B2 (en) | 2021-09-14 | 2024-10-01 | Applied Materials, Inc. | Distortion current mitigation in a radio frequency plasma processing chamber |
US11972924B2 (en) | 2022-06-08 | 2024-04-30 | Applied Materials, Inc. | Pulsed voltage source for plasma processing applications |
US12111341B2 (en) | 2022-10-05 | 2024-10-08 | Applied Materials, Inc. | In-situ electric field detection method and apparatus |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2535663B2 (ja) * | 1990-10-02 | 1996-09-18 | 株式会社アビサレ | 掲示装置 |
US5557215A (en) * | 1993-05-12 | 1996-09-17 | Tokyo Electron Limited | Self-bias measuring method, apparatus thereof and electrostatic chucking apparatus |
JP3257180B2 (ja) * | 1993-09-21 | 2002-02-18 | ソニー株式会社 | 成膜方法 |
US6141203A (en) * | 1994-03-03 | 2000-10-31 | Sherman; Arthur | Electrostatic chuck |
TW334609B (en) * | 1996-09-19 | 1998-06-21 | Hitachi Ltd | Electrostatic chuck, method and device for processing sanyle use the same |
US5986874A (en) * | 1997-06-03 | 1999-11-16 | Watkins-Johnson Company | Electrostatic support assembly having an integral ion focus ring |
DE19853092B4 (de) * | 1998-11-18 | 2004-10-21 | Leica Microsystems Lithography Gmbh | Übernahme- und Haltesystem für ein Substrat |
US6430022B2 (en) * | 1999-04-19 | 2002-08-06 | Applied Materials, Inc. | Method and apparatus for controlling chucking force in an electrostatic |
JP3953767B2 (ja) * | 2001-10-01 | 2007-08-08 | シャープ株式会社 | 液晶表示装置の製造方法及び製造装置 |
-
2003
- 2003-06-20 JP JP2003176608A patent/JP4323232B2/ja not_active Expired - Fee Related
- 2003-12-02 US US10/725,983 patent/US20040223284A1/en not_active Abandoned
- 2003-12-02 KR KR1020030086758A patent/KR100694691B1/ko active IP Right Grant
- 2003-12-03 TW TW092134047A patent/TWI227862B/zh not_active IP Right Cessation
-
2006
- 2006-03-10 KR KR1020060022655A patent/KR100918634B1/ko active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
JP2004235605A (ja) | 2004-08-19 |
JP4323232B2 (ja) | 2009-09-02 |
KR20060027853A (ko) | 2006-03-28 |
KR20040048837A (ko) | 2004-06-10 |
US20040223284A1 (en) | 2004-11-11 |
TW200416635A (en) | 2004-09-01 |
TWI227862B (en) | 2005-02-11 |
KR100918634B1 (ko) | 2009-09-25 |
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