KR100645640B1 - 회절형 박막 압전 마이크로 미러 및 그 제조 방법 - Google Patents

회절형 박막 압전 마이크로 미러 및 그 제조 방법 Download PDF

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Publication number
KR100645640B1
KR100645640B1 KR20040074875A KR20040074875A KR100645640B1 KR 100645640 B1 KR100645640 B1 KR 100645640B1 KR 20040074875 A KR20040074875 A KR 20040074875A KR 20040074875 A KR20040074875 A KR 20040074875A KR 100645640 B1 KR100645640 B1 KR 100645640B1
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KR
South Korea
Prior art keywords
piezoelectric
layer
substrate
voltage
piezoelectric material
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Expired - Fee Related
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KR20040074875A
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English (en)
Korean (ko)
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KR20050042442A (ko
Inventor
윤상경
송종형
안승도
오민석
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삼성전기주식회사
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0808—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more diffracting elements
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B3/00—Devices comprising flexible or deformable elements, e.g. comprising elastic tongues or membranes
    • B81B3/0064—Constitution or structural means for improving or controlling the physical properties of a device
    • B81B3/0083—Optical properties
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00015—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
    • B81C1/00134—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems comprising flexible or deformable structures
    • B81C1/00142—Bridges
    • G—PHYSICS
    • G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
    • G09F9/00—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
    • G09F9/30—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements
    • G09F9/37—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements being movable elements
    • G09F9/372—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements being movable elements the positions of the elements being controlled by the application of an electric field
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00—Piezoelectric or electrostrictive devices
    • H10N30/80—Constructional details
    • H10N30/85—Piezoelectric or electrostrictive active materials
    • H10N30/853—Ceramic compositions

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Theoretical Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Ceramic Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
  • Micromachines (AREA)
  • General Electrical Machinery Utilizing Piezoelectricity, Electrostriction Or Magnetostriction (AREA)
KR20040074875A 2003-11-03 2004-09-18 회절형 박막 압전 마이크로 미러 및 그 제조 방법 Expired - Fee Related KR100645640B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020030077389 2003-11-03
KR20030077389 2003-11-03

Publications (2)

Publication Number Publication Date
KR20050042442A KR20050042442A (ko) 2005-05-09
KR100645640B1 true KR100645640B1 (ko) 2006-11-15

Family

ID=34420705

Family Applications (1)

Application Number Title Priority Date Filing Date
KR20040074875A Expired - Fee Related KR100645640B1 (ko) 2003-11-03 2004-09-18 회절형 박막 압전 마이크로 미러 및 그 제조 방법

Country Status (6)

Country Link
US (1) US7626745B2 (enExample)
EP (1) EP1528038B1 (enExample)
JP (1) JP2005141208A (enExample)
KR (1) KR100645640B1 (enExample)
CN (1) CN1614458B (enExample)
DE (1) DE602004023264D1 (enExample)

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Publication number Priority date Publication date Assignee Title
KR100632606B1 (ko) * 2004-08-19 2006-10-09 삼성전기주식회사 색선별 슬릿을 이용한 광변조기 다중광 스캐닝 장치
US7215461B1 (en) * 2004-09-14 2007-05-08 Silicon Light Machines Corporation MEMS devices with increased damping for suspended movable structures
KR100897671B1 (ko) * 2005-02-04 2009-05-14 삼성전기주식회사 회절형 광변조기
KR100832622B1 (ko) * 2005-05-25 2008-05-27 삼성전기주식회사 광변조기 및 그 광변조기를 이용한 프로젝터를 구비한휴대용 단말기
KR100905553B1 (ko) * 2005-06-10 2009-07-02 삼성전기주식회사 회절형 광변조기의 미러 위치 보상 장치 및 그 제어 방법
KR100859003B1 (ko) * 2005-11-01 2008-09-18 삼성전기주식회사 알루미늄 합금을 이용한 광 반사층을 갖는 광변조기 소자및 그 제조 방법
KR100781367B1 (ko) * 2005-11-01 2007-11-30 삼성전기주식회사 광반사층 상에 보호막을 갖는 광변조기 소자
DE102006057567B4 (de) * 2006-11-28 2008-09-04 Micronic Laser Systems Ab Mikrooptisches Element mit einem Substrat, an dem an einer optisch wirksamen Oberfläche mindestens eine Höhenstufe ausgebildet ist, Verfahren zu seiner Herstellung und Verwendungen
DE102006057568A1 (de) * 2006-11-28 2008-05-29 Micronic Laser Systems Ab Mikrooptisches Element mit einem Substrat und Verfahren zu seiner Herstellung
US7698941B2 (en) * 2007-06-20 2010-04-20 Headway Technologies, Inc. Sensing unit and method of making same
NO333724B1 (no) * 2009-08-14 2013-09-02 Sintef En mikromekanisk rekke med optisk reflekterende overflater
JP5703440B2 (ja) * 2010-07-09 2015-04-22 株式会社ユーテック 圧電体回折格子、プロジェクター、発光装置及び表示装置
KR102065107B1 (ko) * 2013-05-20 2020-02-12 삼성디스플레이 주식회사 무마스크 노광 장치
JP6225544B2 (ja) * 2013-07-31 2017-11-08 株式会社デンソー 圧電素子の製造方法
JP5857342B2 (ja) * 2014-07-17 2016-02-10 株式会社ユーテック 発光装置及び表示装置
WO2016130996A1 (en) * 2015-02-13 2016-08-18 Airmar Technology Corporation Acoustic transducer element
US20190033500A1 (en) * 2016-04-01 2019-01-31 Intel Corporation Package-integrated piezoelectric optical grating switch array
JP6690419B2 (ja) * 2016-06-08 2020-04-28 株式会社デンソー 半導体光デバイス、および、その製造方法
IT202000001411A1 (it) * 2020-01-24 2021-07-24 St Microelectronics Srl Metodo di lavorazione di una fetta per la fabbricazione di una struttura oscillante quale un microspecchio

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JPH0572490A (ja) 1991-09-13 1993-03-26 Nippon Telegr & Teleph Corp <Ntt> 光学装置
US5311360A (en) 1992-04-28 1994-05-10 The Board Of Trustees Of The Leland Stanford, Junior University Method and apparatus for modulating a light beam
JP2973272B2 (ja) 1994-05-10 1999-11-08 オムロン株式会社 可変光学面及び光スキャニングシステム
US5637517A (en) 1995-05-26 1997-06-10 Daewoo Electronics Co., Ltd. Method for forming array of thin film actuated mirrors
JP2924738B2 (ja) 1995-09-29 1999-07-26 オムロン株式会社 光偏向装置
TW357271B (en) * 1996-02-26 1999-05-01 Seiko Epson Corp Light regulator, display and the electronic machine
JPH09289342A (ja) 1996-04-19 1997-11-04 Sony Corp 多層型圧電アクチュエータ
FR2753565B1 (fr) 1996-09-13 1998-11-27 Thomson Csf Dispositif de commutation electrique et dispositif d'affichage utilisant ce dispositif de commutation
AUPO850597A0 (en) * 1997-08-11 1997-09-04 Silverbrook Research Pty Ltd Image processing method and apparatus (art01a)
US6060818A (en) 1998-06-02 2000-05-09 Hewlett-Packard Company SBAR structures and method of fabrication of SBAR.FBAR film processing techniques for the manufacturing of SBAR/BAR filters
US6238581B1 (en) 1998-12-18 2001-05-29 Eastman Kodak Company Process for manufacturing an electro-mechanical grating device
US6724125B2 (en) 1999-03-30 2004-04-20 Massachusetts Institute Of Technology Methods and apparatus for diffractive optical processing using an actuatable structure
GB2353410B (en) 1999-08-18 2002-04-17 Marconi Electronic Syst Ltd Electrical switches
JP3979515B2 (ja) 1999-12-28 2007-09-19 パイオニア株式会社 可変光学素子とその可変光学素子を備えたピックアップ装置並びにそのピックアップ装置を備えた情報記録再生装置
JP2002055297A (ja) 2000-08-11 2002-02-20 Ngk Insulators Ltd レーザビーム出力装置
JP2002162573A (ja) 2000-11-24 2002-06-07 Sony Corp 空間変調器及び画像表示装置
AU2002309106A1 (en) 2001-07-05 2003-02-24 International Business Machines Coporation Microsystem switches
JP3852306B2 (ja) 2001-07-06 2006-11-29 ソニー株式会社 Ｍｅｍｓ素子の製造方法、ｇｌｖデバイスの製造方法、及びレーザディスプレイの製造方法

Also Published As

Publication number Publication date
EP1528038B1 (en) 2009-09-23
KR20050042442A (ko) 2005-05-09
CN1614458A (zh) 2005-05-11
DE602004023264D1 (de) 2009-11-05
US20050105157A1 (en) 2005-05-19
EP1528038A1 (en) 2005-05-04
CN1614458B (zh) 2010-05-12
JP2005141208A (ja) 2005-06-02
US7626745B2 (en) 2009-12-01

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