IT202000001411A1 - Metodo di lavorazione di una fetta per la fabbricazione di una struttura oscillante quale un microspecchio - Google Patents

Metodo di lavorazione di una fetta per la fabbricazione di una struttura oscillante quale un microspecchio

Info

Publication number
IT202000001411A1
IT202000001411A1 IT102020000001411A IT202000001411A IT202000001411A1 IT 202000001411 A1 IT202000001411 A1 IT 202000001411A1 IT 102020000001411 A IT102020000001411 A IT 102020000001411A IT 202000001411 A IT202000001411 A IT 202000001411A IT 202000001411 A1 IT202000001411 A1 IT 202000001411A1
Authority
IT
Italy
Prior art keywords
slice
mirror
micro
manufacture
processing method
Prior art date
Application number
IT102020000001411A
Other languages
English (en)
Inventor
Enri Duqi
Nicolo' Boni
Lorenzo Baldo
Massimiliano Merli
Roberto Carminati
Original Assignee
St Microelectronics Srl
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by St Microelectronics Srl filed Critical St Microelectronics Srl
Priority to IT102020000001411A priority Critical patent/IT202000001411A1/it
Priority to EP21152454.1A priority patent/EP3854751B1/en
Priority to US17/155,429 priority patent/US11673799B2/en
Priority to CN202110095545.5A priority patent/CN113176664A/zh
Publication of IT202000001411A1 publication Critical patent/IT202000001411A1/it

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00015—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
    • B81C1/00134—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems comprising flexible or deformable structures
    • B81C1/00142—Bridges
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00015—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
    • B81C1/00134—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems comprising flexible or deformable structures
    • B81C1/00158—Diaphragms, membranes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G02B26/0858—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD the reflecting means being moved or deformed by piezoelectric means
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G02B26/0841—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD the reflecting element being moved or deformed by electrostatic means
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/10—Scanning systems
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00—Piezoelectric or electrostrictive devices
    • H10N30/01—Manufacture or treatment
    • H10N30/09—Forming piezoelectric or electrostrictive materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B2201/00—Specific applications of microelectromechanical systems
    • B81B2201/04—Optical MEMS
    • B81B2201/042—Micromirrors, not used as optical switches
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B2203/00—Basic microelectromechanical structures
    • B81B2203/01—Suspended structures, i.e. structures allowing a movement
    • B81B2203/0109—Bridges
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B2203/00—Basic microelectromechanical structures
    • B81B2203/01—Suspended structures, i.e. structures allowing a movement
    • B81B2203/0145—Flexible holders
    • B81B2203/0154—Torsion bars
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C2201/00—Manufacture or treatment of microstructural devices or systems
    • B81C2201/01—Manufacture or treatment of microstructural devices or systems in or on a substrate
    • B81C2201/0101—Shaping material; Structuring the bulk substrate or layers on the substrate; Film patterning
    • B81C2201/0128—Processes for removing material
    • B81C2201/013—Etching

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Micromachines (AREA)
IT102020000001411A 2020-01-24 2020-01-24 Metodo di lavorazione di una fetta per la fabbricazione di una struttura oscillante quale un microspecchio IT202000001411A1 (it)

Priority Applications (4)

Application Number Priority Date Filing Date Title
IT102020000001411A IT202000001411A1 (it) 2020-01-24 2020-01-24 Metodo di lavorazione di una fetta per la fabbricazione di una struttura oscillante quale un microspecchio
EP21152454.1A EP3854751B1 (en) 2020-01-24 2021-01-20 Method of processing a wafer for manufacturing an oscillating structure such as a micro-mirror
US17/155,429 US11673799B2 (en) 2020-01-24 2021-01-22 Method of processing a wafer for manufacturing an oscillating structure such as a micro-mirror
CN202110095545.5A CN113176664A (zh) 2020-01-24 2021-01-25 处理用于制造诸如微镜的振荡结构的晶片的方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
IT102020000001411A IT202000001411A1 (it) 2020-01-24 2020-01-24 Metodo di lavorazione di una fetta per la fabbricazione di una struttura oscillante quale un microspecchio

Publications (1)

Publication Number Publication Date
IT202000001411A1 true IT202000001411A1 (it) 2021-07-24

Family

ID=70155220

Family Applications (1)

Application Number Title Priority Date Filing Date
IT102020000001411A IT202000001411A1 (it) 2020-01-24 2020-01-24 Metodo di lavorazione di una fetta per la fabbricazione di una struttura oscillante quale un microspecchio

Country Status (4)

Country Link
US (1) US11673799B2 (it)
EP (1) EP3854751B1 (it)
CN (1) CN113176664A (it)
IT (1) IT202000001411A1 (it)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20110109951A1 (en) 2009-10-29 2011-05-12 Btendo Method and device for monitoring movement of mirrors in a mems device
CN108594428A (zh) * 2018-04-16 2018-09-28 西安知微传感技术有限公司 Mems微振镜及基于soi顶层硅预制该mems微振镜的制作方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3987382B2 (ja) 2002-06-11 2007-10-10 富士通株式会社 マイクロミラー素子およびその製造方法
KR100645640B1 (ko) 2003-11-03 2006-11-15 삼성전기주식회사 회절형 박막 압전 마이크로 미러 및 그 제조 방법
JP5172364B2 (ja) * 2008-01-16 2013-03-27 スタンレー電気株式会社 光偏向器
JP6261923B2 (ja) * 2013-09-17 2018-01-17 スタンレー電気株式会社 光偏向ミラー及びこれを用いた光偏向器
JP6349229B2 (ja) * 2014-10-23 2018-06-27 スタンレー電気株式会社 二軸光偏向器及びその製造方法
JP6516516B2 (ja) * 2015-03-16 2019-05-22 スタンレー電気株式会社 光偏向器
IT201600079604A1 (it) * 2016-07-28 2018-01-28 St Microelectronics Srl Struttura oscillante con attuazione piezoelettrica, sistema e metodo di fabbricazione
KR102547651B1 (ko) * 2016-09-20 2023-06-26 이노비즈 테크놀로지스 엘티디 Lidar 시스템 및 방법
IT201700091226A1 (it) * 2017-08-07 2019-02-07 St Microelectronics Srl Dispositivo mems comprendente una membrana ed un attuatore per controllare la curvatura della membrana e compensare deformazioni indesiderate della membrana

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20110109951A1 (en) 2009-10-29 2011-05-12 Btendo Method and device for monitoring movement of mirrors in a mems device
CN108594428A (zh) * 2018-04-16 2018-09-28 西安知微传感技术有限公司 Mems微振镜及基于soi顶层硅预制该mems微振镜的制作方法

Also Published As

Publication number Publication date
EP3854751B1 (en) 2024-04-03
CN113176664A (zh) 2021-07-27
US20210229984A1 (en) 2021-07-29
US11673799B2 (en) 2023-06-13
EP3854751A1 (en) 2021-07-28

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