KR100633343B1 - 공간부를 형성할 고체 상태 자외선 가우시안 빔의 빔 성형 및 프로젝션 이미지 생성을 위한 시스템 및 방법 - Google Patents

공간부를 형성할 고체 상태 자외선 가우시안 빔의 빔 성형 및 프로젝션 이미지 생성을 위한 시스템 및 방법 Download PDF

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KR100633343B1
KR100633343B1 KR1020017014584A KR20017014584A KR100633343B1 KR 100633343 B1 KR100633343 B1 KR 100633343B1 KR 1020017014584 A KR1020017014584 A KR 1020017014584A KR 20017014584 A KR20017014584 A KR 20017014584A KR 100633343 B1 KR100633343 B1 KR 100633343B1
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South Korea
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gaussian
output
laser
energy
layer material
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Korean (ko)
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KR20020072186A (ko
Inventor
던스키코리엠.
리우신빙
크로그리오니콜라스제이.
로호와이
군드럼브리안씨.
마츠모토히사시
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일렉트로 싸이언티픽 인더스트리이즈 인코포레이티드
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/36—Removing material
    • B23K26/38—Removing material by boring or cutting
    • B23K26/382—Removing material by boring or cutting by boring
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
    • B23K26/066—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms by using masks
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/073—Shaping the laser spot
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/073—Shaping the laser spot
    • B23K26/0732—Shaping the laser spot into a rectangular shape
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/36—Removing material
    • B23K26/38—Removing material by boring or cutting
    • B23K26/382—Removing material by boring or cutting by boring
    • B23K26/389—Removing material by boring or cutting by boring of fluid openings, e.g. nozzles, jets
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/36—Removing material
    • B23K26/40—Removing material taking account of the properties of the material involved
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0011—Working of insulating substrates or insulating layers
    • H05K3/0017—Etching of the substrate by chemical or physical means
    • H05K3/0026—Etching of the substrate by chemical or physical means by laser ablation
    • H05K3/0032—Etching of the substrate by chemical or physical means by laser ablation of organic insulating material
    • H05K3/0038—Etching of the substrate by chemical or physical means by laser ablation of organic insulating material combined with laser drilling through a metal layer
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2101/00—Articles made by soldering, welding or cutting
    • B23K2101/36—Electric or electronic devices
    • B23K2101/42—Printed circuits
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2103/00—Materials to be soldered, welded or cut
    • B23K2103/08—Non-ferrous metals or alloys
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2103/00—Materials to be soldered, welded or cut
    • B23K2103/08—Non-ferrous metals or alloys
    • B23K2103/10—Aluminium or alloys thereof
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2103/00—Materials to be soldered, welded or cut
    • B23K2103/08—Non-ferrous metals or alloys
    • B23K2103/12—Copper or alloys thereof
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2103/00—Materials to be soldered, welded or cut
    • B23K2103/16—Composite materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2103/00—Materials to be soldered, welded or cut
    • B23K2103/16—Composite materials
    • B23K2103/166—Multilayered materials
    • B23K2103/172—Multilayered materials wherein at least one of the layers is non-metallic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2103/00—Materials to be soldered, welded or cut
    • B23K2103/18—Dissimilar materials
    • B23K2103/26—Alloys of Nickel and Cobalt and Chromium
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2103/00—Materials to be soldered, welded or cut
    • B23K2103/30—Organic materials
    • B23K2103/42—Plastics other than composite materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2103/00—Materials to be soldered, welded or cut
    • B23K2103/50—Inorganic materials other than metals or composite materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2103/00—Materials to be soldered, welded or cut
    • B23K2103/50—Inorganic materials other than metals or composite materials
    • B23K2103/52—Ceramics
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0011—Working of insulating substrates or insulating layers
    • H05K3/0017—Etching of the substrate by chemical or physical means
    • H05K3/0026—Etching of the substrate by chemical or physical means by laser ablation
    • H05K3/0032—Etching of the substrate by chemical or physical means by laser ablation of organic insulating material
    • H05K3/0035—Etching of the substrate by chemical or physical means by laser ablation of organic insulating material of blind holes, i.e. having a metal layer at the bottom
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/40—Forming printed elements for providing electric connections to or between printed circuits
    • H05K3/42—Plated through-holes or plated via connections
    • H05K3/425—Plated through-holes or plated via connections characterised by the sequence of steps for plating the through-holes or via connections in relation to the conductive pattern
    • H05K3/427—Plated through-holes or plated via connections characterised by the sequence of steps for plating the through-holes or via connections in relation to the conductive pattern initial plating of through-holes in metal-clad substrates
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W20/00—Interconnections in chips, wafers or substrates
    • H10W20/01—Manufacture or treatment
    • H10W20/071—Manufacture or treatment of dielectric parts thereof
    • H10W20/081—Manufacture or treatment of dielectric parts thereof by forming openings in the dielectric parts
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00—Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/01—Manufacture or treatment
    • H10W70/05—Manufacture or treatment of insulating or insulated package substrates, or of interposers, or of redistribution layers
    • H10W70/095—Manufacture or treatment of insulating or insulated package substrates, or of interposers, or of redistribution layers of vias therein

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  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Laser Beam Processing (AREA)
  • Mechanical Optical Scanning Systems (AREA)
  • Lasers (AREA)
KR1020017014584A 1999-05-28 2000-05-26 공간부를 형성할 고체 상태 자외선 가우시안 빔의 빔 성형 및 프로젝션 이미지 생성을 위한 시스템 및 방법 Expired - Lifetime KR100633343B1 (ko)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
US13656899P 1999-05-28 1999-05-28
US60/136,568 1999-05-28
US17509800P 2000-01-07 2000-01-07
US60/175,098 2000-01-07
US19366800P 2000-03-31 2000-03-31
US60/193,668 2000-03-31

Publications (2)

Publication Number Publication Date
KR20020072186A KR20020072186A (ko) 2002-09-14
KR100633343B1 true KR100633343B1 (ko) 2006-10-11

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KR1020017014584A Expired - Lifetime KR100633343B1 (ko) 1999-05-28 2000-05-26 공간부를 형성할 고체 상태 자외선 가우시안 빔의 빔 성형 및 프로젝션 이미지 생성을 위한 시스템 및 방법

Country Status (12)

Country Link
US (1) US6433301B1 (enExample)
EP (1) EP1187698B1 (enExample)
JP (1) JP2003500220A (enExample)
KR (1) KR100633343B1 (enExample)
CN (1) CN1182936C (enExample)
AT (1) ATE260733T1 (enExample)
AU (1) AU5303400A (enExample)
CA (1) CA2373565C (enExample)
DE (1) DE60008732T2 (enExample)
HK (1) HK1043560A1 (enExample)
TW (1) TW482705B (enExample)
WO (1) WO2000073013A1 (enExample)

Families Citing this family (158)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6791060B2 (en) * 1999-05-28 2004-09-14 Electro Scientific Industries, Inc. Beam shaping and projection imaging with solid state UV gaussian beam to form vias
DE10035446A1 (de) * 1999-07-23 2001-04-05 Heidelberg Instruments Mikrotechnik Gmbh Verfahren zur Erzeugung von Mikrobohrungen
US7723642B2 (en) * 1999-12-28 2010-05-25 Gsi Group Corporation Laser-based system for memory link processing with picosecond lasers
US7838794B2 (en) 1999-12-28 2010-11-23 Gsi Group Corporation Laser-based method and system for removing one or more target link structures
US20040134894A1 (en) * 1999-12-28 2004-07-15 Bo Gu Laser-based system for memory link processing with picosecond lasers
US6281471B1 (en) 1999-12-28 2001-08-28 Gsi Lumonics, Inc. Energy-efficient, laser-based method and system for processing target material
US7671295B2 (en) * 2000-01-10 2010-03-02 Electro Scientific Industries, Inc. Processing a memory link with a set of at least two laser pulses
JP3413160B2 (ja) * 2000-06-15 2003-06-03 キヤノン株式会社 照明装置及びそれを用いた走査型露光装置
KR100773070B1 (ko) * 2000-07-12 2007-11-02 일렉트로 싸이언티픽 인더스트리이즈 인코포레이티드 Ic 퓨즈를 하나의 펄스로 절단하기 위한 uv 레이저시스템 및 방법
US7157038B2 (en) 2000-09-20 2007-01-02 Electro Scientific Industries, Inc. Ultraviolet laser ablative patterning of microstructures in semiconductors
US6676878B2 (en) 2001-01-31 2004-01-13 Electro Scientific Industries, Inc. Laser segmented cutting
US6689985B2 (en) 2001-01-17 2004-02-10 Orbotech, Ltd. Laser drill for use in electrical circuit fabrication
US6621044B2 (en) * 2001-01-18 2003-09-16 Anvik Corporation Dual-beam materials-processing system
CN1301178C (zh) * 2001-01-31 2007-02-21 电子科学工业公司 半导体中微结构的紫外线激光烧蚀的图案化
US6534743B2 (en) 2001-02-01 2003-03-18 Electro Scientific Industries, Inc. Resistor trimming with small uniform spot from solid-state UV laser
DE10295946B4 (de) * 2001-02-01 2013-09-26 Electro Scientific Industries, Inc. Verfahren zum Lasertrimmen eines Schichtwiderstandes
US6762124B2 (en) * 2001-02-14 2004-07-13 Avery Dennison Corporation Method for patterning a multilayered conductor/substrate structure
US6777645B2 (en) * 2001-03-29 2004-08-17 Gsi Lumonics Corporation High-speed, precision, laser-based method and system for processing material of one or more targets within a field
US6804269B2 (en) * 2001-06-19 2004-10-12 Hitachi Via Mechanics, Ltd. Laser beam delivery system with trepanning module
JP4397571B2 (ja) 2001-09-25 2010-01-13 株式会社半導体エネルギー研究所 レーザ照射方法およびレーザ照射装置、並びに半導体装置の作製方法
US20030067774A1 (en) * 2001-10-04 2003-04-10 Nanovia, L.P. Illumination systems and methods employing diffractive holographic optical elements
DE10207288B4 (de) * 2002-02-21 2005-05-04 Newson Engineering Nv Verfahren zum Bohren von Löchern mittels eines Laserstrahls in einem Substrat, insbesondere in einem elektrischen Schaltungsubstrat
US6884962B2 (en) * 2002-03-18 2005-04-26 Hitachi Via Mechanics, Ltd. Beam or wave front
US7563695B2 (en) 2002-03-27 2009-07-21 Gsi Group Corporation Method and system for high-speed precise laser trimming and scan lens for use therein
US6951995B2 (en) 2002-03-27 2005-10-04 Gsi Lumonics Corp. Method and system for high-speed, precise micromachining an array of devices
US20040017430A1 (en) * 2002-07-23 2004-01-29 Yosuke Mizuyama Laser processing method and laser processing apparatus
GB0222342D0 (en) * 2002-09-26 2002-11-06 British Nuclear Fuels Plc Surface treatment of concrete
US7161089B2 (en) * 2002-12-04 2007-01-09 Tdk Corporation Electronic component
US20040195222A1 (en) * 2002-12-25 2004-10-07 Semiconductor Energy Laboratory Co., Ltd. Laser irradiation method, laser irradiation apparatus, and method for manufacturing semiconductor device
JP3807374B2 (ja) * 2003-01-31 2006-08-09 住友電気工業株式会社 一括多点ホモジナイズ光学系
TWI248244B (en) * 2003-02-19 2006-01-21 J P Sercel Associates Inc System and method for cutting using a variable astigmatic focal beam spot
US6784400B1 (en) * 2003-03-03 2004-08-31 Paul S. Banks Method of short pulse hole drilling without a resultant pilot hole and backwall damage
US20040251243A1 (en) * 2003-04-10 2004-12-16 Lizotte Todd E. System and method for generating and controlling multiple independently steerable laser beams for material processing
US6909735B2 (en) * 2003-04-10 2005-06-21 Hitachi Via Mechanics, Ltd. System and method for generating and controlling multiple independently steerable laser beam for material processing
US8921733B2 (en) * 2003-08-11 2014-12-30 Raydiance, Inc. Methods and systems for trimming circuits
US7060624B2 (en) * 2003-08-13 2006-06-13 International Business Machines Corporation Deep filled vias
US6982206B1 (en) * 2003-10-02 2006-01-03 Lsi Logic Corporation Mechanism for improving the structural integrity of low-k films
US7511247B2 (en) * 2004-03-22 2009-03-31 Panasonic Corporation Method of controlling hole shape during ultrafast laser machining by manipulating beam polarization
US7057133B2 (en) * 2004-04-14 2006-06-06 Electro Scientific Industries, Inc. Methods of drilling through-holes in homogenous and non-homogenous substrates
US7302309B2 (en) 2004-04-26 2007-11-27 Hewlett-Packard Development Company, L.P. Laser micromachining methods and systems
US7687740B2 (en) * 2004-06-18 2010-03-30 Electro Scientific Industries, Inc. Semiconductor structure processing using multiple laterally spaced laser beam spots delivering multiple blows
US7923306B2 (en) * 2004-06-18 2011-04-12 Electro Scientific Industries, Inc. Semiconductor structure processing using multiple laser beam spots
US8148211B2 (en) * 2004-06-18 2012-04-03 Electro Scientific Industries, Inc. Semiconductor structure processing using multiple laser beam spots spaced on-axis delivered simultaneously
US7633034B2 (en) * 2004-06-18 2009-12-15 Electro Scientific Industries, Inc. Semiconductor structure processing using multiple laser beam spots overlapping lengthwise on a structure
US7935941B2 (en) * 2004-06-18 2011-05-03 Electro Scientific Industries, Inc. Semiconductor structure processing using multiple laser beam spots spaced on-axis on non-adjacent structures
US7629234B2 (en) * 2004-06-18 2009-12-08 Electro Scientific Industries, Inc. Semiconductor structure processing using multiple laterally spaced laser beam spots with joint velocity profiling
US7435927B2 (en) * 2004-06-18 2008-10-14 Electron Scientific Industries, Inc. Semiconductor link processing using multiple laterally spaced laser beam spots with on-axis offset
US8383982B2 (en) * 2004-06-18 2013-02-26 Electro Scientific Industries, Inc. Methods and systems for semiconductor structure processing using multiple laser beam spots
US7244907B2 (en) * 2004-06-30 2007-07-17 Matsushita Electric Industrial Co., Ltd. Method of optimizing optical power use in a parallel processing laser system
US20060000816A1 (en) * 2004-06-30 2006-01-05 Matsushita Electric Industrial Co., Ltd. System for and method of zoom processing
US7772523B2 (en) 2004-07-30 2010-08-10 Semiconductor Energy Laboratory Co., Ltd Laser irradiation apparatus and laser irradiation method
CN101667538B (zh) * 2004-08-23 2012-10-10 株式会社半导体能源研究所 半导体器件及其制造方法
WO2006053300A2 (en) 2004-11-15 2006-05-18 Electro Scientific Industries, Inc. Tracking and marking specimens having defects
KR100700641B1 (ko) * 2004-12-03 2007-03-27 삼성에스디아이 주식회사 레이저 조사 장치, 패터닝 방법 및 그를 이용한 레이저열전사 패터닝 방법과 이를 이용한 유기 전계 발광 소자의제조 방법
JP4559260B2 (ja) * 2005-03-04 2010-10-06 日立ビアメカニクス株式会社 プリント基板の穴明け方法
TWI382795B (zh) * 2005-03-04 2013-01-11 日立比亞機械股份有限公司 A method of opening a printed circuit board and an opening device for a printed circuit board
JP4332855B2 (ja) * 2005-06-07 2009-09-16 住友電気工業株式会社 ウエッジを用いた回折型ビームホモジナイザ光学系
FR2887161B1 (fr) * 2005-06-20 2007-09-07 Commissariat Energie Atomique Procede et dispositif d'ablation laser d'une couche superficielle d'une paroi, telle q'un revetement de peinture dans une installation nucleaire
EP1736272B9 (en) * 2005-06-21 2009-08-12 Fameccanica.Data S.p.A. A method and device for laser cutting articles, in particular sanitary products and components thereof, with a laser spot diameter between 0.1 and 0.3 mm
US7411735B2 (en) 2005-12-06 2008-08-12 3M Innovative Property Company Illumination system incorporating collimated light source
JP2006205261A (ja) * 2006-04-14 2006-08-10 Hitachi Via Mechanics Ltd プリント基板の穴あけ加工装置
US7605343B2 (en) * 2006-05-24 2009-10-20 Electro Scientific Industries, Inc. Micromachining with short-pulsed, solid-state UV laser
US8624157B2 (en) 2006-05-25 2014-01-07 Electro Scientific Industries, Inc. Ultrashort laser pulse wafer scribing
US20070272666A1 (en) * 2006-05-25 2007-11-29 O'brien James N Infrared laser wafer scribing using short pulses
US8084706B2 (en) * 2006-07-20 2011-12-27 Gsi Group Corporation System and method for laser processing at non-constant velocities
JP4912806B2 (ja) * 2006-09-21 2012-04-11 東急車輛製造株式会社 レーザスポット溶接部の評価方法
US7977602B2 (en) * 2007-03-21 2011-07-12 Photon Dynamics, Inc. Laser ablation using multiple wavelengths
JP5028124B2 (ja) * 2007-03-29 2012-09-19 株式会社ニデック 眼科用レーザ治療装置
US8481887B2 (en) * 2007-05-03 2013-07-09 Electro Scientific Industries, Inc. Method for machining tapered micro holes
EP1998215A1 (en) 2007-05-31 2008-12-03 Molecular Technology (MolTech) Gmbh Achromatic optical system for beam shaping
US8710402B2 (en) * 2007-06-01 2014-04-29 Electro Scientific Industries, Inc. Method of and apparatus for laser drilling holes with improved taper
US8498464B2 (en) * 2007-09-27 2013-07-30 Siemens Medical Solutions Usa, Inc. Intrinsic co-registration for modular multimodality medical imaging systems
GB2457720A (en) * 2008-02-23 2009-08-26 Philip Thomas Rumsby Method for laser processing on the opposite sides of thin transparent substrates
EP2253414A4 (en) * 2008-02-28 2012-12-05 Wavelock Advanced Technology Co Ltd METHOD OF FORMING A THROUGH HOLE, AND PRODUCT HAVING A THROUGH HOLE
CN102006964B (zh) * 2008-03-21 2016-05-25 Imra美国公司 基于激光的材料加工方法和系统
GB2460648A (en) * 2008-06-03 2009-12-09 M Solv Ltd Method and apparatus for laser focal spot size control
US8609512B2 (en) * 2009-03-27 2013-12-17 Electro Scientific Industries, Inc. Method for laser singulation of chip scale packages on glass substrates
US8350187B2 (en) * 2009-03-28 2013-01-08 Electro Scientific Industries, Inc. Method and apparatus for laser machining
WO2010137475A1 (ja) * 2009-05-25 2010-12-02 三菱電機株式会社 レーザ加工装置およびレーザ加工方法
US8023206B2 (en) * 2009-07-24 2011-09-20 Molecular Technology Gmbh Achromatic optical system for beam shaping
WO2011018989A1 (ja) * 2009-08-11 2011-02-17 浜松ホトニクス株式会社 レーザ加工装置及びレーザ加工方法
US8435437B2 (en) 2009-09-04 2013-05-07 Abbott Cardiovascular Systems Inc. Setting laser power for laser machining stents from polymer tubing
US20130256286A1 (en) * 2009-12-07 2013-10-03 Ipg Microsystems Llc Laser processing using an astigmatic elongated beam spot and using ultrashort pulses and/or longer wavelengths
KR101243920B1 (ko) * 2010-01-07 2013-03-14 삼성디스플레이 주식회사 기판 밀봉에 사용되는 레이저 빔 조사 장치, 기판 밀봉 방법, 및 유기 발광 디스플레이 장치의 제조 방법
KR20130059337A (ko) 2010-03-30 2013-06-05 아이엠알에이 아메리카, 인코포레이티드. 레이저 기반 재료 가공 장치 및 방법들
WO2012021748A1 (en) 2010-08-12 2012-02-16 Raydiance, Inc. Polymer tubing laser micromachining
US8604380B2 (en) 2010-08-19 2013-12-10 Electro Scientific Industries, Inc. Method and apparatus for optimally laser marking articles
GB201014778D0 (en) 2010-09-06 2010-10-20 Baird Brian W Picosecond laser beam shaping assembly and a method of shaping a picosecond laser beam
US9114482B2 (en) 2010-09-16 2015-08-25 Raydiance, Inc. Laser based processing of layered materials
US9023461B2 (en) 2010-10-21 2015-05-05 Electro Scientific Industries, Inc. Apparatus for optically laser marking articles
CN102218606A (zh) * 2011-05-18 2011-10-19 苏州德龙激光有限公司 紫外激光打孔的装置
CN102243137B (zh) * 2011-06-21 2013-04-10 中国科学院上海光学精密机械研究所 光束整形元件光学性能的检测装置和检测方法
US10239160B2 (en) 2011-09-21 2019-03-26 Coherent, Inc. Systems and processes that singulate materials
US9289858B2 (en) 2011-12-20 2016-03-22 Electro Scientific Industries, Inc. Drilling holes with minimal taper in cured silicone
WO2014066251A1 (en) 2012-10-22 2014-05-01 Electro Scientific Industries, Inc. Method and apparatus for marking an article
CN104903044B (zh) 2013-01-11 2018-01-12 伊雷克托科学工业股份有限公司 激光脉冲能量控制系统及方法
WO2014126137A1 (ja) * 2013-02-13 2014-08-21 住友化学株式会社 レーザー光照射装置及び光学部材貼合体の製造装置
KR102245810B1 (ko) 2013-03-15 2021-04-30 일렉트로 싸이언티픽 인더스트리이즈 인코포레이티드 Aod 라우트 프로세싱을 위한 레이저 시스템들 및 방법들
TWI637803B (zh) 2013-03-15 2018-10-11 美商伊雷克托科學工業股份有限公司 雷射處理設備和經由雷射工具操作而處理工件的方法
US10226837B2 (en) 2013-03-15 2019-03-12 Nlight, Inc. Thermal processing with line beams
US9527159B2 (en) 2013-03-15 2016-12-27 Electro Scientific Industries, Inc. Laser emission-based control of beam positioner
US9291825B2 (en) * 2013-03-22 2016-03-22 Applied Materials Israel, Ltd. Calibratable beam shaping system and method
US9463528B2 (en) 2013-08-16 2016-10-11 Electro Scientific Industries, Inc. Laser systems and methods for internally marking thin layers, and articles produced thereby
CN103639594B (zh) * 2013-12-19 2015-10-28 苏州德龙激光股份有限公司 激光钻孔方法
US9285593B1 (en) 2013-12-20 2016-03-15 AdlOptica Optical Systems GmbH Method and apparatus for shaping focused laser beams
KR20150102180A (ko) * 2014-02-27 2015-09-07 삼성디스플레이 주식회사 레이저 빔 조사 장치 및 이를 이용한 유기 발광 디스플레이 장치의 제조 방법
US9594937B2 (en) 2014-02-28 2017-03-14 Electro Scientific Industries, Inc. Optical mark reader
US9269035B2 (en) 2014-02-28 2016-02-23 Electro Scientific Industries, Inc. Modified two-dimensional codes, and laser systems and methods for producing such codes
JP6324151B2 (ja) * 2014-03-26 2018-05-16 住友重機械工業株式会社 レーザ加工装置及びレーザ加工方法
US10069271B2 (en) 2014-06-02 2018-09-04 Nlight, Inc. Scalable high power fiber laser
CN105720463B (zh) 2014-08-01 2021-05-14 恩耐公司 光纤和光纤传输的激光器中的背向反射保护与监控
BR112017008782A2 (pt) * 2014-10-28 2018-01-30 Tecnofive S R L método e aparelho para aplicação de uma fita adesiva de dupla face ativada por calor para um suporte
WO2016080347A1 (ja) * 2014-11-20 2016-05-26 日本ゼオン株式会社 光学フィルムの製造方法
DE102014224182A1 (de) * 2014-11-26 2016-06-02 Robert Bosch Gmbh Vorrichtung und Verfahren zur Lasermaterialbearbeitung
KR20170102250A (ko) 2014-12-29 2017-09-08 일렉트로 싸이언티픽 인더스트리이즈 인코포레이티드 정렬 특징부로 독립적 측면 측정을 통한 적응형 부분 프로파일 생성
US9837783B2 (en) 2015-01-26 2017-12-05 Nlight, Inc. High-power, single-mode fiber sources
KR102387132B1 (ko) 2015-02-27 2022-04-15 일렉트로 싸이언티픽 인더스트리이즈 인코포레이티드 횡축 미세 기계 가공을 위한 고속 빔 조작
US10050404B2 (en) 2015-03-26 2018-08-14 Nlight, Inc. Fiber source with cascaded gain stages and/or multimode delivery fiber with low splice loss
CN107924023B (zh) 2015-07-08 2020-12-01 恩耐公司 具有用于增加的光束参数乘积的中心折射率受抑制的纤维
CN116213918B (zh) * 2015-09-09 2026-07-14 伊雷克托科学工业股份有限公司 镭射处理设备、镭射处理工件的方法及相关配置
CN108369315B (zh) 2015-09-24 2020-08-04 恩耐公司 用于控制光束参数积的装置和方法
US11179807B2 (en) 2015-11-23 2021-11-23 Nlight, Inc. Fine-scale temporal control for laser material processing
CN108367389B (zh) 2015-11-23 2020-07-28 恩耐公司 激光加工方法和装置
CN105552029B (zh) * 2015-12-16 2018-05-25 新昌县鸿吉电子科技有限公司 Led芯片切割方法
US10466494B2 (en) * 2015-12-18 2019-11-05 Nlight, Inc. Reverse interleaving for laser line generators
JP6468295B2 (ja) * 2016-01-27 2019-02-13 株式会社デンソー 部材の製造方法、及び、部材の製造装置
CN107092166B (zh) * 2016-02-18 2019-01-29 上海微电子装备(集团)股份有限公司 曝光系统、曝光装置及曝光方法
CN107309556A (zh) * 2016-04-14 2017-11-03 大族激光科技产业集团股份有限公司 一种激光钻孔装置及方法
US10684487B2 (en) * 2016-09-29 2020-06-16 Nlight, Inc. Frequency-converted optical beams having adjustable beam characteristics
US10656427B2 (en) * 2016-09-29 2020-05-19 Nlight, Inc. Multicore fiber-coupled optical probing techniques
US10670872B2 (en) * 2016-09-29 2020-06-02 Nlight, Inc. All-fiber optical beam switch
US10646963B2 (en) * 2016-09-29 2020-05-12 Nlight, Inc. Use of variable beam parameters to control a melt pool
US10673198B2 (en) * 2016-09-29 2020-06-02 Nlight, Inc. Fiber-coupled laser with time varying beam characteristics
US10732439B2 (en) * 2016-09-29 2020-08-04 Nlight, Inc. Fiber-coupled device for varying beam characteristics
US10668535B2 (en) * 2016-09-29 2020-06-02 Nlight, Inc. Method of forming three-dimensional objects
US10661391B2 (en) * 2016-09-29 2020-05-26 Nlight, Inc. Method of forming pores in three-dimensional objects
US10673199B2 (en) * 2016-09-29 2020-06-02 Nlight, Inc. Fiber-based saturable absorber
US10668567B2 (en) * 2016-09-29 2020-06-02 Nlight, Inc. Multi-operation laser tooling for deposition and material processing operations
US10668537B2 (en) * 2016-09-29 2020-06-02 Nlight, Inc. Systems for and methods of temperature control in additive manufacturing
US10663742B2 (en) * 2016-09-29 2020-05-26 Nlight, Inc. Method and system for cutting a material using a laser having adjustable beam characteristics
US10656440B2 (en) * 2016-09-29 2020-05-19 Nlight, Inc. Fiber optical beam delivery device producing output exhibiting intensity distribution profile having non-zero ellipticity
US10661342B2 (en) * 2016-09-29 2020-05-26 Nlight, Inc. Additive manufacturing systems and methods for the same
US10730785B2 (en) * 2016-09-29 2020-08-04 Nlight, Inc. Optical fiber bending mechanisms
US10423015B2 (en) 2016-09-29 2019-09-24 Nlight, Inc. Adjustable beam characteristics
US10649241B2 (en) * 2016-09-29 2020-05-12 Nlight, Inc. Multi-function semiconductor and electronics processing
US10739621B2 (en) * 2016-09-29 2020-08-11 Nlight, Inc. Methods of and systems for materials processing using optical beams
US10673197B2 (en) * 2016-09-29 2020-06-02 Nlight, Inc. Fiber-based optical modulator
TWI604907B (zh) 2016-10-11 2017-11-11 財團法人工業技術研究院 雷射均勻加工裝置及其方法
US20180178322A1 (en) * 2016-12-28 2018-06-28 Metal Industries Research & Development Centre Laser processing device and laser processing method
JP6977308B2 (ja) * 2017-04-28 2021-12-08 Agc株式会社 ガラス基板およびガラス基板の製造方法
JP6749308B2 (ja) * 2017-12-04 2020-09-02 Dmg森精機株式会社 レーザ積層造形装置及びレーザ積層方法
CN109141825B (zh) * 2018-09-13 2019-07-02 西华大学 亚波长光学成像器件焦距测量装置及其测量方法
CN111451218B (zh) * 2020-04-14 2024-11-29 深圳市汇泽激光科技有限公司 一种合束激光的产生方法、激光器以及激光清洗方法
GB202005541D0 (en) * 2020-04-16 2020-06-03 M Solv Ltd Method and apparatus for performing laser ablation
CN112222645A (zh) * 2020-08-24 2021-01-15 梅林� 一种在线细棒物体打孔的聚焦调节装置和方法
CN113210856B (zh) * 2021-04-22 2022-07-19 广东工业大学 Pcb短波长脉冲激光钻孔方法及相关钻孔装置
KR20240056119A (ko) * 2022-10-21 2024-04-30 세메스 주식회사 기판 처리 장치 및 기판 처리 방법
CN116673618A (zh) * 2023-07-07 2023-09-01 珠海市申科谱工业科技有限公司 医疗塑料导管激光打孔工艺

Family Cites Families (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3848104A (en) 1973-04-09 1974-11-12 Avco Everett Res Lab Inc Apparatus for heat treating a surface
GB1502127A (en) 1975-01-27 1978-02-22 Xerox Corp Geometrical transformations in optics
US4475027A (en) 1981-11-17 1984-10-02 Allied Corporation Optical beam homogenizer
US4521075A (en) 1983-03-07 1985-06-04 Obenschain Stephen P Controllable spatial incoherence echelon for laser
US4789770A (en) * 1987-07-15 1988-12-06 Westinghouse Electric Corp. Controlled depth laser drilling system
DD288933A5 (de) 1989-10-30 1991-04-11 Friedrich-Schiller-Universitaet,De Verfahren zur lasermaterialbearbeitung mit dynamischer fokussierung
US5293025A (en) * 1991-08-01 1994-03-08 E. I. Du Pont De Nemours And Company Method for forming vias in multilayer circuits
US5300756A (en) 1991-10-22 1994-04-05 General Scanning, Inc. Method for severing integrated-circuit connection paths by a phase-plate-adjusted laser beam
US5473475A (en) 1993-01-29 1995-12-05 The United States Of America As Represented By The United States Department Of Energy Method for changing the cross section of a laser beam
US5453594A (en) 1993-10-06 1995-09-26 Electro Scientific Industries, Inc. Radiation beam position and emission coordination system
US5611946A (en) 1994-02-18 1997-03-18 New Wave Research Multi-wavelength laser system, probe station and laser cutter system using the same
US5627847A (en) 1995-05-04 1997-05-06 Regents Of The University Of Minnesota Distortion-compensated phase grating and mode-selecting mirror for a laser
US5841099A (en) * 1994-07-18 1998-11-24 Electro Scientific Industries, Inc. Method employing UV laser pulses of varied energy density to form depthwise self-limiting blind vias in multilayered targets
US5593606A (en) 1994-07-18 1997-01-14 Electro Scientific Industries, Inc. Ultraviolet laser system and method for forming vias in multi-layered targets
US5559338A (en) 1994-10-04 1996-09-24 Excimer Laser Systems, Inc. Deep ultraviolet optical imaging system for microlithography and/or microfabrication
US5751585A (en) 1995-03-20 1998-05-12 Electro Scientific Industries, Inc. High speed, high accuracy multi-stage tool positioning system
JPH0961611A (ja) * 1995-06-16 1997-03-07 Nippon Steel Corp バイナリーオプティックス及びそれを用いたレーザ加工装置
DE19619481C1 (de) * 1996-05-14 1997-11-27 Aesculap Meditec Gmbh Verfahren und Vorrichtung zum Abtragen von Material mit einem Laserstrahl
US5864430A (en) 1996-09-10 1999-01-26 Sandia Corporation Gaussian beam profile shaping apparatus, method therefor and evaluation thereof
JPH10323787A (ja) * 1997-05-23 1998-12-08 Nec Corp レーザ加工装置
JP3175005B2 (ja) * 1997-05-28 2001-06-11 住友重機械工業株式会社 レーザ加工装置
JP3691221B2 (ja) * 1997-09-24 2005-09-07 三菱電機株式会社 レーザ加工方法
GB9811557D0 (en) 1998-05-29 1998-07-29 Exitech Ltd The use of beam shaping for improving the performance of machines used to laser drill microvia holes in printed circuit (wiring) and other packages
FR2781707B1 (fr) 1998-07-30 2000-09-08 Snecma Procede d'usinage par laser excimere de trous ou de formes a profil variable
US6256121B1 (en) * 1999-10-08 2001-07-03 Nanovia, Lp Apparatus for ablating high-density array of vias or indentation in surface of object

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