HK1043560A1 - 采用固态紫外高斯激光束成孔的波束成形和投射成像 - Google Patents

采用固态紫外高斯激光束成孔的波束成形和投射成像 Download PDF

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Publication number
HK1043560A1
HK1043560A1 HK02105379.8A HK02105379A HK1043560A1 HK 1043560 A1 HK1043560 A1 HK 1043560A1 HK 02105379 A HK02105379 A HK 02105379A HK 1043560 A1 HK1043560 A1 HK 1043560A1
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HK
Hong Kong
Prior art keywords
gaussian
output
energy
layer
laser
Prior art date
Application number
HK02105379.8A
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English (en)
Chinese (zh)
Inventor
C‧M‧丹斯基
X‧刘
N‧J‧克罗利奥
X‧劉
H‧W‧罗
B‧C‧冈德拉姆
N‧J‧克羅利奧
H‧马特萨毛托
H‧W‧羅
B‧C‧岡德拉姆
H‧馬特薩毛托
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电子科学工业公司
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Application filed by 电子科学工业公司 filed Critical 电子科学工业公司
Publication of HK1043560A1 publication Critical patent/HK1043560A1/zh

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/36Removing material
    • B23K26/38Removing material by boring or cutting
    • B23K26/382Removing material by boring or cutting by boring
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06Shaping the laser beam, e.g. by masks or multi-focusing
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/062Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/064Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
    • B23K26/066Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms by using masks
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/073Shaping the laser spot
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/073Shaping the laser spot
    • B23K26/0732Shaping the laser spot into a rectangular shape
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/36Removing material
    • B23K26/38Removing material by boring or cutting
    • B23K26/382Removing material by boring or cutting by boring
    • B23K26/389Removing material by boring or cutting by boring of fluid openings, e.g. nozzles, jets
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/36Removing material
    • B23K26/40Removing material taking account of the properties of the material involved
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/0011Working of insulating substrates or insulating layers
    • H05K3/0017Etching of the substrate by chemical or physical means
    • H05K3/0026Etching of the substrate by chemical or physical means by laser ablation
    • H05K3/0032Etching of the substrate by chemical or physical means by laser ablation of organic insulating material
    • H05K3/0038Etching of the substrate by chemical or physical means by laser ablation of organic insulating material combined with laser drilling through a metal layer
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2101/00Articles made by soldering, welding or cutting
    • B23K2101/36Electric or electronic devices
    • B23K2101/42Printed circuits
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2103/00Materials to be soldered, welded or cut
    • B23K2103/08Non-ferrous metals or alloys
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2103/00Materials to be soldered, welded or cut
    • B23K2103/08Non-ferrous metals or alloys
    • B23K2103/10Aluminium or alloys thereof
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2103/00Materials to be soldered, welded or cut
    • B23K2103/08Non-ferrous metals or alloys
    • B23K2103/12Copper or alloys thereof
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2103/00Materials to be soldered, welded or cut
    • B23K2103/16Composite materials, e.g. fibre reinforced
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2103/00Materials to be soldered, welded or cut
    • B23K2103/16Composite materials, e.g. fibre reinforced
    • B23K2103/166Multilayered materials
    • B23K2103/172Multilayered materials wherein at least one of the layers is non-metallic
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2103/00Materials to be soldered, welded or cut
    • B23K2103/18Dissimilar materials
    • B23K2103/26Alloys of Nickel and Cobalt and Chromium
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2103/00Materials to be soldered, welded or cut
    • B23K2103/30Organic material
    • B23K2103/42Plastics
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2103/00Materials to be soldered, welded or cut
    • B23K2103/50Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2103/00Materials to be soldered, welded or cut
    • B23K2103/50Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26
    • B23K2103/52Ceramics
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/48Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the groups H01L21/18 - H01L21/326 or H10D48/04 - H10D48/07
    • H01L21/4814Conductive parts
    • H01L21/4846Leads on or in insulating or insulated substrates, e.g. metallisation
    • H01L21/486Via connections through the substrate with or without pins
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/768Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
    • H01L21/76801Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing
    • H01L21/76802Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing by forming openings in dielectrics
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/0011Working of insulating substrates or insulating layers
    • H05K3/0017Etching of the substrate by chemical or physical means
    • H05K3/0026Etching of the substrate by chemical or physical means by laser ablation
    • H05K3/0032Etching of the substrate by chemical or physical means by laser ablation of organic insulating material
    • H05K3/0035Etching of the substrate by chemical or physical means by laser ablation of organic insulating material of blind holes, i.e. having a metal layer at the bottom
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/40Forming printed elements for providing electric connections to or between printed circuits
    • H05K3/42Plated through-holes or plated via connections
    • H05K3/425Plated through-holes or plated via connections characterised by the sequence of steps for plating the through-holes or via connections in relation to the conductive pattern
    • H05K3/427Plated through-holes or plated via connections characterised by the sequence of steps for plating the through-holes or via connections in relation to the conductive pattern initial plating of through-holes in metal-clad substrates

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  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Laser Beam Processing (AREA)
  • Mechanical Optical Scanning Systems (AREA)
  • Lasers (AREA)
HK02105379.8A 1999-05-28 2000-05-26 采用固态紫外高斯激光束成孔的波束成形和投射成像 HK1043560A1 (zh)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
US13656899P 1999-05-28 1999-05-28
US60/136,568 1999-05-28
US17509800P 2000-01-07 2000-01-07
US60/175,098 2000-01-07
US19366800P 2000-03-31 2000-03-31
US60/193,668 2000-03-31
PCT/US2000/014816 WO2000073013A1 (en) 1999-05-28 2000-05-26 Beam shaping and projection imaging with solid state uv gaussian beam to form vias

Publications (1)

Publication Number Publication Date
HK1043560A1 true HK1043560A1 (zh) 2002-09-20

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HK02105379.8A HK1043560A1 (zh) 1999-05-28 2000-05-26 采用固态紫外高斯激光束成孔的波束成形和投射成像

Country Status (12)

Country Link
US (1) US6433301B1 (enExample)
EP (1) EP1187698B1 (enExample)
JP (1) JP2003500220A (enExample)
KR (1) KR100633343B1 (enExample)
CN (1) CN1182936C (enExample)
AT (1) ATE260733T1 (enExample)
AU (1) AU5303400A (enExample)
CA (1) CA2373565C (enExample)
DE (1) DE60008732T2 (enExample)
HK (1) HK1043560A1 (enExample)
TW (1) TW482705B (enExample)
WO (1) WO2000073013A1 (enExample)

Families Citing this family (157)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6791060B2 (en) * 1999-05-28 2004-09-14 Electro Scientific Industries, Inc. Beam shaping and projection imaging with solid state UV gaussian beam to form vias
EP1202833B1 (de) * 1999-07-23 2003-12-03 Heidelberg Instruments Mikrotechnik GmbH Verfahren zur erzeugung von mikrobohrungen
US7838794B2 (en) 1999-12-28 2010-11-23 Gsi Group Corporation Laser-based method and system for removing one or more target link structures
US8217304B2 (en) 2001-03-29 2012-07-10 Gsi Group Corporation Methods and systems for thermal-based laser processing a multi-material device
US6281471B1 (en) 1999-12-28 2001-08-28 Gsi Lumonics, Inc. Energy-efficient, laser-based method and system for processing target material
US7723642B2 (en) * 1999-12-28 2010-05-25 Gsi Group Corporation Laser-based system for memory link processing with picosecond lasers
US20040134894A1 (en) * 1999-12-28 2004-07-15 Bo Gu Laser-based system for memory link processing with picosecond lasers
US7671295B2 (en) 2000-01-10 2010-03-02 Electro Scientific Industries, Inc. Processing a memory link with a set of at least two laser pulses
JP3413160B2 (ja) * 2000-06-15 2003-06-03 キヤノン株式会社 照明装置及びそれを用いた走査型露光装置
JP5033296B2 (ja) * 2000-07-12 2012-09-26 エレクトロ サイエンティフィック インダストリーズ インコーポレーテッド Icヒューズ切断用シングルパルスのためのuvレーザシステムおよびその方法
US7157038B2 (en) 2000-09-20 2007-01-02 Electro Scientific Industries, Inc. Ultraviolet laser ablative patterning of microstructures in semiconductors
US6676878B2 (en) 2001-01-31 2004-01-13 Electro Scientific Industries, Inc. Laser segmented cutting
US6689985B2 (en) 2001-01-17 2004-02-10 Orbotech, Ltd. Laser drill for use in electrical circuit fabrication
US6621044B2 (en) * 2001-01-18 2003-09-16 Anvik Corporation Dual-beam materials-processing system
GB2389811B (en) * 2001-01-31 2004-10-27 Electro Scient Ind Inc Ultraviolet laser ablative patterning of microstructures in semiconductors
US6534743B2 (en) 2001-02-01 2003-03-18 Electro Scientific Industries, Inc. Resistor trimming with small uniform spot from solid-state UV laser
TW523837B (en) * 2001-02-01 2003-03-11 Electro Scient Ind Inc Resistor trimming with small uniform spot from solid-state UV laser
US6762124B2 (en) * 2001-02-14 2004-07-13 Avery Dennison Corporation Method for patterning a multilayered conductor/substrate structure
US6804269B2 (en) * 2001-06-19 2004-10-12 Hitachi Via Mechanics, Ltd. Laser beam delivery system with trepanning module
JP4397571B2 (ja) 2001-09-25 2010-01-13 株式会社半導体エネルギー研究所 レーザ照射方法およびレーザ照射装置、並びに半導体装置の作製方法
US20030067774A1 (en) * 2001-10-04 2003-04-10 Nanovia, L.P. Illumination systems and methods employing diffractive holographic optical elements
DE10207288B4 (de) * 2002-02-21 2005-05-04 Newson Engineering Nv Verfahren zum Bohren von Löchern mittels eines Laserstrahls in einem Substrat, insbesondere in einem elektrischen Schaltungsubstrat
US6884962B2 (en) * 2002-03-18 2005-04-26 Hitachi Via Mechanics, Ltd. Beam or wave front
US6951995B2 (en) 2002-03-27 2005-10-04 Gsi Lumonics Corp. Method and system for high-speed, precise micromachining an array of devices
US7563695B2 (en) 2002-03-27 2009-07-21 Gsi Group Corporation Method and system for high-speed precise laser trimming and scan lens for use therein
US20040017430A1 (en) * 2002-07-23 2004-01-29 Yosuke Mizuyama Laser processing method and laser processing apparatus
GB0222342D0 (en) * 2002-09-26 2002-11-06 British Nuclear Fuels Plc Surface treatment of concrete
US7161089B2 (en) * 2002-12-04 2007-01-09 Tdk Corporation Electronic component
US20040195222A1 (en) * 2002-12-25 2004-10-07 Semiconductor Energy Laboratory Co., Ltd. Laser irradiation method, laser irradiation apparatus, and method for manufacturing semiconductor device
JP3807374B2 (ja) * 2003-01-31 2006-08-09 住友電気工業株式会社 一括多点ホモジナイズ光学系
TWI248244B (en) * 2003-02-19 2006-01-21 J P Sercel Associates Inc System and method for cutting using a variable astigmatic focal beam spot
US6784400B1 (en) * 2003-03-03 2004-08-31 Paul S. Banks Method of short pulse hole drilling without a resultant pilot hole and backwall damage
US20040251243A1 (en) * 2003-04-10 2004-12-16 Lizotte Todd E. System and method for generating and controlling multiple independently steerable laser beams for material processing
US6909735B2 (en) * 2003-04-10 2005-06-21 Hitachi Via Mechanics, Ltd. System and method for generating and controlling multiple independently steerable laser beam for material processing
US8921733B2 (en) * 2003-08-11 2014-12-30 Raydiance, Inc. Methods and systems for trimming circuits
US7060624B2 (en) * 2003-08-13 2006-06-13 International Business Machines Corporation Deep filled vias
US6982206B1 (en) * 2003-10-02 2006-01-03 Lsi Logic Corporation Mechanism for improving the structural integrity of low-k films
US7511247B2 (en) * 2004-03-22 2009-03-31 Panasonic Corporation Method of controlling hole shape during ultrafast laser machining by manipulating beam polarization
WO2011123205A1 (en) 2010-03-30 2011-10-06 Imra America, Inc. Laser-based material processing apparatus and methods
US7057133B2 (en) * 2004-04-14 2006-06-06 Electro Scientific Industries, Inc. Methods of drilling through-holes in homogenous and non-homogenous substrates
US7302309B2 (en) 2004-04-26 2007-11-27 Hewlett-Packard Development Company, L.P. Laser micromachining methods and systems
US7629234B2 (en) * 2004-06-18 2009-12-08 Electro Scientific Industries, Inc. Semiconductor structure processing using multiple laterally spaced laser beam spots with joint velocity profiling
US7633034B2 (en) * 2004-06-18 2009-12-15 Electro Scientific Industries, Inc. Semiconductor structure processing using multiple laser beam spots overlapping lengthwise on a structure
US7935941B2 (en) * 2004-06-18 2011-05-03 Electro Scientific Industries, Inc. Semiconductor structure processing using multiple laser beam spots spaced on-axis on non-adjacent structures
US7435927B2 (en) * 2004-06-18 2008-10-14 Electron Scientific Industries, Inc. Semiconductor link processing using multiple laterally spaced laser beam spots with on-axis offset
US8148211B2 (en) * 2004-06-18 2012-04-03 Electro Scientific Industries, Inc. Semiconductor structure processing using multiple laser beam spots spaced on-axis delivered simultaneously
US7923306B2 (en) * 2004-06-18 2011-04-12 Electro Scientific Industries, Inc. Semiconductor structure processing using multiple laser beam spots
US8383982B2 (en) * 2004-06-18 2013-02-26 Electro Scientific Industries, Inc. Methods and systems for semiconductor structure processing using multiple laser beam spots
US7687740B2 (en) * 2004-06-18 2010-03-30 Electro Scientific Industries, Inc. Semiconductor structure processing using multiple laterally spaced laser beam spots delivering multiple blows
US20060000816A1 (en) * 2004-06-30 2006-01-05 Matsushita Electric Industrial Co., Ltd. System for and method of zoom processing
US7244907B2 (en) * 2004-06-30 2007-07-17 Matsushita Electric Industrial Co., Ltd. Method of optimizing optical power use in a parallel processing laser system
US7772523B2 (en) 2004-07-30 2010-08-10 Semiconductor Energy Laboratory Co., Ltd Laser irradiation apparatus and laser irradiation method
US8304313B2 (en) * 2004-08-23 2012-11-06 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and its manufacturing method
US8694148B2 (en) 2004-11-15 2014-04-08 Electro Scientific Industries, Inc. Tracking and marking specimens having defects formed during laser via drilling
KR100700641B1 (ko) * 2004-12-03 2007-03-27 삼성에스디아이 주식회사 레이저 조사 장치, 패터닝 방법 및 그를 이용한 레이저열전사 패터닝 방법과 이를 이용한 유기 전계 발광 소자의제조 방법
JP4559260B2 (ja) * 2005-03-04 2010-10-06 日立ビアメカニクス株式会社 プリント基板の穴明け方法
TWI382795B (zh) * 2005-03-04 2013-01-11 Hitachi Via Mechanics Ltd A method of opening a printed circuit board and an opening device for a printed circuit board
JP4332855B2 (ja) * 2005-06-07 2009-09-16 住友電気工業株式会社 ウエッジを用いた回折型ビームホモジナイザ光学系
FR2887161B1 (fr) * 2005-06-20 2007-09-07 Commissariat Energie Atomique Procede et dispositif d'ablation laser d'une couche superficielle d'une paroi, telle q'un revetement de peinture dans une installation nucleaire
ATE389497T1 (de) * 2005-06-21 2008-04-15 Fameccanica Data Spa Verfanren und vorrichtung zum laserschneiden von artikeln, insbesondere sanitärprodukten und ihren bestandteilen, mit einem laserfokuspunktdurchmesser von 0.1 bis 0.3 mm
US7411735B2 (en) 2005-12-06 2008-08-12 3M Innovative Property Company Illumination system incorporating collimated light source
JP2006205261A (ja) * 2006-04-14 2006-08-10 Hitachi Via Mechanics Ltd プリント基板の穴あけ加工装置
US7605343B2 (en) 2006-05-24 2009-10-20 Electro Scientific Industries, Inc. Micromachining with short-pulsed, solid-state UV laser
US20070272666A1 (en) * 2006-05-25 2007-11-29 O'brien James N Infrared laser wafer scribing using short pulses
US8624157B2 (en) * 2006-05-25 2014-01-07 Electro Scientific Industries, Inc. Ultrashort laser pulse wafer scribing
US8084706B2 (en) * 2006-07-20 2011-12-27 Gsi Group Corporation System and method for laser processing at non-constant velocities
JP4912806B2 (ja) * 2006-09-21 2012-04-11 東急車輛製造株式会社 レーザスポット溶接部の評価方法
US7977602B2 (en) * 2007-03-21 2011-07-12 Photon Dynamics, Inc. Laser ablation using multiple wavelengths
JP5028124B2 (ja) 2007-03-29 2012-09-19 株式会社ニデック 眼科用レーザ治療装置
US8481887B2 (en) * 2007-05-03 2013-07-09 Electro Scientific Industries, Inc. Method for machining tapered micro holes
EP1998215A1 (en) 2007-05-31 2008-12-03 Molecular Technology (MolTech) Gmbh Achromatic optical system for beam shaping
US8710402B2 (en) * 2007-06-01 2014-04-29 Electro Scientific Industries, Inc. Method of and apparatus for laser drilling holes with improved taper
US8498464B2 (en) * 2007-09-27 2013-07-30 Siemens Medical Solutions Usa, Inc. Intrinsic co-registration for modular multimodality medical imaging systems
GB2457720A (en) * 2008-02-23 2009-08-26 Philip Thomas Rumsby Method for laser processing on the opposite sides of thin transparent substrates
JP5432547B2 (ja) * 2008-02-28 2014-03-05 株式会社ウェーブロック・アドバンスト・テクノロジー 貫通孔形成方法、及び、貫通孔形成加工品
CN105583526B (zh) * 2008-03-21 2018-08-17 Imra美国公司 基于激光的材料加工方法和系统
GB2460648A (en) * 2008-06-03 2009-12-09 M Solv Ltd Method and apparatus for laser focal spot size control
US8609512B2 (en) * 2009-03-27 2013-12-17 Electro Scientific Industries, Inc. Method for laser singulation of chip scale packages on glass substrates
US8350187B2 (en) * 2009-03-28 2013-01-08 Electro Scientific Industries, Inc. Method and apparatus for laser machining
US20120031883A1 (en) * 2009-05-25 2012-02-09 Mitsubishi Electric Corporation Laser machining device and laser machining method
US8023206B2 (en) * 2009-07-24 2011-09-20 Molecular Technology Gmbh Achromatic optical system for beam shaping
KR101770836B1 (ko) * 2009-08-11 2017-08-23 하마마츠 포토닉스 가부시키가이샤 레이저 가공장치 및 레이저 가공방법
US8435437B2 (en) 2009-09-04 2013-05-07 Abbott Cardiovascular Systems Inc. Setting laser power for laser machining stents from polymer tubing
US20130256286A1 (en) * 2009-12-07 2013-10-03 Ipg Microsystems Llc Laser processing using an astigmatic elongated beam spot and using ultrashort pulses and/or longer wavelengths
KR101243920B1 (ko) * 2010-01-07 2013-03-14 삼성디스플레이 주식회사 기판 밀봉에 사용되는 레이저 빔 조사 장치, 기판 밀봉 방법, 및 유기 발광 디스플레이 장치의 제조 방법
US8884184B2 (en) 2010-08-12 2014-11-11 Raydiance, Inc. Polymer tubing laser micromachining
US8604380B2 (en) 2010-08-19 2013-12-10 Electro Scientific Industries, Inc. Method and apparatus for optimally laser marking articles
GB201014778D0 (en) 2010-09-06 2010-10-20 Baird Brian W Picosecond laser beam shaping assembly and a method of shaping a picosecond laser beam
US9120181B2 (en) 2010-09-16 2015-09-01 Coherent, Inc. Singulation of layered materials using selectively variable laser output
US9023461B2 (en) 2010-10-21 2015-05-05 Electro Scientific Industries, Inc. Apparatus for optically laser marking articles
CN102218606A (zh) * 2011-05-18 2011-10-19 苏州德龙激光有限公司 紫外激光打孔的装置
CN102243137B (zh) * 2011-06-21 2013-04-10 中国科学院上海光学精密机械研究所 光束整形元件光学性能的检测装置和检测方法
US10239160B2 (en) 2011-09-21 2019-03-26 Coherent, Inc. Systems and processes that singulate materials
US9289858B2 (en) 2011-12-20 2016-03-22 Electro Scientific Industries, Inc. Drilling holes with minimal taper in cured silicone
CN104736291A (zh) 2012-10-22 2015-06-24 伊雷克托科学工业股份有限公司 用于对物品做标记的方法及设备
EP2943311A4 (en) 2013-01-11 2016-08-31 Electro Scient Ind Inc LASER PULSE POWER CONTROL SYSTEMS AND METHOD
CN105102171B (zh) * 2013-02-13 2018-01-30 住友化学株式会社 光学部件贴合体的制造装置
KR102245810B1 (ko) 2013-03-15 2021-04-30 일렉트로 싸이언티픽 인더스트리이즈 인코포레이티드 Aod 라우트 프로세싱을 위한 레이저 시스템들 및 방법들
CN105102174B (zh) 2013-03-15 2017-05-31 伊雷克托科学工业股份有限公司 基于激光放射所控制的射束定位器
US10226837B2 (en) 2013-03-15 2019-03-12 Nlight, Inc. Thermal processing with line beams
JP6636417B2 (ja) 2013-03-15 2020-01-29 エレクトロ サイエンティフィック インダストリーズ インコーポレーテッド Aod移動減少用aodツール整定のためのレーザシステム及び方法
US9291825B2 (en) * 2013-03-22 2016-03-22 Applied Materials Israel, Ltd. Calibratable beam shaping system and method
JP6474810B2 (ja) 2013-08-16 2019-02-27 エレクトロ サイエンティフィック インダストリーズ インコーポレーテッド 薄層の内部にマーキングするためのレーザシステム並びに方法及びこれにより作製される対象物
CN103639594B (zh) * 2013-12-19 2015-10-28 苏州德龙激光股份有限公司 激光钻孔方法
US9285593B1 (en) 2013-12-20 2016-03-15 AdlOptica Optical Systems GmbH Method and apparatus for shaping focused laser beams
KR20150102180A (ko) * 2014-02-27 2015-09-07 삼성디스플레이 주식회사 레이저 빔 조사 장치 및 이를 이용한 유기 발광 디스플레이 장치의 제조 방법
US9594937B2 (en) 2014-02-28 2017-03-14 Electro Scientific Industries, Inc. Optical mark reader
US9269035B2 (en) 2014-02-28 2016-02-23 Electro Scientific Industries, Inc. Modified two-dimensional codes, and laser systems and methods for producing such codes
JP6324151B2 (ja) * 2014-03-26 2018-05-16 住友重機械工業株式会社 レーザ加工装置及びレーザ加工方法
US10069271B2 (en) 2014-06-02 2018-09-04 Nlight, Inc. Scalable high power fiber laser
US10310201B2 (en) 2014-08-01 2019-06-04 Nlight, Inc. Back-reflection protection and monitoring in fiber and fiber-delivered lasers
CN107073810A (zh) * 2014-10-28 2017-08-18 泰克诺菲弗公司 用于将热活化双面胶带施加到支撑件上的方法和装置
KR20170088844A (ko) * 2014-11-20 2017-08-02 니폰 제온 가부시키가이샤 광학 필름의 제조 방법
DE102014224182A1 (de) * 2014-11-26 2016-06-02 Robert Bosch Gmbh Vorrichtung und Verfahren zur Lasermaterialbearbeitung
US9983562B2 (en) 2014-12-29 2018-05-29 Electro Scientific Industries, Inc. Adaptive part profile creation via independent side measurement with alignment features
US9837783B2 (en) 2015-01-26 2017-12-05 Nlight, Inc. High-power, single-mode fiber sources
US10507544B2 (en) 2015-02-27 2019-12-17 Electro Scientific Industries, Inc Fast beam manipulation for cross-axis miromaching
US10050404B2 (en) 2015-03-26 2018-08-14 Nlight, Inc. Fiber source with cascaded gain stages and/or multimode delivery fiber with low splice loss
WO2017008022A1 (en) 2015-07-08 2017-01-12 Nlight, Inc. Fiber with depressed central index for increased beam parameter product
US11077526B2 (en) * 2015-09-09 2021-08-03 Electro Scientific Industries, Inc. Laser processing apparatus, methods of laser-processing workpieces and related arrangements
WO2017053985A1 (en) 2015-09-24 2017-03-30 Nlight, Inc. Beam parameter product (bpp) control by varying fiber-to-fiber angle
EP3380266B1 (en) 2015-11-23 2021-08-11 NLIGHT, Inc. Fine-scale temporal control for laser material processing
US11179807B2 (en) 2015-11-23 2021-11-23 Nlight, Inc. Fine-scale temporal control for laser material processing
CN105552029B (zh) * 2015-12-16 2018-05-25 新昌县鸿吉电子科技有限公司 Led芯片切割方法
US10466494B2 (en) * 2015-12-18 2019-11-05 Nlight, Inc. Reverse interleaving for laser line generators
JP6468295B2 (ja) * 2016-01-27 2019-02-13 株式会社デンソー 部材の製造方法、及び、部材の製造装置
CN107092166B (zh) * 2016-02-18 2019-01-29 上海微电子装备(集团)股份有限公司 曝光系统、曝光装置及曝光方法
CN107309556A (zh) * 2016-04-14 2017-11-03 大族激光科技产业集团股份有限公司 一种激光钻孔装置及方法
US10673199B2 (en) * 2016-09-29 2020-06-02 Nlight, Inc. Fiber-based saturable absorber
US10673197B2 (en) * 2016-09-29 2020-06-02 Nlight, Inc. Fiber-based optical modulator
US10656427B2 (en) * 2016-09-29 2020-05-19 Nlight, Inc. Multicore fiber-coupled optical probing techniques
US10670872B2 (en) * 2016-09-29 2020-06-02 Nlight, Inc. All-fiber optical beam switch
US10661342B2 (en) * 2016-09-29 2020-05-26 Nlight, Inc. Additive manufacturing systems and methods for the same
US10423015B2 (en) * 2016-09-29 2019-09-24 Nlight, Inc. Adjustable beam characteristics
US10732439B2 (en) * 2016-09-29 2020-08-04 Nlight, Inc. Fiber-coupled device for varying beam characteristics
US10668567B2 (en) * 2016-09-29 2020-06-02 Nlight, Inc. Multi-operation laser tooling for deposition and material processing operations
US10661391B2 (en) * 2016-09-29 2020-05-26 Nlight, Inc. Method of forming pores in three-dimensional objects
US10730785B2 (en) * 2016-09-29 2020-08-04 Nlight, Inc. Optical fiber bending mechanisms
US10656440B2 (en) * 2016-09-29 2020-05-19 Nlight, Inc. Fiber optical beam delivery device producing output exhibiting intensity distribution profile having non-zero ellipticity
US10649241B2 (en) * 2016-09-29 2020-05-12 Nlight, Inc. Multi-function semiconductor and electronics processing
US10668537B2 (en) * 2016-09-29 2020-06-02 Nlight, Inc. Systems for and methods of temperature control in additive manufacturing
US10739621B2 (en) * 2016-09-29 2020-08-11 Nlight, Inc. Methods of and systems for materials processing using optical beams
US10684487B2 (en) * 2016-09-29 2020-06-16 Nlight, Inc. Frequency-converted optical beams having adjustable beam characteristics
US10663742B2 (en) * 2016-09-29 2020-05-26 Nlight, Inc. Method and system for cutting a material using a laser having adjustable beam characteristics
US10673198B2 (en) * 2016-09-29 2020-06-02 Nlight, Inc. Fiber-coupled laser with time varying beam characteristics
US10668535B2 (en) * 2016-09-29 2020-06-02 Nlight, Inc. Method of forming three-dimensional objects
US10646963B2 (en) * 2016-09-29 2020-05-12 Nlight, Inc. Use of variable beam parameters to control a melt pool
TWI604907B (zh) 2016-10-11 2017-11-11 財團法人工業技術研究院 雷射均勻加工裝置及其方法
US20180178322A1 (en) * 2016-12-28 2018-06-28 Metal Industries Research & Development Centre Laser processing device and laser processing method
JP6977308B2 (ja) * 2017-04-28 2021-12-08 Agc株式会社 ガラス基板およびガラス基板の製造方法
JP6749308B2 (ja) * 2017-12-04 2020-09-02 Dmg森精機株式会社 レーザ積層造形装置及びレーザ積層方法
CN109141825B (zh) * 2018-09-13 2019-07-02 西华大学 亚波长光学成像器件焦距测量装置及其测量方法
CN111451218B (zh) * 2020-04-14 2024-11-29 深圳市汇泽激光科技有限公司 一种合束激光的产生方法、激光器以及激光清洗方法
GB202005541D0 (en) * 2020-04-16 2020-06-03 M Solv Ltd Method and apparatus for performing laser ablation
CN112222645A (zh) * 2020-08-24 2021-01-15 梅林� 一种在线细棒物体打孔的聚焦调节装置和方法
CN113210856B (zh) * 2021-04-22 2022-07-19 广东工业大学 Pcb短波长脉冲激光钻孔方法及相关钻孔装置
CN116673618A (zh) * 2023-07-07 2023-09-01 珠海市申科谱工业科技有限公司 医疗塑料导管激光打孔工艺

Family Cites Families (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3848104A (en) 1973-04-09 1974-11-12 Avco Everett Res Lab Inc Apparatus for heat treating a surface
GB1502127A (en) 1975-01-27 1978-02-22 Xerox Corp Geometrical transformations in optics
US4475027A (en) 1981-11-17 1984-10-02 Allied Corporation Optical beam homogenizer
US4521075A (en) 1983-03-07 1985-06-04 Obenschain Stephen P Controllable spatial incoherence echelon for laser
US4789770A (en) * 1987-07-15 1988-12-06 Westinghouse Electric Corp. Controlled depth laser drilling system
DD288933A5 (de) 1989-10-30 1991-04-11 Friedrich-Schiller-Universitaet,De Verfahren zur lasermaterialbearbeitung mit dynamischer fokussierung
US5293025A (en) * 1991-08-01 1994-03-08 E. I. Du Pont De Nemours And Company Method for forming vias in multilayer circuits
US5300756A (en) 1991-10-22 1994-04-05 General Scanning, Inc. Method for severing integrated-circuit connection paths by a phase-plate-adjusted laser beam
US5473475A (en) 1993-01-29 1995-12-05 The United States Of America As Represented By The United States Department Of Energy Method for changing the cross section of a laser beam
US5453594A (en) 1993-10-06 1995-09-26 Electro Scientific Industries, Inc. Radiation beam position and emission coordination system
US5611946A (en) 1994-02-18 1997-03-18 New Wave Research Multi-wavelength laser system, probe station and laser cutter system using the same
US5627847A (en) 1995-05-04 1997-05-06 Regents Of The University Of Minnesota Distortion-compensated phase grating and mode-selecting mirror for a laser
US5841099A (en) 1994-07-18 1998-11-24 Electro Scientific Industries, Inc. Method employing UV laser pulses of varied energy density to form depthwise self-limiting blind vias in multilayered targets
US5593606A (en) 1994-07-18 1997-01-14 Electro Scientific Industries, Inc. Ultraviolet laser system and method for forming vias in multi-layered targets
US5559338A (en) 1994-10-04 1996-09-24 Excimer Laser Systems, Inc. Deep ultraviolet optical imaging system for microlithography and/or microfabrication
US5751585A (en) 1995-03-20 1998-05-12 Electro Scientific Industries, Inc. High speed, high accuracy multi-stage tool positioning system
JPH0961611A (ja) * 1995-06-16 1997-03-07 Nippon Steel Corp バイナリーオプティックス及びそれを用いたレーザ加工装置
DE19619481C1 (de) * 1996-05-14 1997-11-27 Aesculap Meditec Gmbh Verfahren und Vorrichtung zum Abtragen von Material mit einem Laserstrahl
US5864430A (en) * 1996-09-10 1999-01-26 Sandia Corporation Gaussian beam profile shaping apparatus, method therefor and evaluation thereof
JPH10323787A (ja) * 1997-05-23 1998-12-08 Nec Corp レーザ加工装置
JP3175005B2 (ja) * 1997-05-28 2001-06-11 住友重機械工業株式会社 レーザ加工装置
JP3691221B2 (ja) * 1997-09-24 2005-09-07 三菱電機株式会社 レーザ加工方法
GB9811557D0 (en) 1998-05-29 1998-07-29 Exitech Ltd The use of beam shaping for improving the performance of machines used to laser drill microvia holes in printed circuit (wiring) and other packages
FR2781707B1 (fr) 1998-07-30 2000-09-08 Snecma Procede d'usinage par laser excimere de trous ou de formes a profil variable
US6256121B1 (en) * 1999-10-08 2001-07-03 Nanovia, Lp Apparatus for ablating high-density array of vias or indentation in surface of object

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