KR100625745B1 - 구동장치, 노광장치 및 디바이스 제조방법 - Google Patents
구동장치, 노광장치 및 디바이스 제조방법 Download PDFInfo
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- KR100625745B1 KR100625745B1 KR1020050003146A KR20050003146A KR100625745B1 KR 100625745 B1 KR100625745 B1 KR 100625745B1 KR 1020050003146 A KR1020050003146 A KR 1020050003146A KR 20050003146 A KR20050003146 A KR 20050003146A KR 100625745 B1 KR100625745 B1 KR 100625745B1
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- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B19/00—Programme-control systems
- G05B19/02—Programme-control systems electric
- G05B19/18—Numerical control [NC], i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form
- G05B19/414—Structure of the control system, e.g. common controller or multiprocessor systems, interface to servo, programmable interface controller
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70766—Reaction force control means, e.g. countermass
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B27/00—Photographic printing apparatus
- G03B27/02—Exposure apparatus for contact printing
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
- G03F7/70725—Stages control
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
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- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B19/00—Programme-control systems
- G05B19/02—Programme-control systems electric
- G05B19/18—Numerical control [NC], i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form
- G05B19/404—Numerical control [NC], i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form characterised by control arrangements for compensation, e.g. for backlash, overshoot, tool offset, tool wear, temperature, machine construction errors, load, inertia
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- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/30—Nc systems
- G05B2219/41—Servomotor, servo controller till figures
- G05B2219/41191—Cancel vibration by positioning two slides, opposite acceleration
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- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/30—Nc systems
- G05B2219/45—Nc applications
- G05B2219/45028—Lithography
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- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/30—Nc systems
- G05B2219/49—Nc machine tool, till multiple
- G05B2219/49257—Six or more linear drives to position x y z table
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- Environmental & Geological Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
Description
Claims (16)
- 물체를 이동시키는 구동장치로서:상기 물체를 X방향 및 Y방향으로 구동하는 제 1액츄에이터;상기 제 1액츄에이터가 상기 물체를 구동할 때에 발생하는 반력을 받는 반력카운터를 구동하는 제 2액츄에이터; 및상기 물체를 상기 제 1액츄에이터로 구동할 때에 상기 반력카운터가 받는 반력을 상기 제 2액츄에이터에 의해서 상쇄하도록 상기 물체의 X방향 및 Y방향의 위치에 근거해서 상기 제 2액츄에이터를 제어하는 제어부;를 구비한 것을 특징으로 하는 구동장치.
- 제 1항에 있어서, 상기 제어부는 상기 물체의 X방향 및 Y방향의 위치에 근거해서 상기 물체의 X방향 및 Y방향의 가속도를 연산하고, 상기 물체의 X방향 및 Y방향의 위치 및 상기 물체의 X방향 및 Y방향의 가속도에 근거해서 상기 제 2액츄에이터를 제어하는 것을 특징으로 하는 구동장치.
- 제 1항에 있어서, 상기 물체의 X방향 및 Y방향의 가속도를 검출하는 가속도센서를 더 구비하고, 상기 제어부는 상기 물체의 X방향 및 Y방향 가속도와 상기 물체의 X방향 및 Y방향의 위치에 근거해서 상기 제 2액츄에이터를 제어하는 것을 특징으로 하는 구동장치.
- 제 1항에 있어서, 상기 제어부는 상기 물체를 상기 제 1액츄에이터로 구동할 때에 상기 반력카운터가 받는 X방향 반력, Y방향 반력 및 모멘트 반력을 상기 제 2액츄에이터에 의해서 상쇄하도록 상기 제 2액츄에이터를 제어하는 것을 특징으로 하는 구동장치.
- 제 1항에 있어서, 상기 제어부는 상기 물체를 상기 제 1액츄에이터로 구동할 때에 상기반력카운터가 받는 X방향 반력, Y방향 반력 및 모멘트 반력을 연산하고, 상기 X방향 반력, 상기 Y방향 반력 및 상기 모멘트 반력에 근거해서 상기 반력카운터를 구동하기 위한 프로파일을 생성하는 것을 특징으로 하는 구동장치.
- 제 5항에 있어서, 상기 제어부는 상기 물체의 중량을 m, X방향 위치를 x, Y방향 위치를 y, X방향 가속도를 AccX, Y방향 가속도를 AccY로 하고, 상기 반력카운터가 받는 X방향 반력을 Fx , Y방향 반력을 Fy, 모멘트 반력을 Fr로 했을 때에, Fx, Fy, Fr를Fx = mㆍAccX,Fy = mㆍAccY,Fr = yㆍFx - xㆍFy = m(yㆍAccX - xㆍAccY)에 따라 연산하는 것을 특징으로 하는 구동장치.
- 제 6항에 있어서, 상기 제어부는 상기 제 2액츄에이터의 X방향 추력의 총화를 Σ(FMx), Y방향 추력의 총화를 Σ(FMy), 모멘트 추력의 총화를 Σ(FMr)로 했을 때에, Σ(FMx) = -Fx, Σ(FMy) = -Fy, Σ(FMr) = -Fr가 성립하도록 상기반력카운터를 구동하기 위한 프로파일을 생성하는 것을 특징으로 하는 구동장치.
- 제 7항에 있어서, 상기 프로파일은 추력지령치를 제공하는 프로파일인 것을 특징으로 하는 구동장치.
- 제 1항에 있어서, 상기 제어부는 상기 제 1액츄에이터가 상기 물체를 구동할 때에 발생하는 반력을 받는 복수의 반력카운터의 각각의 중량을 M(i), 각각의 X방향 가속도를 AccMX(i), 각각의 Y방향 가속도를 AccMY(i), 각각의 관성 모멘트를 J(i), 각각의 각속도를 AccMJ(i)로 했을 때에, Σ(M(i)ㆍAccMX(i)) = -Fx , Σ(M(i)ㆍAccMY(i)) = -Fy, Σ(J(i)ㆍAccMJ(i)) = -Fr가 성립하도록 상기 제 2액츄에이터를 구동하기 위한 프로파일을 생성하는 것을 특징으로 하는 구동장치.
- 제 9항에 있어서, 상기 프로파일은 가속도지령치를 제공하는 프로파일인 것을 특징으로 하는 구동장치.
- 제 10항에 있어서, 상기 제어부는 상기 가속도지령치를 속도지령치로 변환하고, 상기 속도지령치에 의해서 상기 제 2액츄에이터를 제어하는 것을 특징으로 하 는 구동장치.
- 제 10항에 있어서, 상기 제어부는 상기 가속도지령치를 위치지령치로 변환하고, 상기 위치지령치에 의해서 상기 제 2액츄에이터를 제어하는 것을 특징으로 하는 구동장치.
- 제 1항에 있어서, 상기 반력카운터는 상기 제 1액츄에이터의 고정자를 포함하는 것을 특징으로 하는 구동장치.
- 제 1항에 있어서, 상기 제어부는 상기 물체의 속도가 0이 된 상태에 있어서 상기 반력카운터의 속도가 0이 아닌 경우에, 상기 반력카운터를 서서히 감속시키도록 상기 제 2액츄에이터를 제어하는 것을 특징으로 하는 구동장치.
- 척을 가지고, 상기 척 상에 고정된 기판에 패턴을 전사 또는 그리는 노광장치로서, 상기 척이 제 1항에 기재된 구동장치에 의해서 구동되는 것을 특징으로 하는 노광장치.
- 제 15항에 기재된 노광장치를 사용해서 디바이스를 제조하는 것을 특징으로 하는 디바이스 제조방법.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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JPJP-P-2004-00008404 | 2004-01-15 | ||
JP2004008404A JP2005203567A (ja) | 2004-01-15 | 2004-01-15 | 駆動装置、露光装置及びデバイス製造方法 |
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KR20050075288A KR20050075288A (ko) | 2005-07-20 |
KR100625745B1 true KR100625745B1 (ko) | 2006-09-20 |
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KR1020050003146A KR100625745B1 (ko) | 2004-01-15 | 2005-01-13 | 구동장치, 노광장치 및 디바이스 제조방법 |
Country Status (4)
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US (3) | US7215095B2 (ko) |
EP (1) | EP1555576A3 (ko) |
JP (1) | JP2005203567A (ko) |
KR (1) | KR100625745B1 (ko) |
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2004
- 2004-01-15 JP JP2004008404A patent/JP2005203567A/ja active Pending
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2005
- 2005-01-10 US US11/031,021 patent/US7215095B2/en not_active Expired - Fee Related
- 2005-01-11 EP EP05250112A patent/EP1555576A3/en not_active Withdrawn
- 2005-01-13 KR KR1020050003146A patent/KR100625745B1/ko active IP Right Grant
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2007
- 2007-03-23 US US11/690,216 patent/US7385370B2/en not_active Expired - Fee Related
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Also Published As
Publication number | Publication date |
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US20050156552A1 (en) | 2005-07-21 |
US20080122395A1 (en) | 2008-05-29 |
EP1555576A2 (en) | 2005-07-20 |
US7385370B2 (en) | 2008-06-10 |
US7795833B2 (en) | 2010-09-14 |
US7215095B2 (en) | 2007-05-08 |
EP1555576A3 (en) | 2009-03-18 |
US20070194741A1 (en) | 2007-08-23 |
KR20050075288A (ko) | 2005-07-20 |
JP2005203567A (ja) | 2005-07-28 |
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