KR100593429B1 - 수동형 열 보정에 의한 마이크로리소그래피의 투사형노광 장치 및 광학 장치 - Google Patents

수동형 열 보정에 의한 마이크로리소그래피의 투사형노광 장치 및 광학 장치 Download PDF

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Publication number
KR100593429B1
KR100593429B1 KR1019980057360A KR19980057360A KR100593429B1 KR 100593429 B1 KR100593429 B1 KR 100593429B1 KR 1019980057360 A KR1019980057360 A KR 1019980057360A KR 19980057360 A KR19980057360 A KR 19980057360A KR 100593429 B1 KR100593429 B1 KR 100593429B1
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KR
South Korea
Prior art keywords
optical element
exposure apparatus
projection type
type exposure
optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
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KR1019980057360A
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English (en)
Korean (ko)
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KR19990071443A (ko
Inventor
크리스띠앙 바그너
미햐엘 트룬츠
랄프 힐거스
Original Assignee
칼 짜이스 에스엠테 아게
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Publication of KR19990071443A publication Critical patent/KR19990071443A/ko
Application granted granted Critical
Publication of KR100593429B1 publication Critical patent/KR100593429B1/ko
Anticipated expiration legal-status Critical
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
    • G02B7/028—Mountings, adjusting means, or light-tight connections, for optical elements for lenses with means for compensating for changes in temperature or for controlling the temperature; thermal stabilisation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/70108—Off-axis setting using a light-guiding element, e.g. diffractive optical elements [DOEs] or light guides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G03F7/70891—Temperature

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Optics & Photonics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
KR1019980057360A 1998-02-20 1998-12-22 수동형 열 보정에 의한 마이크로리소그래피의 투사형노광 장치 및 광학 장치 Expired - Fee Related KR100593429B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19807094.2 1998-02-20
DE19807094A DE19807094A1 (de) 1998-02-20 1998-02-20 Optische Anordnung und Projektionsbelichtungsanlage der Mikrolithographie mit passiver thermischer Kompensation

Publications (2)

Publication Number Publication Date
KR19990071443A KR19990071443A (ko) 1999-09-27
KR100593429B1 true KR100593429B1 (ko) 2006-10-24

Family

ID=7858359

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019980057360A Expired - Fee Related KR100593429B1 (ko) 1998-02-20 1998-12-22 수동형 열 보정에 의한 마이크로리소그래피의 투사형노광 장치 및 광학 장치

Country Status (5)

Country Link
EP (2) EP0938009B1 (enExample)
JP (1) JPH11287936A (enExample)
KR (1) KR100593429B1 (enExample)
DE (3) DE19807094A1 (enExample)
TW (1) TW401516B (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2021005073A (ja) * 2019-06-25 2021-01-14 キヤノン株式会社 露光装置、露光方法および物品製造方法

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US7274430B2 (en) 1998-02-20 2007-09-25 Carl Zeiss Smt Ag Optical arrangement and projection exposure system for microlithography with passive thermal compensation
DE19956353C1 (de) * 1999-11-24 2001-08-09 Zeiss Carl Optische Anordnung
DE19959741A1 (de) * 1999-12-10 2001-06-13 Zeiss Carl Vorrichtung zur deformationsarmen Lagerung eines optischen Elementes und Verfahren zur deformationsarmen Lagerung des optischen Elementes
DE19963588C2 (de) * 1999-12-29 2002-01-10 Zeiss Carl Optische Anordnung
US6621557B2 (en) 2000-01-13 2003-09-16 Nikon Corporation Projection exposure apparatus and exposure methods
DE10151919B4 (de) * 2001-10-20 2007-02-01 Carl Zeiss Smt Ag Belichtungsobjektiv in der Halbleiterlithographie
EP1310829B1 (en) * 2001-11-07 2007-05-02 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2003218023A (ja) * 2002-01-28 2003-07-31 Nikon Corp Ｘ線反射鏡、ｘ線露光転写装置及び半導体デバイスの製造方法
DE10210893A1 (de) * 2002-03-07 2003-09-18 Zeiss Carl Laser Optics Gmbh Optische Anordnung mit einem optischen Bauelement, insbesondere einer Blende
JP4590205B2 (ja) * 2003-05-14 2010-12-01 キヤノン株式会社 ミラー保持方法、光学装置、露光装置、およびデバイス製造方法
GB0511692D0 (en) 2005-06-08 2005-07-13 Digital Projection Ltd Heat transfer apparatus
DE102006021797A1 (de) * 2006-05-09 2007-11-15 Carl Zeiss Smt Ag Optische Abbildungseinrichtung mit thermischer Dämpfung
GB2451684A (en) * 2007-08-09 2009-02-11 Digital Projection Ltd Heat transfer apparatus for cooling a light valve or digital micro mirror
WO2009124590A1 (en) * 2008-04-09 2009-10-15 Carl Zeiss Smt Ag Optical aperture device
DE102009035788B4 (de) * 2009-07-31 2011-06-30 Carl Zeiss Laser Optics GmbH, 73447 Optische Anordnung in einem optischen System, insbesondere einer Beleuchtungseinrichtung
DE102013203032A1 (de) * 2013-02-25 2014-02-27 Carl Zeiss Smt Gmbh Optische Anordnung mit einem optischen Element und einem zusätzlichen Wärmeleitelement
CN103499865B (zh) * 2013-10-10 2015-07-29 中国科学院上海技术物理研究所 一种具有热应力缓冲结构的滤光片安装支架
DE102015115931B3 (de) * 2015-09-21 2016-10-27 Jenoptik Optical Systems Gmbh Spannungsentkoppelte monolithische Linsenfassung
DE102015115929B3 (de) 2015-09-21 2016-10-06 Jenoptik Optical Systems Gmbh Monolithische Linsenfassung
DE102017217111A1 (de) * 2017-09-26 2019-03-28 Robert Bosch Gmbh Anordnung eines optischen Systems und Entwärmungsverfahren
DE102017217107A1 (de) * 2017-09-26 2019-03-28 Robert Bosch Gmbh Anordnung eines optischen Systems und Entwärmungsverfahren
EP3704546A1 (en) * 2017-10-30 2020-09-09 ASML Holding N.V. Assembly for use in semiconductor photolithography and method of manufacturing same
IL284361B2 (en) * 2021-06-24 2024-08-01 Rafael Advanced Defense Systems Ltd Temperature balanced spacer

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US4057332A (en) * 1976-04-21 1977-11-08 Caterpillar Tractor Co. Peripherally cooled laser lens assembly
JPS56102392A (en) * 1980-01-22 1981-08-15 Nec Corp Laser working optical device
JPH05203884A (ja) * 1992-01-24 1993-08-13 Toshiba Corp 光学素子
KR19980070376A (ko) * 1997-01-08 1998-10-26 갈라스 윌리엄 이 면 냉각 고전력 레이저 광학 셀

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US4155631A (en) * 1977-04-14 1979-05-22 W. J. Schafer Associates, Inc. Apparatus for compensating for thermally introduced distortions in reflecting surfaces
JPS6037632B2 (ja) * 1983-02-15 1985-08-27 株式会社東芝 固体レ−ザ発振装置
JPS59175178A (ja) * 1983-03-24 1984-10-03 Mitsubishi Electric Corp レ−ザ装置
JPS61208002A (ja) * 1985-03-13 1986-09-16 Toshiba Corp 光透過装置
DE69220868T2 (de) 1991-09-07 1997-11-06 Canon K.K., Tokio/Tokyo System zur Stabilisierung der Formen von optischen Elementen, Belichtungsvorrichtung unter Verwendung dieses Systems und Verfahren zur Herstellung von Halbleitervorrichtungen
JP3169267B2 (ja) * 1992-06-17 2001-05-21 パイオニア株式会社 液体プリズム
JP3368091B2 (ja) * 1994-04-22 2003-01-20 キヤノン株式会社 投影露光装置及びデバイスの製造方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4057332A (en) * 1976-04-21 1977-11-08 Caterpillar Tractor Co. Peripherally cooled laser lens assembly
JPS56102392A (en) * 1980-01-22 1981-08-15 Nec Corp Laser working optical device
JPH05203884A (ja) * 1992-01-24 1993-08-13 Toshiba Corp 光学素子
KR19980070376A (ko) * 1997-01-08 1998-10-26 갈라스 윌리엄 이 면 냉각 고전력 레이저 광학 셀

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2021005073A (ja) * 2019-06-25 2021-01-14 キヤノン株式会社 露光装置、露光方法および物品製造方法

Also Published As

Publication number Publication date
DE59912313D1 (de) 2005-09-01
EP1596235A1 (de) 2005-11-16
JPH11287936A (ja) 1999-10-19
EP0938009B1 (de) 2005-07-27
DE59914228D1 (de) 2007-04-12
DE19807094A1 (de) 1999-08-26
EP1596235B1 (de) 2007-02-28
EP0938009A1 (de) 1999-08-25
KR19990071443A (ko) 1999-09-27
TW401516B (en) 2000-08-11

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