JPH11287936A5 - - Google Patents

Info

Publication number
JPH11287936A5
JPH11287936A5 JP1999035932A JP3593299A JPH11287936A5 JP H11287936 A5 JPH11287936 A5 JP H11287936A5 JP 1999035932 A JP1999035932 A JP 1999035932A JP 3593299 A JP3593299 A JP 3593299A JP H11287936 A5 JPH11287936 A5 JP H11287936A5
Authority
JP
Japan
Prior art keywords
optical element
projection exposure
exposure apparatus
heat conduction
thermal contact
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1999035932A
Other languages
English (en)
Japanese (ja)
Other versions
JPH11287936A (ja
Filing date
Publication date
Priority claimed from DE19807094A external-priority patent/DE19807094A1/de
Application filed filed Critical
Publication of JPH11287936A publication Critical patent/JPH11287936A/ja
Publication of JPH11287936A5 publication Critical patent/JPH11287936A5/ja
Pending legal-status Critical Current

Links

JP11035932A 1998-02-20 1999-02-15 受動熱補償を伴う光学構造及びマイクロリソグラフィの投影露光装置 Pending JPH11287936A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19807094.2 1998-02-20
DE19807094A DE19807094A1 (de) 1998-02-20 1998-02-20 Optische Anordnung und Projektionsbelichtungsanlage der Mikrolithographie mit passiver thermischer Kompensation

Publications (2)

Publication Number Publication Date
JPH11287936A JPH11287936A (ja) 1999-10-19
JPH11287936A5 true JPH11287936A5 (enExample) 2006-04-06

Family

ID=7858359

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11035932A Pending JPH11287936A (ja) 1998-02-20 1999-02-15 受動熱補償を伴う光学構造及びマイクロリソグラフィの投影露光装置

Country Status (5)

Country Link
EP (2) EP0938009B1 (enExample)
JP (1) JPH11287936A (enExample)
KR (1) KR100593429B1 (enExample)
DE (3) DE19807094A1 (enExample)
TW (1) TW401516B (enExample)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7274430B2 (en) 1998-02-20 2007-09-25 Carl Zeiss Smt Ag Optical arrangement and projection exposure system for microlithography with passive thermal compensation
DE19956353C1 (de) * 1999-11-24 2001-08-09 Zeiss Carl Optische Anordnung
DE19959741A1 (de) * 1999-12-10 2001-06-13 Zeiss Carl Vorrichtung zur deformationsarmen Lagerung eines optischen Elementes und Verfahren zur deformationsarmen Lagerung des optischen Elementes
DE19963588C2 (de) * 1999-12-29 2002-01-10 Zeiss Carl Optische Anordnung
US6621557B2 (en) 2000-01-13 2003-09-16 Nikon Corporation Projection exposure apparatus and exposure methods
DE10151919B4 (de) * 2001-10-20 2007-02-01 Carl Zeiss Smt Ag Belichtungsobjektiv in der Halbleiterlithographie
EP1310829B1 (en) * 2001-11-07 2007-05-02 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2003218023A (ja) * 2002-01-28 2003-07-31 Nikon Corp Ｘ線反射鏡、ｘ線露光転写装置及び半導体デバイスの製造方法
DE10210893A1 (de) * 2002-03-07 2003-09-18 Zeiss Carl Laser Optics Gmbh Optische Anordnung mit einem optischen Bauelement, insbesondere einer Blende
JP4590205B2 (ja) * 2003-05-14 2010-12-01 キヤノン株式会社 ミラー保持方法、光学装置、露光装置、およびデバイス製造方法
GB0511692D0 (en) 2005-06-08 2005-07-13 Digital Projection Ltd Heat transfer apparatus
DE102006021797A1 (de) * 2006-05-09 2007-11-15 Carl Zeiss Smt Ag Optische Abbildungseinrichtung mit thermischer Dämpfung
GB2451684A (en) * 2007-08-09 2009-02-11 Digital Projection Ltd Heat transfer apparatus for cooling a light valve or digital micro mirror
WO2009124590A1 (en) * 2008-04-09 2009-10-15 Carl Zeiss Smt Ag Optical aperture device
DE102009035788B4 (de) * 2009-07-31 2011-06-30 Carl Zeiss Laser Optics GmbH, 73447 Optische Anordnung in einem optischen System, insbesondere einer Beleuchtungseinrichtung
DE102013203032A1 (de) * 2013-02-25 2014-02-27 Carl Zeiss Smt Gmbh Optische Anordnung mit einem optischen Element und einem zusätzlichen Wärmeleitelement
CN103499865B (zh) * 2013-10-10 2015-07-29 中国科学院上海技术物理研究所 一种具有热应力缓冲结构的滤光片安装支架
DE102015115931B3 (de) * 2015-09-21 2016-10-27 Jenoptik Optical Systems Gmbh Spannungsentkoppelte monolithische Linsenfassung
DE102015115929B3 (de) 2015-09-21 2016-10-06 Jenoptik Optical Systems Gmbh Monolithische Linsenfassung
DE102017217111A1 (de) * 2017-09-26 2019-03-28 Robert Bosch Gmbh Anordnung eines optischen Systems und Entwärmungsverfahren
DE102017217107A1 (de) * 2017-09-26 2019-03-28 Robert Bosch Gmbh Anordnung eines optischen Systems und Entwärmungsverfahren
EP3704546A1 (en) * 2017-10-30 2020-09-09 ASML Holding N.V. Assembly for use in semiconductor photolithography and method of manufacturing same
JP6951498B2 (ja) * 2019-06-25 2021-10-20 キヤノン株式会社 露光装置、露光方法および物品製造方法
IL284361B2 (en) * 2021-06-24 2024-08-01 Rafael Advanced Defense Systems Ltd Temperature balanced spacer

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4057332A (en) * 1976-04-21 1977-11-08 Caterpillar Tractor Co. Peripherally cooled laser lens assembly
US4155631A (en) * 1977-04-14 1979-05-22 W. J. Schafer Associates, Inc. Apparatus for compensating for thermally introduced distortions in reflecting surfaces
JPS56102392A (en) * 1980-01-22 1981-08-15 Nec Corp Laser working optical device
JPS6037632B2 (ja) * 1983-02-15 1985-08-27 株式会社東芝 固体レ−ザ発振装置
JPS59175178A (ja) * 1983-03-24 1984-10-03 Mitsubishi Electric Corp レ−ザ装置
JPS61208002A (ja) * 1985-03-13 1986-09-16 Toshiba Corp 光透過装置
DE69220868T2 (de) 1991-09-07 1997-11-06 Canon K.K., Tokio/Tokyo System zur Stabilisierung der Formen von optischen Elementen, Belichtungsvorrichtung unter Verwendung dieses Systems und Verfahren zur Herstellung von Halbleitervorrichtungen
JPH05203884A (ja) * 1992-01-24 1993-08-13 Toshiba Corp 光学素子
JP3169267B2 (ja) * 1992-06-17 2001-05-21 パイオニア株式会社 液体プリズム
JP3368091B2 (ja) * 1994-04-22 2003-01-20 キヤノン株式会社 投影露光装置及びデバイスの製造方法
US5881088A (en) * 1997-01-08 1999-03-09 Trw Inc. Face-cooled high-power laser optic cell

Similar Documents

Publication Publication Date Title
JPH11287936A5 (enExample)
KR100593429B1 (ko) 수동형 열 보정에 의한 마이크로리소그래피의 투사형노광 장치 및 광학 장치
EP1120690B1 (en) EUV reticle thermal management
CN103038708B (zh) Euv曝光设备
KR101670518B1 (ko) 광학 소자의 온도 제어 장치
KR100716108B1 (ko) 광학 장치
US20080212052A1 (en) Optical arrangement and projection exposure system for microlithography with passive thermal compensation
KR950033690A (ko) 투영노광장치
KR102572139B1 (ko) 리소그래피 장치용 미러를 제조하기 위한 방법
JP2006322981A5 (enExample)
WO2006074812A2 (en) Illumination sytsem for a microlithographic projection exposure apparatus
TW200619860A (en) Lithographic apparatus, an apparatus comprising an illumination system, an apparatus comprising a projection system, an optical element for a lithographic apparatus and device manufacturing method
TWI345139B (en) Lithographic apparatus, device manufacturing method, and device manufactured thereby
KR20160124102A (ko) 특히 마이크로리소그래픽 투영 노광 장치 내의 광학 시스템의 서브조립체
JP6282742B2 (ja) マイクロリソグラフィ投影露光装置及びそのような装置における光学波面変形を補正する方法
US20050105066A1 (en) Lithographic apparatus and device manufacturing method
JP2005532680A5 (enExample)
TW201133151A (en) Method and device for keeping the mask dimensions constant in the mask plane in lithography
JP2007158225A5 (enExample)
KR20220167373A (ko) 광학 시스템의 구성요소
JP6510979B2 (ja) マイクロリソグラフィ投影露光装置の光学系
US11921435B2 (en) Lithographic systems and methods of operating the same
JP2005243904A5 (enExample)
JP2006269941A5 (enExample)
JP5208266B2 (ja) 光学アパーチャ装置