KR100517445B1 - 중성-에이징되고 표면적이 감소된 소수성 실리카 겔 - Google Patents
중성-에이징되고 표면적이 감소된 소수성 실리카 겔 Download PDFInfo
- Publication number
- KR100517445B1 KR100517445B1 KR10-1999-7007674A KR19997007674A KR100517445B1 KR 100517445 B1 KR100517445 B1 KR 100517445B1 KR 19997007674 A KR19997007674 A KR 19997007674A KR 100517445 B1 KR100517445 B1 KR 100517445B1
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- KR
- South Korea
- Prior art keywords
- silica
- silica hydrogel
- hydrophobic silica
- hydrogel
- gel
- Prior art date
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 396
- 239000000377 silicon dioxide Substances 0.000 title claims abstract description 156
- 230000002209 hydrophobic effect Effects 0.000 title claims abstract description 80
- 239000000499 gel Substances 0.000 title claims abstract description 39
- 239000000017 hydrogel Substances 0.000 claims abstract description 98
- 238000000034 method Methods 0.000 claims abstract description 57
- 239000000741 silica gel Substances 0.000 claims abstract description 49
- 229910002027 silica gel Inorganic materials 0.000 claims abstract description 49
- 239000000203 mixture Substances 0.000 claims abstract description 47
- 150000003961 organosilicon compounds Chemical class 0.000 claims abstract description 35
- 239000008119 colloidal silica Substances 0.000 claims abstract description 29
- 239000003960 organic solvent Substances 0.000 claims abstract description 23
- 239000002253 acid Substances 0.000 claims abstract description 19
- 150000007522 mineralic acids Chemical class 0.000 claims abstract description 14
- 230000003197 catalytic effect Effects 0.000 claims abstract description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 34
- 239000002245 particle Substances 0.000 claims description 26
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 19
- 239000002904 solvent Substances 0.000 claims description 15
- UQEAIHBTYFGYIE-UHFFFAOYSA-N hexamethyldisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)C UQEAIHBTYFGYIE-UHFFFAOYSA-N 0.000 claims description 14
- 229910052684 Cerium Inorganic materials 0.000 claims description 12
- 125000004432 carbon atom Chemical group C* 0.000 claims description 11
- 150000001875 compounds Chemical class 0.000 claims description 11
- 229910052742 iron Inorganic materials 0.000 claims description 10
- 239000004215 Carbon black (E152) Substances 0.000 claims description 9
- 238000006243 chemical reaction Methods 0.000 claims description 9
- XSDCTSITJJJDPY-UHFFFAOYSA-N chloro-ethenyl-dimethylsilane Chemical compound C[Si](C)(Cl)C=C XSDCTSITJJJDPY-UHFFFAOYSA-N 0.000 claims description 9
- 229930195733 hydrocarbon Natural products 0.000 claims description 9
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 8
- 238000002156 mixing Methods 0.000 claims description 6
- 125000005375 organosiloxane group Chemical group 0.000 claims description 6
- 230000032683 aging Effects 0.000 claims description 5
- LIKFHECYJZWXFJ-UHFFFAOYSA-N dimethyldichlorosilane Chemical compound C[Si](C)(Cl)Cl LIKFHECYJZWXFJ-UHFFFAOYSA-N 0.000 claims description 5
- 150000001282 organosilanes Chemical class 0.000 claims description 5
- 239000004094 surface-active agent Substances 0.000 claims description 4
- 241000625836 Ochrolechia Species 0.000 claims description 2
- LGWCCQIZIJQENG-UHFFFAOYSA-N chloro-hex-1-enyl-dimethylsilane Chemical compound CCCCC=C[Si](C)(C)Cl LGWCCQIZIJQENG-UHFFFAOYSA-N 0.000 claims description 2
- CHSOOADWBVJAOF-VOTSOKGWSA-N dichloro-[(E)-hex-1-enyl]-methylsilane Chemical compound CCCC\C=C\[Si](C)(Cl)Cl CHSOOADWBVJAOF-VOTSOKGWSA-N 0.000 claims description 2
- YLJJAVFOBDSYAN-UHFFFAOYSA-N dichloro-ethenyl-methylsilane Chemical compound C[Si](Cl)(Cl)C=C YLJJAVFOBDSYAN-UHFFFAOYSA-N 0.000 claims description 2
- 239000012760 heat stabilizer Substances 0.000 claims description 2
- 125000001181 organosilyl group Chemical group [SiH3]* 0.000 claims description 2
- 238000010008 shearing Methods 0.000 claims description 2
- VTHOKNTVYKTUPI-UHFFFAOYSA-N triethoxy-[3-(3-triethoxysilylpropyltetrasulfanyl)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCSSSSCCC[Si](OCC)(OCC)OCC VTHOKNTVYKTUPI-UHFFFAOYSA-N 0.000 claims description 2
- ZMIGMASIKSOYAM-UHFFFAOYSA-N cerium Chemical compound [Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce] ZMIGMASIKSOYAM-UHFFFAOYSA-N 0.000 claims 1
- 125000005843 halogen group Chemical group 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 abstract description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 75
- -1 alkoxy radicals Chemical class 0.000 description 24
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 22
- 239000008367 deionised water Substances 0.000 description 20
- 229910021641 deionized water Inorganic materials 0.000 description 20
- 238000003756 stirring Methods 0.000 description 20
- 239000012071 phase Substances 0.000 description 18
- 229920002379 silicone rubber Polymers 0.000 description 14
- 239000000243 solution Substances 0.000 description 13
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 12
- 239000004115 Sodium Silicate Substances 0.000 description 12
- 239000000047 product Substances 0.000 description 12
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 12
- 229910052911 sodium silicate Inorganic materials 0.000 description 12
- 239000000945 filler Substances 0.000 description 11
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 description 10
- 230000000704 physical effect Effects 0.000 description 10
- 229920001971 elastomer Polymers 0.000 description 7
- 239000004945 silicone rubber Substances 0.000 description 7
- 239000012530 fluid Substances 0.000 description 6
- 238000009826 distribution Methods 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- 239000005060 rubber Substances 0.000 description 5
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- 239000000908 ammonium hydroxide Substances 0.000 description 4
- 239000008346 aqueous phase Substances 0.000 description 4
- 239000003480 eluent Substances 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 229910052736 halogen Inorganic materials 0.000 description 4
- 150000002367 halogens Chemical class 0.000 description 4
- IXCSERBJSXMMFS-UHFFFAOYSA-N hcl hcl Chemical compound Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 150000003254 radicals Chemical group 0.000 description 4
- 230000003014 reinforcing effect Effects 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 239000005046 Chlorosilane Substances 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 230000002378 acidificating effect Effects 0.000 description 3
- 239000002585 base Substances 0.000 description 3
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical class Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 description 3
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 3
- 238000009472 formulation Methods 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- 230000007935 neutral effect Effects 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 3
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 3
- 229920002554 vinyl polymer Polymers 0.000 description 3
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- 244000043261 Hevea brasiliensis Species 0.000 description 2
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 239000003377 acid catalyst Substances 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 238000005119 centrifugation Methods 0.000 description 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
- IJOOHPMOJXWVHK-UHFFFAOYSA-N chlorotrimethylsilane Chemical compound C[Si](C)(C)Cl IJOOHPMOJXWVHK-UHFFFAOYSA-N 0.000 description 2
- BYLOHCRAPOSXLY-UHFFFAOYSA-N dichloro(diethyl)silane Chemical compound CC[Si](Cl)(Cl)CC BYLOHCRAPOSXLY-UHFFFAOYSA-N 0.000 description 2
- 239000004205 dimethyl polysiloxane Substances 0.000 description 2
- 239000000806 elastomer Substances 0.000 description 2
- 239000012467 final product Substances 0.000 description 2
- 230000002431 foraging effect Effects 0.000 description 2
- 230000007062 hydrolysis Effects 0.000 description 2
- 238000006460 hydrolysis reaction Methods 0.000 description 2
- 230000003301 hydrolyzing effect Effects 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 2
- 229920003052 natural elastomer Polymers 0.000 description 2
- 229920001194 natural rubber Polymers 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 2
- 150000008117 polysulfides Polymers 0.000 description 2
- 239000011148 porous material Substances 0.000 description 2
- 238000010992 reflux Methods 0.000 description 2
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- 239000012763 reinforcing filler Substances 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 1
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 description 1
- YQJPWWLJDNCSCN-UHFFFAOYSA-N 1,3-diphenyltetramethyldisiloxane Chemical compound C=1C=CC=CC=1[Si](C)(C)O[Si](C)(C)C1=CC=CC=C1 YQJPWWLJDNCSCN-UHFFFAOYSA-N 0.000 description 1
- DURPTKYDGMDSBL-UHFFFAOYSA-N 1-butoxybutane Chemical compound CCCCOCCCC DURPTKYDGMDSBL-UHFFFAOYSA-N 0.000 description 1
- CMCBDXRRFKYBDG-UHFFFAOYSA-N 1-dodecoxydodecane Chemical compound CCCCCCCCCCCCOCCCCCCCCCCCC CMCBDXRRFKYBDG-UHFFFAOYSA-N 0.000 description 1
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 1
- WBIQQQGBSDOWNP-UHFFFAOYSA-N 2-dodecylbenzenesulfonic acid Chemical compound CCCCCCCCCCCCC1=CC=CC=C1S(O)(=O)=O WBIQQQGBSDOWNP-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- IKYAJDOSWUATPI-UHFFFAOYSA-N 3-[dimethoxy(methyl)silyl]propane-1-thiol Chemical compound CO[Si](C)(OC)CCCS IKYAJDOSWUATPI-UHFFFAOYSA-N 0.000 description 1
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonium chloride Substances [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 1
- KXDHJXZQYSOELW-UHFFFAOYSA-N Carbamic acid Chemical compound NC(O)=O KXDHJXZQYSOELW-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910002492 Ce(NO3)3·6H2O Inorganic materials 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
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- SNRUBQQJIBEYMU-UHFFFAOYSA-N Dodecane Natural products CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 1
- 239000004944 Liquid Silicone Rubber Substances 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
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- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 1
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- 239000012190 activator Substances 0.000 description 1
- 238000013019 agitation Methods 0.000 description 1
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- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 125000003368 amide group Chemical group 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 235000019270 ammonium chloride Nutrition 0.000 description 1
- 239000003945 anionic surfactant Substances 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 150000005840 aryl radicals Chemical class 0.000 description 1
- 239000003637 basic solution Substances 0.000 description 1
- SRSXLGNVWSONIS-UHFFFAOYSA-N benzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-N 0.000 description 1
- 229940092714 benzenesulfonic acid Drugs 0.000 description 1
- SNAFCWIFMFKILC-UHFFFAOYSA-N bis(ethenyl)-dipropoxysilane Chemical compound CCCO[Si](C=C)(C=C)OCCC SNAFCWIFMFKILC-UHFFFAOYSA-N 0.000 description 1
- YTJUXOIAXOQWBV-UHFFFAOYSA-N butoxy(trimethyl)silane Chemical compound CCCCO[Si](C)(C)C YTJUXOIAXOQWBV-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000003093 cationic surfactant Substances 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- QABCGOSYZHCPGN-UHFFFAOYSA-N chloro(dimethyl)silicon Chemical compound C[Si](C)Cl QABCGOSYZHCPGN-UHFFFAOYSA-N 0.000 description 1
- 125000004218 chloromethyl group Chemical group [H]C([H])(Cl)* 0.000 description 1
- 229910000423 chromium oxide Inorganic materials 0.000 description 1
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- 150000001924 cycloalkanes Chemical class 0.000 description 1
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- OHABWQNEJUUFAV-UHFFFAOYSA-N dichloro-methyl-(3,3,3-trifluoropropyl)silane Chemical compound C[Si](Cl)(Cl)CCC(F)(F)F OHABWQNEJUUFAV-UHFFFAOYSA-N 0.000 description 1
- APGQQLCRLIBICD-UHFFFAOYSA-N dichloro-methyl-pentylsilane Chemical compound CCCCC[Si](C)(Cl)Cl APGQQLCRLIBICD-UHFFFAOYSA-N 0.000 description 1
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- YCEQUKAYVABWTE-UHFFFAOYSA-N dichloro-methyl-prop-2-enylsilane Chemical compound C[Si](Cl)(Cl)CC=C YCEQUKAYVABWTE-UHFFFAOYSA-N 0.000 description 1
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- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
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- 150000002170 ethers Chemical class 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
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- 125000000524 functional group Chemical group 0.000 description 1
- QFWPJPIVLCBXFJ-UHFFFAOYSA-N glymidine Chemical compound N1=CC(OCCOC)=CN=C1NS(=O)(=O)C1=CC=CC=C1 QFWPJPIVLCBXFJ-UHFFFAOYSA-N 0.000 description 1
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- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
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- 125000006038 hexenyl group Chemical group 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
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- 239000001257 hydrogen Substances 0.000 description 1
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- 230000005499 meniscus Effects 0.000 description 1
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- POPACFLNWGUDSR-UHFFFAOYSA-N methoxy(trimethyl)silane Chemical compound CO[Si](C)(C)C POPACFLNWGUDSR-UHFFFAOYSA-N 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 239000002736 nonionic surfactant Substances 0.000 description 1
- HMMGMWAXVFQUOA-UHFFFAOYSA-N octamethylcyclotetrasiloxane Chemical compound C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O1 HMMGMWAXVFQUOA-UHFFFAOYSA-N 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 150000002902 organometallic compounds Chemical class 0.000 description 1
- 238000005191 phase separation Methods 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920001021 polysulfide Polymers 0.000 description 1
- 239000005077 polysulfide Substances 0.000 description 1
- KWYUFKZDYYNOTN-UHFFFAOYSA-M potassium hydroxide Substances [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- 125000002572 propoxy group Chemical group [*]OC([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 150000003856 quaternary ammonium compounds Chemical class 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 239000012744 reinforcing agent Substances 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 229930195734 saturated hydrocarbon Natural products 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 150000004760 silicates Chemical class 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 238000010561 standard procedure Methods 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- IKRMQEUTISXXQP-UHFFFAOYSA-N tetrasulfane Chemical compound SSSS IKRMQEUTISXXQP-UHFFFAOYSA-N 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- WILBTFWIBAOWLN-UHFFFAOYSA-N triethyl(triethylsilyloxy)silane Chemical compound CC[Si](CC)(CC)O[Si](CC)(CC)CC WILBTFWIBAOWLN-UHFFFAOYSA-N 0.000 description 1
- JZQGWNPHDJYISY-UHFFFAOYSA-N trimethyl-[methyl(phenyl)silyl]oxysilane Chemical compound C[SiH](O[Si](C)(C)C)c1ccccc1 JZQGWNPHDJYISY-UHFFFAOYSA-N 0.000 description 1
- 239000005051 trimethylchlorosilane Substances 0.000 description 1
- 125000000026 trimethylsilyl group Chemical group [H]C([H])([H])[Si]([*])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 229930195735 unsaturated hydrocarbon Natural products 0.000 description 1
- 239000011800 void material Substances 0.000 description 1
- 239000003039 volatile agent Substances 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
- C01B33/157—After-treatment of gels
- C01B33/159—Coating or hydrophobisation
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
- C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
- C09C1/28—Compounds of silicon
- C09C1/30—Silicic acid
- C09C1/3081—Treatment with organo-silicon compounds
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/16—Preparation of silica xerogels
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/64—Nanometer sized, i.e. from 1-100 nanometer
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/12—Surface area
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/14—Pore volume
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/16—Pore diameter
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/22—Rheological behaviour as dispersion, e.g. viscosity, sedimentation stability
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/80—Compositional purity
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/90—Other properties not specified above
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
- Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]
- Y10T428/2991—Coated
- Y10T428/2993—Silicic or refractory material containing [e.g., tungsten oxide, glass, cement, etc.]
- Y10T428/2995—Silane, siloxane or silicone coating
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Nanotechnology (AREA)
- Dispersion Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Composite Materials (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Materials Engineering (AREA)
- Crystallography & Structural Chemistry (AREA)
- Physics & Mathematics (AREA)
- Silicon Compounds (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Solid-Sorbent Or Filter-Aiding Compositions (AREA)
Abstract
Description
Claims (26)
- (A) (i) 밀리리터당 0.02 내지 0.5g의 SiO2를 포함하고 평균 입경이 4㎚ 미만인 실리카 하이드로졸 및 (ii) 평균 입경이 4㎚ 이상인 콜로이드성 실리카 0.1 내지 50 중량%를 포함하는 혼합물을, 20 내지 250℃의 온도범위에서 pH 1 미만의 강 무기산과 접촉시켜 콜로이드성 실리카가 도입되어 있는 실리카 하이드로겔을 제조하는 단계,(B) 상기 실리카 하이드로겔을 10분 내지 76시간 동안 3.5 내지 8의 pH에서 에이징시키는 단계,(C) 상기 실리카 하이드로겔을 (1) 촉매량의 강산 및 (2) 하기 화학식 1의 유기실란 및 하기 화학식 2의 유기실록산으로 이루어진 군으로부터 선택된 유기규소 화합물과 함께 혼합하여, 건조 상태에서 측정시 표면적이 100 내지 450㎡/g인 소수성 실리카 겔을 제조하는 단계를 포함하는, 중성-에이징된 소수성 실리카 겔의 제조방법:화학식 1R1 aHbSiX4-a-b화학식 2R1 nSiO(4-n)/2상기 식에서,R1은 각각 독립적으로 탄소수 1 내지 12의 탄화수소 라디칼 및 탄소수 1 내지 12의 유기작용성 탄화수소 라디칼로 이루어진 군으로부터 선택되고,X는 각각 독립적으로 할로겐 원자 및 탄소수 1 내지 12의 알콕시 라디칼로 이루어진 군으로부터 선택되고,a는 0, 1, 2 또는 3이고,b는 0 또는 1이고,a+b는 1, 2, 또는 3이고,단, b가 1인 경우 a+b는 2 또는 3이고,n은 2 내지 3의 정수이다.
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- 제 1 항에 있어서,실리카 하이드로겔이 0 내지 250℃의 온도에서 에이징되는 방법.
- 삭제
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- 제 1 항 또는 제 7 항에 있어서,단계(C)의 수행 전 단계(B)의 실리카 하이드로겔을 전단(shearing)시키는 단계를 추가로 포함하는 방법.
- 제 1 항 또는 제 7 항에 있어서,단계(C)의 혼합이 30 내지 150℃의 온도에서 수행되는 방법.
- 제 1 항 또는 제 7 항에 있어서,유기규소 화합물이 헥사메틸디실록산인 방법.
- 삭제
- 제 1 항 또는 제 7 항에 있어서,유기규소 화합물이 디메틸디클로로실란, 비닐메틸디클로로실란, 비닐디메틸클로로실란, 헥세닐메틸디클로로실란, 헥세닐디메틸클로로실란, 디메틸디클로로실란 및 비스{3-(트리에톡시실릴)프로필}테트라설파이드로 이루어진 군으로부터 선택된 유기실란인 방법.
- 삭제
- 제 1 항 또는 제 7 항에 있어서,유기규소 화합물이 실리카 하이드로겔의 SiO2 단위 당 0.04개 이상의 유기실릴 단위를 제공하는 방법.
- 제 1 항 또는 제 7 항에 있어서,소수성 실리카 하이드로겔을 소수성 실리카 유기 겔로 전환시키기에 충분한 양의 수-불혼화성 유기 용매와 접촉시키는 단계를 추가로 포함하는 방법.
- 제 1 항 또는 제 7 항에 있어서,단계(C)의 혼합 동안 실리카 하이드로겔과 유기규소 화합물의 반응을 용이하게 하는 계면활성제의 존재를 추가로 포함하는 방법.
- 제 1 항 또는 제 7 항에 있어서,단계(C)의 혼합 동안 실리카 하이드로겔과 유기규소 화합물의 반응을 용이하게 하는 수-혼화성 용매의 존재를 추가로 포함하는 방법.
- 제 1 항 또는 제 7 항에 있어서,세륨 및 철의 수용성 화합물로 이루어진 군으로부터 선택된 효과량의 열 안정화제와 실리카 하이드로겔을 혼합하는 단계를 추가로 포함하는 방법.
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Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
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US80509797A | 1997-02-24 | 1997-02-24 | |
US8/805,097 | 1997-02-24 | ||
US08/805,097 | 1997-02-24 | ||
PCT/US1998/003311 WO1998037014A1 (en) | 1997-02-24 | 1998-02-18 | Neutral-aged hydrophobic silica gels with reduced surface area |
Publications (2)
Publication Number | Publication Date |
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KR20000075613A KR20000075613A (ko) | 2000-12-26 |
KR100517445B1 true KR100517445B1 (ko) | 2005-09-29 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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KR10-1999-7007674A KR100517445B1 (ko) | 1997-02-24 | 1998-02-18 | 중성-에이징되고 표면적이 감소된 소수성 실리카 겔 |
Country Status (11)
Country | Link |
---|---|
US (1) | US6107351A (ko) |
EP (1) | EP0963342B1 (ko) |
JP (1) | JP3394048B2 (ko) |
KR (1) | KR100517445B1 (ko) |
CN (1) | CN1248220A (ko) |
AU (1) | AU6178498A (ko) |
BR (1) | BR9807718A (ko) |
CA (1) | CA2280909C (ko) |
DE (1) | DE69813191T2 (ko) |
TW (1) | TW467867B (ko) |
WO (1) | WO1998037014A1 (ko) |
Families Citing this family (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE19648798C2 (de) * | 1996-11-26 | 1998-11-19 | Hoechst Ag | Verfahren zur Herstellung von organisch modifizierten Aerogelen durch Oberflächenmodifikation des wäßrigen Gels (ohne vorherigen Lösungsmitteltausch) und anschließender Trocknung |
US6051672A (en) * | 1998-08-24 | 2000-04-18 | Dow Corning Corporation | Method for making hydrophobic non-aggregated colloidal silica |
US6972301B2 (en) * | 2002-06-06 | 2005-12-06 | Sasol North America Inc. | Process for producing organically modified metal oxides and products thereof |
US8435474B2 (en) | 2006-09-15 | 2013-05-07 | Cabot Corporation | Surface-treated metal oxide particles |
US8202502B2 (en) | 2006-09-15 | 2012-06-19 | Cabot Corporation | Method of preparing hydrophobic silica |
US8455165B2 (en) | 2006-09-15 | 2013-06-04 | Cabot Corporation | Cyclic-treated metal oxide |
US20080070146A1 (en) | 2006-09-15 | 2008-03-20 | Cabot Corporation | Hydrophobic-treated metal oxide |
DE102007023103A1 (de) * | 2007-05-16 | 2008-11-20 | Evonik Degussa Gmbh | Siliciumdioxid-Dispersion und Verfahren zur Beschichtung von Substraten |
EP2110414A1 (de) * | 2008-04-18 | 2009-10-21 | Nanoresins AG | Oberflächenmodifizierte Siliziumdioxid-Partikel |
AU2012258092B2 (en) | 2011-05-13 | 2015-08-20 | Merck Patent Gmbh | Process for producing inorganic particulate material |
US10577250B2 (en) | 2011-05-13 | 2020-03-03 | Merck Patent Gmbh | Process for producing of inorganic particulate material |
WO2018213050A1 (en) | 2017-05-15 | 2018-11-22 | Saudi Arabian Oil Company | Composition and method for water and gas shut-off in subterranean formations |
CN111194344B (zh) * | 2017-05-15 | 2022-08-30 | 沙特阿拉伯石油公司 | 用于地下地层中的水和气体封堵的组合物和方法 |
CN108863612A (zh) * | 2018-09-12 | 2018-11-23 | 蚌埠市瑞丰现代农业种植专业合作社 | 一种高产绿色水稻专用复合肥制备方法 |
JP2022530184A (ja) * | 2019-03-25 | 2022-06-28 | ビーエーエスエフ ソシエタス・ヨーロピア | 多孔質シリカを疎水化するための新規な方法 |
WO2021046294A1 (en) | 2019-09-05 | 2021-03-11 | Saudi Arabian Oil Company | Propping open hydraulic fractures |
CN110589839B (zh) * | 2019-09-23 | 2021-02-23 | 东莞创利科技发展有限公司 | 一种二氧化硅增强剂及其制备方法和应用 |
CN111252773B (zh) * | 2020-01-16 | 2023-01-06 | 刘文治 | 一种焚烧含硅灰渣的资源化处理生产无钠硅溶胶的方法 |
US11802232B2 (en) | 2021-03-10 | 2023-10-31 | Saudi Arabian Oil Company | Polymer-nanofiller hydrogels |
CN113388080B (zh) * | 2021-06-21 | 2022-10-28 | 台州泰捷化工科技有限公司 | 一种医用硅胶防滑带 |
US11708521B2 (en) | 2021-12-14 | 2023-07-25 | Saudi Arabian Oil Company | Rigless method for selective zonal isolation in subterranean formations using polymer gels |
US11572761B1 (en) | 2021-12-14 | 2023-02-07 | Saudi Arabian Oil Company | Rigless method for selective zonal isolation in subterranean formations using colloidal silica |
US12158053B2 (en) | 2021-12-14 | 2024-12-03 | Saudi Arabian Oil Company | Selective zonal isolation |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3122520A (en) * | 1959-10-05 | 1964-02-25 | Dow Corning | Method of making silicone rubber fillers |
Family Cites Families (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2441422A (en) * | 1945-02-10 | 1948-05-11 | Gen Electric | Organosilicon-silica sols, gels, and aerogels |
GB783868A (en) * | 1954-10-06 | 1957-10-02 | Midland Silicones Ltd | A process of preparing hydrophobic organo-silicon powders |
US3015645A (en) * | 1954-10-06 | 1962-01-02 | Dow Corning | Silica powders |
US2802850A (en) * | 1954-11-01 | 1957-08-13 | Gen Electric | Hydrophobic silicas |
US2892797A (en) * | 1956-02-17 | 1959-06-30 | Du Pont | Process for modifying the properties of a silica sol and product thereof |
US3024126A (en) * | 1960-06-15 | 1962-03-06 | Dow Corning | Method of treating reinforcing silica |
BE633180A (ko) * | 1962-06-04 | |||
DE1963439A1 (de) * | 1969-12-18 | 1971-06-24 | Dynamit Nobel Ag | Verfahren zur Herstellung poroeser Kieselsaeure |
US4006175A (en) * | 1969-12-18 | 1977-02-01 | Dynamit Nobel Aktiengesellschaft | Porous silicic acid and its production |
US3810843A (en) * | 1971-05-28 | 1974-05-14 | Gen Electric | Silicone-silica compositions |
US3979546A (en) * | 1971-12-30 | 1976-09-07 | Sws Silicones Corporation | Alkoxysiloxanol modified surfaces |
DE2435860B2 (de) * | 1974-07-25 | 1977-10-20 | Deutsche Gold- U. Silber-Scheideanstalt, Vorm. Roessler, 6000 Frankfurt | Verfahren zur herstellung von feinteiligen hydrophoben kieselsaeuren oder silicaten |
US4316807A (en) * | 1978-04-03 | 1982-02-23 | W. R. Grace & Co. | Viscosifying agent |
US4208316A (en) * | 1978-06-29 | 1980-06-17 | Deutsche Gold- Und Silber-Scheideanstalt Vormals Roessler | Hydrophobic precipitated silicic acid and compositions containing same |
DE3005137A1 (de) * | 1980-02-12 | 1981-08-20 | Degussa Ag, 6000 Frankfurt | Cerhaltige faellungskieselsaeure, verfahren zu deren herstellung, sowie zu elastomeren haertbare massen, die die cerhaltige faellungskieselsaeure enthalten |
US4950502A (en) * | 1987-09-10 | 1990-08-21 | Dow Corning Corporation | Method of hydrophobing silica |
US4985477A (en) * | 1988-05-13 | 1991-01-15 | Dow Corning Corporation | Method of producing treated silica filler for silicone rubber |
US5565142A (en) * | 1992-04-01 | 1996-10-15 | Deshpande; Ravindra | Preparation of high porosity xerogels by chemical surface modification. |
DE4422912A1 (de) * | 1994-06-30 | 1996-01-11 | Hoechst Ag | Xerogele, Verfahren zu ihrer Herstellung, sowie ihre Verwendung |
US5807501A (en) * | 1997-02-20 | 1998-09-15 | Dow Corning Corporation | Neutral-aged hydrophobic organosilicate-modified silica gels |
US5789514A (en) * | 1997-02-24 | 1998-08-04 | Dow Corning Corporation | Method for preparing hydrophobic silica gels |
-
1998
- 1998-02-18 DE DE69813191T patent/DE69813191T2/de not_active Expired - Lifetime
- 1998-02-18 WO PCT/US1998/003311 patent/WO1998037014A1/en active IP Right Grant
- 1998-02-18 BR BR9807718-0A patent/BR9807718A/pt not_active Application Discontinuation
- 1998-02-18 EP EP98906599A patent/EP0963342B1/en not_active Expired - Lifetime
- 1998-02-18 CN CN98802756A patent/CN1248220A/zh active Pending
- 1998-02-18 AU AU61784/98A patent/AU6178498A/en not_active Abandoned
- 1998-02-18 KR KR10-1999-7007674A patent/KR100517445B1/ko not_active IP Right Cessation
- 1998-02-18 CA CA002280909A patent/CA2280909C/en not_active Expired - Lifetime
- 1998-02-18 JP JP53689298A patent/JP3394048B2/ja not_active Expired - Lifetime
- 1998-02-20 TW TW087102453A patent/TW467867B/zh not_active IP Right Cessation
- 1998-02-23 US US09/028,038 patent/US6107351A/en not_active Expired - Lifetime
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3122520A (en) * | 1959-10-05 | 1964-02-25 | Dow Corning | Method of making silicone rubber fillers |
Also Published As
Publication number | Publication date |
---|---|
DE69813191D1 (de) | 2003-05-15 |
CN1248220A (zh) | 2000-03-22 |
BR9807718A (pt) | 2000-02-15 |
JP2000512974A (ja) | 2000-10-03 |
DE69813191T2 (de) | 2004-02-05 |
TW467867B (en) | 2001-12-11 |
EP0963342B1 (en) | 2003-04-09 |
WO1998037014A1 (en) | 1998-08-27 |
CA2280909A1 (en) | 1998-08-27 |
EP0963342A1 (en) | 1999-12-15 |
AU6178498A (en) | 1998-09-09 |
JP3394048B2 (ja) | 2003-04-07 |
CA2280909C (en) | 2007-11-13 |
US6107351A (en) | 2000-08-22 |
KR20000075613A (ko) | 2000-12-26 |
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