KR100449309B1 - 폴리실옥산광안정화제 - Google Patents
폴리실옥산광안정화제 Download PDFInfo
- Publication number
- KR100449309B1 KR100449309B1 KR1019960023193A KR19960023193A KR100449309B1 KR 100449309 B1 KR100449309 B1 KR 100449309B1 KR 1019960023193 A KR1019960023193 A KR 1019960023193A KR 19960023193 A KR19960023193 A KR 19960023193A KR 100449309 B1 KR100449309 B1 KR 100449309B1
- Authority
- KR
- South Korea
- Prior art keywords
- alkyl
- hydrogen
- phenyl
- tert
- formula
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/38—Polysiloxanes modified by chemical after-treatment
- C08G77/382—Polysiloxanes modified by chemical after-treatment containing atoms other than carbon, hydrogen, oxygen or silicon
- C08G77/388—Polysiloxanes modified by chemical after-treatment containing atoms other than carbon, hydrogen, oxygen or silicon containing nitrogen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/38—Polysiloxanes modified by chemical after-treatment
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/54—Silicon-containing compounds
- C08K5/544—Silicon-containing compounds containing nitrogen
- C08K5/5477—Silicon-containing compounds containing nitrogen containing nitrogen in a heterocyclic ring
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L101/00—Compositions of unspecified macromolecular compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L2201/00—Properties
- C08L2201/08—Stabilised against heat, light or radiation or oxydation
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Silicon Polymers (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CH185495 | 1995-06-23 | ||
| CH95/1854 | 1995-06-23 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR970001420A KR970001420A (ko) | 1997-01-24 |
| KR100449309B1 true KR100449309B1 (ko) | 2004-12-08 |
Family
ID=4220166
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1019960023193A Expired - Fee Related KR100449309B1 (ko) | 1995-06-23 | 1996-06-19 | 폴리실옥산광안정화제 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US5837792A (enExample) |
| EP (1) | EP0750011B1 (enExample) |
| JP (1) | JP3700066B2 (enExample) |
| KR (1) | KR100449309B1 (enExample) |
| CA (1) | CA2179697A1 (enExample) |
| DE (1) | DE59608106D1 (enExample) |
| TW (1) | TW325490B (enExample) |
| ZA (1) | ZA965278B (enExample) |
Families Citing this family (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19628017A1 (de) * | 1996-07-11 | 1998-01-15 | Wacker Chemie Gmbh | Permanente Organosiliciumverbindungen, deren Herstellung und Verwendung |
| FR2752582B1 (fr) * | 1996-08-21 | 2003-06-13 | Rhone Poulenc Chimie | Compositions a base de polyorganosiloxanes a groupements fonctionnels reticulables et leur utilisation pour la realisation de revetements anti-adherents |
| EP1305320B1 (en) | 2000-08-03 | 2006-05-31 | Ciba SC Holding AG | Photostable, silylated benzotriazole uv absorbers and compositions stabilized therewith |
| US6803395B2 (en) * | 2001-11-15 | 2004-10-12 | Xerox Corporation | Photoprotective and lightfastness-enhancing siloxanes |
| US6861458B2 (en) * | 2001-11-15 | 2005-03-01 | Xerox Corporation | Photoprotective and lightfastness-enhancing siloxanes |
| JP2006513291A (ja) * | 2003-01-09 | 2006-04-20 | アルコン,インコーポレイテッド | 眼科用レンズ材料のための二重機能性uv吸収材 |
| US20050188773A1 (en) * | 2004-02-27 | 2005-09-01 | Fox Richard B. | High volume air sampler |
| JP4882261B2 (ja) * | 2004-03-31 | 2012-02-22 | 住友化学株式会社 | 高分子錯体化合物およびそれを用いた高分子発光素子 |
| EP1749859B1 (en) * | 2004-05-07 | 2019-09-11 | Kaneka Corporation | Curable composition |
| DE102005004706A1 (de) * | 2005-02-02 | 2006-08-10 | Goldschmidt Gmbh | UV-Licht absorbierende quaternäre Polysiloxane |
| CN101156096B (zh) * | 2005-03-31 | 2010-09-01 | 株式会社日本触媒 | 偏振镜保护薄膜、偏振片、及图像显示装置 |
| JP4875314B2 (ja) * | 2005-03-31 | 2012-02-15 | 東レ・ダウコーニング株式会社 | 有機変性シリコーンの製造方法 |
| JP4730886B2 (ja) * | 2005-06-01 | 2011-07-20 | 信越化学工業株式会社 | 紫外線吸収性基含有オルガノポリシロキサン、該ポリシロキサンの製造方法、及び該ポリシロキサンを配合してなる処理剤 |
| KR101416030B1 (ko) * | 2006-12-22 | 2014-07-08 | 주식회사 동진쎄미켐 | 유기반사방지막 형성용 폴리머 및 이를 포함하는 조성물 |
| CN102292397B (zh) | 2009-01-19 | 2014-12-10 | 巴斯夫欧洲公司 | 有机黑色颜料及其制备 |
| JP6351062B2 (ja) * | 2014-02-27 | 2018-07-04 | インテル・コーポレーション | 硬化性エポキシ組成物、フィルム、積層フィルム、プリプレグ、積層体、硬化物、及び複合体 |
| TWI688609B (zh) * | 2014-11-13 | 2020-03-21 | 美商道康寧公司 | 含硫聚有機矽氧烷組成物及相關態樣 |
| JP6497697B2 (ja) * | 2015-01-30 | 2019-04-10 | 関西ペイント株式会社 | 常温硬化性の耐候性塗料組成物 |
| CN110621751B (zh) * | 2017-03-29 | 2022-05-10 | 埃肯有机硅法国简易股份公司 | 可用于部件的包覆模塑的聚加成交联性有机硅组合物 |
| CN120518952A (zh) * | 2025-07-10 | 2025-08-22 | 东莞市宇捷实业投资有限公司 | 一种耐老化回收pp复合材料及其制备方法 |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2044272B (en) | 1979-02-05 | 1983-03-16 | Sandoz Ltd | Stabilising polymers |
| US4923914A (en) * | 1988-04-14 | 1990-05-08 | Kimberly-Clark Corporation | Surface-segregatable, melt-extrudable thermoplastic composition |
| US4859759A (en) * | 1988-04-14 | 1989-08-22 | Kimberly-Clark Corporation | Siloxane containing benzotriazolyl/tetraalkylpiperidyl substituent |
| FR2635780B1 (fr) * | 1988-08-04 | 1990-12-14 | Rhone Poulenc Chimie | Diorganopolysiloxane a fonction benzotriazole |
| JPH02243695A (ja) * | 1989-03-16 | 1990-09-27 | Shin Etsu Chem Co Ltd | 有機ケイ素化合物 |
| US5175312A (en) | 1989-08-31 | 1992-12-29 | Ciba-Geigy Corporation | 3-phenylbenzofuran-2-ones |
| DE69030362T2 (de) | 1989-12-05 | 1997-10-23 | Ciba Geigy Ag | Stabilisiertes organisches Material |
| US5198498A (en) * | 1990-02-06 | 1993-03-30 | Ciba-Geigy Corporation | Light-stabilized binders for coating compositions |
| EP0502821B1 (de) * | 1991-03-05 | 1996-01-31 | Ciba-Geigy Ag | Silylierte 2-(2-Hydroxyphenyl)-4,6-diaryl-1,3,5-triazine |
| EP0530135A1 (de) * | 1991-06-03 | 1993-03-03 | Ciba-Geigy Ag | UV-Absorber enthaltendes photographisches Material |
| EP0520938B1 (de) * | 1991-06-03 | 1997-09-24 | Ciba SC Holding AG | UV-Absorber enthaltendes photographisches Material |
| TW206220B (enExample) | 1991-07-01 | 1993-05-21 | Ciba Geigy Ag | |
| US5252643A (en) | 1991-07-01 | 1993-10-12 | Ciba-Geigy Corporation | Thiomethylated benzofuran-2-ones |
| EP0526399B1 (de) * | 1991-07-29 | 1995-09-27 | Ciba SC Holding AG | Lichtstabilisierte Copolymer-Zusammensetzungen als Bindemittel für Lacke |
| EP0531258B1 (de) * | 1991-09-05 | 1997-09-10 | Ciba SC Holding AG | UV-Absorber enthaltendes photographisches Material |
| TW260686B (enExample) | 1992-05-22 | 1995-10-21 | Ciba Geigy | |
| GB2267490B (en) | 1992-05-22 | 1995-08-09 | Ciba Geigy Ag | 3-(Carboxymethoxyphenyl)benzofuran-2-one stabilisers |
| MX9305489A (es) | 1992-09-23 | 1994-03-31 | Ciba Geigy Ag | 3-(dihidrobenzofuran-5-il)benzofuran-2-onas, estabilizadores. |
| TW255902B (enExample) | 1992-09-23 | 1995-09-01 | Ciba Geigy |
-
1996
- 1996-06-11 TW TW085106992A patent/TW325490B/zh active
- 1996-06-13 US US08/662,578 patent/US5837792A/en not_active Expired - Lifetime
- 1996-06-14 DE DE59608106T patent/DE59608106D1/de not_active Expired - Lifetime
- 1996-06-14 EP EP96810400A patent/EP0750011B1/de not_active Expired - Lifetime
- 1996-06-19 KR KR1019960023193A patent/KR100449309B1/ko not_active Expired - Fee Related
- 1996-06-21 ZA ZA965278A patent/ZA965278B/xx unknown
- 1996-06-21 CA CA002179697A patent/CA2179697A1/en not_active Abandoned
- 1996-06-24 JP JP18279296A patent/JP3700066B2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0912725A (ja) | 1997-01-14 |
| US5837792A (en) | 1998-11-17 |
| DE59608106D1 (de) | 2001-12-13 |
| TW325490B (en) | 1998-01-21 |
| EP0750011A1 (de) | 1996-12-27 |
| EP0750011B1 (de) | 2001-11-07 |
| JP3700066B2 (ja) | 2005-09-28 |
| ZA965278B (en) | 1996-12-23 |
| KR970001420A (ko) | 1997-01-24 |
| CA2179697A1 (en) | 1996-12-24 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PA0109 | Patent application |
St.27 status event code: A-0-1-A10-A12-nap-PA0109 |
|
| R17-X000 | Change to representative recorded |
St.27 status event code: A-3-3-R10-R17-oth-X000 |
|
| R17-X000 | Change to representative recorded |
St.27 status event code: A-3-3-R10-R17-oth-X000 |
|
| PG1501 | Laying open of application |
St.27 status event code: A-1-1-Q10-Q12-nap-PG1501 |
|
| N231 | Notification of change of applicant | ||
| PN2301 | Change of applicant |
St.27 status event code: A-3-3-R10-R13-asn-PN2301 St.27 status event code: A-3-3-R10-R11-asn-PN2301 |
|
| A201 | Request for examination | ||
| P11-X000 | Amendment of application requested |
St.27 status event code: A-2-2-P10-P11-nap-X000 |
|
| P13-X000 | Application amended |
St.27 status event code: A-2-2-P10-P13-nap-X000 |
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| PA0201 | Request for examination |
St.27 status event code: A-1-2-D10-D11-exm-PA0201 |
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| E902 | Notification of reason for refusal | ||
| PE0902 | Notice of grounds for rejection |
St.27 status event code: A-1-2-D10-D21-exm-PE0902 |
|
| T11-X000 | Administrative time limit extension requested |
St.27 status event code: U-3-3-T10-T11-oth-X000 |
|
| P11-X000 | Amendment of application requested |
St.27 status event code: A-2-2-P10-P11-nap-X000 |
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| P13-X000 | Application amended |
St.27 status event code: A-2-2-P10-P13-nap-X000 |
|
| E701 | Decision to grant or registration of patent right | ||
| PE0701 | Decision of registration |
St.27 status event code: A-1-2-D10-D22-exm-PE0701 |
|
| GRNT | Written decision to grant | ||
| PR0701 | Registration of establishment |
St.27 status event code: A-2-4-F10-F11-exm-PR0701 |
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| PR1002 | Payment of registration fee |
St.27 status event code: A-2-2-U10-U11-oth-PR1002 Fee payment year number: 1 |
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| PG1601 | Publication of registration |
St.27 status event code: A-4-4-Q10-Q13-nap-PG1601 |
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| LAPS | Lapse due to unpaid annual fee | ||
| PC1903 | Unpaid annual fee |
St.27 status event code: A-4-4-U10-U13-oth-PC1903 Not in force date: 20070909 Payment event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE |
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| R18-X000 | Changes to party contact information recorded |
St.27 status event code: A-5-5-R10-R18-oth-X000 |
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| PC1903 | Unpaid annual fee |
St.27 status event code: N-4-6-H10-H13-oth-PC1903 Ip right cessation event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE Not in force date: 20070909 |