KR100394315B1 - 수성 무전기 도금 용액 - Google Patents

수성 무전기 도금 용액 Download PDF

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Publication number
KR100394315B1
KR100394315B1 KR1019960031377A KR19960031377A KR100394315B1 KR 100394315 B1 KR100394315 B1 KR 100394315B1 KR 1019960031377 A KR1019960031377 A KR 1019960031377A KR 19960031377 A KR19960031377 A KR 19960031377A KR 100394315 B1 KR100394315 B1 KR 100394315B1
Authority
KR
South Korea
Prior art keywords
acid
salt
plating solution
group
electroless plating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1019960031377A
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English (en)
Korean (ko)
Other versions
KR970027362A (ko
Inventor
에스. 보키사 죠지
제이. 윌리스 윌리엄
Original Assignee
맥긴-로코, 인코포레이티드
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 맥긴-로코, 인코포레이티드 filed Critical 맥긴-로코, 인코포레이티드
Publication of KR970027362A publication Critical patent/KR970027362A/ko
Application granted granted Critical
Publication of KR100394315B1 publication Critical patent/KR100394315B1/ko
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31—Coating with metals
    • C23C18/32—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31—Coating with metals
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/30—Assembling printed circuits with electric components, e.g. with resistor
    • H05K3/32—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
    • H05K3/34—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by soldering
    • H05K3/3457—Solder materials or compositions; Methods of application thereof
    • H05K3/3473—Plating of solder
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
    • H05K3/382—Improvement of the adhesion between the insulating substrate and the metal by special treatment of the metal

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemically Coating (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Soil Conditioners And Soil-Stabilizing Materials (AREA)
KR1019960031377A 1995-11-15 1996-07-30 수성 무전기 도금 용액 Expired - Fee Related KR100394315B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/559,712 US5554211A (en) 1995-11-15 1995-11-15 Aqueous electroless plating solutions
US08/559,712 1995-11-15

Publications (2)

Publication Number Publication Date
KR970027362A KR970027362A (ko) 1997-06-24
KR100394315B1 true KR100394315B1 (ko) 2003-10-22

Family

ID=24234709

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019960031377A Expired - Fee Related KR100394315B1 (ko) 1995-11-15 1996-07-30 수성 무전기 도금 용액

Country Status (6)

Country Link
US (1) US5554211A (enExample)
EP (1) EP0774534B1 (enExample)
JP (1) JPH09176863A (enExample)
KR (1) KR100394315B1 (enExample)
DE (2) DE69607106D1 (enExample)
TW (1) TW322516B (enExample)

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WO1998049367A1 (en) * 1997-04-28 1998-11-05 Fry's Metals, Inc. Bismuth coating protection for copper
RU2121013C1 (ru) * 1997-09-02 1998-10-27 Открытое акционерное общество "ГАЗ" Раствор для химического нанесения оловянных покрытий на детали из меди и ее сплавов
EP0924777A3 (en) * 1997-10-15 1999-07-07 Canon Kabushiki Kaisha A method for the formation of an indium oxide film by electro deposition process or electroless deposition process, a substrate provided with said indium oxide film for a semiconductor element, and a semiconductor element provided with said substrate
US6284309B1 (en) 1997-12-19 2001-09-04 Atotech Deutschland Gmbh Method of producing copper surfaces for improved bonding, compositions used therein and articles made therefrom
US6063172A (en) * 1998-10-13 2000-05-16 Mcgean-Rohco, Inc. Aqueous immersion plating bath and method for plating
US6086779A (en) * 1999-03-01 2000-07-11 Mcgean-Rohco, Inc. Copper etching compositions and method for etching copper
US6806236B2 (en) * 1999-05-13 2004-10-19 Schlumberger Technology Corporation Composition and method for treating a subterranean formation
US6821323B1 (en) * 1999-11-12 2004-11-23 Enthone Inc. Process for the non-galvanic tin plating of copper or copper alloys
US6361823B1 (en) 1999-12-03 2002-03-26 Atotech Deutschland Gmbh Process for whisker-free aqueous electroless tin plating
US6506314B1 (en) 2000-07-27 2003-01-14 Atotech Deutschland Gmbh Adhesion of polymeric materials to metal surfaces
US6551931B1 (en) 2000-11-07 2003-04-22 International Business Machines Corporation Method to selectively cap interconnects with indium or tin bronzes and/or oxides thereof and the interconnect so capped
US7037559B2 (en) * 2003-05-01 2006-05-02 International Business Machines Corporation Immersion plating and plated structures
JP2005060822A (ja) * 2003-08-08 2005-03-10 Rohm & Haas Electronic Materials Llc 複合基体の電気メッキ
DE102004030930A1 (de) * 2004-06-25 2006-02-23 Ormecon Gmbh Zinnbeschichtete Leiterplatten mit geringer Neigung zur Whiskerbildung
DE102004047423C5 (de) * 2004-09-28 2011-04-21 AHC-Oberflächentechnik GmbH & Co. OHG Außenstromlos aufgebrachte Nickellegierung und ihre Verwendung
US7410899B2 (en) * 2005-09-20 2008-08-12 Enthone, Inc. Defectivity and process control of electroless deposition in microelectronics applications
US7507321B2 (en) * 2006-01-06 2009-03-24 Solopower, Inc. Efficient gallium thin film electroplating methods and chemistries
US7892413B2 (en) * 2006-09-27 2011-02-22 Solopower, Inc. Electroplating methods and chemistries for deposition of copper-indium-gallium containing thin films
US20080175993A1 (en) * 2006-10-13 2008-07-24 Jalal Ashjaee Reel-to-reel reaction of a precursor film to form solar cell absorber
US20090183675A1 (en) * 2006-10-13 2009-07-23 Mustafa Pinarbasi Reactor to form solar cell absorbers
US20100139557A1 (en) * 2006-10-13 2010-06-10 Solopower, Inc. Reactor to form solar cell absorbers in roll-to-roll fashion
JP5497261B2 (ja) 2006-12-15 2014-05-21 ローム・アンド・ハース・エレクトロニック・マテリアルズ，エル．エル．シー． インジウム組成物
US7868182B2 (en) * 2007-01-12 2011-01-11 Arduengo Iii Anthony J Solventless one-step process for the production of imidazole-2-thiones
US20080176096A1 (en) * 2007-01-22 2008-07-24 Yen-Hang Cheng Solderable layer and a method for manufacturing the same
JP2008260981A (ja) * 2007-04-10 2008-10-30 Yuken Industry Co Ltd めっき液、めっき方法およびめっき皮膜が形成された物品
US8425753B2 (en) * 2008-05-19 2013-04-23 Solopower, Inc. Electroplating methods and chemistries for deposition of copper-indium-gallium containing thin films
US8226807B2 (en) 2007-12-11 2012-07-24 Enthone Inc. Composite coatings for whisker reduction
US20090145764A1 (en) * 2007-12-11 2009-06-11 Enthone Inc. Composite coatings for whisker reduction
TW200936960A (en) 2008-02-20 2009-09-01 Grand Mate Co Ltd LPG flow rate control valve
US8722609B2 (en) * 2008-04-04 2014-05-13 Ecolab Inc Limescale and soap scum removing composition containing methane sulfonic acid
EP2848714B1 (en) 2008-04-22 2016-11-23 Rohm and Haas Electronic Materials LLC Method of replenishing indium ions in indium electroplating compositions
CN102112664B (zh) 2008-05-29 2016-06-01 日本帕卡濑精株式会社 带有铋被膜的金属材料及其制造方法、在其中所使用的表面处理液以及阳离子电沉积涂覆金属材料及其制造方法
US20100226629A1 (en) * 2008-07-21 2010-09-09 Solopower, Inc. Roll-to-roll processing and tools for thin film solar cell manufacturing
US8895441B2 (en) 2012-02-24 2014-11-25 Lam Research Corporation Methods and materials for anchoring gapfill metals
JP6163023B2 (ja) * 2013-06-10 2017-07-12 日本電波工業株式会社 水晶デバイス及び水晶デバイスの製造方法
US20150221930A1 (en) * 2014-02-03 2015-08-06 Ayyakkannu Manivannan ELECTROLESS DEPOSITION OF Bi, Sb, Si, Sn, AND Co AND THEIR ALLOYS
WO2017060216A1 (en) 2015-10-06 2017-04-13 Atotech Deutschland Gmbh Process for indium or indium alloy deposition and article
EP3199666B1 (en) 2016-01-29 2018-09-26 ATOTECH Deutschland GmbH Aqueous indium or indium alloy plating bath and process for deposition of indium or an indium alloy
US20180016690A1 (en) 2016-07-18 2018-01-18 Rohm And Haas Electronic Materials Llc Indium electroplating compositions containing 2-imidazolidinethione compounds and methods for electroplating indium
KR20180024765A (ko) * 2016-08-31 2018-03-08 주식회사 호진플라텍 전기도금을 이용한 주석-비스무트-납 삼원합금 솔더 조성물
US11686007B2 (en) * 2017-12-18 2023-06-27 New Mexico Tech University Research Park Corporation Tin-indium alloy electroplating solution

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US4715894A (en) * 1985-08-29 1987-12-29 Techno Instruments Investments 1983 Ltd. Use of immersion tin and tin alloys as a bonding medium for multilayer circuits
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US5391402A (en) * 1993-12-03 1995-02-21 Motorola Immersion plating of tin-bismuth solder

Also Published As

Publication number Publication date
JPH09176863A (ja) 1997-07-08
EP0774534B1 (en) 2000-03-15
EP0774534A1 (en) 1997-05-21
DE69607106T4 (de) 2002-03-14
DE69607106T2 (de) 2000-08-10
TW322516B (enExample) 1997-12-11
KR970027362A (ko) 1997-06-24
DE69607106D1 (de) 2000-04-20
US5554211A (en) 1996-09-10

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