KR100305960B1 - 감광성조성물및이조성물을사용한패턴형성방법 - Google Patents

감광성조성물및이조성물을사용한패턴형성방법 Download PDF

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Publication number
KR100305960B1
KR100305960B1 KR1019940008028A KR19940008028A KR100305960B1 KR 100305960 B1 KR100305960 B1 KR 100305960B1 KR 1019940008028 A KR1019940008028 A KR 1019940008028A KR 19940008028 A KR19940008028 A KR 19940008028A KR 100305960 B1 KR100305960 B1 KR 100305960B1
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South Korea
Prior art keywords
polymer
photosensitive composition
substrate
compound
group
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KR1019940008028A
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English (en)
Korean (ko)
Inventor
이마이겐지
이와사와나오즈미
야마오까쓰구오
Original Assignee
사사키 요시오
간사이 페인트 가부시키가이샤
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

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  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
KR1019940008028A 1993-04-16 1994-04-16 감광성조성물및이조성물을사용한패턴형성방법 Expired - Fee Related KR100305960B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP93-113769 1993-04-16
JP11376993 1993-04-16
JP93-119353 1993-04-23
JP11935393 1993-04-23

Publications (1)

Publication Number Publication Date
KR100305960B1 true KR100305960B1 (ko) 2001-11-30

Family

ID=26452696

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019940008028A Expired - Fee Related KR100305960B1 (ko) 1993-04-16 1994-04-16 감광성조성물및이조성물을사용한패턴형성방법

Country Status (3)

Country Link
US (2) US5496678A (cg-RX-API-DMAC10.html)
KR (1) KR100305960B1 (cg-RX-API-DMAC10.html)
TW (1) TW265425B (cg-RX-API-DMAC10.html)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101258726B1 (ko) * 2008-03-26 2013-04-26 다이요 홀딩스 가부시키가이샤 감광성 수지 조성물, 그의 경화물 및 그의 경화물로 이루어지는 솔더 레지스트층을 갖는 인쇄 배선 기판
KR101285640B1 (ko) 2005-07-25 2013-07-12 닛산 가가쿠 고교 가부시키 가이샤 포지형 감광성 수지 조성물 및 이로부터 얻어지는 경화막

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5496678A (en) * 1993-04-16 1996-03-05 Kansai Paint Co., Ltd. Photosensitive compositions containing a polymer with carboxyl and hydroxyphenyl groups, a compound with multiple ethylenic unsaturation and a photo-acid generator
DE69624968T2 (de) * 1995-04-21 2003-11-06 Arch Specialty Chemicals, Inc. Vernetzte Polymere
US6140022A (en) * 1996-07-19 2000-10-31 Agfa-Gevaert, N.V. Radiation sensitive imaging element and a method for producing lithographic plates therewith
US6200726B1 (en) 1996-09-16 2001-03-13 International Business Machines Corporation Optimization of space width for hybrid photoresist
US5962184A (en) * 1996-12-13 1999-10-05 International Business Machines Corporation Photoresist composition comprising a copolymer of a hydroxystyrene and a (meth)acrylate substituted with an alicyclic ester substituent
TW468091B (en) * 1997-09-05 2001-12-11 Kansai Paint Co Ltd Visible light-sensitive compositions and pattern formation process
WO1999054788A1 (fr) * 1998-04-17 1999-10-28 Kansai Paint Co., Ltd. Composition de resine photosensible
US6630285B2 (en) * 1998-10-15 2003-10-07 Mitsui Chemicals, Inc. Positive sensitive resin composition and a process for forming a resist pattern therewith
US6072006A (en) 1998-11-06 2000-06-06 Arch Specialty Chemicals, Inc. Preparation of partially cross-linked polymers and their use in pattern formation
US6670100B1 (en) * 1999-05-20 2003-12-30 Kansai Paint Co., Ltd. Positive type actinic ray-curable dry film and pattern-forming method by use of the same
WO2001013179A1 (en) * 1999-08-13 2001-02-22 Board Of Regents, University Of Texas System Water-processable photoresist compositions
US6555286B1 (en) 1999-08-25 2003-04-29 Kansai Paint Co., Ltd. Positive type actinic-ray-curable dry film and pattern-forming method by use of the same
US6455231B1 (en) * 1999-11-03 2002-09-24 Shipley Company, L.L.C. Dry film photoimageable compositions
JP3755571B2 (ja) 1999-11-12 2006-03-15 信越化学工業株式会社 化学増幅ポジ型レジスト材料及びパターン形成方法
KR100555286B1 (ko) * 2000-03-22 2006-03-03 신에쓰 가가꾸 고교 가부시끼가이샤 화학 증폭 포지티브형 레지스트 재료 및 패턴 형성 방법
JP2002122986A (ja) * 2000-10-16 2002-04-26 Kansai Paint Co Ltd ポジ型感光性樹脂組成物、ポジ型感光性ドライフィルム、その組成物を使用して得られる材料及びパターン形成方法
TWI298423B (en) 2001-02-06 2008-07-01 Nagase & Co Ltd Developer producing equipment and method
US7078158B2 (en) * 2001-09-11 2006-07-18 Kansai Paint Co., Ltd. Composition for activation energy rays and method of forming pattern
TWI411884B (zh) * 2006-05-16 2013-10-11 Nissan Chemical Ind Ltd 含有矽氧烷的正型感光性樹脂組成物

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3779778A (en) * 1972-02-09 1973-12-18 Minnesota Mining & Mfg Photosolubilizable compositions and elements
US4491628A (en) * 1982-08-23 1985-01-01 International Business Machines Corporation Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone
MY103006A (en) * 1987-03-30 1993-03-31 Microsi Inc Photoresist compositions
DE69226920T2 (de) * 1991-10-07 1999-01-28 Fuji Photo Film Co., Ltd., Minami-Ashigara, Kanagawa Lichtempfindliche Zusammensetzung
US5262280A (en) * 1992-04-02 1993-11-16 Shipley Company Inc. Radiation sensitive compositions
US5496678A (en) * 1993-04-16 1996-03-05 Kansai Paint Co., Ltd. Photosensitive compositions containing a polymer with carboxyl and hydroxyphenyl groups, a compound with multiple ethylenic unsaturation and a photo-acid generator

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101285640B1 (ko) 2005-07-25 2013-07-12 닛산 가가쿠 고교 가부시키 가이샤 포지형 감광성 수지 조성물 및 이로부터 얻어지는 경화막
KR101258726B1 (ko) * 2008-03-26 2013-04-26 다이요 홀딩스 가부시키가이샤 감광성 수지 조성물, 그의 경화물 및 그의 경화물로 이루어지는 솔더 레지스트층을 갖는 인쇄 배선 기판

Also Published As

Publication number Publication date
US5650259A (en) 1997-07-22
US5496678A (en) 1996-03-05
TW265425B (cg-RX-API-DMAC10.html) 1995-12-11

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