JPWO2025033511A5 - - Google Patents

Info

Publication number
JPWO2025033511A5
JPWO2025033511A5 JP2024573595A JP2024573595A JPWO2025033511A5 JP WO2025033511 A5 JPWO2025033511 A5 JP WO2025033511A5 JP 2024573595 A JP2024573595 A JP 2024573595A JP 2024573595 A JP2024573595 A JP 2024573595A JP WO2025033511 A5 JPWO2025033511 A5 JP WO2025033511A5
Authority
JP
Japan
Prior art keywords
deposition
substrate
source
opening width
opening
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2024573595A
Other languages
English (en)
Japanese (ja)
Other versions
JPWO2025033511A1 (https=
JP7708339B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/JP2024/028534 external-priority patent/WO2025033511A1/ja
Publication of JPWO2025033511A1 publication Critical patent/JPWO2025033511A1/ja
Priority to JP2025112686A priority Critical patent/JP2025129320A/ja
Application granted granted Critical
Publication of JPWO2025033511A5 publication Critical patent/JPWO2025033511A5/ja
Publication of JP7708339B2 publication Critical patent/JP7708339B2/ja
Priority to JP2025179713A priority patent/JP2026012862A/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2024573595A 2023-08-10 2024-08-08 蒸着マスク及び、電子デバイスの製造方法 Active JP7708339B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2025112686A JP2025129320A (ja) 2023-08-10 2025-07-03 蒸着マスク及び、電子デバイスの製造方法
JP2025179713A JP2026012862A (ja) 2023-08-10 2025-10-24 蒸着マスク及び、電子デバイスの製造方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2023130556 2023-08-10
JP2023130556 2023-08-10
PCT/JP2024/028534 WO2025033511A1 (ja) 2023-08-10 2024-08-08 蒸着マスク及び、電子デバイスの製造方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2025112686A Division JP2025129320A (ja) 2023-08-10 2025-07-03 蒸着マスク及び、電子デバイスの製造方法

Publications (3)

Publication Number Publication Date
JPWO2025033511A1 JPWO2025033511A1 (https=) 2025-02-13
JPWO2025033511A5 true JPWO2025033511A5 (https=) 2025-07-15
JP7708339B2 JP7708339B2 (ja) 2025-07-15

Family

ID=94534445

Family Applications (3)

Application Number Title Priority Date Filing Date
JP2024573595A Active JP7708339B2 (ja) 2023-08-10 2024-08-08 蒸着マスク及び、電子デバイスの製造方法
JP2025112686A Pending JP2025129320A (ja) 2023-08-10 2025-07-03 蒸着マスク及び、電子デバイスの製造方法
JP2025179713A Pending JP2026012862A (ja) 2023-08-10 2025-10-24 蒸着マスク及び、電子デバイスの製造方法

Family Applications After (2)

Application Number Title Priority Date Filing Date
JP2025112686A Pending JP2025129320A (ja) 2023-08-10 2025-07-03 蒸着マスク及び、電子デバイスの製造方法
JP2025179713A Pending JP2026012862A (ja) 2023-08-10 2025-10-24 蒸着マスク及び、電子デバイスの製造方法

Country Status (4)

Country Link
JP (3) JP7708339B2 (https=)
KR (1) KR20250078513A (https=)
CN (1) CN121285649A (https=)
WO (1) WO2025033511A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20250078513A (ko) * 2023-08-10 2025-06-02 도판 홀딩스 가부시키가이샤 증착 마스크, 및 전자 디바이스의 제조 방법

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008189990A (ja) 2007-02-05 2008-08-21 Seiko Epson Corp 蒸着用マスクおよび蒸着用マスクの製造方法
US9142779B2 (en) * 2013-08-06 2015-09-22 University Of Rochester Patterning of OLED materials
CN108735915B (zh) 2017-04-14 2021-02-09 上海视涯技术有限公司 用于oled蒸镀的荫罩及其制作方法、oled面板的制作方法
JP7432133B2 (ja) 2019-03-25 2024-02-16 大日本印刷株式会社 マスク
JP2022184708A (ja) 2021-05-31 2022-12-13 キヤノン株式会社 蒸着マスク、及び有機電子デバイスの製造方法
US20250122606A1 (en) 2022-01-31 2025-04-17 Dai Nippon Printing Co., Ltd. Vapor deposition mask, framed vapor deposition mask, method of manufacturing vapor deposition mask, method of manufacturing organic device, and method of manufacturing framed vapor deposition mask
KR20250078513A (ko) * 2023-08-10 2025-06-02 도판 홀딩스 가부시키가이샤 증착 마스크, 및 전자 디바이스의 제조 방법

Similar Documents

Publication Publication Date Title
JP2019195059A5 (https=)
JPWO2025033511A5 (https=)
JP2002515178A (ja) 電子多層素子の製造方法
CN1834282B (zh) 成膜装置、成膜方法
US20150159283A1 (en) Metal mask manufacturing method and metal mask
JPWO2025033509A5 (https=)
JPS63310965A (ja) スパッタリング装置
JP2022184708A5 (https=)
CN100515794C (zh) 印版及其制造方法
JP2023085372A (ja) マスク
KR950015647A (ko) 반도체장치의 제조방법
JP2022029308A5 (https=)
JPWO2025033507A5 (https=)
JPS6153717A (ja) 薄膜形成方法および形成装置
TWI805984B (zh) 金屬遮罩
JPH11140638A (ja) スパッタ装置及びコリメーター
JPWO2025105425A5 (https=)
JP2854545B2 (ja) 位相反転マスク及びその製造方法
CN114540787B (zh) 一种掩膜板、其制作方法及显示面板
CN221297026U (zh) 一种镀膜用的掩膜
JP6885431B2 (ja) 蒸着マスクの製造方法
JPS6164873A (ja) 薄膜形成方法
JPH11106895A (ja) 成膜装置のシールド板
JP3820449B2 (ja) 階段状多層薄膜の作製方法
CN117626188A (zh) 一种改善蒸发镀膜的台阶覆盖的方法