KR20250078513A - 증착 마스크, 및 전자 디바이스의 제조 방법 - Google Patents

증착 마스크, 및 전자 디바이스의 제조 방법 Download PDF

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Publication number
KR20250078513A
KR20250078513A KR1020257014032A KR20257014032A KR20250078513A KR 20250078513 A KR20250078513 A KR 20250078513A KR 1020257014032 A KR1020257014032 A KR 1020257014032A KR 20257014032 A KR20257014032 A KR 20257014032A KR 20250078513 A KR20250078513 A KR 20250078513A
Authority
KR
South Korea
Prior art keywords
deposition
opening
substrate
deposition mask
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
KR1020257014032A
Other languages
English (en)
Korean (ko)
Inventor
아오이 사노
가즈마 우스이
히로유키 미치
료마 모테기
Original Assignee
도판 홀딩스 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 도판 홀딩스 가부시키가이샤 filed Critical 도판 홀딩스 가부시키가이샤
Publication of KR20250078513A publication Critical patent/KR20250078513A/ko
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12—Organic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/24—Deposition of silicon only
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • General Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Physical Vapour Deposition (AREA)
  • Electroluminescent Light Sources (AREA)
KR1020257014032A 2023-08-10 2024-08-08 증착 마스크, 및 전자 디바이스의 제조 방법 Pending KR20250078513A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2023-130556 2023-08-10
JP2023130556 2023-08-10
PCT/JP2024/028534 WO2025033511A1 (ja) 2023-08-10 2024-08-08 蒸着マスク及び、電子デバイスの製造方法

Publications (1)

Publication Number Publication Date
KR20250078513A true KR20250078513A (ko) 2025-06-02

Family

ID=94534445

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020257014032A Pending KR20250078513A (ko) 2023-08-10 2024-08-08 증착 마스크, 및 전자 디바이스의 제조 방법

Country Status (4)

Country Link
JP (3) JP7708339B2 (https=)
KR (1) KR20250078513A (https=)
CN (1) CN121285649A (https=)
WO (1) WO2025033511A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20250078513A (ko) * 2023-08-10 2025-06-02 도판 홀딩스 가부시키가이샤 증착 마스크, 및 전자 디바이스의 제조 방법

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008189990A (ja) 2007-02-05 2008-08-21 Seiko Epson Corp 蒸着用マスクおよび蒸着用マスクの製造方法
JP2022184708A (ja) 2021-05-31 2022-12-13 キヤノン株式会社 蒸着マスク、及び有機電子デバイスの製造方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9142779B2 (en) * 2013-08-06 2015-09-22 University Of Rochester Patterning of OLED materials
CN108735915B (zh) 2017-04-14 2021-02-09 上海视涯技术有限公司 用于oled蒸镀的荫罩及其制作方法、oled面板的制作方法
JP7432133B2 (ja) 2019-03-25 2024-02-16 大日本印刷株式会社 マスク
US20250122606A1 (en) 2022-01-31 2025-04-17 Dai Nippon Printing Co., Ltd. Vapor deposition mask, framed vapor deposition mask, method of manufacturing vapor deposition mask, method of manufacturing organic device, and method of manufacturing framed vapor deposition mask
KR20250078513A (ko) * 2023-08-10 2025-06-02 도판 홀딩스 가부시키가이샤 증착 마스크, 및 전자 디바이스의 제조 방법

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008189990A (ja) 2007-02-05 2008-08-21 Seiko Epson Corp 蒸着用マスクおよび蒸着用マスクの製造方法
JP2022184708A (ja) 2021-05-31 2022-12-13 キヤノン株式会社 蒸着マスク、及び有機電子デバイスの製造方法

Also Published As

Publication number Publication date
JP2026012862A (ja) 2026-01-27
JP2025129320A (ja) 2025-09-04
CN121285649A (zh) 2026-01-06
JPWO2025033511A1 (https=) 2025-02-13
WO2025033511A1 (ja) 2025-02-13
JP7708339B2 (ja) 2025-07-15

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Legal Events

Date Code Title Description
PA0105 International application

Patent event date: 20250428

Patent event code: PA01051R01D

Comment text: International Patent Application

PA0201 Request for examination
PG1501 Laying open of application