JPWO2025033511A1 - - Google Patents

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Publication number
JPWO2025033511A1
JPWO2025033511A1 JP2024573595A JP2024573595A JPWO2025033511A1 JP WO2025033511 A1 JPWO2025033511 A1 JP WO2025033511A1 JP 2024573595 A JP2024573595 A JP 2024573595A JP 2024573595 A JP2024573595 A JP 2024573595A JP WO2025033511 A1 JPWO2025033511 A1 JP WO2025033511A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2024573595A
Other languages
Japanese (ja)
Other versions
JPWO2025033511A5 (https=
JP7708339B2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2025033511A1 publication Critical patent/JPWO2025033511A1/ja
Priority to JP2025112686A priority Critical patent/JP2025129320A/ja
Application granted granted Critical
Publication of JPWO2025033511A5 publication Critical patent/JPWO2025033511A5/ja
Publication of JP7708339B2 publication Critical patent/JP7708339B2/ja
Priority to JP2025179713A priority patent/JP2026012862A/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12—Organic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/24—Deposition of silicon only
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • General Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Physical Vapour Deposition (AREA)
  • Electroluminescent Light Sources (AREA)
JP2024573595A 2023-08-10 2024-08-08 蒸着マスク及び、電子デバイスの製造方法 Active JP7708339B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2025112686A JP2025129320A (ja) 2023-08-10 2025-07-03 蒸着マスク及び、電子デバイスの製造方法
JP2025179713A JP2026012862A (ja) 2023-08-10 2025-10-24 蒸着マスク及び、電子デバイスの製造方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2023130556 2023-08-10
JP2023130556 2023-08-10
PCT/JP2024/028534 WO2025033511A1 (ja) 2023-08-10 2024-08-08 蒸着マスク及び、電子デバイスの製造方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2025112686A Division JP2025129320A (ja) 2023-08-10 2025-07-03 蒸着マスク及び、電子デバイスの製造方法

Publications (3)

Publication Number Publication Date
JPWO2025033511A1 true JPWO2025033511A1 (https=) 2025-02-13
JPWO2025033511A5 JPWO2025033511A5 (https=) 2025-07-15
JP7708339B2 JP7708339B2 (ja) 2025-07-15

Family

ID=94534445

Family Applications (3)

Application Number Title Priority Date Filing Date
JP2024573595A Active JP7708339B2 (ja) 2023-08-10 2024-08-08 蒸着マスク及び、電子デバイスの製造方法
JP2025112686A Pending JP2025129320A (ja) 2023-08-10 2025-07-03 蒸着マスク及び、電子デバイスの製造方法
JP2025179713A Pending JP2026012862A (ja) 2023-08-10 2025-10-24 蒸着マスク及び、電子デバイスの製造方法

Family Applications After (2)

Application Number Title Priority Date Filing Date
JP2025112686A Pending JP2025129320A (ja) 2023-08-10 2025-07-03 蒸着マスク及び、電子デバイスの製造方法
JP2025179713A Pending JP2026012862A (ja) 2023-08-10 2025-10-24 蒸着マスク及び、電子デバイスの製造方法

Country Status (4)

Country Link
JP (3) JP7708339B2 (https=)
KR (1) KR20250078513A (https=)
CN (1) CN121285649A (https=)
WO (1) WO2025033511A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20250078513A (ko) * 2023-08-10 2025-06-02 도판 홀딩스 가부시키가이샤 증착 마스크, 및 전자 디바이스의 제조 방법

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008189990A (ja) * 2007-02-05 2008-08-21 Seiko Epson Corp 蒸着用マスクおよび蒸着用マスクの製造方法
US20200044010A1 (en) * 2017-04-14 2020-02-06 Shanghai Seeo Optronics Technology Co., Ltd Shadow mask for oled evaporation and manufacturing method therefor, and oled panel manufacturing method
JP2020158807A (ja) * 2019-03-25 2020-10-01 大日本印刷株式会社 マスク
JP2022184708A (ja) * 2021-05-31 2022-12-13 キヤノン株式会社 蒸着マスク、及び有機電子デバイスの製造方法
WO2023145951A1 (ja) * 2022-01-31 2023-08-03 大日本印刷株式会社 蒸着マスク、フレーム付き蒸着マスク、蒸着マスクの製造方法、有機デバイスの製造方法及びフレーム付き蒸着マスクの製造方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9142779B2 (en) * 2013-08-06 2015-09-22 University Of Rochester Patterning of OLED materials
KR20250078513A (ko) * 2023-08-10 2025-06-02 도판 홀딩스 가부시키가이샤 증착 마스크, 및 전자 디바이스의 제조 방법

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008189990A (ja) * 2007-02-05 2008-08-21 Seiko Epson Corp 蒸着用マスクおよび蒸着用マスクの製造方法
US20200044010A1 (en) * 2017-04-14 2020-02-06 Shanghai Seeo Optronics Technology Co., Ltd Shadow mask for oled evaporation and manufacturing method therefor, and oled panel manufacturing method
JP2020158807A (ja) * 2019-03-25 2020-10-01 大日本印刷株式会社 マスク
JP2022184708A (ja) * 2021-05-31 2022-12-13 キヤノン株式会社 蒸着マスク、及び有機電子デバイスの製造方法
WO2023145951A1 (ja) * 2022-01-31 2023-08-03 大日本印刷株式会社 蒸着マスク、フレーム付き蒸着マスク、蒸着マスクの製造方法、有機デバイスの製造方法及びフレーム付き蒸着マスクの製造方法

Also Published As

Publication number Publication date
JP2026012862A (ja) 2026-01-27
JP2025129320A (ja) 2025-09-04
CN121285649A (zh) 2026-01-06
KR20250078513A (ko) 2025-06-02
WO2025033511A1 (ja) 2025-02-13
JP7708339B2 (ja) 2025-07-15

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