JPWO2023190696A5 - - Google Patents
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- Publication number
- JPWO2023190696A5 JPWO2023190696A5 JP2024512685A JP2024512685A JPWO2023190696A5 JP WO2023190696 A5 JPWO2023190696 A5 JP WO2023190696A5 JP 2024512685 A JP2024512685 A JP 2024512685A JP 2024512685 A JP2024512685 A JP 2024512685A JP WO2023190696 A5 JPWO2023190696 A5 JP WO2023190696A5
- Authority
- JP
- Japan
- Prior art keywords
- absorption
- control film
- layer
- reflective photomask
- reflective
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010521 absorption reaction Methods 0.000 claims 32
- 239000010410 layer Substances 0.000 claims 30
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims 12
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims 12
- 239000010931 gold Substances 0.000 claims 8
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims 6
- 239000000463 material Substances 0.000 claims 6
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims 4
- 239000010949 copper Substances 0.000 claims 4
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims 4
- 229910052737 gold Inorganic materials 0.000 claims 4
- 229910052741 iridium Inorganic materials 0.000 claims 4
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 claims 4
- 229910052763 palladium Inorganic materials 0.000 claims 4
- 229910052697 platinum Inorganic materials 0.000 claims 4
- 239000011241 protective layer Substances 0.000 claims 4
- 239000010948 rhodium Substances 0.000 claims 4
- 229910052709 silver Inorganic materials 0.000 claims 4
- 239000004332 silver Substances 0.000 claims 4
- 239000000758 substrate Substances 0.000 claims 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims 2
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 claims 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims 2
- 230000008033 biological extinction Effects 0.000 claims 2
- 229910017052 cobalt Inorganic materials 0.000 claims 2
- 239000010941 cobalt Substances 0.000 claims 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims 2
- 229910052802 copper Inorganic materials 0.000 claims 2
- 229910052738 indium Inorganic materials 0.000 claims 2
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 claims 2
- 229910052750 molybdenum Inorganic materials 0.000 claims 2
- 239000011733 molybdenum Substances 0.000 claims 2
- 229910052759 nickel Inorganic materials 0.000 claims 2
- 229910052762 osmium Inorganic materials 0.000 claims 2
- SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 claims 2
- 229910052702 rhenium Inorganic materials 0.000 claims 2
- WUAPFZMCVAUBPE-UHFFFAOYSA-N rhenium atom Chemical compound [Re] WUAPFZMCVAUBPE-UHFFFAOYSA-N 0.000 claims 2
- 229910052703 rhodium Inorganic materials 0.000 claims 2
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 claims 2
- 229910052707 ruthenium Inorganic materials 0.000 claims 2
- 229910052715 tantalum Inorganic materials 0.000 claims 2
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims 2
- JBQYATWDVHIOAR-UHFFFAOYSA-N tellanylidenegermanium Chemical compound [Te]=[Ge] JBQYATWDVHIOAR-UHFFFAOYSA-N 0.000 claims 2
- 229910052714 tellurium Inorganic materials 0.000 claims 2
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 claims 2
- 230000002745 absorbent Effects 0.000 claims 1
- 239000002250 absorbent Substances 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2022054284 | 2022-03-29 | ||
| PCT/JP2023/012835 WO2023190696A1 (ja) | 2022-03-29 | 2023-03-29 | 反射型フォトマスクブランク及び反射型フォトマスク |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2023190696A1 JPWO2023190696A1 (https=) | 2023-10-05 |
| JPWO2023190696A5 true JPWO2023190696A5 (https=) | 2024-10-02 |
Family
ID=88202079
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024512685A Pending JPWO2023190696A1 (https=) | 2022-03-29 | 2023-03-29 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US20250199393A1 (https=) |
| EP (1) | EP4502727A4 (https=) |
| JP (1) | JPWO2023190696A1 (https=) |
| KR (1) | KR20240146079A (https=) |
| CN (1) | CN118922779A (https=) |
| TW (1) | TW202347008A (https=) |
| WO (1) | WO2023190696A1 (https=) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP4553575A1 (en) * | 2023-11-10 | 2025-05-14 | Imec VZW | Extreme ultraviolet lithography mask |
| WO2025115438A1 (ja) * | 2023-11-27 | 2025-06-05 | Ａｇｃ株式会社 | 反射型マスクブランク、反射型マスク、反射型マスクの製造方法 |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH037360Y2 (https=) | 1985-11-18 | 1991-02-22 | ||
| US8962220B2 (en) * | 2009-04-02 | 2015-02-24 | Toppan Printing Co., Ltd. | Reflective photomask and reflective photomask blank |
| JP6441012B2 (ja) * | 2014-09-30 | 2018-12-19 | Hoya株式会社 | 反射型マスクブランク、反射型マスク及びその製造方法、並びに半導体装置の製造方法 |
| JP6739960B2 (ja) * | 2016-03-28 | 2020-08-12 | Hoya株式会社 | 反射型マスクブランク、反射型マスク及び半導体装置の製造方法 |
| WO2018159785A1 (ja) | 2017-03-02 | 2018-09-07 | Hoya株式会社 | 反射型マスクブランク、反射型マスク及びその製造方法、並びに半導体装置の製造方法 |
| KR102906466B1 (ko) | 2018-05-25 | 2026-01-02 | 호야 가부시키가이샤 | 반사형 마스크 블랭크, 반사형 마스크, 그리고 반사형 마스크 및 반도체 장치의 제조 방법 |
| EP3882698A4 (en) * | 2018-11-15 | 2022-08-17 | Toppan Printing Co., Ltd. | BLANK REFLECTIVE PHOTOMASK AND REFLECTIVE PHOTOMASK |
| JP7250511B2 (ja) * | 2018-12-27 | 2023-04-03 | Hoya株式会社 | 反射型マスクブランク、反射型マスク、及び半導体装置の製造方法 |
| WO2020179463A1 (ja) * | 2019-03-07 | 2020-09-10 | Hoya株式会社 | マスクブランク、転写用マスクの製造方法、及び半導体デバイスの製造方法 |
| WO2021132111A1 (ja) * | 2019-12-27 | 2021-07-01 | Ａｇｃ株式会社 | Ｅｕｖリソグラフィ用反射型マスクブランク、ｅｕｖリソグラフィ用反射型マスク、およびそれらの製造方法 |
| JP6929983B1 (ja) * | 2020-03-10 | 2021-09-01 | Hoya株式会社 | 反射型マスクブランクおよび反射型マスク、並びに半導体デバイスの製造方法 |
-
2023
- 2023-03-29 CN CN202380029334.9A patent/CN118922779A/zh active Pending
- 2023-03-29 TW TW112112012A patent/TW202347008A/zh unknown
- 2023-03-29 US US18/848,891 patent/US20250199393A1/en active Pending
- 2023-03-29 JP JP2024512685A patent/JPWO2023190696A1/ja active Pending
- 2023-03-29 WO PCT/JP2023/012835 patent/WO2023190696A1/ja not_active Ceased
- 2023-03-29 KR KR1020247031334A patent/KR20240146079A/ko active Pending
- 2023-03-29 EP EP23780705.2A patent/EP4502727A4/en active Pending
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