JPWO2023166378A5 - - Google Patents

Info

Publication number
JPWO2023166378A5
JPWO2023166378A5 JP2024504026A JP2024504026A JPWO2023166378A5 JP WO2023166378 A5 JPWO2023166378 A5 JP WO2023166378A5 JP 2024504026 A JP2024504026 A JP 2024504026A JP 2024504026 A JP2024504026 A JP 2024504026A JP WO2023166378 A5 JPWO2023166378 A5 JP WO2023166378A5
Authority
JP
Japan
Prior art keywords
conductor
transistor
insulator
metal oxide
semiconductor device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2024504026A
Other languages
English (en)
Japanese (ja)
Other versions
JPWO2023166378A1 (https=
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/IB2023/051550 external-priority patent/WO2023166378A1/ja
Publication of JPWO2023166378A1 publication Critical patent/JPWO2023166378A1/ja
Publication of JPWO2023166378A5 publication Critical patent/JPWO2023166378A5/ja
Pending legal-status Critical Current

Links

JP2024504026A 2022-03-04 2023-02-21 Pending JPWO2023166378A1 (https=)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2022033577 2022-03-04
PCT/IB2023/051550 WO2023166378A1 (ja) 2022-03-04 2023-02-21 半導体装置

Publications (2)

Publication Number Publication Date
JPWO2023166378A1 JPWO2023166378A1 (https=) 2023-09-07
JPWO2023166378A5 true JPWO2023166378A5 (https=) 2026-01-19

Family

ID=87883161

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2024504026A Pending JPWO2023166378A1 (https=) 2022-03-04 2023-02-21

Country Status (5)

Country Link
US (1) US20250185229A1 (https=)
JP (1) JPWO2023166378A1 (https=)
CN (1) CN118715619A (https=)
TW (1) TW202339129A (https=)
WO (1) WO2023166378A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US12592275B2 (en) * 2024-01-09 2026-03-31 Macronix International Co., Ltd. Memory structure and control method for reducing layout area of memory device
WO2025163445A1 (ja) * 2024-01-31 2025-08-07 株式会社半導体エネルギー研究所 半導体装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100626036B1 (ko) * 2004-11-17 2006-09-20 삼성에스디아이 주식회사 유기 발광 소자 및 상기 유기 발광 소자의 제조방법
WO2012121265A1 (en) * 2011-03-10 2012-09-13 Semiconductor Energy Laboratory Co., Ltd. Memory device and method for manufacturing the same
TWI685113B (zh) * 2015-02-11 2020-02-11 日商半導體能源研究所股份有限公司 半導體裝置及其製造方法
WO2018203181A1 (ja) * 2017-05-01 2018-11-08 株式会社半導体エネルギー研究所 半導体装置

Similar Documents

Publication Publication Date Title
JP2025186396A5 (https=)
JP2024105364A5 (ja) 半導体装置
JP2021114625A5 (https=)
JP2022043102A5 (https=)
JP2024050886A5 (https=)
JP2024020477A5 (https=)
JP2025175092A5 (https=)
JPWO2020003047A5 (ja) 半導体装置
JP2023138517A5 (ja) 表示装置
JP2022043062A5 (https=)
JP2021168394A5 (ja) 表示装置
JP2019179924A5 (ja) トランジスタ
JP2020120116A5 (ja) 半導体装置
JP2024012439A5 (https=)
JP2018133570A5 (ja) 半導体装置
JP2018190976A5 (ja) 半導体装置
JP2020120107A5 (ja) 半導体装置
JP2013102140A5 (ja) 半導体装置
JPWO2021019334A5 (https=)
JPWO2023166378A5 (https=)
JPWO2020201870A5 (ja) 半導体装置
JPWO2021140407A5 (https=)
JPWO2019135137A5 (ja) 半導体装置
JP2020167362A5 (https=)
JP2018041958A5 (https=)