JPWO2023156869A5 - - Google Patents
Info
- Publication number
- JPWO2023156869A5 JPWO2023156869A5 JP2024500691A JP2024500691A JPWO2023156869A5 JP WO2023156869 A5 JPWO2023156869 A5 JP WO2023156869A5 JP 2024500691 A JP2024500691 A JP 2024500691A JP 2024500691 A JP2024500691 A JP 2024500691A JP WO2023156869 A5 JPWO2023156869 A5 JP WO2023156869A5
- Authority
- JP
- Japan
- Prior art keywords
- conductor
- insulator
- metal oxide
- transistor
- region
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2022024002 | 2022-02-18 | ||
| PCT/IB2023/050943 WO2023156869A1 (ja) | 2022-02-18 | 2023-02-03 | 半導体装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2023156869A1 JPWO2023156869A1 (https=) | 2023-08-24 |
| JPWO2023156869A5 true JPWO2023156869A5 (https=) | 2026-01-07 |
Family
ID=87577707
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024500691A Pending JPWO2023156869A1 (https=) | 2022-02-18 | 2023-02-03 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20250120182A1 (https=) |
| JP (1) | JPWO2023156869A1 (https=) |
| KR (1) | KR20240148840A (https=) |
| CN (1) | CN118613922A (https=) |
| WO (1) | WO2023156869A1 (https=) |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003142576A (ja) * | 2001-10-31 | 2003-05-16 | Mitsubishi Electric Corp | 半導体装置およびその製造方法 |
| KR100615085B1 (ko) * | 2004-01-12 | 2006-08-22 | 삼성전자주식회사 | 노드 콘택 구조체들, 이를 채택하는 반도체소자들, 이를채택하는 에스램 셀들 및 이를 제조하는 방법들 |
| JP2012033828A (ja) * | 2010-08-02 | 2012-02-16 | Toshiba Corp | 半導体記憶装置及びその製造方法 |
| US9455337B2 (en) * | 2014-06-18 | 2016-09-27 | Semiconductor Energy Laboratory Co., Ltd. | Method for manufacturing semiconductor device |
| JP2019201062A (ja) * | 2018-05-15 | 2019-11-21 | 株式会社半導体エネルギー研究所 | 半導体装置、および半導体装置の作製方法 |
| JP2020123612A (ja) * | 2019-01-29 | 2020-08-13 | 株式会社半導体エネルギー研究所 | 半導体装置の製造方法、半導体装置の製造装置 |
| CN114424339A (zh) | 2019-09-20 | 2022-04-29 | 株式会社半导体能源研究所 | 半导体装置及半导体装置的制造方法 |
-
2023
- 2023-02-03 JP JP2024500691A patent/JPWO2023156869A1/ja active Pending
- 2023-02-03 CN CN202380018983.9A patent/CN118613922A/zh active Pending
- 2023-02-03 WO PCT/IB2023/050943 patent/WO2023156869A1/ja not_active Ceased
- 2023-02-03 KR KR1020247027140A patent/KR20240148840A/ko active Pending
- 2023-02-03 US US18/834,279 patent/US20250120182A1/en active Pending
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