JPWO2023090252A5 - - Google Patents

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JPWO2023090252A5
JPWO2023090252A5 JP2023561562A JP2023561562A JPWO2023090252A5 JP WO2023090252 A5 JPWO2023090252 A5 JP WO2023090252A5 JP 2023561562 A JP2023561562 A JP 2023561562A JP 2023561562 A JP2023561562 A JP 2023561562A JP WO2023090252 A5 JPWO2023090252 A5 JP WO2023090252A5
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Japan
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clock signal
frequency
source
bias
reference clock
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JP2023561562A
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Japanese (ja)
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JPWO2023090252A1 (https=
JP7646868B2 (ja
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Priority claimed from PCT/JP2022/041958 external-priority patent/WO2023090252A1/ja
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JP2023561562A 2021-11-19 2022-11-10 プラズマ処理装置、制御方法、電源システム、プログラム、及び記憶媒体 Active JP7646868B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2021188307 2021-11-19
JP2021188307 2021-11-19
PCT/JP2022/041958 WO2023090252A1 (ja) 2021-11-19 2022-11-10 プラズマ処理装置、制御方法、電源システム、プログラム、及び記憶媒体

Publications (3)

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JPWO2023090252A1 JPWO2023090252A1 (https=) 2023-05-25
JPWO2023090252A5 true JPWO2023090252A5 (https=) 2024-12-11
JP7646868B2 JP7646868B2 (ja) 2025-03-17

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JP2023561562A Active JP7646868B2 (ja) 2021-11-19 2022-11-10 プラズマ処理装置、制御方法、電源システム、プログラム、及び記憶媒体

Country Status (6)

Country Link
US (1) US20240304418A1 (https=)
JP (1) JP7646868B2 (https=)
KR (1) KR20240101830A (https=)
CN (1) CN118303135A (https=)
TW (1) TW202336803A (https=)
WO (1) WO2023090252A1 (https=)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102786710B1 (ko) * 2021-01-29 2025-03-25 도쿄엘렉트론가부시키가이샤 플라즈마 처리 장치 및 소스 고주파 전력의 소스 주파수를 제어하는 방법
US20250087462A1 (en) * 2023-09-08 2025-03-13 Applied Materials, Inc. Radio-frequency (rf) matching network and tuning technique
WO2025211081A1 (ja) * 2024-04-03 2025-10-09 東京エレクトロン株式会社 プラズマ処理装置、電源システム、及び制御方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH114406A (ja) * 1997-06-13 1999-01-06 Canon Inc 画像処理装置、画像メモリの読み出し方法及びコンピュータ読み取り可能な記録媒体
JP4323880B2 (ja) * 2003-06-26 2009-09-02 パナソニック株式会社 クロック信号発生回路、受信装置、および受信方法
JP5319150B2 (ja) 2008-03-31 2013-10-16 東京エレクトロン株式会社 プラズマ処理装置及びプラズマ処理方法及びコンピュータ読み取り可能な記憶媒体
US7956696B2 (en) * 2008-09-19 2011-06-07 Altera Corporation Techniques for generating fractional clock signals
JP6162016B2 (ja) * 2013-10-09 2017-07-12 東京エレクトロン株式会社 プラズマ処理装置
JP6295119B2 (ja) * 2014-03-25 2018-03-14 株式会社日立ハイテクノロジーズ プラズマ処理装置
JP6043852B2 (ja) * 2015-10-01 2016-12-14 株式会社日立ハイテクノロジーズ プラズマ処理装置

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