JPWO2022260042A5 - - Google Patents

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Publication number
JPWO2022260042A5
JPWO2022260042A5 JP2023527875A JP2023527875A JPWO2022260042A5 JP WO2022260042 A5 JPWO2022260042 A5 JP WO2022260042A5 JP 2023527875 A JP2023527875 A JP 2023527875A JP 2023527875 A JP2023527875 A JP 2023527875A JP WO2022260042 A5 JPWO2022260042 A5 JP WO2022260042A5
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Japan
Prior art keywords
flow path
base
cavity
intermediate flow
process gas
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JP2023527875A
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English (en)
Japanese (ja)
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JP7675814B2 (ja
JPWO2022260042A1 (https=
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Priority claimed from PCT/JP2022/022978 external-priority patent/WO2022260042A1/ja
Publication of JPWO2022260042A1 publication Critical patent/JPWO2022260042A1/ja
Publication of JPWO2022260042A5 publication Critical patent/JPWO2022260042A5/ja
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Publication of JP7675814B2 publication Critical patent/JP7675814B2/ja
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JP2023527875A 2021-06-07 2022-06-07 シャワープレート Active JP7675814B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2021095171 2021-06-07
JP2021095171 2021-06-07
PCT/JP2022/022978 WO2022260042A1 (ja) 2021-06-07 2022-06-07 シャワープレート

Publications (3)

Publication Number Publication Date
JPWO2022260042A1 JPWO2022260042A1 (https=) 2022-12-15
JPWO2022260042A5 true JPWO2022260042A5 (https=) 2024-03-06
JP7675814B2 JP7675814B2 (ja) 2025-05-13

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ID=84425074

Family Applications (1)

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JP2023527875A Active JP7675814B2 (ja) 2021-06-07 2022-06-07 シャワープレート

Country Status (3)

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US (1) US12539520B2 (https=)
JP (1) JP7675814B2 (https=)
WO (1) WO2022260042A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102752082B1 (ko) * 2023-12-12 2025-01-10 주식회사 미코세라믹스 퍼지 가스 유로를 구비하는 서셉터
WO2026029004A1 (ja) * 2024-07-30 2026-02-05 京セラ株式会社 熱交換器

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5900103A (en) * 1994-04-20 1999-05-04 Tokyo Electron Limited Plasma treatment method and apparatus
JPH0945624A (ja) * 1995-07-27 1997-02-14 Tokyo Electron Ltd 枚葉式の熱処理装置
JP3649267B2 (ja) 1996-10-11 2005-05-18 株式会社荏原製作所 反応ガス噴射ヘッド
KR100492258B1 (ko) 1996-10-11 2005-09-02 가부시키가이샤 에바라 세이사꾸쇼 반응가스분출헤드
JPH11302850A (ja) * 1998-04-17 1999-11-02 Ebara Corp ガス噴射装置
JP2004281648A (ja) * 2003-03-14 2004-10-07 Matsushita Electric Ind Co Ltd 半導体装置の製造方法
JP4877748B2 (ja) * 2006-03-31 2012-02-15 東京エレクトロン株式会社 基板処理装置および処理ガス吐出機構
WO2009042137A2 (en) * 2007-09-25 2009-04-02 Lam Research Corporation Temperature control modules for showerhead electrode assemblies for plasma processing apparatuses
KR20210018232A (ko) 2018-06-07 2021-02-17 도쿄엘렉트론가부시키가이샤 기판 처리 장치 및 샤워 헤드
JP7042170B2 (ja) * 2018-06-22 2022-03-25 日本特殊陶業株式会社 シャワーヘッド用ガス分配体
KR102204026B1 (ko) 2018-07-06 2021-01-18 주식회사 케이에스엠컴포넌트 세라믹 샤워 헤드 및 그를 구비한 화학 기상 증착 장치

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