JP7675814B2 - シャワープレート - Google Patents

シャワープレート Download PDF

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Publication number
JP7675814B2
JP7675814B2 JP2023527875A JP2023527875A JP7675814B2 JP 7675814 B2 JP7675814 B2 JP 7675814B2 JP 2023527875 A JP2023527875 A JP 2023527875A JP 2023527875 A JP2023527875 A JP 2023527875A JP 7675814 B2 JP7675814 B2 JP 7675814B2
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JP
Japan
Prior art keywords
base
cavity
flow path
shower plate
intermediate flow
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2023527875A
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English (en)
Japanese (ja)
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JPWO2022260042A1 (https=
JPWO2022260042A5 (https=
Inventor
大貴 渡邉
美紀 ▲濱▼田
裕作 石峯
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Corp
Original Assignee
Kyocera Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyocera Corp filed Critical Kyocera Corp
Publication of JPWO2022260042A1 publication Critical patent/JPWO2022260042A1/ja
Publication of JPWO2022260042A5 publication Critical patent/JPWO2022260042A5/ja
Application granted granted Critical
Publication of JP7675814B2 publication Critical patent/JP7675814B2/ja
Active legal-status Critical Current
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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B1/00—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means
    • B05B1/24—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means incorporating means for heating the liquid or other fluent material, e.g. electrically
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563—Gas nozzles
    • C23C16/45565—Shower nozzles
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563—Gas nozzles
    • C23C16/4557—Heated nozzles
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/10—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor
    • H05B3/18—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor the conductor being embedded in an insulating material
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B1/00—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means
    • B05B1/005—Nozzles or other outlets specially adapted for discharging one or more gases
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B1/00—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means
    • B05B1/14—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means with multiple outlet openings; with strainers in or outside the outlet opening

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Resistance Heating (AREA)
  • Surface Heating Bodies (AREA)
JP2023527875A 2021-06-07 2022-06-07 シャワープレート Active JP7675814B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2021095171 2021-06-07
JP2021095171 2021-06-07
PCT/JP2022/022978 WO2022260042A1 (ja) 2021-06-07 2022-06-07 シャワープレート

Publications (3)

Publication Number Publication Date
JPWO2022260042A1 JPWO2022260042A1 (https=) 2022-12-15
JPWO2022260042A5 JPWO2022260042A5 (https=) 2024-03-06
JP7675814B2 true JP7675814B2 (ja) 2025-05-13

Family

ID=84425074

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023527875A Active JP7675814B2 (ja) 2021-06-07 2022-06-07 シャワープレート

Country Status (3)

Country Link
US (1) US12539520B2 (https=)
JP (1) JP7675814B2 (https=)
WO (1) WO2022260042A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102752082B1 (ko) * 2023-12-12 2025-01-10 주식회사 미코세라믹스 퍼지 가스 유로를 구비하는 서셉터
WO2026029004A1 (ja) * 2024-07-30 2026-02-05 京セラ株式会社 熱交換器

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004281648A (ja) 2003-03-14 2004-10-07 Matsushita Electric Ind Co Ltd 半導体装置の製造方法
JP2007273747A (ja) 2006-03-31 2007-10-18 Tokyo Electron Ltd 基板処理装置および処理ガス吐出機構
JP2010541239A (ja) 2007-09-25 2010-12-24 ラム リサーチ コーポレーション プラズマ処理装置のためのシャワーヘッド電極アセンブリ用温度制御モジュール
WO2019235282A1 (ja) 2018-06-07 2019-12-12 東京エレクトロン株式会社 基板処理装置およびシャワーヘッド
JP2019220639A (ja) 2018-06-22 2019-12-26 日本特殊陶業株式会社 シャワーヘッド用ガス分配体

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5900103A (en) * 1994-04-20 1999-05-04 Tokyo Electron Limited Plasma treatment method and apparatus
JPH0945624A (ja) * 1995-07-27 1997-02-14 Tokyo Electron Ltd 枚葉式の熱処理装置
JP3649267B2 (ja) 1996-10-11 2005-05-18 株式会社荏原製作所 反応ガス噴射ヘッド
KR100492258B1 (ko) 1996-10-11 2005-09-02 가부시키가이샤 에바라 세이사꾸쇼 반응가스분출헤드
JPH11302850A (ja) * 1998-04-17 1999-11-02 Ebara Corp ガス噴射装置
KR102204026B1 (ko) 2018-07-06 2021-01-18 주식회사 케이에스엠컴포넌트 세라믹 샤워 헤드 및 그를 구비한 화학 기상 증착 장치

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004281648A (ja) 2003-03-14 2004-10-07 Matsushita Electric Ind Co Ltd 半導体装置の製造方法
JP2007273747A (ja) 2006-03-31 2007-10-18 Tokyo Electron Ltd 基板処理装置および処理ガス吐出機構
JP2010541239A (ja) 2007-09-25 2010-12-24 ラム リサーチ コーポレーション プラズマ処理装置のためのシャワーヘッド電極アセンブリ用温度制御モジュール
WO2019235282A1 (ja) 2018-06-07 2019-12-12 東京エレクトロン株式会社 基板処理装置およびシャワーヘッド
JP2019220639A (ja) 2018-06-22 2019-12-26 日本特殊陶業株式会社 シャワーヘッド用ガス分配体

Also Published As

Publication number Publication date
US12539520B2 (en) 2026-02-03
JPWO2022260042A1 (https=) 2022-12-15
US20240226922A9 (en) 2024-07-11
WO2022260042A1 (ja) 2022-12-15
US20240131534A1 (en) 2024-04-25

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