JPWO2022260042A1 - - Google Patents

Info

Publication number
JPWO2022260042A1
JPWO2022260042A1 JP2023527875A JP2023527875A JPWO2022260042A1 JP WO2022260042 A1 JPWO2022260042 A1 JP WO2022260042A1 JP 2023527875 A JP2023527875 A JP 2023527875A JP 2023527875 A JP2023527875 A JP 2023527875A JP WO2022260042 A1 JPWO2022260042 A1 JP WO2022260042A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2023527875A
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Japanese (ja)
Other versions
JP7675814B2 (ja
JPWO2022260042A5 (https=
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed filed Critical
Publication of JPWO2022260042A1 publication Critical patent/JPWO2022260042A1/ja
Publication of JPWO2022260042A5 publication Critical patent/JPWO2022260042A5/ja
Application granted granted Critical
Publication of JP7675814B2 publication Critical patent/JP7675814B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B1/00—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means
    • B05B1/24—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means incorporating means for heating the liquid or other fluent material, e.g. electrically
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563—Gas nozzles
    • C23C16/45565—Shower nozzles
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563—Gas nozzles
    • C23C16/4557—Heated nozzles
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/10—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor
    • H05B3/18—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor the conductor being embedded in an insulating material
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B1/00—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means
    • B05B1/005—Nozzles or other outlets specially adapted for discharging one or more gases
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B1/00—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means
    • B05B1/14—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means with multiple outlet openings; with strainers in or outside the outlet opening

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Resistance Heating (AREA)
  • Surface Heating Bodies (AREA)
JP2023527875A 2021-06-07 2022-06-07 シャワープレート Active JP7675814B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2021095171 2021-06-07
JP2021095171 2021-06-07
PCT/JP2022/022978 WO2022260042A1 (ja) 2021-06-07 2022-06-07 シャワープレート

Publications (3)

Publication Number Publication Date
JPWO2022260042A1 true JPWO2022260042A1 (https=) 2022-12-15
JPWO2022260042A5 JPWO2022260042A5 (https=) 2024-03-06
JP7675814B2 JP7675814B2 (ja) 2025-05-13

Family

ID=84425074

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023527875A Active JP7675814B2 (ja) 2021-06-07 2022-06-07 シャワープレート

Country Status (3)

Country Link
US (1) US12539520B2 (https=)
JP (1) JP7675814B2 (https=)
WO (1) WO2022260042A1 (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN120149192A (zh) * 2023-12-12 2025-06-13 美科陶瓷科技有限公司 具有吹扫气体流路的基座

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2026029004A1 (ja) * 2024-07-30 2026-02-05 京セラ株式会社 熱交換器

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0945624A (ja) * 1995-07-27 1997-02-14 Tokyo Electron Ltd 枚葉式の熱処理装置
JPH10168572A (ja) * 1996-10-11 1998-06-23 Ebara Corp 反応ガス噴射ヘッド
JPH11302850A (ja) * 1998-04-17 1999-11-02 Ebara Corp ガス噴射装置
JP2004281648A (ja) * 2003-03-14 2004-10-07 Matsushita Electric Ind Co Ltd 半導体装置の製造方法
JP2007273747A (ja) * 2006-03-31 2007-10-18 Tokyo Electron Ltd 基板処理装置および処理ガス吐出機構
JP2010541239A (ja) * 2007-09-25 2010-12-24 ラム リサーチ コーポレーション プラズマ処理装置のためのシャワーヘッド電極アセンブリ用温度制御モジュール
WO2019235282A1 (ja) * 2018-06-07 2019-12-12 東京エレクトロン株式会社 基板処理装置およびシャワーヘッド
JP2019220639A (ja) * 2018-06-22 2019-12-26 日本特殊陶業株式会社 シャワーヘッド用ガス分配体

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5900103A (en) * 1994-04-20 1999-05-04 Tokyo Electron Limited Plasma treatment method and apparatus
KR100492258B1 (ko) 1996-10-11 2005-09-02 가부시키가이샤 에바라 세이사꾸쇼 반응가스분출헤드
KR102204026B1 (ko) 2018-07-06 2021-01-18 주식회사 케이에스엠컴포넌트 세라믹 샤워 헤드 및 그를 구비한 화학 기상 증착 장치

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0945624A (ja) * 1995-07-27 1997-02-14 Tokyo Electron Ltd 枚葉式の熱処理装置
JPH10168572A (ja) * 1996-10-11 1998-06-23 Ebara Corp 反応ガス噴射ヘッド
JPH11302850A (ja) * 1998-04-17 1999-11-02 Ebara Corp ガス噴射装置
JP2004281648A (ja) * 2003-03-14 2004-10-07 Matsushita Electric Ind Co Ltd 半導体装置の製造方法
JP2007273747A (ja) * 2006-03-31 2007-10-18 Tokyo Electron Ltd 基板処理装置および処理ガス吐出機構
JP2010541239A (ja) * 2007-09-25 2010-12-24 ラム リサーチ コーポレーション プラズマ処理装置のためのシャワーヘッド電極アセンブリ用温度制御モジュール
WO2019235282A1 (ja) * 2018-06-07 2019-12-12 東京エレクトロン株式会社 基板処理装置およびシャワーヘッド
JP2019220639A (ja) * 2018-06-22 2019-12-26 日本特殊陶業株式会社 シャワーヘッド用ガス分配体

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN120149192A (zh) * 2023-12-12 2025-06-13 美科陶瓷科技有限公司 具有吹扫气体流路的基座

Also Published As

Publication number Publication date
JP7675814B2 (ja) 2025-05-13
US12539520B2 (en) 2026-02-03
US20240226922A9 (en) 2024-07-11
WO2022260042A1 (ja) 2022-12-15
US20240131534A1 (en) 2024-04-25

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