JPWO2021187574A5 - - Google Patents

Download PDF

Info

Publication number
JPWO2021187574A5
JPWO2021187574A5 JP2021517064A JP2021517064A JPWO2021187574A5 JP WO2021187574 A5 JPWO2021187574 A5 JP WO2021187574A5 JP 2021517064 A JP2021517064 A JP 2021517064A JP 2021517064 A JP2021517064 A JP 2021517064A JP WO2021187574 A5 JPWO2021187574 A5 JP WO2021187574A5
Authority
JP
Japan
Prior art keywords
producing
light
film
transparent conductive
conductive layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2021517064A
Other languages
English (en)
Japanese (ja)
Other versions
JPWO2021187574A1 (https=
JP7451505B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/JP2021/011149 external-priority patent/WO2021187574A1/ja
Publication of JPWO2021187574A1 publication Critical patent/JPWO2021187574A1/ja
Publication of JPWO2021187574A5 publication Critical patent/JPWO2021187574A5/ja
Application granted granted Critical
Publication of JP7451505B2 publication Critical patent/JP7451505B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2021517064A 2020-03-19 2021-03-18 透明導電性フィルムの製造方法 Active JP7451505B2 (ja)

Applications Claiming Priority (17)

Application Number Priority Date Filing Date Title
JP2020049864 2020-03-19
JP2020049864 2020-03-19
JP2020074853 2020-04-20
JP2020074853 2020-04-20
JP2020074854 2020-04-20
JP2020074854 2020-04-20
JP2020134832 2020-08-07
JP2020134833 2020-08-07
JP2020134833 2020-08-07
JP2020134832 2020-08-07
JP2020140238 2020-08-21
JP2020140238 2020-08-21
JP2020200422 2020-12-02
JP2020200422 2020-12-02
JP2020200421 2020-12-02
JP2020200421 2020-12-02
PCT/JP2021/011149 WO2021187574A1 (ja) 2020-03-19 2021-03-18 透明導電性フィルムの製造方法

Publications (3)

Publication Number Publication Date
JPWO2021187574A1 JPWO2021187574A1 (https=) 2021-09-23
JPWO2021187574A5 true JPWO2021187574A5 (https=) 2023-03-29
JP7451505B2 JP7451505B2 (ja) 2024-03-18

Family

ID=77771038

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021517064A Active JP7451505B2 (ja) 2020-03-19 2021-03-18 透明導電性フィルムの製造方法

Country Status (5)

Country Link
JP (1) JP7451505B2 (https=)
KR (1) KR20220155279A (https=)
CN (1) CN115298756B (https=)
TW (1) TW202145259A (https=)
WO (1) WO2021187574A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20250129468A1 (en) * 2023-10-18 2025-04-24 Northrop Grumman Systems Corporation Sputtering of high-quality superconducting thin films
CN120717705B (zh) * 2025-09-04 2025-12-16 洛阳理工学院 一种高透ito导电玻璃及其制备方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05334924A (ja) * 1992-05-29 1993-12-17 Tonen Corp 透明導電薄膜の製造法
JPH0641723A (ja) * 1992-07-27 1994-02-15 Tonen Corp 透明導電膜
JPH07262829A (ja) * 1994-03-25 1995-10-13 Hitachi Ltd 透明導電膜及びその形成方法
JP2000038654A (ja) * 1998-07-21 2000-02-08 Nippon Sheet Glass Co Ltd 透明導電膜付き基板の製造方法、透明導電膜付き基板およびそれを用いた液晶表示素子
JP5543907B2 (ja) * 2010-12-24 2014-07-09 日東電工株式会社 透明導電性フィルムおよびその製造方法
JP6435597B2 (ja) * 2013-09-13 2018-12-12 東ソー株式会社 透明導電性フィルム及びその製造方法
JP6211557B2 (ja) * 2014-04-30 2017-10-11 日東電工株式会社 透明導電性フィルム及びその製造方法
WO2015178298A1 (ja) * 2014-05-20 2015-11-26 日東電工株式会社 透明導電性フィルムおよびその製造方法
JP2019003900A (ja) * 2017-06-19 2019-01-10 学校法人 工学院大学 透明導電膜、透明導電膜つき透明基板、透明導電膜つき透明基板の製造方法、タッチパネル

Similar Documents

Publication Publication Date Title
JPWO2021187574A5 (https=)
JPWO2021187573A5 (https=)
CN102881357B (zh) 一种复合透明导电薄膜
JP2011501426A5 (https=)
CN109728162B (zh) 相变薄膜、相变存储单元及其制备方法及相变存储器
US10236398B2 (en) Method for manufacturing transparent electrode
JP2013524537A5 (https=)
JP2010157681A5 (https=)
JP2007526601A5 (https=)
JP2008123664A5 (https=)
CN107634328A (zh) 一种石墨烯透明天线及其制备方法
JPH11195711A5 (ja) 半導体装置
CN103280525A (zh) 一种透明阻变存储器及其制备方法
CN106298083A (zh) 一种柔性透明电极的制备方法
CN110571331A (zh) 抗应力的超晶格相变存储单元、其制备方法与相变存储器
CN104317162A (zh) 一种石墨烯的化学图形化方法
JP2004079606A5 (https=)
CN105525265A (zh) 复合相变薄膜材料(Si/Ge2Sb2Te5/Si)n及其制备方法
CN105448674B (zh) N型半导体层以及n型薄膜晶体管的制备方法
CN205140537U (zh) 一种石墨烯复合电极
KR20150075173A (ko) 투명 전도성 산화물과 은 나노 와이어를 포함하는 투명 전극 및 그 제조방법
CN107628605B (zh) 一种三步法制备无需转移的石墨烯的方法
CN118064853A (zh) 一种导电azo陶瓷膜的制备方法
CN117042479A (zh) 一种高导电性透明导电电极及其制备方法和应用
JP2009099327A5 (https=)