JPWO2021187574A5 - - Google Patents

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JPWO2021187574A5
JPWO2021187574A5 JP2021517064A JP2021517064A JPWO2021187574A5 JP WO2021187574 A5 JPWO2021187574 A5 JP WO2021187574A5 JP 2021517064 A JP2021517064 A JP 2021517064A JP 2021517064 A JP2021517064 A JP 2021517064A JP WO2021187574 A5 JPWO2021187574 A5 JP WO2021187574A5
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JP
Japan
Prior art keywords
producing
light
film
transparent conductive
conductive layer
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JP2021517064A
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English (en)
Japanese (ja)
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JP7451505B2 (ja
JPWO2021187574A1 (https=
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Priority claimed from PCT/JP2021/011149 external-priority patent/WO2021187574A1/ja
Publication of JPWO2021187574A1 publication Critical patent/JPWO2021187574A1/ja
Publication of JPWO2021187574A5 publication Critical patent/JPWO2021187574A5/ja
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JP2021517064A 2020-03-19 2021-03-18 透明導電性フィルムの製造方法 Active JP7451505B2 (ja)

Applications Claiming Priority (17)

Application Number Priority Date Filing Date Title
JP2020049864 2020-03-19
JP2020049864 2020-03-19
JP2020074854 2020-04-20
JP2020074853 2020-04-20
JP2020074853 2020-04-20
JP2020074854 2020-04-20
JP2020134832 2020-08-07
JP2020134833 2020-08-07
JP2020134833 2020-08-07
JP2020134832 2020-08-07
JP2020140238 2020-08-21
JP2020140238 2020-08-21
JP2020200421 2020-12-02
JP2020200421 2020-12-02
JP2020200422 2020-12-02
JP2020200422 2020-12-02
PCT/JP2021/011149 WO2021187574A1 (ja) 2020-03-19 2021-03-18 透明導電性フィルムの製造方法

Publications (3)

Publication Number Publication Date
JPWO2021187574A1 JPWO2021187574A1 (https=) 2021-09-23
JPWO2021187574A5 true JPWO2021187574A5 (https=) 2023-03-29
JP7451505B2 JP7451505B2 (ja) 2024-03-18

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ID=77771038

Family Applications (1)

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JP2021517064A Active JP7451505B2 (ja) 2020-03-19 2021-03-18 透明導電性フィルムの製造方法

Country Status (5)

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JP (1) JP7451505B2 (https=)
KR (1) KR20220155279A (https=)
CN (1) CN115298756B (https=)
TW (1) TW202145259A (https=)
WO (1) WO2021187574A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20250129468A1 (en) * 2023-10-18 2025-04-24 Northrop Grumman Systems Corporation Sputtering of high-quality superconducting thin films
CN120717705B (zh) * 2025-09-04 2025-12-16 洛阳理工学院 一种高透ito导电玻璃及其制备方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05334924A (ja) * 1992-05-29 1993-12-17 Tonen Corp 透明導電薄膜の製造法
JPH0641723A (ja) * 1992-07-27 1994-02-15 Tonen Corp 透明導電膜
JPH07262829A (ja) * 1994-03-25 1995-10-13 Hitachi Ltd 透明導電膜及びその形成方法
JP2000038654A (ja) * 1998-07-21 2000-02-08 Nippon Sheet Glass Co Ltd 透明導電膜付き基板の製造方法、透明導電膜付き基板およびそれを用いた液晶表示素子
JP5543907B2 (ja) * 2010-12-24 2014-07-09 日東電工株式会社 透明導電性フィルムおよびその製造方法
JP6435597B2 (ja) * 2013-09-13 2018-12-12 東ソー株式会社 透明導電性フィルム及びその製造方法
JP6211557B2 (ja) * 2014-04-30 2017-10-11 日東電工株式会社 透明導電性フィルム及びその製造方法
CN105637111A (zh) * 2014-05-20 2016-06-01 日东电工株式会社 透明导电性薄膜及其制造方法
JP2019003900A (ja) 2017-06-19 2019-01-10 学校法人 工学院大学 透明導電膜、透明導電膜つき透明基板、透明導電膜つき透明基板の製造方法、タッチパネル

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