JPWO2021106460A5 - - Google Patents

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Publication number
JPWO2021106460A5
JPWO2021106460A5 JP2021561230A JP2021561230A JPWO2021106460A5 JP WO2021106460 A5 JPWO2021106460 A5 JP WO2021106460A5 JP 2021561230 A JP2021561230 A JP 2021561230A JP 2021561230 A JP2021561230 A JP 2021561230A JP WO2021106460 A5 JPWO2021106460 A5 JP WO2021106460A5
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JP
Japan
Prior art keywords
mass
alkylammonium fluoride
content
quaternary alkylammonium
cleaning composition
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JP2021561230A
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English (en)
Japanese (ja)
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JP7619277B2 (ja
JPWO2021106460A1 (https=
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Priority claimed from PCT/JP2020/039997 external-priority patent/WO2021106460A1/ja
Publication of JPWO2021106460A1 publication Critical patent/JPWO2021106460A1/ja
Publication of JPWO2021106460A5 publication Critical patent/JPWO2021106460A5/ja
Application granted granted Critical
Publication of JP7619277B2 publication Critical patent/JP7619277B2/ja
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JP2021561230A 2019-11-25 2020-10-23 分解洗浄組成物の製造方法 Active JP7619277B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2019212251 2019-11-25
JP2019212251 2019-11-25
PCT/JP2020/039997 WO2021106460A1 (ja) 2019-11-25 2020-10-23 分解洗浄組成物の製造方法

Publications (3)

Publication Number Publication Date
JPWO2021106460A1 JPWO2021106460A1 (https=) 2021-06-03
JPWO2021106460A5 true JPWO2021106460A5 (https=) 2022-07-21
JP7619277B2 JP7619277B2 (ja) 2025-01-22

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JP2021561230A Active JP7619277B2 (ja) 2019-11-25 2020-10-23 分解洗浄組成物の製造方法

Country Status (6)

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US (1) US12545862B2 (https=)
JP (1) JP7619277B2 (https=)
KR (1) KR102772597B1 (https=)
CN (1) CN114746536B (https=)
TW (1) TWI776264B (https=)
WO (1) WO2021106460A1 (https=)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115315788B (zh) * 2020-03-23 2026-03-20 日产化学株式会社 半导体基板的清洗方法、经加工的半导体基板的制造方法以及剥离用组合物
CN116507683B (zh) * 2021-09-16 2025-03-28 日产化学株式会社 半导体基板的清洗方法、经加工的半导体基板的制造方法以及剥离和溶解用组合物
KR20240036038A (ko) * 2021-12-24 2024-03-19 가부시끼가이샤 레조낙 분해 세정 조성물 및 그 제조 방법
JPWO2024058018A1 (https=) * 2022-09-13 2024-03-21
EP4571819A4 (en) * 2022-09-13 2025-12-31 Nissan Chemical Corp METHOD FOR CLEANING A SEMICONDUCTIVE SUBSTRATE, METHOD FOR PRODUCING A TREATMENTED SEMICONDUCTIVE SUBSTRATE, AND PEEL AND DISSOLUTION COMPOSITION
JPWO2024176810A1 (https=) * 2023-02-20 2024-08-29

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NL95122C (https=) * 1954-11-22
US3673099A (en) 1970-10-19 1972-06-27 Bell Telephone Labor Inc Process and composition for stripping cured resins from substrates
US4428871A (en) 1981-09-23 1984-01-31 J. T. Baker Chemical Company Stripping compositions and methods of stripping resists
US4744834A (en) 1986-04-30 1988-05-17 Noor Haq Photoresist stripper comprising a pyrrolidinone, a diethylene glycol ether, a polyglycol and a quaternary ammonium hydroxide
US20040084060A1 (en) * 1999-05-28 2004-05-06 Peter Zhu Method and kit for removing aldehyde-based stains
US6576734B1 (en) * 1999-12-16 2003-06-10 Chisso Corporation Modified polyorganosiloxane and method for producing it
US6475292B1 (en) * 2000-07-31 2002-11-05 Shipley Company, L.L.C. Photoresist stripping method
WO2004094581A1 (en) 2003-04-18 2004-11-04 Ekc Technology, Inc. Aqueous fluoride compositions for cleaning semiconductor devices
US8030263B2 (en) * 2004-07-01 2011-10-04 Air Products And Chemicals, Inc. Composition for stripping and cleaning and use thereof
US7632796B2 (en) * 2005-10-28 2009-12-15 Dynaloy, Llc Dynamic multi-purpose composition for the removal of photoresists and method for its use
JP5513994B2 (ja) * 2010-06-01 2014-06-04 出光興産株式会社 洗浄剤組成物及びそれを用いたエアゾール組成物
EP2497844A1 (en) * 2011-03-10 2012-09-12 Kao Corporation, S.A. Quaternary ammonium esters (Esterquats) containing composition for inhibiting corrosion of metal surface
JP6165665B2 (ja) 2013-05-30 2017-07-19 信越化学工業株式会社 基板の洗浄方法
CN107034028B (zh) * 2015-12-04 2021-05-25 三星电子株式会社 用于除去有机硅树脂的组合物、使用其薄化基材和制造半导体封装体的方法及使用其的系统
KR102067444B1 (ko) 2015-12-11 2020-01-17 후지필름 가부시키가이샤 반도체 디바이스용 처리액의 보관 방법, 처리액 수용체
KR102295991B1 (ko) 2017-08-31 2021-09-01 후지필름 가부시키가이샤 처리액, 키트, 기판의 세정 방법
US11787908B2 (en) * 2018-12-21 2023-10-17 Dow Silicones Corporation Methods for making polyfunctional organosiloxanes and compositions containing same
JP7219423B2 (ja) * 2019-02-15 2023-02-08 日産化学株式会社 洗浄剤組成物及び洗浄方法
WO2020179819A1 (ja) * 2019-03-05 2020-09-10 日産化学株式会社 洗浄剤組成物及び洗浄方法
US11732214B2 (en) * 2019-11-20 2023-08-22 Nissan Chemical Corporation Cleaning agent composition comprising an alkylamide solvent and a fluorine-containing quaternary ammonium salt

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