JP6165665B2 - 基板の洗浄方法 - Google Patents
基板の洗浄方法 Download PDFInfo
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- JP6165665B2 JP6165665B2 JP2014079883A JP2014079883A JP6165665B2 JP 6165665 B2 JP6165665 B2 JP 6165665B2 JP 2014079883 A JP2014079883 A JP 2014079883A JP 2014079883 A JP2014079883 A JP 2014079883A JP 6165665 B2 JP6165665 B2 JP 6165665B2
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- LRGJRHZIDJQFCL-UHFFFAOYSA-M tetraethylazanium;hydroxide Chemical compound [OH-].CC[N+](CC)(CC)CC LRGJRHZIDJQFCL-UHFFFAOYSA-M 0.000 claims description 12
- 150000003242 quaternary ammonium salts Chemical class 0.000 claims description 11
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- 238000001556 precipitation Methods 0.000 description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
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- QWOZZTWBWQMEPD-UHFFFAOYSA-N 1-(2-ethoxypropoxy)propan-2-ol Chemical compound CCOC(C)COCC(C)O QWOZZTWBWQMEPD-UHFFFAOYSA-N 0.000 description 1
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- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 1
- GZMAAYIALGURDQ-UHFFFAOYSA-N 2-(2-hexoxyethoxy)ethanol Chemical compound CCCCCCOCCOCCO GZMAAYIALGURDQ-UHFFFAOYSA-N 0.000 description 1
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- WAEVWDZKMBQDEJ-UHFFFAOYSA-N 2-[2-(2-methoxypropoxy)propoxy]propan-1-ol Chemical compound COC(C)COC(C)COC(C)CO WAEVWDZKMBQDEJ-UHFFFAOYSA-N 0.000 description 1
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- RRVHYCIYDCQSDQ-UHFFFAOYSA-N CC(CC(C)O)C.CC(CO)CCC Chemical compound CC(CC(C)O)C.CC(CO)CCC RRVHYCIYDCQSDQ-UHFFFAOYSA-N 0.000 description 1
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- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
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- 239000003795 chemical substances by application Substances 0.000 description 1
- OEYIOHPDSNJKLS-UHFFFAOYSA-N choline Chemical compound C[N+](C)(C)CCO OEYIOHPDSNJKLS-UHFFFAOYSA-N 0.000 description 1
- 229960001231 choline Drugs 0.000 description 1
- 239000012459 cleaning agent Substances 0.000 description 1
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- 229940075557 diethylene glycol monoethyl ether Drugs 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
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- 238000010438 heat treatment Methods 0.000 description 1
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- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- 125000002768 hydroxyalkyl group Chemical group 0.000 description 1
- 229940035429 isobutyl alcohol Drugs 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- JCGNDDUYTRNOFT-UHFFFAOYSA-N oxolane-2,4-dione Chemical compound O=C1COC(=O)C1 JCGNDDUYTRNOFT-UHFFFAOYSA-N 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
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- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
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- 238000004528 spin coating Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/20—Organic compounds containing oxygen
- C11D3/2003—Alcohols; Phenols
- C11D3/2006—Monohydric alcohols
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/32—Organic compounds containing nitrogen
- C11D7/3209—Amines or imines with one to four nitrogen atoms; Quaternized amines
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/20—Organic compounds containing oxygen
- C11D3/2003—Alcohols; Phenols
- C11D3/2006—Monohydric alcohols
- C11D3/201—Monohydric alcohols linear
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/20—Organic compounds containing oxygen
- C11D3/2003—Alcohols; Phenols
- C11D3/2041—Dihydric alcohols
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/20—Organic compounds containing oxygen
- C11D3/2003—Alcohols; Phenols
- C11D3/2041—Dihydric alcohols
- C11D3/2044—Dihydric alcohols linear
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/20—Organic compounds containing oxygen
- C11D3/2068—Ethers
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/26—Organic compounds containing nitrogen
- C11D3/30—Amines; Substituted amines ; Quaternized amines
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/50—Solvents
- C11D7/5004—Organic solvents
- C11D7/5022—Organic solvents containing oxygen
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
- H01L21/02057—Cleaning during device manufacture
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
- H01L21/02057—Cleaning during device manufacture
- H01L21/02068—Cleaning during device manufacture during, before or after processing of conductive layers, e.g. polysilicon or amorphous silicon layers
- H01L21/02074—Cleaning during device manufacture during, before or after processing of conductive layers, e.g. polysilicon or amorphous silicon layers the processing being a planarization of conductive layers
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- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
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Description
(A)第四級アンモニウム塩:0.1〜2.0質量%
(B)水:0.1〜4.0質量%
(C)有機溶媒:94.0〜99.8質量%
を含有してなるものであることを特徴とする基板の洗浄剤組成物を提供する。
接触角を100度未満にすることにより半導体パッケージ材等の積層体に用いられる場合において、封止材との接着力等の効果が格段に向上するものを得ることができる。
前述のように、シリコン半導体基板等の基板を短時間で十分に洗浄することが可能で、高効率で良好な基板の洗浄が可能な洗浄剤組成物の開発が望まれていた。
本発明の基板表面の洗浄に用いられる洗浄剤組成物は、
(A)第四級アンモニウム塩:0.1〜2.0質量%
(B)水:0.1〜4.0質量%
(C)有機溶媒:94.0〜99.8質量%
を含有してなる洗浄剤組成物である。
本発明の目的を達しうる第四級アンモニウム塩は、第四級アンモニウム水酸化物、第四級アンモニウム塩化物等が挙げられ、この第四級アンモニウム水酸化物としては炭素数1〜5の直鎖状アルキル基を有するテトラアルキルアンモニウム、炭素数1〜5のアルキル基及び炭素数1〜5のヒドロキシアルキル基を有するトリアルキルヒドロキシアルキルアンモニウムヒドロキシド等が挙げられ、テトラメチルアンモニウムヒドロキシド(TMAH)、テトラエチルアンモニウムヒドロキシド(TEAH)、テトラプロピルアンモニウムヒドロキシド(TPAH)、テトラブチルアンモニウムヒドロキシド(TBAH)、トリメチル(ヒドロキシエチル)アンモニウムヒドロキシド(通称:コリン)、トリエチル(ヒドロキシエチル)アンモニウムヒドロキシド等が挙げられる。上述の第四級アンモニウム塩の中で、洗浄性、洗浄液の安定性などの理由から、テトラアルキルアンモニウムヒドロキシド、特にテトラエチルアンモニウムヒドロキシド(TEAH)が好ましい。
本発明の目的を達しうる有機溶媒は、特に限定されないが、例えば分子中に少なくとも1個以上の水酸基を含有しており、例えば炭素数1〜8、好ましくは炭素数2〜7、さらに好ましくは炭素数3〜6の飽和脂肪族アルコール類、炭素数2〜16、好ましくは炭素数3〜14、好ましくは炭素数5〜12のグリコール類、炭素数4〜20、炭素数4〜18、炭素数4〜15のグリコールエーテル類等が挙げられ、1種または2種以上混合して
用いることができる。飽和脂肪族1価アルコール類としては、例えばメタノール、エタノール、n−プロピルアルコール、イソプロピルアルコール、1−ブタノール、2−ブタノール、イソブチルアルコール、tert−ブチルアルコール、1−ペンタノール、2−ペンタノール、3−ペンタノール、2−メチル−1−ブタノール、イソペンチルアルコール、sec−ブチルアルコール、tert−ペンチルアルコール、3−メチル−2−ブタノール、ネオペンチルアルコール、1−ヘキサノール、2−メチル−1−ペンタノール、4−メチル−2−ペンタノール、2−エチル−1−ブタノール、1−ヘプタノール、2−ヘプタノール、3−ヘプタノール、1−オクタノール、2−オクタノール、2−エチル−1−ヘキサノール、シクロヘキサノール、1−メチルシクロヘキサノール、2−メチルシクロヘキサノール、3−メチルシクロヘキサノール、4−メチルシクロヘキサノール、2−エチルヘキシルアルコール等が挙げられる。グリコール類としては、例えばエチレングリコール、プロピレングリコール、ブチレングリコール、ヘキシレングリコール、ジエチレングリコール、ジプロピレングリコール、トリメチレングリコール、トリエチレングリコール、テトラエチレングリコール、テトラエチレングリコール等が挙げられる。グリコールエーテル類としては、例えばエチレングリコールモノメチルエーテル、エチレングリコールモノエチルエーテル、エチレングリコールモノn−プロピルエーテル、エチレングリコールモノn−ブチルエーテル、ジエチレングリコールモノメチルエーテル、ジエチレングリコールモノエチルエーテル、ジエチレングリコールモノプロピルエーテル、ジエチレングリコールモノブチルエーテル、ジエチレングリコールモノヘキシルエーテル、トリエチレングリコールモノメチルエーテル、トリエチレングリコールモノエチルエーテル、プロピレングリコールモノメチルエーテル、プロピレングリコールモノエチルエーテル、プロピレングリコールモノプロピルエーテル、プロピレングリコールモノブチルエーテル、ジプロピレングリコールモノメチルエーテル、ジプロピレングリコールモノエチルエーテル、トリプロピレングリコールモノメチルエーテル、3−メトキシ−3−メチル−1−ブタノール等が挙げられる。
なかでも炭素数6〜12の高級有機溶剤を用いることが好ましく、特にプロピレングリコールモノブチルエーテルが好ましく用いることができる。
[基板の製造]
シリコーン樹脂ノナン溶液接着剤を用い、直径8インチシリコン半導体基板(直径200mm、厚さ:725μm)上にスピンコートにて10μmの膜厚で接着層を形成した。8インチガラス基板(ガラスウエハ)を支持基板とし、この支持基板と、接着層を有するシリコン半導体基板を真空接合装置内で200℃にて接合し、ウエハ、接着層、及び支持基板からなる積層体を作製した。その後グラインダーを用いてシリコン半導体基板の裏面研削を行った。最終基板厚50μmまでグラインドした。続いて積層基板のうちシリコン半導体基板を水平に固定しておき、支持基板を剥離した後、ノナンに6分間浸漬し、接着層を除去した後乾燥させることにより、洗浄試験用シリコン半導体基板を作製した。この時、基板表面の水接触角は108度であり、X線電子分光装置で基板表面の元素分析を行なった結果、Si含有率は23%であった。なお、Si含有率は、シリコン基板由来のSiは除く。
攪拌装置、冷却装置、温度計を取り付けた500mlフラスコに、TMAH・五水和物4g、水1g、1−ブトキシ−2−プロパノール95gを仕込み、室温で撹拌し、TMAH・五水和物を溶解させ洗浄剤組成物Aを得た。
攪拌装置、冷却装置、温度計を取り付けた500mlフラスコに、25%TPAH水溶液4g、1−プロポキシ−2−プロパノール96gを仕込み、室温で均一になるまで撹拌し、洗浄剤組成物Bを得た。
攪拌装置、冷却装置、温度計を取り付けた500mlフラスコに、37%TBAHメタノール溶液2.7g、水0.3g、1−ブタノール97gを仕込み、室温で均一になるまで撹拌し、洗浄剤組成物Cを得た。
攪拌装置、冷却装置、温度計を取り付けた500mlフラスコに、35%TEAH水溶液1.5g、1−ブトキシ−2−プロパノール98.5gを仕込み、室温で均一になるまで撹拌し、洗浄剤組成物Dを得た。
攪拌装置、冷却装置、温度計を取り付けた500mlフラスコに、35%TEAH水溶液1.5g、水0.5g、1−ヘキサノール49g、1−ブトキシ−2−プロパノール49gを仕込み、室温で均一になるまで撹拌し、洗浄剤組成物Eを得た。
攪拌装置、冷却装置、温度計を取り付けた500mlフラスコに、35%TEAH水溶液2.86g、水0.14g、ジプロピレングリコール48.5g、1−ブトキシ−2−プロパノール48.5gを仕込み、室温で均一になるまで撹拌し、洗浄剤組成物Fを得た。
攪拌装置、冷却装置、温度計を取り付けた500mlフラスコに、35%TEAH水溶液5.71g、水0.09g、メタノール47.15g、1−プロポキシ−2−プロパノール47.15gを仕込み、室温で均一になるまで撹拌し、洗浄剤組成物Gを得た。
攪拌装置、冷却装置、温度計を取り付けた500mlフラスコに、35%TEAH水溶液0.14g、水0.86g、1−ブトキシ−2−プロパノール99gを仕込み、室温で撹拌し洗浄剤組成物Hを得た。
攪拌装置、冷却装置、温度計を取り付けた500mlフラスコに、TMAH・五水和物6g、水2g、1−ブトキシ−2−プロパノール92gを仕込み、室温で撹拌し、TMAH・五水和物を溶解させ洗浄剤組成物Iを得たが、水層が分離し、良好な洗浄剤組成物を得ることはできなかった。
攪拌装置、冷却装置、温度計を取り付けた500mlフラスコに、水3g、1−プロポキシ−2−プロパノール97gを仕込み、室温で均一になるまで撹拌し、洗浄剤組成物Jを得た。
攪拌装置、冷却装置、温度計を取り付けた500mlフラスコに、10%TEAHプロピレングリコール溶液5g、1−ブトキシ−2−プロパノール95gを仕込み、室温で均一になるまで撹拌し、洗浄剤組成物Kを得た。
前記シリコン半導体基板を洗浄剤組成物A〜Kを用いて浸漬により6分間洗浄を行なった。洗浄剤組成物の評価として下記評価を行なった。各組成物の組成比と結果を表1に示す。
洗浄剤組成物の外観を目視にて確認した。沈殿物の析出や、水層の分離等の不具合を確認し、異常が確認されなかった場合は○、異常が確認された場合は×で示す。
製造されたシリコン半導体基板を、洗浄剤組成物A〜H及びJそしてKを用いて洗浄を行なった。具体的には洗浄液組成物A〜H及びJそしてKに任意の時間浸漬後、1分間純水で洗い流し、乾燥させたシリコン半導体基板表面の水接触角を確認した。洗浄前の水接触角は108°であり、接触角が30°未満となるまでに要した時間が、6分未満の場合は◎、6分以上10分未満の場合は○、10分以上場合は×で示す。
測定装置:協和界面科学(株)製 接触角計 DM−301
製造されたシリコン半導体基板を、洗浄剤組成物A〜H及びJそしてKを用いて洗浄を行なった。具体的には洗浄液組成物A〜H及びJそしてKに6分間浸漬後、1分間純水で洗い流し、乾燥させたシリコン半導体基板表面の水接触角を上記装置を用いて確認した。
製造されたシリコン半導体基板を、洗浄剤組成物A〜H及びJそしてKを用いて洗浄を行なった。具体的には洗浄液組成物A〜H及びJそしてKに6分間浸漬後、1分間純水で洗い流し、乾燥させたシリコン半導体基板表面をX線電子分光装置を用いて洗浄後基板表面の元素分析を行い、Si含有率を分析した。
測定装置:KRATOS製 AXIS−Ultra DLD
一方、本発明の基板の洗浄剤組成物の構成要件を満たさない比較例1〜比較例4において、良好な洗浄性を得ることはできず、また、基板の腐食も発生した。
これより、本発明の基板の洗浄剤組成物であれば、薄型基板でも短時間で良好な洗浄性が得られ、基板を腐食することなく高効率でシリコン半導体基板の洗浄が可能となることが確認された。
Claims (5)
- 表面がシリコーン系接着剤に汚染された水接触角が100度以上の基板の前記表面を、
(A)第四級アンモニウム塩:0.1〜2.0質量%
(B)水:0.1〜4.0質量%
(C)有機溶媒:94.0〜99.8質量%
を含有してなる基板の洗浄剤組成物により洗浄し、水接触角が10〜30度の基板を得る基板の洗浄方法であり、
前記有機溶媒を、分子中に少なくとも1個以上の水酸基を含有した有機溶媒であって、炭素数1〜8の飽和脂肪族アルコール、炭素数2〜16のグリコール、及び炭素数4〜20のグリコールエーテルのうち少なくとも1種以上を含むものとし、
前記洗浄される基板を厚さ20〜100μmの半導体パッケージ用に薄型加工された薄型基板とすることを特徴とする基板の洗浄方法。 - 前記洗浄される基板を、シリコン半導体基板とすることを特徴とする請求項1に記載の基板の洗浄方法。
- 前記第四級アンモニウム塩をテトラアルキルアンモニウムヒドロキシドとすることを特徴とする請求項1又は請求項2に記載の基板の洗浄方法。
- 前記テトラアルキルアンモニウムヒドロキシドをテトラエチルアンモニウムヒドロキシドとすることを特徴とする請求項3に記載の基板の洗浄方法。
- 前記有機溶媒を、炭素数1〜8の飽和脂肪族アルコールとすることを特徴とする請求項1乃至請求項4のいずれか1項に記載の基板の洗浄方法。
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US10894935B2 (en) | 2015-12-04 | 2021-01-19 | Samsung Electronics Co., Ltd. | Composition for removing silicone resins and method of thinning substrate by using the same |
JP6536464B2 (ja) | 2016-04-26 | 2019-07-03 | 信越化学工業株式会社 | 洗浄剤組成物及び薄型基板の製造方法 |
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TW201510214A (zh) | 2015-03-16 |
US20170130174A1 (en) | 2017-05-11 |
KR20140141482A (ko) | 2014-12-10 |
TWI601815B (zh) | 2017-10-11 |
US10260027B2 (en) | 2019-04-16 |
JP2015007217A (ja) | 2015-01-15 |
US20140357052A1 (en) | 2014-12-04 |
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