JPWO2021039274A5 - - Google Patents
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- Publication number
- JPWO2021039274A5 JPWO2021039274A5 JP2021542667A JP2021542667A JPWO2021039274A5 JP WO2021039274 A5 JPWO2021039274 A5 JP WO2021039274A5 JP 2021542667 A JP2021542667 A JP 2021542667A JP 2021542667 A JP2021542667 A JP 2021542667A JP WO2021039274 A5 JPWO2021039274 A5 JP WO2021039274A5
- Authority
- JP
- Japan
- Prior art keywords
- mass
- alkylammonium fluoride
- content
- quaternary
- quaternary alkylammonium
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2019154914 | 2019-08-27 | ||
| JP2019154914 | 2019-08-27 | ||
| PCT/JP2020/029340 WO2021039274A1 (ja) | 2019-08-27 | 2020-07-30 | 組成物、及び接着性ポリマーの洗浄方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPWO2021039274A1 JPWO2021039274A1 (https=) | 2021-03-04 |
| JPWO2021039274A5 true JPWO2021039274A5 (https=) | 2022-05-11 |
| JP7574798B2 JP7574798B2 (ja) | 2024-10-29 |
Family
ID=74685865
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2021542667A Active JP7574798B2 (ja) | 2019-08-27 | 2020-07-30 | 組成物、及び接着性ポリマーの洗浄方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US11781092B2 (https=) |
| JP (1) | JP7574798B2 (https=) |
| KR (1) | KR102669766B1 (https=) |
| CN (1) | CN114269892B (https=) |
| TW (1) | TWI758813B (https=) |
| WO (1) | WO2021039274A1 (https=) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102804998B1 (ko) * | 2020-03-23 | 2025-05-09 | 닛산 가가쿠 가부시키가이샤 | 반도체 기판의 세정 방법, 가공된 반도체 기판의 제조 방법 및 박리용 조성물 |
| US12577508B2 (en) * | 2020-04-09 | 2026-03-17 | Resonac Corporation | Composition, and method for cleaning adhesive polymer |
| WO2022244593A1 (ja) * | 2021-05-21 | 2022-11-24 | 昭和電工株式会社 | 分解洗浄組成物及びその製造方法、並びに接着性ポリマーの洗浄方法 |
| TW202504983A (zh) * | 2021-09-16 | 2025-02-01 | 日商日產化學股份有限公司 | 半導體基板之洗淨方法、加工後之半導體基板之製造方法、以及剝離及溶解用組成物 |
| CN116218612B (zh) * | 2021-12-06 | 2024-07-09 | 上海新阳半导体材料股份有限公司 | 一种聚酰亚胺清洗液在清洗半导体器件中的应用 |
| CN116218611B (zh) * | 2021-12-06 | 2024-06-21 | 上海新阳半导体材料股份有限公司 | 一种聚酰亚胺清洗液 |
| CN116218610B (zh) * | 2021-12-06 | 2024-07-09 | 上海新阳半导体材料股份有限公司 | 一种聚酰亚胺清洗液的制备方法 |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6652665B1 (en) | 2002-05-31 | 2003-11-25 | International Business Machines Corporation | Method of removing silicone polymer deposits from electronic components |
| JP2006176700A (ja) * | 2004-12-24 | 2006-07-06 | Tokuyama Corp | 洗浄剤組成物 |
| TWI339780B (en) * | 2005-07-28 | 2011-04-01 | Rohm & Haas Elect Mat | Stripper |
| CN101201556A (zh) * | 2006-12-15 | 2008-06-18 | 安集微电子（上海）有限公司 | 低蚀刻性光刻胶清洗剂 |
| US20080234162A1 (en) | 2007-03-21 | 2008-09-25 | General Chemical Performance Products Llc | Semiconductor etch residue remover and cleansing compositions |
| DE102011088885A1 (de) | 2011-12-16 | 2013-06-20 | Wacker Chemie Ag | Siliconlöser |
| BE1020269A5 (nl) * | 2012-01-17 | 2013-07-02 | Taminco | Gebruik van vervangende oplosmiddelen voor n-methylpyrrolidon (nmp). |
| JP2014133855A (ja) | 2012-12-11 | 2014-07-24 | Fujifilm Corp | シロキサン樹脂の除去剤、それを用いたシロキサン樹脂の除去方法並びに半導体基板製品及び半導体素子の製造方法 |
| US11978622B2 (en) * | 2014-06-30 | 2024-05-07 | Entegris, Inc. | Aqueous and semi-aqueous cleaners for the removal of post-etch residues with tungsten and cobalt compatibility |
| KR20160070386A (ko) * | 2014-12-10 | 2016-06-20 | 동우 화인켐 주식회사 | 실리콘계 수지 제거용 조성물 |
| KR102347599B1 (ko) * | 2014-12-16 | 2022-01-10 | 동우 화인켐 주식회사 | 실리콘계 수지 제거용 조성물 |
| JP6536464B2 (ja) | 2016-04-26 | 2019-07-03 | 信越化学工業株式会社 | 洗浄剤組成物及び薄型基板の製造方法 |
| KR102519448B1 (ko) * | 2017-03-24 | 2023-04-07 | 후지필름 일렉트로닉 머티리얼스 유.에스.에이., 아이엔씨. | 표면 처리 방법 및 이를 위한 조성물 |
| CN108929808B (zh) * | 2017-05-26 | 2020-11-27 | 荒川化学工业株式会社 | 无铅软钎料焊剂用清洗剂组合物、无铅软钎料焊剂的清洗方法 |
| PL3844142T3 (pl) * | 2018-08-30 | 2024-12-02 | Huntsman Petrochemical Llc | Czwartorzędowe wodorotlenki amoniowe poliamin |
| KR102181219B1 (ko) * | 2019-04-19 | 2020-11-20 | 동우 화인켐 주식회사 | 접착 폴리머 제거용 조성물 |
-
2020
- 2020-07-30 JP JP2021542667A patent/JP7574798B2/ja active Active
- 2020-07-30 KR KR1020227002686A patent/KR102669766B1/ko active Active
- 2020-07-30 CN CN202080058952.2A patent/CN114269892B/zh active Active
- 2020-07-30 US US17/634,625 patent/US11781092B2/en active Active
- 2020-07-30 WO PCT/JP2020/029340 patent/WO2021039274A1/ja not_active Ceased
- 2020-08-07 TW TW109126780A patent/TWI758813B/zh active
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