CN114269892B - 组合物、及粘接性聚合物的清洗方法 - Google Patents
组合物、及粘接性聚合物的清洗方法 Download PDFInfo
- Publication number
- CN114269892B CN114269892B CN202080058952.2A CN202080058952A CN114269892B CN 114269892 B CN114269892 B CN 114269892B CN 202080058952 A CN202080058952 A CN 202080058952A CN 114269892 B CN114269892 B CN 114269892B
- Authority
- CN
- China
- Prior art keywords
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- dimethyl ether
- glycol dimethyl
- dipropylene glycol
- Prior art date
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/50—Solvents
- C11D7/5004—Organic solvents
- C11D7/5013—Organic solvents containing nitrogen
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/50—Solvents
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/32—Organic compounds containing nitrogen
- C11D7/3209—Amines or imines with one to four nitrogen atoms; Quaternized amines
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D9/00—Chemical paint or ink removers
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/20—Organic compounds containing oxygen
- C11D3/2068—Ethers
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/26—Organic compounds containing nitrogen
- C11D3/28—Heterocyclic compounds containing nitrogen in the ring
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/43—Solvents
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/26—Organic compounds containing oxygen
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/26—Organic compounds containing oxygen
- C11D7/263—Ethers
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/28—Organic compounds containing halogen
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/32—Organic compounds containing nitrogen
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/32—Organic compounds containing nitrogen
- C11D7/3281—Heterocyclic compounds
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/50—Solvents
- C11D7/5004—Organic solvents
- C11D7/5022—Organic solvents containing oxygen
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P52/00—Grinding, lapping or polishing of wafers, substrates or parts of devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P70/00—Cleaning of wafers, substrates or parts of devices
- H10P70/20—Cleaning during device manufacture
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
- C11D2111/10—Objects to be cleaned
- C11D2111/14—Hard surfaces
- C11D2111/22—Electronic devices, e.g. PCBs or semiconductors
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02W—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO WASTEWATER TREATMENT OR WASTE MANAGEMENT
- Y02W30/00—Technologies for solid waste management
- Y02W30/50—Reuse, recycling or recovery technologies
- Y02W30/62—Plastics recycling; Rubber recycling
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Wood Science & Technology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Health & Medical Sciences (AREA)
- Emergency Medicine (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Detergent Compositions (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Cleaning By Liquid Or Steam (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2019154914 | 2019-08-27 | ||
| JP2019-154914 | 2019-08-27 | ||
| PCT/JP2020/029340 WO2021039274A1 (ja) | 2019-08-27 | 2020-07-30 | 組成物、及び接着性ポリマーの洗浄方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN114269892A CN114269892A (zh) | 2022-04-01 |
| CN114269892B true CN114269892B (zh) | 2024-02-23 |
Family
ID=74685865
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202080058952.2A Active CN114269892B (zh) | 2019-08-27 | 2020-07-30 | 组合物、及粘接性聚合物的清洗方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US11781092B2 (https=) |
| JP (1) | JP7574798B2 (https=) |
| KR (1) | KR102669766B1 (https=) |
| CN (1) | CN114269892B (https=) |
| TW (1) | TWI758813B (https=) |
| WO (1) | WO2021039274A1 (https=) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102804998B1 (ko) * | 2020-03-23 | 2025-05-09 | 닛산 가가쿠 가부시키가이샤 | 반도체 기판의 세정 방법, 가공된 반도체 기판의 제조 방법 및 박리용 조성물 |
| US12577508B2 (en) * | 2020-04-09 | 2026-03-17 | Resonac Corporation | Composition, and method for cleaning adhesive polymer |
| WO2022244593A1 (ja) * | 2021-05-21 | 2022-11-24 | 昭和電工株式会社 | 分解洗浄組成物及びその製造方法、並びに接着性ポリマーの洗浄方法 |
| TW202504983A (zh) * | 2021-09-16 | 2025-02-01 | 日商日產化學股份有限公司 | 半導體基板之洗淨方法、加工後之半導體基板之製造方法、以及剝離及溶解用組成物 |
| CN116218612B (zh) * | 2021-12-06 | 2024-07-09 | 上海新阳半导体材料股份有限公司 | 一种聚酰亚胺清洗液在清洗半导体器件中的应用 |
| CN116218611B (zh) * | 2021-12-06 | 2024-06-21 | 上海新阳半导体材料股份有限公司 | 一种聚酰亚胺清洗液 |
| CN116218610B (zh) * | 2021-12-06 | 2024-07-09 | 上海新阳半导体材料股份有限公司 | 一种聚酰亚胺清洗液的制备方法 |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004000969A (ja) * | 2002-05-31 | 2004-01-08 | Internatl Business Mach Corp <Ibm> | 電子コンポーネントからシリコーンポリマ付着物を除去する方法 |
| JP2006176700A (ja) * | 2004-12-24 | 2006-07-06 | Tokuyama Corp | 洗浄剤組成物 |
| CN101201556A (zh) * | 2006-12-15 | 2008-06-18 | 安集微电子(上海)有限公司 | 低蚀刻性光刻胶清洗剂 |
| JP2008252100A (ja) * | 2007-03-21 | 2008-10-16 | General Chemical Performance Products Llc | 半導体エッチング残渣の除去剤及び洗浄剤 |
| BE1020269A5 (nl) * | 2012-01-17 | 2013-07-02 | Taminco | Gebruik van vervangende oplosmiddelen voor n-methylpyrrolidon (nmp). |
| JP2018199808A (ja) * | 2017-05-26 | 2018-12-20 | 荒川化学工業株式会社 | 鉛フリーはんだフラックス用洗浄剤組成物、鉛フリーはんだフラックスの洗浄方法 |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI339780B (en) * | 2005-07-28 | 2011-04-01 | Rohm & Haas Elect Mat | Stripper |
| DE102011088885A1 (de) | 2011-12-16 | 2013-06-20 | Wacker Chemie Ag | Siliconlöser |
| JP2014133855A (ja) | 2012-12-11 | 2014-07-24 | Fujifilm Corp | シロキサン樹脂の除去剤、それを用いたシロキサン樹脂の除去方法並びに半導体基板製品及び半導体素子の製造方法 |
| US11978622B2 (en) * | 2014-06-30 | 2024-05-07 | Entegris, Inc. | Aqueous and semi-aqueous cleaners for the removal of post-etch residues with tungsten and cobalt compatibility |
| KR20160070386A (ko) * | 2014-12-10 | 2016-06-20 | 동우 화인켐 주식회사 | 실리콘계 수지 제거용 조성물 |
| KR102347599B1 (ko) * | 2014-12-16 | 2022-01-10 | 동우 화인켐 주식회사 | 실리콘계 수지 제거용 조성물 |
| JP6536464B2 (ja) | 2016-04-26 | 2019-07-03 | 信越化学工業株式会社 | 洗浄剤組成物及び薄型基板の製造方法 |
| KR102519448B1 (ko) * | 2017-03-24 | 2023-04-07 | 후지필름 일렉트로닉 머티리얼스 유.에스.에이., 아이엔씨. | 표면 처리 방법 및 이를 위한 조성물 |
| PL3844142T3 (pl) * | 2018-08-30 | 2024-12-02 | Huntsman Petrochemical Llc | Czwartorzędowe wodorotlenki amoniowe poliamin |
| KR102181219B1 (ko) * | 2019-04-19 | 2020-11-20 | 동우 화인켐 주식회사 | 접착 폴리머 제거용 조성물 |
-
2020
- 2020-07-30 JP JP2021542667A patent/JP7574798B2/ja active Active
- 2020-07-30 KR KR1020227002686A patent/KR102669766B1/ko active Active
- 2020-07-30 CN CN202080058952.2A patent/CN114269892B/zh active Active
- 2020-07-30 US US17/634,625 patent/US11781092B2/en active Active
- 2020-07-30 WO PCT/JP2020/029340 patent/WO2021039274A1/ja not_active Ceased
- 2020-08-07 TW TW109126780A patent/TWI758813B/zh active
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004000969A (ja) * | 2002-05-31 | 2004-01-08 | Internatl Business Mach Corp <Ibm> | 電子コンポーネントからシリコーンポリマ付着物を除去する方法 |
| JP2006176700A (ja) * | 2004-12-24 | 2006-07-06 | Tokuyama Corp | 洗浄剤組成物 |
| CN101201556A (zh) * | 2006-12-15 | 2008-06-18 | 安集微电子(上海)有限公司 | 低蚀刻性光刻胶清洗剂 |
| JP2008252100A (ja) * | 2007-03-21 | 2008-10-16 | General Chemical Performance Products Llc | 半導体エッチング残渣の除去剤及び洗浄剤 |
| BE1020269A5 (nl) * | 2012-01-17 | 2013-07-02 | Taminco | Gebruik van vervangende oplosmiddelen voor n-methylpyrrolidon (nmp). |
| CN104136595A (zh) * | 2012-01-17 | 2014-11-05 | 塔明克公司 | 改进的n-烷基吡咯烷酮溶剂的用途 |
| JP2018199808A (ja) * | 2017-05-26 | 2018-12-20 | 荒川化学工業株式会社 | 鉛フリーはんだフラックス用洗浄剤組成物、鉛フリーはんだフラックスの洗浄方法 |
Non-Patent Citations (2)
| Title |
|---|
| Design and processing of integrated micro accelerometers using standard CMOS process;Dai, CL ; Lu, SS ; Chang, PZ;《JOURNAL OF THE CHINESE INSTITUTE OF ENGINEERS》;第20卷(第1期);47-55 * |
| 用于清洗行业的低气味醇醚溶剂;陈伟;;中国洗涤用品工业(03);40-42 * |
Also Published As
| Publication number | Publication date |
|---|---|
| CN114269892A (zh) | 2022-04-01 |
| KR20220025847A (ko) | 2022-03-03 |
| WO2021039274A1 (ja) | 2021-03-04 |
| TW202113059A (zh) | 2021-04-01 |
| US11781092B2 (en) | 2023-10-10 |
| JPWO2021039274A1 (https=) | 2021-03-04 |
| KR102669766B1 (ko) | 2024-05-28 |
| US20220290078A1 (en) | 2022-09-15 |
| JP7574798B2 (ja) | 2024-10-29 |
| TWI758813B (zh) | 2022-03-21 |
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Address after: Tokyo, Japan Applicant after: Lishennoco Co.,Ltd. Address before: Tokyo, Japan Applicant before: Showa electrical materials Co.,Ltd. |
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Effective date of registration: 20230506 Address after: Tokyo, Japan Applicant after: Showa electrical materials Co.,Ltd. Address before: Tokyo, Japan Applicant before: SHOWA DENKO Kabushiki Kaisha |
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