JPWO2021105095A5 - - Google Patents
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- Publication number
- JPWO2021105095A5 JPWO2021105095A5 JP2022529919A JP2022529919A JPWO2021105095A5 JP WO2021105095 A5 JPWO2021105095 A5 JP WO2021105095A5 JP 2022529919 A JP2022529919 A JP 2022529919A JP 2022529919 A JP2022529919 A JP 2022529919A JP WO2021105095 A5 JPWO2021105095 A5 JP WO2021105095A5
- Authority
- JP
- Japan
- Prior art keywords
- approximately
- oxygen
- ruthenium
- carried out
- containing layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 claims description 68
- 239000002243 precursor Substances 0.000 claims description 36
- 239000000376 reactant Substances 0.000 claims description 21
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 claims description 17
- 229910052707 ruthenium Inorganic materials 0.000 claims description 17
- 238000010926 purge Methods 0.000 claims description 16
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 15
- 239000001301 oxygen Substances 0.000 claims description 15
- 229910052760 oxygen Inorganic materials 0.000 claims description 15
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 claims description 6
- GQPLMRYTRLFLPF-UHFFFAOYSA-N Nitrous Oxide Chemical compound [O-][N+]#N GQPLMRYTRLFLPF-UHFFFAOYSA-N 0.000 claims description 6
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims description 4
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 claims description 4
- 239000007795 chemical reaction product Substances 0.000 claims description 4
- 239000000758 substrate Substances 0.000 claims description 4
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 claims description 3
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 claims description 3
- 229910001882 dioxygen Inorganic materials 0.000 claims description 3
- 239000001272 nitrous oxide Substances 0.000 claims description 3
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 2
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 2
- 150000003973 alkyl amines Chemical class 0.000 claims description 2
- 229910021529 ammonia Inorganic materials 0.000 claims description 2
- 229910052802 copper Inorganic materials 0.000 claims description 2
- 238000000151 deposition Methods 0.000 claims description 2
- 239000001257 hydrogen Substances 0.000 claims description 2
- 229910052739 hydrogen Inorganic materials 0.000 claims description 2
- 239000012535 impurity Substances 0.000 claims description 2
- 229910052751 metal Inorganic materials 0.000 claims description 2
- 239000002184 metal Substances 0.000 claims description 2
- 229910021645 metal ion Inorganic materials 0.000 claims description 2
- 150000002739 metals Chemical class 0.000 claims description 2
- 229910052750 molybdenum Inorganic materials 0.000 claims description 2
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 claims description 2
- 229910052721 tungsten Inorganic materials 0.000 claims description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 2
- 229910001868 water Inorganic materials 0.000 claims description 2
- 125000000217 alkyl group Chemical group 0.000 claims 1
- 150000001350 alkyl halides Chemical class 0.000 claims 1
- -1 cyclic alkyl halides Chemical class 0.000 description 1
- 125000005010 perfluoroalkyl group Chemical group 0.000 description 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201962940524P | 2019-11-26 | 2019-11-26 | |
| US62/940,524 | 2019-11-26 | ||
| PCT/EP2020/083152 WO2021105095A1 (en) | 2019-11-26 | 2020-11-24 | Ruthenium pyrazolate precursor for atomic layer deposition and similar processes |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2023502764A JP2023502764A (ja) | 2023-01-25 |
| JPWO2021105095A5 true JPWO2021105095A5 (enrdf_load_stackoverflow) | 2023-11-21 |
Family
ID=73598078
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2022529919A Pending JP2023502764A (ja) | 2019-11-26 | 2020-11-24 | 原子層堆積のためのルテニウムピラゾレート前駆体及び類似法 |
Country Status (7)
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2007064376A2 (en) * | 2005-11-28 | 2007-06-07 | Honeywell International Inc. | Organometallic precursors and related intermediates for deposition processes, their production and methods of use |
| TWI425110B (zh) * | 2007-07-24 | 2014-02-01 | Sigma Aldrich Co | 以化學相沉積法製造含金屬薄膜之方法 |
| TW200951241A (en) * | 2008-05-30 | 2009-12-16 | Sigma Aldrich Co | Methods of forming ruthenium-containing films by atomic layer deposition |
| JP2013530304A (ja) * | 2010-04-19 | 2013-07-25 | レール・リキード−ソシエテ・アノニム・プール・レテュード・エ・レクスプロワタシオン・デ・プロセデ・ジョルジュ・クロード | Ｃｖｄ及びａｌｄ用のルテニウム含有前駆体 |
| US9416443B2 (en) * | 2012-02-07 | 2016-08-16 | L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude | Method for the deposition of a ruthenium containing film using arene diazadiene ruthenium(0) precursors |
| JP6509128B2 (ja) * | 2013-12-20 | 2019-05-08 | 株式会社Adeka | ルテニウム化合物、薄膜形成用原料及び薄膜の製造方法 |
| WO2017009948A1 (ja) * | 2015-07-14 | 2017-01-19 | リサーチ コーオペレーション ファウンデーション オブ ヨンナム ユニバーシティ | 原子層蒸着法によるルテニウム薄膜の形成方法 |
| KR102638657B1 (ko) * | 2016-11-08 | 2024-02-19 | 메르크 파텐트 게엠베하 | 사이클로펜타디에닐 리간드를 포함하는 금속 착화합물 |
| CN111344294A (zh) * | 2017-11-16 | 2020-06-26 | 株式会社Adeka | 钌化合物、薄膜形成用原料以及薄膜的制造方法 |
| TWI790320B (zh) * | 2017-12-16 | 2023-01-21 | 美商應用材料股份有限公司 | 釕的選擇性原子層沉積 |
| KR20200118831A (ko) * | 2018-02-12 | 2020-10-16 | 메르크 파텐트 게엠베하 | 무산소성 공반응물을 이용한 루테늄의 기상 증착 방법 |
-
2020
- 2020-11-24 IL IL293077A patent/IL293077A/en unknown
- 2020-11-24 KR KR1020227021527A patent/KR20220104805A/ko active Pending
- 2020-11-24 EP EP20812263.0A patent/EP4065743A1/en active Pending
- 2020-11-24 CN CN202080078108.6A patent/CN114667367A/zh active Pending
- 2020-11-24 WO PCT/EP2020/083152 patent/WO2021105095A1/en unknown
- 2020-11-24 JP JP2022529919A patent/JP2023502764A/ja active Pending
- 2020-11-24 US US17/764,292 patent/US20220341039A1/en not_active Abandoned
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