JPWO2021070919A5 - - Google Patents
Download PDFInfo
- Publication number
- JPWO2021070919A5 JPWO2021070919A5 JP2021551710A JP2021551710A JPWO2021070919A5 JP WO2021070919 A5 JPWO2021070919 A5 JP WO2021070919A5 JP 2021551710 A JP2021551710 A JP 2021551710A JP 2021551710 A JP2021551710 A JP 2021551710A JP WO2021070919 A5 JPWO2021070919 A5 JP WO2021070919A5
- Authority
- JP
- Japan
- Prior art keywords
- underlayer film
- resist underlayer
- measured
- silicon wafer
- extinction coefficient
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2026004220A JP2026063133A (ja) | 2019-10-10 | 2026-01-14 | 複素環化合物を含むレジスト下層膜形成組成物 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2019186784 | 2019-10-10 | ||
| JP2019186784 | 2019-10-10 | ||
| PCT/JP2020/038222 WO2021070919A1 (ja) | 2019-10-10 | 2020-10-09 | 複素環化合物を含むレジスト下層膜形成組成物 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2026004220A Division JP2026063133A (ja) | 2019-10-10 | 2026-01-14 | 複素環化合物を含むレジスト下層膜形成組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPWO2021070919A1 JPWO2021070919A1 (https=) | 2021-04-15 |
| JPWO2021070919A5 true JPWO2021070919A5 (https=) | 2023-08-24 |
| JP7852249B2 JP7852249B2 (ja) | 2026-04-28 |
Family
ID=75437247
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2021551710A Active JP7852249B2 (ja) | 2019-10-10 | 2020-10-09 | 複素環化合物を含むレジスト下層膜形成組成物 |
| JP2026004220A Pending JP2026063133A (ja) | 2019-10-10 | 2026-01-14 | 複素環化合物を含むレジスト下層膜形成組成物 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2026004220A Pending JP2026063133A (ja) | 2019-10-10 | 2026-01-14 | 複素環化合物を含むレジスト下層膜形成組成物 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20220356297A1 (https=) |
| JP (2) | JP7852249B2 (https=) |
| KR (1) | KR102820400B1 (https=) |
| CN (1) | CN114424121B (https=) |
| WO (1) | WO2021070919A1 (https=) |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3368680B2 (ja) * | 1994-09-12 | 2003-01-20 | 日産化学工業株式会社 | 新規エポキシ化合物及びその製造方法 |
| JP2004034148A (ja) | 2002-07-08 | 2004-02-05 | Kurimoto Ltd | 遠心力鋳造法による鉄系形状記憶合金製管継手の品質管理方法 |
| US7816067B2 (en) * | 2005-06-10 | 2010-10-19 | Nissan Chemical Industries, Ltd. | Coating-type underlayer coating forming composition for lithography containing naphthalene resin derivative |
| JP5337983B2 (ja) * | 2007-09-19 | 2013-11-06 | 日産化学工業株式会社 | 多環式脂肪族環を有するポリマーを含むリソグラフィー用レジスト下層膜形成組成物 |
| JP2009096340A (ja) | 2007-10-17 | 2009-05-07 | Toyota Motor Corp | ハイブリッド車およびその制御方法 |
| KR101808893B1 (ko) * | 2011-04-28 | 2017-12-13 | 제이에스알 가부시끼가이샤 | 레지스트 하층막 형성용 조성물 및 패턴 형성 방법 |
| US9195137B2 (en) * | 2012-03-08 | 2015-11-24 | Nissan Chemical Industries, Ltd. | Composition for forming highly adhesive resist underlayer film |
| KR101866209B1 (ko) * | 2012-05-07 | 2018-06-11 | 닛산 가가쿠 고교 가부시키 가이샤 | 레지스트 하층막 형성조성물 |
| AU2013298680C1 (en) * | 2012-07-30 | 2016-11-10 | Akzo Nobel Coatings International B.V. | High heat resistant composition |
| WO2015046149A1 (ja) * | 2013-09-27 | 2015-04-02 | 日産化学工業株式会社 | レジスト下層膜形成組成物及びそれを用いたレジストパターンの形成方法 |
| KR20190028651A (ko) * | 2016-07-15 | 2019-03-19 | 닛산 가가쿠 가부시키가이샤 | 히단토인환을 갖는 화합물을 포함하는 레지스트 하층막형성 조성물 |
| KR20190056088A (ko) * | 2017-11-16 | 2019-05-24 | 롬엔드하스전자재료코리아유한회사 | 감광성 수지 조성물 및 이로부터 제조된 경화막 |
| TWI840342B (zh) * | 2018-02-02 | 2024-05-01 | 日商日產化學股份有限公司 | 具有二硫化物結構之阻劑下層膜形成組成物、阻劑下層膜、使用在半導體裝置的製造之阻劑圖型之形成方法、半導體裝置之製造方法，及經圖型化之基板之製造方法 |
-
2020
- 2020-10-09 KR KR1020227005653A patent/KR102820400B1/ko active Active
- 2020-10-09 US US17/763,253 patent/US20220356297A1/en active Pending
- 2020-10-09 CN CN202080065831.0A patent/CN114424121B/zh active Active
- 2020-10-09 WO PCT/JP2020/038222 patent/WO2021070919A1/ja not_active Ceased
- 2020-10-09 JP JP2021551710A patent/JP7852249B2/ja active Active
-
2026
- 2026-01-14 JP JP2026004220A patent/JP2026063133A/ja active Pending
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR101342024B1 (ko) | 나프탈렌 수지 유도체를 함유하는 리소그래피용 도포형 하층막 형성 조성물 | |
| US5294680A (en) | Polymeric dyes for antireflective coatings | |
| US11215928B2 (en) | Composition for resist underlayer film formation, resist underlayer film and method for forming the same, and production method of a patterned substrate | |
| JP2010528334A5 (https=) | ||
| JP2018146945A5 (https=) | ||
| TWI748087B (zh) | 使用茀化合物之阻劑下層膜形成組成物 | |
| TW201402696A (zh) | 含添加劑之含有矽的ｅｕｖ阻劑底層膜形成組成物 | |
| TW201730267A (zh) | 包含具長鏈烷基之酚醛清漆的阻劑下層膜形成組成物 | |
| TWI460066B (zh) | Pattern formation method | |
| JPWO2019225614A1 (ja) | 環式カルボニル化合物を用いたレジスト下層膜形成組成物 | |
| JPWO2021070919A5 (https=) | ||
| TW202346382A (zh) | 光可固化組成物 | |
| WO2022206316A1 (zh) | 一种减反射防宽红外耐高温树脂镜片及其制备方法 | |
| TWI834886B (zh) | 含有二氰基苯乙烯基之可濕蝕刻之阻劑下層膜形成組成物、經圖案化的基板之製造方法及半導體裝置之製造方法 | |
| TWI546622B (zh) | 感光性樹脂組成物 | |
| JPWO2021171943A5 (https=) | ||
| TW455742B (en) | Photodefinable mixture | |
| WO2020235427A1 (ja) | レジスト下層膜形成組成物 | |
| TWI894293B (zh) | 使用二芳基甲烷衍生物之阻劑下層膜形成組成物、阻劑下層膜及半導體裝置之製造方法 | |
| JPWO2022249863A5 (https=) | ||
| TWI839551B (zh) | 阻劑下層膜形成組成物 | |
| JPH058801B2 (https=) | ||
| JPWO2021260943A5 (https=) | ||
| JP2022132962A (ja) | レジスト下層膜形成組成物 | |
| TWI853103B (zh) | 阻劑下層膜形成組成物 |